| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/19/2004 | US20040161711 Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems |
| 08/19/2004 | US20040161710 Pattern formation method |
| 08/19/2004 | US20040161707 Photomask and pattern forming method employing the same |
| 08/19/2004 | US20040161706 Flash memory with reduced source resistance and fabrication method thereof |
| 08/19/2004 | US20040161705 Relief images; applying curable compound |
| 08/19/2004 | US20040161702 For fabricating circuitized substrates which reduces the formation of shorts |
| 08/19/2004 | US20040161699 For providing relief images of enhanced resolution |
| 08/19/2004 | US20040161698 Provide contrast upon exposure to photogenerated acid; photoimageable |
| 08/19/2004 | US20040161697 For use in the production of a semiconductor |
| 08/19/2004 | US20040161679 Loading into layout processing software the GDS data for two layers that define a transistor; generating a phase mask; inputting gate block data that includes assigned phase areas and polygate areas; generating a trim mask; providing a modified GDS |
| 08/19/2004 | US20040161678 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 08/19/2004 | US20040161677 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 08/19/2004 | US20040161619 Overcoating substrate with polyamic acid and polylactone; baking while controlling temperature; then coating with photoresist; exposure to radiation; development |
| 08/19/2004 | US20040160777 Illumination device, and coordinate measuring instrument having an illumination device |
| 08/19/2004 | US20040160677 Catadioptric reduction lens |
| 08/19/2004 | US20040160666 Catadioptric projection system for 157 nm lithography |
| 08/19/2004 | US20040160653 Systems and methods for correcting for spherical aberration in a scanning imaging system |
| 08/19/2004 | US20040160592 Scanning exposure apparatus |
| 08/19/2004 | US20040160591 Diaphragm for an integrator unit |
| 08/19/2004 | US20040160588 Method of determining stray radiation lithographic projection apparatus |
| 08/19/2004 | US20040160587 Optical magnification adjustment system and projection exposure device |
| 08/19/2004 | US20040160586 Exposure Method and Apparatus with Vibration-Preventative Control |
| 08/19/2004 | US20040160585 Lithographic apparatus and device manufacturing method |
| 08/19/2004 | US20040160584 Exposure apparatus and purging method for the same |
| 08/19/2004 | US20040160583 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/19/2004 | US20040160582 Lithographic apparatus and device manufacturing method |
| 08/19/2004 | US20040160203 System for reducing the effect of reactive forces on a stage using a balance mass |
| 08/19/2004 | US20040160155 Discharge produced plasma EUV light source |
| 08/19/2004 | US20040160132 System and method to reduce the effect of reactive forces on a stage using a balance mass |
| 08/19/2004 | US20040159914 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159890 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159838 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159636 Data path for high performance pattern generator |
| 08/19/2004 | US20040159633 Methods of etching articles via micro contact printing |
| 08/19/2004 | US20040159404 Apparatus for forming a photosensitive element having a layer of particulate material |
| 08/19/2004 | US20040159397 Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information |
| 08/19/2004 | US20040159335 Radiation in the radio or microwave portion of the electromagnetic spectrum is applied to a substrate housed within a pressurized processing chamber to promote desirable chemical reactions involving the substrate; e.g., stripping doped photoresists |
| 08/19/2004 | US20040158973 Spin-valve giant magnetoresistive head and method of manufacturing the same |
| 08/19/2004 | DE10353029B3 Displacement spindle length variation measuring method, for printing plate exposure device, uses measurement of stepping motor clock pulses for displacement of exposure head carrier along reference path |
| 08/19/2004 | DE10302111A1 Bebilderbare Elemente und Zusammensetzungen für Bebilderung mittels UV-Bestrahlung Imageable elements and compositions for imaging by means of UV irradiation |
| 08/19/2004 | DE10258423A1 Verfahren und Maske zur Charakterisierung eines Linsensystems Process and mask for the characterization of a lens system |
| 08/18/2004 | EP1447902A2 Linear motor, stage apparatus, exposure apparatus and device manufacturing method |
| 08/18/2004 | EP1447838A2 System and method to reduce the effect of reactive forces on a stage using a balance mass |
| 08/18/2004 | EP1447717A2 Exposure apparatus, cooling method and device manufacturing method |
| 08/18/2004 | EP1447716A2 Lithographic apparatus with gas flushing system |
| 08/18/2004 | EP1447715A2 Lithographic apparatus and method to detect correct clamping of an object |
| 08/18/2004 | EP1447714A2 Method for generating a circular periodic structure on a basic support material |
| 08/18/2004 | EP1447713A1 Electrode-forming composition for field emission type of display device and method using such a composition |
| 08/18/2004 | EP1447712A1 METHODS OF PRODUCING PHOTOSENSITIVE CERAMIC COMPOSITION AND MULTI−LAYER SUBSTRATE USING IT |
| 08/18/2004 | EP1447711A2 Photomask, pattern formation method using photomask and mask data creation method |
| 08/18/2004 | EP1447440A1 Composition for cleaning |
| 08/18/2004 | EP1447403A1 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
| 08/18/2004 | EP1447238A2 Printing plate material, process of folding the same, and printing process |
| 08/18/2004 | EP1447217A2 Heat-sensitive lithographic printing plate |
| 08/18/2004 | EP1446829A2 Method for forming a structure in a semiconductor substrate |
| 08/18/2004 | EP1446703A2 Optical spot grid array printer |
| 08/18/2004 | EP1446702A2 Maskless printer using photoelectric conversion of a light beam array |
| 08/18/2004 | EP1446701A1 Method for improving sensitometric response of photosensitive imaging media employing microcapsules |
| 08/18/2004 | EP1446700A2 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS |
| 08/18/2004 | EP1446698A1 An interferometer system for a semiconductor exposure system |
| 08/18/2004 | EP1446460A1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 08/18/2004 | EP1446410A1 Multimer forms of acylphosphines and their derivatives |
| 08/18/2004 | EP1353802B1 Method for the production of thermally cross-linked laser engravable flexographic elements and multi-layer composites |
| 08/18/2004 | EP0927381B1 Phase shifting circuit manufacturing method and device |
| 08/18/2004 | CN2634643Y Coated screen back side exposure device of color dispaly tube |
| 08/18/2004 | CN1522484A Line narrowing unit with flexural grating mount |
| 08/18/2004 | CN1522390A Electron beam exposure method and system therefor |
| 08/18/2004 | CN1522389A Method of measuring critical dimension and overlay in single step |
| 08/18/2004 | CN1522388A Photosensitive resin composition, method for producing pattern and electronic parts |
| 08/18/2004 | CN1522387A Photosensitive resin composition and photosensitive dry film resist and photosensitive cover ray film using the same |
| 08/18/2004 | CN1522381A Projection optical system and exposure device having the projection optical system |
| 08/18/2004 | CN1522203A Photosenstivie resin compositive for printing plate precursor capable of laser engraving |
| 08/18/2004 | CN1521803A Method for manufacturing semiconductor device |
| 08/18/2004 | CN1521567A Lithographic apparatus and method to detect correct clamping of an object |
| 08/18/2004 | CN1521566A Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus |
| 08/18/2004 | CN1521565A Electronic device manufacture |
| 08/18/2004 | CN1521564A Exposure unit and method for fabricating color light filter thereof |
| 08/18/2004 | CN1162899C Monocrystalline silicon wafer crystal orientation calibrating method |
| 08/18/2004 | CN1162754C Pattern forming material, pattern forming method, and manufacture method of mask for exposure |
| 08/18/2004 | CN1162753C Polymer for chemically amplified resist and resist composition using the same |
| 08/18/2004 | CN1162752C Cross linking agent for photoresist, and photoresist combination containing the same |
| 08/18/2004 | CN1162745C Active matrix substrate, display device and image sensor |
| 08/18/2004 | CN1162311C System for conveying and supporting sheets |
| 08/17/2004 | US6779171 Field correction of overlay error |
| 08/17/2004 | US6778911 Real time analysis of periodic structures on semiconductors |
| 08/17/2004 | US6778753 Used to fabricate planar optical waveguides with low loss and low birefringence |
| 08/17/2004 | US6778584 High power gas discharge laser with helium purged line narrowing unit |
| 08/17/2004 | US6778285 Automatic in situ pellicle height measurement system |
| 08/17/2004 | US6778260 Coordinate measuring stage and coordinate measuring instrument |
| 08/17/2004 | US6778258 Wafer handling system for use in lithography patterning |
| 08/17/2004 | US6778257 Imaging apparatus |
| 08/17/2004 | US6778255 Exposure apparatus |
| 08/17/2004 | US6777896 Methods and apparatus for initializing a planar motor |
| 08/17/2004 | US6777698 Electron beam exposure apparatus exposing method using an electron beam |
| 08/17/2004 | US6777697 Charged-particle beam exposure apparatus and device manufacturing method using the same |
| 08/17/2004 | US6777694 Electron beam exposure system and electron lens |
| 08/17/2004 | US6777693 Lithographic method using ultra-fine probe needle |
| 08/17/2004 | US6777380 Stripping photoresists |
| 08/17/2004 | US6777345 Patterning methods for fabricating semiconductor devices |
| 08/17/2004 | US6777344 Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications |