| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/17/2004 | US6777173 H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip |
| 08/17/2004 | US6777172 Depositing a layer of photoresist on top of a substrate that includes a sloped surface; and scanning an excimer laser beam over the layer of photoresist to expose the layer of photoresist in a desired pattern |
| 08/17/2004 | US6777170 Stereolithographic patterning by variable dose light delivery |
| 08/17/2004 | US6777168 Multiple photolithographic exposures with different clear patterns |
| 08/17/2004 | US6777167 Comprises sterol layer deposited by evaporation, langmuir-blodgett deposition, spin coating and and/or dip coating |
| 08/17/2004 | US6777166 Aberrations compensation such as image field curvature |
| 08/17/2004 | US6777165 Plasma display panel for flat high density television; film from a water-developable binder polymer, an unsaturated compound, a photosensitizer, fluorescent dye, solvent and pure water; low temperature baking; pollution control |
| 08/17/2004 | US6777163 Process for forming a photosensitive element having a layer of particulate material |
| 08/17/2004 | US6777162 Photosensitive polymer and photoresist composition thereof |
| 08/17/2004 | US6777161 Chemical resistance; uniform film thickness; mixture of phenolic resin and acid generator |
| 08/17/2004 | US6777160 Positive-working resist composition |
| 08/17/2004 | US6777159 Method for forming polyimide pattern using photosensitive polyimide and composition for use therein |
| 08/17/2004 | US6777158 Method for the preparation of a semiconductor device |
| 08/17/2004 | US6777157 Copolymers and photoresist compositions comprising same |
| 08/17/2004 | US6777155 Photosensitive layer includes a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent |
| 08/17/2004 | US6777147 Method for evaluating the effects of multiple exposure processes in lithography |
| 08/17/2004 | US6777146 Adjusting line width deviations |
| 08/17/2004 | US6777145 In-line focus monitor structure and method using top-down SEM |
| 08/17/2004 | US6777143 Optical lithographic exposure apparatus; suitable for double-exposure procedures in the manufacture of integrated circuits |
| 08/17/2004 | US6777140 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask |
| 08/17/2004 | US6777139 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby |
| 08/17/2004 | US6776845 For applying a liquid which contains a resin dissolved in a solvent, e.g., a polyimide solution, on a substrate, such as a semiconductor wafer or an lcd substrate for a liquid crystal display, to form a liquid film |
| 08/17/2004 | US6776094 Kit For Microcontact Printing |
| 08/17/2004 | US6775920 Method of fabricating semiconductor device comprising superposition inspection step |
| 08/12/2004 | WO2004068566A1 Optical system for vacuum ultraviolet light and projection exposure apparatus |
| 08/12/2004 | WO2004068564A1 Illumination optical system, illuminating device, projection exposure apparatus and exposure method |
| 08/12/2004 | WO2004068243A1 Low silicon-outgassing resist for bilayer lithography |
| 08/12/2004 | WO2004068242A1 Resist composition |
| 08/12/2004 | WO2004068224A1 Optical devices incorporating photo reactive polymers |
| 08/12/2004 | WO2004067688A2 Process for refining crude resin for electronic material |
| 08/12/2004 | WO2004067655A1 Coating composition, antireflective film, photoresist and pattern forming method using same |
| 08/12/2004 | WO2004067592A1 Resist polymer and resist composition |
| 08/12/2004 | WO2004067585A1 Polyalkenyl ether compound |
| 08/12/2004 | WO2004067540A1 Novel compounds capable of forming photoconvertible organic thin films and articles having organic thin films |
| 08/12/2004 | WO2004055472A3 Method for aberration detection and measurement |
| 08/12/2004 | WO2004049064A3 Method for the removal of organic residues from finely structured surfaces |
| 08/12/2004 | WO2004017388A3 Lithographic template and method of formation |
| 08/12/2004 | WO2004001372A3 Fabrication of high resolution biological molecule detection device |
| 08/12/2004 | WO2003081339A3 Patterning semiconductor layers using phase shifting and assist features |
| 08/12/2004 | WO2003036516A3 Photocuring system database |
| 08/12/2004 | US20040158809 Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus |
| 08/12/2004 | US20040158808 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation |
| 08/12/2004 | US20040158427 Stage counter mass system |
| 08/12/2004 | US20040158348 Reticle storage system |
| 08/12/2004 | US20040158344 Mask management device in semiconductor wafer production process |
| 08/12/2004 | US20040157974 Printing ink resist composition, method of forming resist film thereof, and method of producing substrate using the same |
| 08/12/2004 | US20040157923 1,3-adamantanedicarboxylic acid-bis(2'-alkyl-2'-adamantyl)-esters; photoresist additive; resin heat resistance improver; pharmaceutical and agrochemical intermediates |
| 08/12/2004 | US20040157430 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 08/12/2004 | US20040157419 Heat processing apparatus and heat processing method |
| 08/12/2004 | US20040157408 Dual sided lithographic substrate imaging |
| 08/12/2004 | US20040157171 Method for removing patterned layer from lower layer through reflow |
| 08/12/2004 | US20040157170 Plasma ashing process for removing photoresist and residues during ferroelectric device fabrication |
| 08/12/2004 | US20040157169 Micro pattern forming method and semiconductor device manufacturing method |
| 08/12/2004 | US20040157168 Method of improving pattern profile of thin photoresist layer |
| 08/12/2004 | US20040157166 Lithographic process for multi-etching steps by using single reticle |
| 08/12/2004 | US20040157165 Methods for forming an air gap in a semiconductor metal line manufacturing process |
| 08/12/2004 | US20040157164 Method of manufacturing semiconductor integrated circuit devices |
| 08/12/2004 | US20040157163 Method of improving photoresist layer uniformity |
| 08/12/2004 | US20040157162 Photosenstivie resin compositive for printing plate precursor capable of laser engraving |
| 08/12/2004 | US20040157161 Method and apparatus for the hardening of photopolymer plates |
| 08/12/2004 | US20040157156 Fluorinated vinyl sulfonate compound for use as monomer |
| 08/12/2004 | US20040157155 Polymers, resist compositions and patterning process |
| 08/12/2004 | US20040157154 Photosensitive composition, planographic printing plate and processing method of planographic printing plate |
| 08/12/2004 | US20040157153 Imagewise exposing the light sensitive planographic printing plate material to laser under a non-yellow safelight to form an image, the non-yellow safelight having an optical filter |
| 08/12/2004 | US20040157152 Capable of forming an image upon irradiation with an infrared laser; has high sensitivity regardless of variation on the light source of an exposure apparatus |
| 08/12/2004 | US20040157151 Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition |
| 08/12/2004 | US20040157150 Capable of forming an image by a computer to plate (CTP) system; printability, scratch resistance, and exposure image visualization, as a processless printing plate material |
| 08/12/2004 | US20040157143 Adjusting an image forming characteristic of a first exposure apparatus in exposure apparatus to expose one layer in consideration of image distortion correction capability of a second exposure apparatus; exposing another layer |
| 08/12/2004 | US20040157142 Exposing reticle onto a substrate that includes a recording media, in a pattern such that adjacent exposures create a pattern of interlocking alignment attributes; developing the recording media; etching exposed substrate; stripping; measruing |
| 08/12/2004 | US20040157141 Colored composition and photosensitive transfer material for producing black matrix, black matrix and method for producing the same, color filter, liquid crystal display, and black matrix substrate |
| 08/12/2004 | US20040157140 Photosensitive coloring composition, color filter using the composition and method of producing the same |
| 08/12/2004 | US20040157136 Compensation of reflective mask effects in lithography systems |
| 08/12/2004 | US20040157135 For the proximity effects in the imaging of patterns in a photolithography |
| 08/12/2004 | US20040156988 Selective and alignment-free molecular patterning of surfaces |
| 08/12/2004 | US20040156157 Combination current sensor and relay |
| 08/12/2004 | US20040156112 Method of manufacturing microlens array |
| 08/12/2004 | US20040156041 Method and apparatus for measuring optical characteristic, and projection exposure apparatus using the same |
| 08/12/2004 | US20040156030 Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations |
| 08/12/2004 | US20040156029 Method for optimizing an illumination source using full resist simulation and process window response metric |
| 08/12/2004 | US20040156028 Both side projection exposure apparatus |
| 08/12/2004 | US20040156026 Exposure apparatus and exposure method |
| 08/12/2004 | US20040155534 Structure integrating gas support bearing and a planar electromagnetic drive and levitation system |
| 08/12/2004 | US20040155346 poor quality photo resist patterns are prevented because the focus area is confined to an exposure region |
| 08/12/2004 | US20040155205 System for recycling gases used in a lithography tool |
| 08/12/2004 | US20040155204 Mask and method for producing thereof and a semiconductor device using the same |
| 08/12/2004 | US20040155203 Device and method for optical processing for processing inorganic transparent material by optical patterning |
| 08/12/2004 | US20040154743 Apparatus and method for low temperature stripping of photoresist and residues |
| 08/12/2004 | US20040154726 Photoreactive resin composition, method for making circuit substrate using same, and method for making ceramic multilayer substrate using same |
| 08/12/2004 | US20040154641 Substrate processing apparatus and method |
| 08/12/2004 | US20040154490 Printing method employing planographic printing plate material |
| 08/12/2004 | US20040154489 Chemical imaging of a lithographic printing plate |
| 08/12/2004 | DE19648063B4 Verfahren zum Herstellen einer Mikrolinse eines Halbleiterbauteils A method of manufacturing a microlens of a semiconductor device |
| 08/12/2004 | DE10338018A1 Photolithographic reduction of lens aberration effects involves carrying out two photolithography transfers of two patterns to wafer while moving plate and wafer parallel to short sides of patterns |
| 08/12/2004 | DE10302665A1 Projektionsbelichtungsanlage mit einem Beleuchtungssystem Projection exposure apparatus having an illumination system |
| 08/12/2004 | DE10235255B4 Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren Reflective mirror for lithographic exposure and production methods |
| 08/11/2004 | EP1445993A2 Extreme uv light source and semiconductor exposure device |
| 08/11/2004 | EP1445655A1 Image formation method on planographic printing plate precursor |
| 08/11/2004 | EP1445654A2 Double layer patterning and technique for milling patterns |
| 08/11/2004 | EP1445653A1 Light sensitive composition and light sensitive planographic printing plate material |
| 08/11/2004 | EP1445652A2 Removable pellicle frame for photolithographic reticle using magnetic force |