| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/10/2004 | WO2004058699A3 Fluoroarylsulfonium photoacid generators |
| 09/10/2004 | WO2004042472B1 Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 09/10/2004 | WO2004038458A3 Apparatus for producing approximately collimated light and method of curing a photopolymerisable layer using the apparatus |
| 09/09/2004 | US20040177103 Method and system for efficient and accurate processing of a discrete time input signal |
| 09/09/2004 | US20040176861 System for controlling a position of a mass |
| 09/09/2004 | US20040176630 Methacrylate compounds with transparency patterns |
| 09/09/2004 | US20040175945 Anisotropic etching of organic-containing insulating layers |
| 09/09/2004 | US20040175734 Support for analyte determination methods and method for producing the support |
| 09/09/2004 | US20040175659 Photosensitive composition for sandblasting and photosensitive film using the same |
| 09/09/2004 | US20040175658 Embossing tool having an arbitrary three-dimensional microstructure |
| 09/09/2004 | US20040175655 Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same |
| 09/09/2004 | US20040175654 Positive working resist composition |
| 09/09/2004 | US20040175653 Photosensitive composition and use thereof |
| 09/09/2004 | US20040175652 Hydrophilic polymer and hydrogen bonding inhibitor; usable under room light; laser beam writable without development and wiping off; scumming free |
| 09/09/2004 | US20040175651 Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same |
| 09/09/2004 | US20040175650 Reactive siloxane oligomer having both aryl and alkyl components, polymerization initiator and crosslinking agent; processability, low birefringence, transparency, heat and moisture resistance; simple, high speed mass production |
| 09/09/2004 | US20040175649 Image-formation material and infrared absorber |
| 09/09/2004 | US20040175648 Photosensitive composition and planographic printing plate precursor using the same |
| 09/09/2004 | US20040175647 Hydrofluorocarbons and hydrofluoroethers; photochemical darkening and bubble formation inhibition; reduced water vapor and oxygen concentrations; immersion photolithography |
| 09/09/2004 | US20040175646 Polyamic acid resin composition |
| 09/09/2004 | US20040175645 Partially decomposable alkali soluble resin and acid generator; forming superfine resist patterns using F2 excimer laser; sensitivity, resolution, coatability |
| 09/09/2004 | US20040175644 Reacting a quantity of trifluoroacetone with a base under conditions sufficient to form a cyclic trimer intermediate, reacting the intermediate with acylating agent to form the acrylic compound |
| 09/09/2004 | US20040175634 Design and layout of phase shifting photolithographic masks |
| 09/09/2004 | US20040175631 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
| 09/09/2004 | US20040175628 Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates |
| 09/09/2004 | US20040175497 Coating unit and coating method |
| 09/09/2004 | US20040175496 Coating thickness control using surface features |
| 09/09/2004 | US20040175450 Stereolithographic shaping method and apparatus |
| 09/09/2004 | US20040174919 Line selected F2 two chamber laser system |
| 09/09/2004 | US20040174624 Reflecting device for electromagnetic waves |
| 09/09/2004 | US20040174619 Adjustment arrangement of an optical element |
| 09/09/2004 | US20040174617 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
| 09/09/2004 | US20040174535 Abberration measuring apparatus |
| 09/09/2004 | US20040174534 Interferometer, exposure apparatus and method for manufacturing device |
| 09/09/2004 | US20040174531 System for interferometric fit testing |
| 09/09/2004 | US20040174514 Exposure apparatus and exposure method |
| 09/09/2004 | US20040174512 Illumination optical apparatus, exposure apparatus and method of exposure |
| 09/09/2004 | US20040174511 Lithographic apparatus |
| 09/09/2004 | US20040174510 Alignment method and exposure apparatus using the method |
| 09/09/2004 | US20040174509 Lithographic apparatus and device manufacturing method |
| 09/09/2004 | US20040174508 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/09/2004 | US20040174507 Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method |
| 09/09/2004 | US20040174506 Method for aberration detection and measurement |
| 09/09/2004 | US20040174505 Exposure apparatus and method of producing device |
| 09/09/2004 | US20040174504 Cooling apparatus |
| 09/09/2004 | US20040174425 Exposure apparatus |
| 09/09/2004 | US20040173871 Gray scale x-ray mask |
| 09/09/2004 | US20040173818 Binder diffusion transfer patterning of a thick film paste layer |
| 09/09/2004 | US20040173762 Tdi detecting device, a feed-through equipment and electron beam apparatus using these devices |
| 09/09/2004 | US20040173761 Lithograph with a trigger mask and method of production of digital holograms in a storage medium |
| 09/09/2004 | US20040173755 Electron-beam focusing apparatus and electron-beam projection lithography system employing the same |
| 09/09/2004 | US20040173463 Method for production of printed wiring board |
| 09/09/2004 | US20040173317 Resist stripper system |
| 09/09/2004 | US20040173148 Discharging unit for discharging a photosensitive material, coater having the discharging unit, and apparatus for coating a photosensitive material having the coater |
| 09/09/2004 | US20040173114 Plate material for printing and method for regenerating/reusing plate material for printing and printing machine |
| 09/09/2004 | DE3825738C5 Lichtempfindliches Gemisch Photosensitive mixture |
| 09/09/2004 | DE10308328A1 Verfahren zur Herstellung eines belichteten Substrats A method of manufacturing an exposed substrate |
| 09/09/2004 | DE10308317A1 Verfahren zur Herstellung eines Resistsubstrats A method for producing a substrate Resist |
| 09/09/2004 | DE10308174A1 Anordnung zum Debrisreduktion bei einer Strahlungsquelle auf Basis eines Plasmas Arrangement for Debrisreduktion at a radiation source based on a plasma |
| 09/09/2004 | DE10305618A1 Method for exposing photosensitive lacquer on semiconductor wafer to form structure pattern in lacquer in manufacture of integrated circuits, forming layer on wafer |
| 09/09/2004 | DE10304667A1 Developer-free imaging of e.g. printed circuit boards or printing plates by imagewise flooding illumination of an element with a coating containing a polyvinyl acetal copolymer and a diazonium polycondensation product |
| 09/09/2004 | DE10243827B4 Direktschreibendes Elektronenstrahl - Lithographieverfahren zur Herstellung einer zweidimensionalen Struktur im Submikrometerbereich Direct-writing electron beam - lithographic process for producing a two-dimensional structure in the submicron range |
| 09/09/2004 | DE10218955B4 Verfahren zur Herstellung einer strukturierten Schicht auf einem Halbleitersubstrat A process for preparing a patterned layer on a semiconductor substrate |
| 09/09/2004 | DE102004007105A1 Verfahren zum Unterdrücken eines Lithographievorgangs am Rand einer Halbleiterscheibe A method of suppressing a lithography process at the edge of a semiconductor wafer |
| 09/08/2004 | EP1455235A2 Lithographic apparatus and device manufacturing method |
| 09/08/2004 | EP1455234A1 Method to reduce precipitation in developers for lithographic printing plates |
| 09/08/2004 | EP1455233A2 Processing method and system |
| 09/08/2004 | EP1455232A2 Exposure apparatus and method of producing a device |
| 09/08/2004 | EP1455231A2 Controlling a position of a mass, especially in a lithographic apparatus |
| 09/08/2004 | EP1455230A2 Polymers and photoresists comprising same |
| 09/08/2004 | EP1455229A1 Silicon-containing fluorinated polymers and photoresists comprising same |
| 09/08/2004 | EP1455228A1 Process for producing polysiloxanes and photoresist compositions comprising the same |
| 09/08/2004 | EP1455227A2 Photosensitive resin composition and printed wiring board |
| 09/08/2004 | EP1455204A1 Device and method for manipulation and routing of a metrology beam |
| 09/08/2004 | EP1455007A2 Method for depositing and patterning carbon nanotubes using chemical self-assembly process |
| 09/08/2004 | EP1454743A2 Device for adjusting the focal point of an exposure head in a plate exposure system |
| 09/08/2004 | EP1454336A2 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field |
| 09/08/2004 | EP1454334A2 Lens array with a laterally movable optical axis for corpuscular rays |
| 09/08/2004 | EP1454194A1 Method and apparatus for patterning a workpiece |
| 09/08/2004 | EP1454192A2 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 09/08/2004 | EP1454112A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/08/2004 | EP1453675A1 Photosensitive composition and photosensitive planographic printing plate |
| 09/08/2004 | CN2639909Y Round Daman optical grating |
| 09/08/2004 | CN1527960A Method for the manufacture of micro structures |
| 09/08/2004 | CN1527959A 图像形成材料 An image forming material |
| 09/08/2004 | CN1527808A Process for production of fluorine-containing norbornene derivatives |
| 09/08/2004 | CN1527359A Method for forming fine pattern |
| 09/08/2004 | CN1527358A Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment |
| 09/08/2004 | CN1527300A Making process of pattern on wafer and its application |
| 09/08/2004 | CN1527140A Device and method for operating and transmitting metrological light beam |
| 09/08/2004 | CN1527139A Photoetching apparatus and devices producing method |
| 09/08/2004 | CN1527138A Photoetching projector and devices producing method thereof |
| 09/08/2004 | CN1527137A Photosensitive lithographic plate printing plate |
| 09/08/2004 | CN1527136A 光致抗蚀剂组合物 The photoresist composition of |
| 09/08/2004 | CN1527135A 光致抗蚀剂组合物 The photoresist composition of |
| 09/08/2004 | CN1527134A Manufacture of ture 3D microelectronic mechanical system based on composite imprinting photoetched material |
| 09/08/2004 | CN1527113A Wide viewing angle planar LCD |
| 09/08/2004 | CN1526752A Polyorganosiloxane and preparing method for photoresist composition containing the said polyorganosiloxane |
| 09/08/2004 | CN1526548A Focusing control of photohead in one printing plate exposure device |
| 09/08/2004 | CN1526482A Photoresist painting method |