| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/11/2004 | EP1445266A2 Photoresist copolymer |
| 08/11/2004 | EP1445120A2 Photosensitive lithographic printing plate |
| 08/11/2004 | EP1444724A2 Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is produced by means of a plasma-enhanced deposition method |
| 08/11/2004 | EP1444552A1 Method for reuse of loaded developer |
| 08/11/2004 | EP1444551A1 Photoresist composition for deep uv radiation containing an additive |
| 08/11/2004 | EP1444550A2 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
| 08/11/2004 | EP1444549A2 Method of patterning electrically conductive polymers |
| 08/11/2004 | EP1444271A1 Fluorinated optical polymer composition |
| 08/11/2004 | EP1444081A1 Composite kinematic coupling |
| 08/11/2004 | EP1230334A4 Non-corrosive cleaning composition for removing plasma etching residues |
| 08/11/2004 | EP1019994B1 Narrow band excimer laser with gas additive |
| 08/11/2004 | EP0900409B1 Processless diacetylenic salt films capable of developing a black image |
| 08/11/2004 | CN1520680A TDI detecting device, feed-through equipment and electrctron beam appts. using these devices |
| 08/11/2004 | CN1520618A Laser parrering of devices |
| 08/11/2004 | CN1520592A Method for prodn. of optical disk matrix |
| 08/11/2004 | CN1520535A Resist remover compsn. |
| 08/11/2004 | CN1520534A Positive resist compsn. of chemical amplification type, resist coated material, method of forming resis pattern, and process for producing semiconductor device |
| 08/11/2004 | CN1520360A Method ofr thermally transferrying oriented materials for organic electronic displays and devices |
| 08/11/2004 | CN1520152A Plotter head unit, plotter and plotting method |
| 08/11/2004 | CN1519890A Photomask group of forming multilayer interlconnection line and semiconductor device made by such photomask |
| 08/11/2004 | CN1519654A Micro imaging method capable of reducing influencc of lens aberration |
| 08/11/2004 | CN1519653A Photoetching mask, its making method and making appts. |
| 08/11/2004 | CN1519652A Mask for projection exposure, projection exposure appts. and used method |
| 08/11/2004 | CN1519651A Projection exposure appts. |
| 08/11/2004 | CN1519650A Hybrid negative typed photoresistive agent in multiple reaction modes and method for forming photoesistive patterns |
| 08/11/2004 | CN1519649A Photosensitive planography printing plate |
| 08/11/2004 | CN1519648A Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern |
| 08/11/2004 | CN1519647A Light mask, mfg. method of electronic device and mfg. method of light mask |
| 08/11/2004 | CN1519592A Photosensitive resin compsn. controlling solubility and pattern formation method of double-layer structure using same |
| 08/11/2004 | CN1519590A Diffusing board and its mfg. method |
| 08/11/2004 | CN1519586A Mfg. method of microlens array |
| 08/11/2004 | CN1519181A Plate supplying appts. |
| 08/11/2004 | CN1161655C Highly transparent, color-pigmented high molecular weight material |
| 08/11/2004 | CN1161449C Stripper compostion for negative chemically amplified resist |
| 08/11/2004 | CN1161242C Picture composition method, device, template and method for making same |
| 08/11/2004 | CN1161231C Lighographic component and its imaging method |
| 08/10/2004 | US6775815 Exposure method for correcting line width variation in a photomask |
| 08/10/2004 | US6775069 Advanced illumination system for use in microlithography |
| 08/10/2004 | US6775063 Optical system and exposure apparatus having the optical system |
| 08/10/2004 | US6775051 Systems and methods for scanning a beam of light across a specimen |
| 08/10/2004 | US6774998 Method and apparatus for identifying misregistration in a complimentary phase shift mask process |
| 08/10/2004 | US6774985 Apparatus imprinting stent configuration image from mask onto tubular blank with photosensitive coating including journaling mechanism receiving and rotating blank, radiation source directing light at surface to expose coating, mask mover |
| 08/10/2004 | US6774984 Optical imaging system with polarizer and a crystalline-quartz plate for use therewith |
| 08/10/2004 | US6774983 Distributed projection system |
| 08/10/2004 | US6774982 Exposure apparatus and device manufacturing method using the same |
| 08/10/2004 | US6774981 Modular exposure apparatus with removable optical device and improved isolation of the optical device |
| 08/10/2004 | US6774380 Variably shaped beam EB writing system |
| 08/10/2004 | US6774379 Electron beam exposure apparatus and deflection amount correction method |
| 08/10/2004 | US6774375 Method and apparatus for forming a curved polyline on a radiation-sensitive resist |
| 08/10/2004 | US6774374 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatuses |
| 08/10/2004 | US6774258 Useful as monomer to form polymer which serves as a base resin in chemically amplified resist |
| 08/10/2004 | US6774192 For use as color filters for liquid-crystal displays |
| 08/10/2004 | US6774097 Resist stripper composition |
| 08/10/2004 | US6774055 In-line system having overlay accuracy measurement function and method for the same |
| 08/10/2004 | US6774044 Reducing photoresist shrinkage via plasma treatment |
| 08/10/2004 | US6774028 Method of forming wiring structure by using photo resist having optimum development rate |
| 08/10/2004 | US6773957 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures |
| 08/10/2004 | US6773888 Photoactivatable silane compounds and methods for their synthesis and use |
| 08/10/2004 | US6773873 pH buffered compositions useful for cleaning residue from semiconductor substrates |
| 08/10/2004 | US6773872 Reduction of inorganic contaminants in polymers and photoresist compositions comprising same |
| 08/10/2004 | US6773870 Comprises controllable transmittance photomask vertically divided into regions having both transparent and dark blocks |
| 08/10/2004 | US6773867 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices |
| 08/10/2004 | US6773866 Aromatic polyimide precursor, wherein a 10 mu m thick polyimide film made from the resin and deposited on a silicon substrate has light transmittance at a wavelength of 365 nm of at least 1% and a residual stress of at most 25 mpa. |
| 08/10/2004 | US6773865 Applying a self-assembled monolayer having metal ligand sites to a substrate; binding a metal deposit to ligand sites of metal ligating self- assembled monolayer; applying a resist to metal deposit |
| 08/10/2004 | US6773864 Substrate comprising: coating layer of an antireflective composition comprising a silicon-containing material; and coating layer of a chemically-amplified positive photoresist composition over the antireflective composition coating layer |
| 08/10/2004 | US6773863 Positive-working chemical-amplification photoresist composition |
| 08/10/2004 | US6773862 Negative resist composition |
| 08/10/2004 | US6773861 UV absorbent and preparation method thereof, compositions and image forming method |
| 08/10/2004 | US6773860 Transferable image receiving sheet and imaging process by use thereof |
| 08/10/2004 | US6773859 Process for making a flexographic printing plate and a photosensitive element for use in the process |
| 08/10/2004 | US6773858 Using an alkali-soluble cellulose whose glucose ring substituent groups are substituted with organic groups at a specific rate of reaction, as a binder in a photoresist composition |
| 08/10/2004 | US6773855 Printed circuit board having a solder resist film formed from the cured film |
| 08/10/2004 | US6773853 Exposing a partial area of a resist film formed on a surface of a substrate to light of different intensities; developing the resist film exposed |
| 08/10/2004 | US6773510 Substrate processing unit |
| 08/10/2004 | US6773503 Method of heat-treating fluoride crystal, method of producing optical part, and optical apparatus |
| 08/10/2004 | US6772776 In a vacuum chamber, generating activated gaseous species that react with the carbon contaminants to form carbon containing gaseous byproducts; especially activating the gas using electrons |
| 08/10/2004 | US6772691 System and method for registering media in an imaging system |
| 08/05/2004 | WO2004066459A1 Electromagnetic radiation pulse timing control |
| 08/05/2004 | WO2004066455A2 Projection illumination unit with an illumination system |
| 08/05/2004 | WO2004066371A1 Exposure device |
| 08/05/2004 | WO2004066370A1 Mask, method for manufacturing mask and method for manufacturing semiconductor device |
| 08/05/2004 | WO2004066366A2 Tailored reflecting diffractor for euv lithographic system aberration measurement |
| 08/05/2004 | WO2004066364A2 Binder diffusion patterning of a thick film paste layer |
| 08/05/2004 | WO2004066358A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 08/05/2004 | WO2004066352A2 System and method for providing high brightness illumination |
| 08/05/2004 | WO2004066276A2 Method and system for replicating film data to a metal substrate and article of manufacture |
| 08/05/2004 | WO2004066029A2 Thermally-convertible lithographic printing precursor developable with aqueous medium |
| 08/05/2004 | WO2004066028A2 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 08/05/2004 | WO2004066026A2 Imageable elements and compositions for imaging by means of uv irradiation |
| 08/05/2004 | WO2004066010A1 Method for production of a facetted mirror |
| 08/05/2004 | WO2004065934A2 Semiconductor fabrication method for making small features |
| 08/05/2004 | WO2004065635A2 Laser exposure of photosensitive masks for dna microarray fabrication |
| 08/05/2004 | WO2004065377A1 Sulfonium salts, radiation-sensitive acid generators, and positive radiation-sensitive resin compositions |
| 08/05/2004 | WO2004065316A2 Polymer derived ceramic materials |
| 08/05/2004 | WO2004065287A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 08/05/2004 | WO2004051709A3 Process for obtaining spatially-organised nanostructures on thin films |
| 08/05/2004 | WO2004051370A8 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 08/05/2004 | WO2004044651B1 A chucking system and method for modulating shapes of substrates |
| 08/05/2004 | WO2004038509A3 Lithography system |
| 08/05/2004 | WO2004038467A3 Improvements in or relating to multiple exposures of photosensitive material |