| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/31/2004 | US6784275 Active energy ray-curable polyimide resin composition |
| 08/31/2004 | US6784268 Ether, polymer, resist composition and patterning process |
| 08/31/2004 | US6784221 Epoxy acrylate of aromatic biphenol-advanced epoxy resin reacted with anhydride |
| 08/31/2004 | US6784036 Method for making semiconductor device |
| 08/31/2004 | US6784005 Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts |
| 08/31/2004 | US6784001 Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same |
| 08/31/2004 | US6783921 Method for etching laminated assembly including polyimide layer |
| 08/31/2004 | US6783919 A stripping formualtion for a photoresist, contains by weight % 20-60 of ethanolamine, 15-50 of n,n-dimethylacetamide, 15-50 of carbitol and 0.1- 10 of gallic acid |
| 08/31/2004 | US6783918 A multifunctional epoxy component, a difunctional epoxy component, a silane coupling agent, an aryl sulfonium photoinitiator, and a non-photoreactive solvent |
| 08/31/2004 | US6783917 High resolution, dimensional stability; electronic devices with smaller feature sizes |
| 08/31/2004 | US6783916 Hydroxyl-containing polymer, amino cross-linking agent, thermal acid generator; for use as undercoat layer in deep uv lithography |
| 08/31/2004 | US6783915 Forming a light-to-heat conversion layer over a donor substrate, covering with black matrix transfer layer, contacting a substrate of display with matrix transfer layer, selective irradiation and transfer of the pattern to receiver |
| 08/31/2004 | US6783914 Encapsulated inorganic resists |
| 08/31/2004 | US6783912 Photoacid generators and photoresists comprising same |
| 08/31/2004 | US6783911 Isocyanate crosslinked imageable compositions |
| 08/31/2004 | US6783905 Exposure region is divided into a plurality of grating regions. a pattern density is obtained for one of the plurality of grating regions. a backward scattering coefficient is determined in accordance with the pattern |
| 08/31/2004 | US6783904 Lithography correction method and device |
| 08/31/2004 | US6783903 Lithographic patterning; calibration |
| 08/31/2004 | US6783840 Resist ink composition |
| 08/31/2004 | US6783836 Adhesion or bonding strength; reduce gloss, reflection |
| 08/31/2004 | US6783809 Photosensitive diacrylate and dimethacrylate compositions |
| 08/31/2004 | US6783695 Acid blend for removing etch residue |
| 08/31/2004 | US6782843 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 08/26/2004 | WO2004073053A1 Stage device, exposure device, and device manufacturing method |
| 08/26/2004 | WO2004073052A1 Exposure apparatus and optical member for exposure apparatus |
| 08/26/2004 | WO2004073049A2 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 08/26/2004 | WO2004072737A2 Method for generating a circular periodic structure on a basic support material |
| 08/26/2004 | WO2004072736A1 Ag paste composition for microelectrode formation and microelectrode formed using the same |
| 08/26/2004 | WO2004072734A2 Transmission mask with differential attenuation to improve iso-dense proximity |
| 08/26/2004 | WO2004072324A1 Fabrication method and apparatus |
| 08/26/2004 | WO2004055592A3 Stable non-photosensitive polyimide precursor compoistions for use in bilayer imaging systems |
| 08/26/2004 | WO2004049062A3 Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits |
| 08/26/2004 | WO2004038761B1 Self-aligning contacts for stacked electronics |
| 08/26/2004 | WO2004031854A3 Illumination system for a wavelength = 193 nm, comprising sensors for determining the illumination |
| 08/26/2004 | WO2004000928A3 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
| 08/26/2004 | US20040168147 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 08/26/2004 | US20040168146 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 08/26/2004 | US20040167748 Characterizing an exposure tool for patterning a wafer |
| 08/26/2004 | US20040167743 System and method for on-the-fly eccentricity recognition |
| 08/26/2004 | US20040167322 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
| 08/26/2004 | US20040167315 For inkjet inks, printing inks, coating paints for cans, plastics, paper, wood and the like, adhesives, phototyping three dimensional modelling |
| 08/26/2004 | US20040167312 Phenol novolak resin, production process thereof, and positive photoresist composition using the same |
| 08/26/2004 | US20040167298 suitable for fine pattern formation in the semiconductor lithography |
| 08/26/2004 | US20040166690 Methods of forming semiconductor constructions |
| 08/26/2004 | US20040166677 Process to suppress lithography at a wafer edge |
| 08/26/2004 | US20040166448 Method for shrinking the image of photoresist |
| 08/26/2004 | US20040166447 diffusing chemical material from a diffusion layer into a pattern photoresist to react to form a reaction layer within the skin layer of the resist; removing the layer to trim said first line width to form a second line width of resist |
| 08/26/2004 | US20040166446 forming a conductive film by an electroless plating method on a glass master having fine depressions and protrusions; electrolytically plating the conductive film; and removing the film and the electrolytic plating layer; film 35 to 200 nm. thick |
| 08/26/2004 | US20040166438 water soluble polymer between metallic surface and polymer layer, especially a patterned photoactive polymer; enhanced adhesion; prevents "curling" or lifting of the other polymer from the metallic surface and prevents undercutting during etching |
| 08/26/2004 | US20040166437 dioxylithocholates, e.g., 3 alpha -acetyl tert-butyl lithocholate and alpha ,10 alpha -diacetyl tert-butyl lithocholate; added to a mixture of a photoacid generator, solvent and a photoresist polymer; contact hole formation |
| 08/26/2004 | US20040166436 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers |
| 08/26/2004 | US20040166434 Photoresist composition for deep ultraviolet lithography |
| 08/26/2004 | US20040166433 Photoresist composition for deep ultraviolet lithography |
| 08/26/2004 | US20040166432 containing long-chain alkoxyl groups; improved resolution and focus latitude; minimized line width variation or shape degradation and debris left after coating, development and peeling; improved pattern profile; suited for microfabrication. |
| 08/26/2004 | US20040166431 microcapsule containing hydrophobic reactive compound; water-soluble compound reactive with hydrophobe; image-forming layer contains water-soluble compound outside microcapsule; on-press developability, long press life, scumming resistance |
| 08/26/2004 | US20040166425 capable of specifying a trajectory characterized as a mathematical smooth function to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time |
| 08/26/2004 | US20040166421 a membrane portion supported by a substrate and having on one side a shielding membrane that has a microaperture; relieves stress that is generated in the border between the membrane portion and the substrate when the membrane portion is sagged. |
| 08/26/2004 | US20040166419 Resolution and process window improvement using lift-off |
| 08/26/2004 | US20040166418 Adjusting line width deviations |
| 08/26/2004 | US20040165883 Developing apparatus and developing method |
| 08/26/2004 | US20040165882 Method for replenishing developer of automatic developing apparatus for photosensitive lithographic printing plate |
| 08/26/2004 | US20040165761 System and method for inspecting errors on a wafer |
| 08/26/2004 | US20040165287 Retainer, exposure apparatus, and device fabrication method |
| 08/26/2004 | US20040165282 Catopic projection optical system and exposure apparatus |
| 08/26/2004 | US20040165271 Enhancing light coupling efficiency for ultra high numerical aperture lithography through first order transmission optimization |
| 08/26/2004 | US20040165257 High performance catadioptric imaging system |
| 08/26/2004 | US20040165255 Catoptic projection optical system |
| 08/26/2004 | US20040165195 Position sensor |
| 08/26/2004 | US20040165194 Method and apparatus for characterization of optical systems |
| 08/26/2004 | US20040165173 Lithographic apparatus, device manufacturing method, and method of manufacturing a component |
| 08/26/2004 | US20040165172 Modular stage with reaction force cancellation |
| 08/26/2004 | US20040165171 Arrangement for debris reduction in a radiation source based on a plasma |
| 08/26/2004 | US20040165170 Pattern generator |
| 08/26/2004 | US20040165169 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 08/26/2004 | US20040165168 Lithographic apparatus and device manufacturing method |
| 08/26/2004 | US20040165167 Method for evaluating lithography system, method for adjusting substrate-processing apparatus, lithography system, and exposure apparatus |
| 08/26/2004 | US20040165166 Exposure apparatus and production method of device using the same |
| 08/26/2004 | US20040165164 Method and system for improving exposure uniformity in a step and repeat process |
| 08/26/2004 | US20040165163 [substrate exposure apparatus and method] |
| 08/26/2004 | US20040165161 Cooling mechanism |
| 08/26/2004 | US20040165160 Lithographic apparatus and device manufacturing method |
| 08/26/2004 | US20040165159 Lithographic apparatus and device manufacturing method |
| 08/26/2004 | US20040165056 Scanning brush and method of use |
| 08/26/2004 | US20040164470 Anti-vibration technique |
| 08/26/2004 | US20040164293 Method of making barrier layers |
| 08/26/2004 | US20040163758 Patterning solution deposited thin films with self-assembled monolayers |
| 08/26/2004 | US20040163563 Imprint lithography template having a mold to compensate for material changes of an underlying liquid |
| 08/26/2004 | DE19607671B4 Verfahren zur Herstellung optischer Bauelemente mit angekoppelten Lichtwellenleitern und nach diesem Verfahren hergestellte Bauelemente Process for the production of optical components with the coupled optical waveguides and components produced by this process |
| 08/26/2004 | DE10392145T5 Extremultraviolett-Lichtquellenvorrichtung Extreme ultraviolet light source device |
| 08/26/2004 | DE10337262A1 Fotomaske, Verfahren zum Herstellen einer elektronischen Vorrichtung, Verfahren zum Herstellen einer Fotomaske Photomask, method for manufacturing an electronic device, method of manufacturing a photomask |
| 08/26/2004 | DE10323728A1 Verfahren zur Verbesserung der Gleichmäßigkeit einer Fotolackschicht A method for improving the uniformity of a photoresist layer |
| 08/26/2004 | DE10305270A1 Verfahren und Vorrichtung zum Entfernen von vernetzten Polymeren aus Metallstrukturen Method and apparatus for removing crosslinked polymers of metal structures |
| 08/25/2004 | EP1450398A2 A method and an apparatus for positioning a substrate relative to a support stage |
| 08/25/2004 | EP1450392A1 Methods and apparatus for positioning a substrate relative to a support stage |
| 08/25/2004 | EP1450361A1 Method for manufacturing stamper for information medium and device for manufacturing stamper for information medium |
| 08/25/2004 | EP1450210A1 Apparatus and method for detecting the edge of a recording material |
| 08/25/2004 | EP1450209A1 Catoptric projection optical system |
| 08/25/2004 | EP1450208A1 Lithographic apparatus having two object holders |
| 08/25/2004 | EP1450207A1 Planographic printing plate precursor |
| 08/25/2004 | EP1450196A1 Catoptric projection optical system and exposure apparatus |