| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/08/2004 | CN1165968C Method for mfg. semiconductor crystal plate by making several zone masks having various scatter abilites |
| 09/08/2004 | CN1165955C Ligh-life electrode for high pressure discharge lamp |
| 09/08/2004 | CN1165812C Photosensitive pastes and substrates for plasma display panel using the same |
| 09/08/2004 | CN1165435C Thermal transfer element with plasticizer-contg. transfer layer and thermal transfer process |
| 09/07/2004 | US6789250 Pattern data generation system, method and program for pattern data generation, reticle fabricating method, and semiconductor device manufacturing method using the pattern data |
| 09/07/2004 | US6788763 Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge |
| 09/07/2004 | US6788477 Apparatus for method for immersion lithography |
| 09/07/2004 | US6788471 Projection exposure apparatus for microlithography |
| 09/07/2004 | US6788433 Character information processor |
| 09/07/2004 | US6788400 Method and apparatus for detecting aberrations in an optical system |
| 09/07/2004 | US6788393 Stage unit and exposure apparatus |
| 09/07/2004 | US6788392 Exposure apparatus, device manufacturing method, gas substituting apparatus, and gas substituting method |
| 09/07/2004 | US6788391 Illumination device, exposure apparatus and exposure method |
| 09/07/2004 | US6788390 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 09/07/2004 | US6788389 Production method of projection optical system |
| 09/07/2004 | US6788388 Illumination device for projection system and method for fabricating |
| 09/07/2004 | US6788387 Lithographic objective having a first lens group including only lenses having a positive refractive power |
| 09/07/2004 | US6788386 Lithographic apparatus and device manufacturing method |
| 09/07/2004 | US6788385 Stage device, exposure apparatus and method |
| 09/07/2004 | US6788383 Lithographic apparatus, device manufacturing methods, and computer-readable storage medium |
| 09/07/2004 | US6787813 Substrate exposure apparatus |
| 09/07/2004 | US6787789 Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/07/2004 | US6787788 Electrode insulator materials for use in extreme ultraviolet electric discharge sources |
| 09/07/2004 | US6787784 Charged-particle beam drawing data creation method, and charged-particle beam drawing apparatus using the same |
| 09/07/2004 | US6787780 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device |
| 09/07/2004 | US6787759 Atomic lithography of two dimensional nanostructures |
| 09/07/2004 | US6787622 Radical polymerizable compound having at least one connecting hetero atom |
| 09/07/2004 | US6787583 Water soluble; binder is acrylated resin; photoinitiator; easy cleaning; excellent wipeability; counterfeit protection |
| 09/07/2004 | US6787459 Method for fabricating a semiconductor device |
| 09/07/2004 | US6787457 Method of etching and anti-reflection film using substituted hydrocarbon with halogen gas |
| 09/07/2004 | US6787455 Bi-layer photoresist method for forming high resolution semiconductor features |
| 09/07/2004 | US6787293 Mixture of fluoride compound, acid and sugar |
| 09/07/2004 | US6787290 Positive-working photoresist composition and resist patterning method using same |
| 09/07/2004 | US6787289 Optics |
| 09/07/2004 | US6787288 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices |
| 09/07/2004 | US6787287 Photosensitive polymers and resist compositions comprising the photosensitive polymers |
| 09/07/2004 | US6787286 Solvents and photoresist compositions for short wavelength imaging |
| 09/07/2004 | US6787285 Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator |
| 09/07/2004 | US6787284 Positive resist composition and base material carrying layer of the positive resist composition |
| 09/07/2004 | US6787283 Positive photoresist composition for far ultraviolet exposure |
| 09/07/2004 | US6787282 An acrylate ester resin that increases a solubility rate in an alkali developing solution by the action of a photoacid generator |
| 09/07/2004 | US6787281 Such as 2-methoxy-4-(phenylamino)-benzenediazonium dodecyl sulfate (msds), which does not contain ozone depletion elements (fluorine, heavy metals); pollution control; lithography |
| 09/07/2004 | US6787274 Mask having dummy features formed at peripheries of isolated edges of features corresponding to each circuit element of an integrated circuit to correct the optical proximity effect (ope) |
| 09/07/2004 | US6787271 Design and layout of phase shifting photolithographic masks |
| 09/07/2004 | US6787198 Hydrothermal treatment of nanostructured films |
| 09/07/2004 | US6787180 Exhaust flow control system |
| 09/07/2004 | US6786994 Polyeric transfer sheet |
| 09/07/2004 | US6786977 Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits |
| 09/07/2004 | US6786970 Equipment for fabricating a semiconductor product |
| 09/07/2004 | US6786607 Arrangement for storing and transporting at least one optical component |
| 09/07/2004 | US6786154 Mechanism for correcting unbalance of a rotor |
| 09/02/2004 | WO2004075269A1 Neutral particle beam lithography |
| 09/02/2004 | WO2004075268A1 Transfer method, exposure method and exposure device, and device manufacturing method |
| 09/02/2004 | WO2004075234A1 Plasma display panel manufacturing method |
| 09/02/2004 | WO2004075232A1 Original form for partition transfer intaglio and method for forming partitions of plasma display panel using the original form |
| 09/02/2004 | WO2004075174A2 System and method for cutting using a variable astigmatic focal beam spot |
| 09/02/2004 | WO2004074942A1 Process for producing water development printing plate for relief printing |
| 09/02/2004 | WO2004074941A1 Water soluble resin composition, method of pattern formation and method of inspecting resist pattern |
| 09/02/2004 | WO2004074940A1 Pattern generation method |
| 09/02/2004 | WO2004074939A1 Exposure apparatus for liquid crystal panel and exposure apparatus |
| 09/02/2004 | WO2004074938A1 Acrylic polymer-containing gap filler forming composition for lithography |
| 09/02/2004 | WO2004074937A1 Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method |
| 09/02/2004 | WO2004074936A1 Negative radiation-sensitive resin composition |
| 09/02/2004 | WO2004074935A1 Micropatterning of molecular surfaces via selective irradiation |
| 09/02/2004 | WO2004074934A1 Mask making method, mask making device, and mask drawing device |
| 09/02/2004 | WO2004074933A2 Dissolution rate modifiers for photoresist compositions |
| 09/02/2004 | WO2004074930A2 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 09/02/2004 | WO2004074929A2 Radiation-sensitive compositions and imageable elements based thereon |
| 09/02/2004 | WO2004074928A2 Photoresist composition for deep ultraviolet lithography |
| 09/02/2004 | WO2004074765A1 Method of forming ultrasmall structures and apparatus therefor |
| 09/02/2004 | WO2004074328A1 Photocurable compositions |
| 09/02/2004 | WO2004074242A2 Halogenated oxime derivatives and the use thereof as latent acids |
| 09/02/2004 | WO2004073379A2 Optical lithography using both photomask surfaces |
| 09/02/2004 | WO2004051706A3 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS |
| 09/02/2004 | WO2004051373A3 Developing mixture, and preparation of lithographic printing plates with this developer |
| 09/02/2004 | WO2004044552A3 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 09/02/2004 | WO2004040374A3 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 09/02/2004 | WO2004030038B1 Compositions substrate for removing etching residue and use thereof |
| 09/02/2004 | WO2003098349A3 Illumination system for microlithography |
| 09/02/2004 | US20040172611 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 09/02/2004 | US20040171267 Suppressing lithography at a wafer edge |
| 09/02/2004 | US20040170931 Aluminum plate support with photosensitive layercomprising ethylenically unsaturated monomer, photopolymerization initiator and polymeric binder; small amount of water; silicate-free; lightweight |
| 09/02/2004 | US20040170930 Method of forming a resist pattern and resist pattern forming apparatus |
| 09/02/2004 | US20040170929 Fine line printing by trimming the sidewalls of pre-developed resist image |
| 09/02/2004 | US20040170928 Patterning methods and systems using reflected interference patterns |
| 09/02/2004 | US20040170926 Patterning semiconductor using system with aperture having two openings aligned in a first axis, a first mask, a second aperture having two openings aligned in a second perpendicular axis |
| 09/02/2004 | US20040170925 Exposure of photopolymerizable composition to radiation; printable paste, electron field emitting film, triode, or display; light source or vacuum electronic |
| 09/02/2004 | US20040170924 Oxime ester photoiniators having a combined structure |
| 09/02/2004 | US20040170923 Three-dimensional articles produced from radiation curable mixture of cationically polymerizing compound and initiator; free-radical polymerizing compound and initiator;and soluble dye comprising diarylmethane, triarylmethane, rhodamine dyes, azo, thiazole , anthraquinone dyes and/or safranin dyes |
| 09/02/2004 | US20040170922 Infrared absorber, sulfonium salt polymerization initiator, ethylenically unsaturated polymerizable compound having urethane skeleton and binder polymer |
| 09/02/2004 | US20040170921 Electron beam recording substrate |
| 09/02/2004 | US20040170920 Photosensitive layer containing infrared radiation absorber, polymerization initiator, polymerizable compound and binder polymer; protective layer containing ultraviolet radiation absorber; insolubility in alkaline developing solution |
| 09/02/2004 | US20040170919 co-/terpolymers comprising vinyl ethers and acrylic esters, used in mixtures with acid generators, bases and solvents to form photoresists having etch reistance and bonding strength; photolithography |
| 09/02/2004 | US20040170918 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray |
| 09/02/2004 | US20040170917 Method of forming thick resist pattern |
| 09/02/2004 | US20040170916 Resist material and nanofabrication method |
| 09/02/2004 | US20040170915 Laser etching to roughen the surface of substrate for better adhesion; encapsulation in mold; semiconductors |
| 09/02/2004 | US20040170914 Polyamic acid polyimide precursor and photoacid generator; interlayer dielectrics of semiconductors; buffer coating films, and alpha -ray shielding films |
| 09/02/2004 | US20040170908 Showing sufficient absorption within the predetermined visible ray region and no unnecessary absorption in the other region; no burn-in due to the decolorization of dyes under normal operating conditions |
| 09/02/2004 | US20040170807 Selecting a 2-D image; converting the selected 2-D image into a 3-D representation thereof; extrapolating a thickness and depth of the 3-D representation based on opacity and color of material into which the lithophane-type work will be produced |