| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/29/2014 | CN103543603A High polymer nano hot stamping device |
| 01/29/2014 | CN103543602A 压印光刻 Imprint lithography |
| 01/29/2014 | CN103543601A Micrographic forming method |
| 01/29/2014 | CN103543490A Long-period fiber bragg grating manufacturing method based on ink-jet printing technology |
| 01/29/2014 | CN103540321A Etching paste, method of preparing the same, and method of forming pattern using the same |
| 01/29/2014 | CN102799066B Method for preparing concave lens array structure on titanium dioxide inorganic-organic photosensitive composite film |
| 01/29/2014 | CN102718902B Poly p-hydroxystyrene based chemically amplified one-component photoresist material, and synthetic method and application thereof |
| 01/29/2014 | CN102707580B Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
| 01/29/2014 | CN102540725B 正性光敏树脂组合物 A positive photosensitive resin composition |
| 01/29/2014 | CN102411268B Photoetching apparatus and method for improving photoetching machine overlay accuracy |
| 01/29/2014 | CN102236265B Lithographic apparatus and method of manufacturing article |
| 01/29/2014 | CN102164977B Photosensitive resin composition and method for producing photosensitive resin used therein |
| 01/29/2014 | CN102063024B Developing solution composition |
| 01/29/2014 | CN102043350B Exposure apparatus, device manufacturing method, and control method of exposure apparatus |
| 01/29/2014 | CN102002257B Acylic resin processed dye composition, dye dispersion fluid, manufacture methods and uses thereof |
| 01/29/2014 | CN101887216B Color composition for color filter, color filter using the composition and liquid crystal display device |
| 01/29/2014 | CN101812173B N-hydroxy maleopimaric acid imide ester acetal polymer and preparation method thereof |
| 01/29/2014 | CN101802717B Projection objective with obscurated pupil for microlithography |
| 01/29/2014 | CN101397429B Pigment dispersion composition, photocurable composition and color filter |
| 01/28/2014 | US8638418 Lithographic apparatus |
| 01/28/2014 | US8638415 Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets |
| 01/28/2014 | US8637835 Drawing apparatus, method of manufacturing article, and processing apparatus |
| 01/28/2014 | US8637623 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
| 01/28/2014 | US8637229 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| 01/28/2014 | US8637226 Method of forming an image having multiple phases |
| 01/28/2014 | US8637224 Thermally crosslinkable resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same, and relief printing plate and process for making same |
| 01/28/2014 | US8637223 Preparation of lithographic printing plates |
| 01/28/2014 | US8637221 Lithographic printing plate precursor, plate making method thereof and novel polymer compound |
| 01/28/2014 | US8637220 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition |
| 01/28/2014 | US8637219 Aromatic ring-containing compound for a resist underlayer and resist underlayer composition |
| 01/28/2014 | US8637140 Method for defining an electrically conductive metal structure on a three-dimensional element and a device made from the method |
| 01/28/2014 | CA2743544C Method and device for producing a base material for screen-printing, and base material of this type |
| 01/23/2014 | WO2014014489A1 Polymers containing heat labile components adsorbed on polymeric carriers and methods for their preparation |
| 01/23/2014 | WO2014014123A1 Liquid immersion member and exposure apparatus |
| 01/23/2014 | WO2014014087A1 Method for producing photosensitive resin element |
| 01/23/2014 | WO2014014044A1 Conductive-layer-integrated flexible printed circuit board |
| 01/23/2014 | WO2014014043A1 Reinforcing-plate-integrated flexible printed circuit board |
| 01/23/2014 | WO2014014034A1 Resin composition for forming resist underlayer film, resist underlayer film, method for forming resist underlayer film, pattern forming method, crosslinking agent and compound |
| 01/23/2014 | WO2014013856A1 Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing article |
| 01/23/2014 | WO2014013733A1 Supporting apparatus, movable body apparatus, exposure apparatus, and device manufacturing method |
| 01/23/2014 | WO2014012941A2 Method for the manufacture of a sorbic acid-based polymer network |
| 01/23/2014 | WO2014012929A1 Illumination optical unit |
| 01/23/2014 | WO2014012912A1 Method for adjusting an illumination setting |
| 01/23/2014 | WO2014012749A1 Electrostatic clamp, lithographic apparatus and method |
| 01/23/2014 | WO2014012729A1 Magnetic device and lithographic apparatus |
| 01/23/2014 | WO2014012660A2 Method for operating a microlithographic projection exposure apparatus |
| 01/23/2014 | WO2014012643A2 System correction from long timescales |
| 01/23/2014 | WO2013174656A3 Lithographic apparatus |
| 01/23/2014 | WO2013156509A3 Sulfonium compounds, their preparation and use |
| 01/23/2014 | WO2013140316A3 Manufacturing method of an apparatus for the processing of single molecules |
| 01/23/2014 | US20140024041 Soft substrate for cell culture and process for preparing the same |
| 01/23/2014 | US20140023973 Extreme ultraviolet/soft x-ray laser nano-scale patterning using the demagnified talbot effect |
| 01/23/2014 | US20140023971 Photoresist composition and method for producing photoresist pattern |
| 01/23/2014 | US20140023970 Photo-Patternable and Developable Silsesquioxane Resins for Use in Device Fabrication |
| 01/23/2014 | US20140023969 Positive photoresist composition, coating film thereof, and novolac phenol resin |
| 01/23/2014 | US20140023968 Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film |
| 01/23/2014 | US20140022563 Periodic Patterns and Technique to Control Misalignment Between Two Layers |
| 01/23/2014 | US20140022527 Lithographic apparatus |
| 01/23/2014 | US20140022526 Lithographic apparatus, and patterning device for use in a lithographic process |
| 01/23/2014 | US20140022525 Deflection Mirror and Projection Exposure Apparatus for Microlithography Comprising Such a Deflection Mirror |
| 01/23/2014 | US20140022524 Device and method for the optical measurement of an optical system by using an immersion fluid |
| 01/23/2014 | US20140022523 Exposure apparatus, exposure method, method for producing device, and optical part |
| 01/23/2014 | US20140022522 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| 01/23/2014 | US20140022031 Method of applying patterned metallization to block filter resonators |
| 01/23/2014 | US20140021167 Large Area Patterning of Nano-Sized Shapes |
| 01/23/2014 | DE102013201857A1 Optical system for performing microlithography process in microlithographic projection exposure system, has absorbent structure that is provided with carbon nanotube coating portion |
| 01/23/2014 | DE102013200367A1 Laser divergence manipulator for laser light source for projection exposure system for use in microlithography, has beam moving unit for local variation of laser beam relative to target area, so that beam cross-section is displaced |
| 01/23/2014 | DE102012212830A1 EUV-Lichtquelle EUV light source |
| 01/23/2014 | DE102012212758A1 Systemkorrektur aus langen Zeitskalen Correction system from long time scales |
| 01/23/2014 | DE102012212757A1 Verfahren zum betreiben einer mikrolithographischen projektionsbelichtungsanlage A method of operating a microlithography projection exposure apparatus |
| 01/23/2014 | DE102012212753A1 Projection optics for forming object field of optics plane in projection exposure system for microlithography, has blinding unit presetting outer boundary of optics with respect to diaphragm direction that is set parallel to planes |
| 01/23/2014 | DE102012212664A1 Verfahren zum Einstellen eines Beleuchtungssettings A method for adjusting an illumination settings |
| 01/23/2014 | DE102012212663A1 Projektionsbelichtungsanlage für die Mikrolithographie mit einer optischen Abstandsmessvorrichtung Projection exposure system for microlithography with an optical distance measuring device |
| 01/23/2014 | DE102012212503A1 Lithographieanlage und verfahren Lithography system and method |
| 01/23/2014 | DE102012212453A1 Beleuchtungsoptik Illumination optics |
| 01/22/2014 | EP2687906A2 Device and method for controlling the positioning of a movable single mirror |
| 01/22/2014 | EP2687905A1 Positive-working lithographic printing plate precursor and method for preparing same |
| 01/22/2014 | EP2686737A1 Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less |
| 01/22/2014 | EP2686736A1 Electrostatic clamp, lithographic apparatus, and device manufacturing method |
| 01/22/2014 | EP2686735A1 Photopatternable structure containing substrate with two-side photoresist coatings |
| 01/22/2014 | EP2686384A1 Water-insoluble coloring compound, ink, resist composition for color filter, and thermal transfer recording sheet |
| 01/22/2014 | EP1693705B1 Positive resist composition and pattern forming method using the resist composition |
| 01/22/2014 | CN203405669U Film capable of achieving black wafer direct alignment |
| 01/22/2014 | CN203402689U Movable carrying device |
| 01/22/2014 | CN103534788A Substrate-replacement method |
| 01/22/2014 | CN103534787A Substrate-replacement device |
| 01/22/2014 | CN103534648A Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition |
| 01/22/2014 | CN103534647A Photosensitive resin composition for forming biochip, and biochip |
| 01/22/2014 | CN103534646A Positive photosensitive siloxane composition |
| 01/22/2014 | CN103534645A Suppression of dewetting of polymer films via inexpensive soft lithography |
| 01/22/2014 | CN103531511A Sucking disc, wafer bearing stage using same and wafer adsorption method |
| 01/22/2014 | CN103531502A Workpiece bench apparatus |
| 01/22/2014 | CN103529748A Control system for nano stamping machine |
| 01/22/2014 | CN103529657A Photoresist stripping agent |
| 01/22/2014 | CN103529656A Imidazoline inhibitor containing photosensitive film cleaning solution |
| 01/22/2014 | CN103529655A Method and system for calibrating linearity of displacement platform |
| 01/22/2014 | CN103529654A Alignment method for internal layers in direct writing type photoetching system |
| 01/22/2014 | CN103529653A Method and system for storing multilayer vectorgraph as exposure data |
| 01/22/2014 | CN103529652A Sheet inlet and outlet controlling method and device for cooling and buffering mechanism for precise length measuring machine |
| 01/22/2014 | CN103529651A Method and system for realizing automatic value filling in glass substrate exposure process |