Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2004
08/17/2004US6777173 H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip
08/17/2004US6777172 Depositing a layer of photoresist on top of a substrate that includes a sloped surface; and scanning an excimer laser beam over the layer of photoresist to expose the layer of photoresist in a desired pattern
08/17/2004US6777170 Stereolithographic patterning by variable dose light delivery
08/17/2004US6777168 Multiple photolithographic exposures with different clear patterns
08/17/2004US6777167 Comprises sterol layer deposited by evaporation, langmuir-blodgett deposition, spin coating and and/or dip coating
08/17/2004US6777166 Aberrations compensation such as image field curvature
08/17/2004US6777165 Plasma display panel for flat high density television; film from a water-developable binder polymer, an unsaturated compound, a photosensitizer, fluorescent dye, solvent and pure water; low temperature baking; pollution control
08/17/2004US6777163 Process for forming a photosensitive element having a layer of particulate material
08/17/2004US6777162 Photosensitive polymer and photoresist composition thereof
08/17/2004US6777161 Chemical resistance; uniform film thickness; mixture of phenolic resin and acid generator
08/17/2004US6777160 Positive-working resist composition
08/17/2004US6777159 Method for forming polyimide pattern using photosensitive polyimide and composition for use therein
08/17/2004US6777158 Method for the preparation of a semiconductor device
08/17/2004US6777157 Copolymers and photoresist compositions comprising same
08/17/2004US6777155 Photosensitive layer includes a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent
08/17/2004US6777147 Method for evaluating the effects of multiple exposure processes in lithography
08/17/2004US6777146 Adjusting line width deviations
08/17/2004US6777145 In-line focus monitor structure and method using top-down SEM
08/17/2004US6777143 Optical lithographic exposure apparatus; suitable for double-exposure procedures in the manufacture of integrated circuits
08/17/2004US6777140 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask
08/17/2004US6777139 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby
08/17/2004US6776845 For applying a liquid which contains a resin dissolved in a solvent, e.g., a polyimide solution, on a substrate, such as a semiconductor wafer or an lcd substrate for a liquid crystal display, to form a liquid film
08/17/2004US6776094 Kit For Microcontact Printing
08/17/2004US6775920 Method of fabricating semiconductor device comprising superposition inspection step
08/12/2004WO2004068566A1 Optical system for vacuum ultraviolet light and projection exposure apparatus
08/12/2004WO2004068564A1 Illumination optical system, illuminating device, projection exposure apparatus and exposure method
08/12/2004WO2004068243A1 Low silicon-outgassing resist for bilayer lithography
08/12/2004WO2004068242A1 Resist composition
08/12/2004WO2004068224A1 Optical devices incorporating photo reactive polymers
08/12/2004WO2004067688A2 Process for refining crude resin for electronic material
08/12/2004WO2004067655A1 Coating composition, antireflective film, photoresist and pattern forming method using same
08/12/2004WO2004067592A1 Resist polymer and resist composition
08/12/2004WO2004067585A1 Polyalkenyl ether compound
08/12/2004WO2004067540A1 Novel compounds capable of forming photoconvertible organic thin films and articles having organic thin films
08/12/2004WO2004055472A3 Method for aberration detection and measurement
08/12/2004WO2004049064A3 Method for the removal of organic residues from finely structured surfaces
08/12/2004WO2004017388A3 Lithographic template and method of formation
08/12/2004WO2004001372A3 Fabrication of high resolution biological molecule detection device
08/12/2004WO2003081339A3 Patterning semiconductor layers using phase shifting and assist features
08/12/2004WO2003036516A3 Photocuring system database
08/12/2004US20040158809 Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus
08/12/2004US20040158808 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation
08/12/2004US20040158427 Stage counter mass system
08/12/2004US20040158348 Reticle storage system
08/12/2004US20040158344 Mask management device in semiconductor wafer production process
08/12/2004US20040157974 Printing ink resist composition, method of forming resist film thereof, and method of producing substrate using the same
08/12/2004US20040157923 1,3-adamantanedicarboxylic acid-bis(2'-alkyl-2'-adamantyl)-esters; photoresist additive; resin heat resistance improver; pharmaceutical and agrochemical intermediates
08/12/2004US20040157430 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment
08/12/2004US20040157419 Heat processing apparatus and heat processing method
08/12/2004US20040157408 Dual sided lithographic substrate imaging
08/12/2004US20040157171 Method for removing patterned layer from lower layer through reflow
08/12/2004US20040157170 Plasma ashing process for removing photoresist and residues during ferroelectric device fabrication
08/12/2004US20040157169 Micro pattern forming method and semiconductor device manufacturing method
08/12/2004US20040157168 Method of improving pattern profile of thin photoresist layer
08/12/2004US20040157166 Lithographic process for multi-etching steps by using single reticle
08/12/2004US20040157165 Methods for forming an air gap in a semiconductor metal line manufacturing process
08/12/2004US20040157164 Method of manufacturing semiconductor integrated circuit devices
08/12/2004US20040157163 Method of improving photoresist layer uniformity
08/12/2004US20040157162 Photosenstivie resin compositive for printing plate precursor capable of laser engraving
08/12/2004US20040157161 Method and apparatus for the hardening of photopolymer plates
08/12/2004US20040157156 Fluorinated vinyl sulfonate compound for use as monomer
08/12/2004US20040157155 Polymers, resist compositions and patterning process
08/12/2004US20040157154 Photosensitive composition, planographic printing plate and processing method of planographic printing plate
08/12/2004US20040157153 Imagewise exposing the light sensitive planographic printing plate material to laser under a non-yellow safelight to form an image, the non-yellow safelight having an optical filter
08/12/2004US20040157152 Capable of forming an image upon irradiation with an infrared laser; has high sensitivity regardless of variation on the light source of an exposure apparatus
08/12/2004US20040157151 Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition
08/12/2004US20040157150 Capable of forming an image by a computer to plate (CTP) system; printability, scratch resistance, and exposure image visualization, as a processless printing plate material
08/12/2004US20040157143 Adjusting an image forming characteristic of a first exposure apparatus in exposure apparatus to expose one layer in consideration of image distortion correction capability of a second exposure apparatus; exposing another layer
08/12/2004US20040157142 Exposing reticle onto a substrate that includes a recording media, in a pattern such that adjacent exposures create a pattern of interlocking alignment attributes; developing the recording media; etching exposed substrate; stripping; measruing
08/12/2004US20040157141 Colored composition and photosensitive transfer material for producing black matrix, black matrix and method for producing the same, color filter, liquid crystal display, and black matrix substrate
08/12/2004US20040157140 Photosensitive coloring composition, color filter using the composition and method of producing the same
08/12/2004US20040157136 Compensation of reflective mask effects in lithography systems
08/12/2004US20040157135 For the proximity effects in the imaging of patterns in a photolithography
08/12/2004US20040156988 Selective and alignment-free molecular patterning of surfaces
08/12/2004US20040156157 Combination current sensor and relay
08/12/2004US20040156112 Method of manufacturing microlens array
08/12/2004US20040156041 Method and apparatus for measuring optical characteristic, and projection exposure apparatus using the same
08/12/2004US20040156030 Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
08/12/2004US20040156029 Method for optimizing an illumination source using full resist simulation and process window response metric
08/12/2004US20040156028 Both side projection exposure apparatus
08/12/2004US20040156026 Exposure apparatus and exposure method
08/12/2004US20040155534 Structure integrating gas support bearing and a planar electromagnetic drive and levitation system
08/12/2004US20040155346 poor quality photo resist patterns are prevented because the focus area is confined to an exposure region
08/12/2004US20040155205 System for recycling gases used in a lithography tool
08/12/2004US20040155204 Mask and method for producing thereof and a semiconductor device using the same
08/12/2004US20040155203 Device and method for optical processing for processing inorganic transparent material by optical patterning
08/12/2004US20040154743 Apparatus and method for low temperature stripping of photoresist and residues
08/12/2004US20040154726 Photoreactive resin composition, method for making circuit substrate using same, and method for making ceramic multilayer substrate using same
08/12/2004US20040154641 Substrate processing apparatus and method
08/12/2004US20040154490 Printing method employing planographic printing plate material
08/12/2004US20040154489 Chemical imaging of a lithographic printing plate
08/12/2004DE19648063B4 Verfahren zum Herstellen einer Mikrolinse eines Halbleiterbauteils A method of manufacturing a microlens of a semiconductor device
08/12/2004DE10338018A1 Photolithographic reduction of lens aberration effects involves carrying out two photolithography transfers of two patterns to wafer while moving plate and wafer parallel to short sides of patterns
08/12/2004DE10302665A1 Projektionsbelichtungsanlage mit einem Beleuchtungssystem Projection exposure apparatus having an illumination system
08/12/2004DE10235255B4 Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren Reflective mirror for lithographic exposure and production methods
08/11/2004EP1445993A2 Extreme uv light source and semiconductor exposure device
08/11/2004EP1445655A1 Image formation method on planographic printing plate precursor
08/11/2004EP1445654A2 Double layer patterning and technique for milling patterns
08/11/2004EP1445653A1 Light sensitive composition and light sensitive planographic printing plate material
08/11/2004EP1445652A2 Removable pellicle frame for photolithographic reticle using magnetic force