G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2004
08/25/2004	EP1450153A1 Inspection device and inspection method for pattern profile, exposure system
08/25/2004	EP1449860A1 Novel fluoropolymer, resist compositions containing the same, and novel fluoromonomers
08/25/2004	EP1449839A2 Fluorinated acrylic compounds, methods for preparation of the compounds and photoresist compositions containing same
08/25/2004	EP1449833A1 Bisimide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
08/25/2004	EP1449655A1 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
08/25/2004	EP1449654A1 A positive type photosensitive image-forming material for an infrared laser and a positive composition for an infrared laser and a positive type photosensitive composition for an infrared laser
08/25/2004	EP1449653A2 Photosensitive composition and planographic printing plate precursor using the same
08/25/2004	EP1449652A2 Planographic printing plate precursor
08/25/2004	EP1449651A2 Polymerizable composition and lithographic printing plate precursor
08/25/2004	EP1449650A2 Photosensitive composition and planographic printing plate precursor using the same
08/25/2004	EP1449284A1 Timing control for two-chamber gas discharge laser system
08/25/2004	EP1449186A2 Laser-transfer film for permanently labeling components
08/25/2004	EP1449034A1 Developing solvent for photopolymerizable printing plates
08/25/2004	EP1449033A1 Defective pixel compensation method
08/25/2004	EP1449032A1 Imaging apparatus
08/25/2004	EP1449031A2 Laser beam pattern generator having rotating scanner compensator and method
08/25/2004	EP1449014A1 Processes using gray scale exposure processes to make microoptical elements and corresponding molds
08/25/2004	EP1448686A1 Stabilized imageable coating composition and printing plate precursor
08/25/2004	EP1448654A1 Radiation curable resin composition for making colored three dimensional objects
08/25/2004	EP1448613A1 Curable mixtures comprising uv-absorber, acylphosphinoxide and hydroxy ketone photoinitiator
08/25/2004	EP1157300B1 Lens system for photodetectors and manufacturing method
08/25/2004	CN1524203A A method of substrate processing and photoresist exposure
08/25/2004	CN1524202A Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask
08/25/2004	CN1524201A Photoresist composition for deep ultraviolet lithography
08/25/2004	CN1524200A Pattern-forming material and method of forming pattern
08/25/2004	CN1524199A Design and layout of phase shifting photolithographic masks
08/25/2004	CN1524104A Photoreactive composition
08/25/2004	CN1523639A Photomask, pattern formation method using photomask and mask data creation method
08/25/2004	CN1523638A Photolithography using single light shield in multiple etching steps
08/25/2004	CN1523451A An etching process
08/25/2004	CN1523449A Pattern formation method
08/25/2004	CN1523448A Transmission shear grating in checkerboard configuration for EUV wavefront sensor
08/25/2004	CN1523447A Photoimageable waveguide composition and waveguide formed therefrom
08/25/2004	CN1523446A Mask graphics producing method and mask graphics producing device
08/25/2004	CN1523445A Light shield for contacting window making process and making process thereof
08/25/2004	CN1523404A Memory capacitor for thin film transistor LCD and process for making same
08/25/2004	CN1523382A Methods of forming waveguides and waveguides formed therefrom
08/25/2004	CN1523381A A process for making color filter
08/25/2004	CN1522854A Original plate for offset
08/25/2004	CN1163797C Positive type photo-anticorrosion composite material
08/25/2004	CN1163796C Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent
08/25/2004	CN1163795C Heat-developable photographic materials
08/24/2004	US6782526 Photomask designing method, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element
08/24/2004	US6782337 Methods and systems for determining a critical dimension an a presence of defects on a specimen
08/24/2004	US6782075 Method of making <200 nm wavelength fluoride crystal lithography/laser optical elements
08/24/2004	US6782074 Optical member for photolithography and method for evaluating the same
08/24/2004	US6782031 Long-pulse pulse power system for gas discharge laser
08/24/2004	US6781766 Projection optical system
08/24/2004	US6781762 Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment
08/24/2004	US6781685 Process and device for in-situ decontamination of a EUV lithography device
08/24/2004	US6781674 System and method to increase throughput in a dual substrate stage double exposure lithography system
08/24/2004	US6781673 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
08/24/2004	US6781672 Exposure apparatus and illumination apparatus
08/24/2004	US6781671 Imaging optical system and exposure apparatus
08/24/2004	US6781670 Immersion lithography
08/24/2004	US6781669 Methods and apparatuses for substrate transporting, positioning, holding, and exposure processing, device manufacturing method and device
08/24/2004	US6781668 Optical arrangement
08/24/2004	US6781285 Packaged strain actuator
08/24/2004	US6781138 Positioning stage with stationary actuators
08/24/2004	US6781086 Method for removing photoresist
08/24/2004	US6781015 Photopolymerization
08/24/2004	US6780953 Organic polymer for anti-reflective coating layer and preparation thereof
08/24/2004	US6780896 Zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. in
08/24/2004	US6780781 Method for manufacturing an electronic device
08/24/2004	US6780656 Correction of overlay offset between inspection layers
08/24/2004	US6780574 Multiple exposure method
08/24/2004	US6780571 Upside down bake plate to make vertical and negative photoresist profile
08/24/2004	US6780570 Method of fabricating a suspended micro-structure with a sloped support
08/24/2004	US6780569 Post-development treatment of patterned photoresist to promote cross-linking of polymer chains
08/24/2004	US6780566 High performance, photoimageable resin compositions and printing plates prepared therefrom
08/24/2004	US6780565 Photosensitive glass paste and method for manufacturing multilayered interconnected circuit board using the same
08/24/2004	US6780563 Polymer, resist composition and patterning process
08/24/2004	US6780562 Lithographic printing plate precursor
08/24/2004	US6780561 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board
08/24/2004	US6780552 Method for controlling the quality of a lithographic structuring step
08/24/2004	US6780550 Single pass lithography overlay technique
08/24/2004	US6780549 Photopolymerizable unsaturated compound, a compound containing an epoxy group, a photopolymerization initiator or sensitizer, and a silica sol filler with a diameter of between 5 nm-0.5 mu m
08/24/2004	US6780546 Blue-sensitized holographic media
08/24/2004	US6780502 Crosslinked elastic polymer in a photo- or thermally-polymerizable resin
08/24/2004	US6780492 Stamping; etching; useful in the manufacture of microelectronic circuitry, biosensors, and high-density assay; biosensors
08/24/2004	US6780461 Environment exchange control for material on a wafer surface
08/24/2004	CA2319018C Process for ashing organic materials from substrates
08/19/2004	WO2004070799A1 Mask processing device, mask processing method, program, and mask
08/19/2004	WO2004070473A1 Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith
08/19/2004	WO2004070472A1 Photomask blank, photomask, and pattern transfer method using photomask
08/19/2004	WO2004070471A2 Arc layer for semiconductor device
08/19/2004	WO2004069959A2 Process for refining crude resin for resist
08/19/2004	WO2004069916A2 Photo-imageable nanocomposites
08/19/2004	WO2004069552A1 Lithographic printing plate original form and plate making method
08/19/2004	WO2004069437A1 Methods and device for removing cross-linked polymers from metal structures
08/19/2004	WO2004055595A3 Method for operating a developing machine and developing machine
08/19/2004	WO2004049065A3 Curable covercoat compositions, cured products obtained therefrom, and methods of manufacture thereof
08/19/2004	WO2004044944A3 Raster frame beam system for electron beam lithography
08/19/2004	WO2003087166A3 Photoactivatable silane compounds and methods for their synthesis and use
08/19/2004	WO2003062921A3 Process and appratus for removal of photoresist from semiconductor wafers using spray nozzles
08/19/2004	US20040162687 Method and apparatus for self-referenced wafer stage positional error mapping
08/19/2004	US20040162363 Mixture of polyamic acid, photosensitive agent, dispersion and solvent; desolventizing; fineness circuit pattern; curing, exposure, development; heat resistance, dimensional stability and insulating properties
08/19/2004	US20040162211 Fused silica having high internal transmission and low birefringence
08/19/2004	US20040162008 Refrigerant supply apparatus
08/19/2004	US20040161864 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern

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