| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/02/2004 | US20040170772 Pump with pressure vessel with partitions for separation and discharging a solution |
| 09/02/2004 | US20040170771 Moving a liquid between a substrate and a template, forming an oblique angle in a plane reducing the distance between substrate and plane and forming a dispersion |
| 09/02/2004 | US20040170770 Bonding and coating a layer for polymers, perfluorosilanes, bonding to coatings |
| 09/02/2004 | US20040170764 Method for coating photoresist on a substrate |
| 09/02/2004 | US20040169937 Optical system for providing a useful light beam influenced by polarization |
| 09/02/2004 | US20040169924 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 09/02/2004 | US20040169914 Catadioptric optical system and exposure apparatus having the same |
| 09/02/2004 | US20040169866 Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
| 09/02/2004 | US20040169861 Apparatus and method for detecting overlay errors using scatterometry |
| 09/02/2004 | US20040169838 Combined on-axis and off-axis illumination |
| 09/02/2004 | US20040169837 Enhanced lithographic displacement measurement system |
| 09/02/2004 | US20040169836 Method of producing an optical imaging system |
| 09/02/2004 | US20040169835 Light condenser |
| 09/02/2004 | US20040169834 Optical device for use with a lithography method |
| 09/02/2004 | US20040169833 Exposure apparatus and exposure method |
| 09/02/2004 | US20040169832 Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same |
| 09/02/2004 | US20040169441 Apparatus to orientate a body with respect to a surface |
| 09/02/2004 | US20040169235 Semiconductor device including a plurality of kinds of MOS transistors and method of manufacturing the same |
| 09/02/2004 | US20040169163 Mixture containing oxidizer and polymerization inhibitor |
| 09/02/2004 | US20040169147 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/02/2004 | US20040169024 Methods for preparing ball grid array substrates via use of a laser |
| 09/02/2004 | US20040169010 Using water vapor to removal impurities; etching titanium nitride film using photoresist as masking; using oxygen, nitrogen as ashing gases; then water |
| 09/02/2004 | US20040169009 Dry developing method |
| 09/02/2004 | US20040168765 Transport apparatus |
| 09/02/2004 | US20040168710 Cleaning solution and method of cleaning a semiconductor substrate using the same |
| 09/02/2004 | US20040168632 Manufacturing system in electronic devices |
| 09/02/2004 | US20040168613 Composition and method to form a release layer |
| 09/02/2004 | US20040168602 Apparatus for controlling the temperature of an exposure drum in a printing plate exposer |
| 09/02/2004 | US20040168599 Wet offset printing form |
| 09/02/2004 | US20040168598 Printing plate material, process of folding the same, and printing process |
| 09/02/2004 | US20040168597 Printing process film, manufacturing method thereof, process film recycling method, and printer |
| 09/02/2004 | US20040168588 Method of orientating a template with respect to a substrate in response to a force exerted on the template |
| 09/02/2004 | US20040168586 Imprint lithography template having a feature size under 250 nm |
| 09/02/2004 | US20040168571 Method for purification of lens gases used in photolithography |
| 09/02/2004 | DE19840833B4 Verfahren zur geometrischen Korrektur von Strukturfehlern A method for geometric correction of structural defects |
| 09/02/2004 | DE10304674A1 Substrate illumination method with a structural pattern that compensates for the optical proximity effect, for use in semiconductor manufacture wherein serif lengths are reduced by a specified amount |
| 09/02/2004 | CA2516495A1 Process for producing water-developable printing plate for use in relief printing |
| 09/02/2004 | CA2515793A1 Optical lithography using both photomask surfaces |
| 09/02/2004 | CA2511979A1 Halogenated oxime derivatives and the use thereof as latent acids |
| 09/01/2004 | EP1453080A1 Process and composition for removing residues from the microstructure of an object |
| 09/01/2004 | EP1453076A2 Deflector, method of its manufacture and its use in a charged particle beam exposure apparatus |
| 09/01/2004 | EP1452923A1 Agent for forming coating for narrowing pattern and method for forming fine pattern using the same |
| 09/01/2004 | EP1452922A1 Method for forming fine pattern |
| 09/01/2004 | EP1452921A1 Projection exposure method and apparatus and device manufacturing method |
| 09/01/2004 | EP1452920A2 Device manufacturing method,device manufactured thereby,computer program for performing the method,lithographic apparatus, and robotics system |
| 09/01/2004 | EP1452919A1 Positive resist composition and method of forming resist pattern |
| 09/01/2004 | EP1452918A1 Positive resist composition and method of forming resist pattern |
| 09/01/2004 | EP1452917A1 Positive resist composition and method of forming resist pattern from the same |
| 09/01/2004 | EP1452916A2 Photosensitive composition, planographic printing plate and processing method of planographic printing plate |
| 09/01/2004 | EP1452915A2 Recording material for holograms, manufacturing method thereof, hologram recording method and hologram reproduction method |
| 09/01/2004 | EP1452851A1 Method and device for measuring contamination of a surface of a component of a lithographic apparatus |
| 09/01/2004 | EP1452620A1 Mask used for layer formation and process of making the mask |
| 09/01/2004 | EP1452335A1 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
| 09/01/2004 | EP1452312A1 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
| 09/01/2004 | EP1452311A2 Arrangement for tempering an exposure drum in a printing plate exposure apparatus |
| 09/01/2004 | EP1451642A1 Chemical rinse composition |
| 09/01/2004 | EP1451641A1 Method and apparatus for image formation |
| 09/01/2004 | EP1451640A1 Photosensitive composition and production processes for photosensitive film and printed wiring board |
| 09/01/2004 | EP1451629A1 Homogenizer |
| 09/01/2004 | EP1451619A2 Structures and methods for reducing aberration in optical systems |
| 09/01/2004 | EP1451413A2 Real-time component monitoring and replenishment system for multicomponent fluids |
| 09/01/2004 | EP1451228A1 Fluorine-containing compounds and polymers derived therefrom |
| 09/01/2004 | EP1451015A1 High speed negative working thermal printing plates |
| 09/01/2004 | EP1451014A1 Laser engravable flexo printing elements for the production of flexo printing forms containing blends of hydrophilic polymers and hydrophobic elastomers |
| 09/01/2004 | EP1089884A4 Method and apparatus for manufacturing cylindrical articles |
| 09/01/2004 | CN2638055Y Criminal investication trace identification special wire optical source for raising image quality |
| 09/01/2004 | CN1526161A Method for removing etch residue resulting from a process for forming a via |
| 09/01/2004 | CN1526008A Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 09/01/2004 | CN1526007A Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 09/01/2004 | CN1525259A Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector |
| 09/01/2004 | CN1525251A 曝光机构和曝光方法 Exposure institutions and exposure method |
| 09/01/2004 | CN1525250A Holotype photoresist combination and forming method of resist pattern |
| 09/01/2004 | CN1525249A Polymerizable composition and lithographic printing plate precursor |
| 09/01/2004 | CN1525248A Positivity light-sensitive composition |
| 09/01/2004 | CN1525247A Device manufacturing method, lithographic apparatus, and robotics system and program |
| 09/01/2004 | CN1525245A Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 09/01/2004 | CN1525160A Method and device for measuring contamination of a surface of a component of a lithographic apparatus |
| 09/01/2004 | CN1165072C Method of forming micro drawing of semiconductor device |
| 09/01/2004 | CN1164977C Method for increasing focusing depth in heliography |
| 09/01/2004 | CN1164418C Filmable material with selectively modifiable characteristics by administration of particular types of energy |
| 08/31/2004 | US6785583 Management system and apparatus, method therefor, and device manufacturing method |
| 08/31/2004 | US6785316 Excimer or molecular laser with optimized spectral purity |
| 08/31/2004 | US6785214 Use of these nanocomposite materials having multiple read/write capabilities at differing wavelengths for use a memory storage medium |
| 08/31/2004 | US6785115 Electrostatic chuck and substrate processing apparatus |
| 08/31/2004 | US6785051 Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| 08/31/2004 | US6785005 Switching type dual wafer stage |
| 08/31/2004 | US6784992 Polarization measurement device and method |
| 08/31/2004 | US6784979 Full-contact type exposure device |
| 08/31/2004 | US6784978 Method, system, and apparatus for management of reaction loads in a lithography system |
| 08/31/2004 | US6784977 Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography |
| 08/31/2004 | US6784976 System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control |
| 08/31/2004 | US6784975 Method and apparatus for irradiating a microlithographic substrate |
| 08/31/2004 | US6784974 Exposure method and exposure apparatus |
| 08/31/2004 | US6784972 Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus |
| 08/31/2004 | US6784912 Compact multibeam laser light source and interleaving raster scan line method for exposing printing plates |
| 08/31/2004 | US6784442 Exposure apparatus, control method thereof, and device manufacturing method |
| 08/31/2004 | US6784438 Electron projection lithography apparatus using secondary electrons |
| 08/31/2004 | US6784426 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method |
| 08/31/2004 | US6784312 Fluorine-containing acrylate monomers |
| 08/31/2004 | US6784300 Monomer/oligomer linked by siloxane to a silicon atom, binders, an acid gernerator when exposed to actinic radiation and a sensitizer |