Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2004
09/15/2004EP1457832A1 Lithographic projection assembly, load lock and method for transferring objects
09/15/2004EP1457831A1 Method and apparatus for maintaining a machine part
09/15/2004EP1457830A2 Lithographic apparatus comprising a temperature conditioned load lock
09/15/2004EP1457829A1 Lithographic projection assembly, handling apparatus for handling substrates and method of handling a substrate
09/15/2004EP1457828A2 Focus spot monitoring in a lithographic projection apparatus
09/15/2004EP1457827A1 Lithographic apparatus, device manufacturing method and device manufactured thereby
09/15/2004EP1457826A1 Lithographic apparatus and device manufacturing method
09/15/2004EP1457825A1 Lithographic apparatus, device manufacturing method and device manufactured thereby
09/15/2004EP1457824A1 Lithographic projection apparatus and device manufacturing method
09/15/2004EP1457823A2 Photosensitive element for use as flexographic printing plate
09/15/2004EP1457822A2 Positive resist composition
09/15/2004EP1457821A1 Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties
09/15/2004EP1457820A2 Aqueous developer solution for offset printing plates
09/15/2004EP1457819A2 Positive resist composition and method of forming a resist pattern using the same
09/15/2004EP1457550A2 Composition for removing residues from the microstructure of an object
09/15/2004EP1456891A2 Imaging device in a projection exposure facility
09/15/2004EP1456870A2 Resistless lithography method for producing fine structures
09/15/2004EP1456705A2 Catadioptrical reduction lens
09/15/2004EP1370910A4 Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose
09/15/2004EP1257613B1 Optical connection of waveguides of an optical element using a near infrared sensitive photopolymerizable composition
09/15/2004EP1240556B1 Photolithography method, photolithography mask blanks, and method of making
09/15/2004EP1203264A4 Apparatus and method of image enhancement through spatial filtering
09/15/2004EP1019948B1 High pressure discharge lamp with long lifetime
09/15/2004CN1529836A Enhanced FIELDBVS device alevts in process control system
09/15/2004CN1529834A Resist compositions with polymers having pendant groups containing plural acid labile moieties
09/15/2004CN1529833A Photosensitive coloring composition, colour filter using said composition and production method thereof
09/15/2004CN1529688A Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and theire use
09/15/2004CN1529206A Light-sensitive resin composition for colour filter film
09/15/2004CN1167106C Photoresist film removing method and device therefor
09/15/2004CN1166987C Contacting-type photo etching device
09/15/2004CN1166985C Light-sensitive resin and compositions and the method for forming pattern using said compositions
09/15/2004CN1166984C Method and apparatus for production of structure by focused laser radiation on photosensitively coated substrate
09/15/2004CN1166710C Producing method of semiconductor device
09/15/2004CN1166704C Anti-reflection coating polymer and preparing method thereof
09/14/2004US6792591 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
09/14/2004US6792590 Eliminating unnecessary evaluation points
09/14/2004US6792328 Metrology diffraction signal adaptation for tool-to-tool matching
09/14/2004US6792076 Target steering system for EUV droplet generators
09/14/2004US6791766 Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
09/14/2004US6791761 Optical projection lens system
09/14/2004US6791686 Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof
09/14/2004US6791670 Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
09/14/2004US6791669 Positioning device and exposure apparatus including the same
09/14/2004US6791668 Semiconductor manufacturing apparatus and method
09/14/2004US6791667 Illumination device for projection system and method for fabricating
09/14/2004US6791666 Variable transmission focal mask for lens heating compensation
09/14/2004US6791665 Lithographic projection apparatus and device manufacturing method
09/14/2004US6791664 Lithographic apparatus, device manufacturing method, and device manufacturing thereby
09/14/2004US6791662 Exposure method and apparatus, and device manufacturing method
09/14/2004US6791661 Gas replacement method and apparatus, and exposure method and apparatus
09/14/2004US6791594 Laser imaging apparatus
09/14/2004US6791443 Actuator and transducer
09/14/2004US6791214 Moving-magnet linear motor, aligner and apparatus provided therewith, and method for manufacturing devices using the same
09/14/2004US6791145 Semiconductor device formed by utilizing deformed pattern
09/14/2004US6791098 Multi-input, multi-output motion control for lithography system
09/14/2004US6791096 Process conditions change monitoring systems that use electron beams, and related monitoring methods
09/14/2004US6791082 Process conditions change monitoring systems that use electron beams, and related monitoring methods
09/14/2004US6790783 Semiconductor fabrication apparatus
09/14/2004US6790681 Substrate processing apparatus and substrate processing method
09/14/2004US6790599 Microfluidic devices and manufacture thereof
09/14/2004US6790598 Methods of patterning resists and structures including the patterned resists
09/14/2004US6790596 Having high sensitivity and causing less gelation
09/14/2004US6790591 Polymers, resist compositions and patterning process
09/14/2004US6790589 Radiation sensitive material and method for forming pattern
09/14/2004US6790587 Fluorinated polymers, photoresists and processes for microlithography
09/14/2004US6790586 Base resin with alicyclic hydrocarbon backbone having a carboxylate moiety which generates a carboxylic acid under acidic conditions, a photoacid generator, and an organic solvent; excimer laser, micropatterning
09/14/2004US6790582 Photoresist compositions
09/14/2004US6790581 Hybrid compound, resist, and patterning process
09/14/2004US6790580 Etching resistance
09/14/2004US6790579 Photoacid initiator generates acid effecting polarity change rendering polymer water soluble in areas exposed to imaging source; integrated circuits, semiconductors
09/14/2004US6790570 Method of using scatterometry measurements to control stepper process parameters
09/14/2004US6790568 In which an alkali-soluble thermoplastic resin layer and a temporary support can be completely separated without a part of the alkali-soluble thermoplastic resin layer remaining on the temporary support
09/14/2004US6790564 Photomask and manufacturing method of an electronic device therewith
09/14/2004US6790480 Coating apparatus
09/14/2004US6790287 Substrate processing apparatus, substrate inspection method and substrate processing system
09/10/2004WO2004077539A1 Etching resistant film, process for producing the same, surface cured resist pattern, process for producing the same, semiconductor device and process for producing the same
09/10/2004WO2004077534A1 Detection method of optimal position detection equation, positioning method, exposure method, device manufacturing method, and device
09/10/2004WO2004077533A1 Exposure apparatus
09/10/2004WO2004077530A2 Titanium carboxylate films for use in semiconductor processing
09/10/2004WO2004077529A2 Edge bead removal for spin-on materials containing low volatility solvents using carbon dioxide cleaning
09/10/2004WO2004077493A2 Method for producing an exposed substrate
09/10/2004WO2004077484A1 Plasma display panel producing method, and plasma display panel
09/10/2004WO2004077164A1 Slm direct writer
09/10/2004WO2004077163A2 Method for creating a pattern on a wafer using a single photomask
09/10/2004WO2004077162A1 Multiple exposure method for circuit performance improvement
09/10/2004WO2004077161A2 Method for producing resist substrates
09/10/2004WO2004077160A2 Method of controlling the differential dissolution rate of photoresist compositions
09/10/2004WO2004077159A1 Coating fluid for forming wettable pattern and method for producing article having pattern formed thereon
09/10/2004WO2004077158A1 Photoresist composition and method of forming resist pattern
09/10/2004WO2004077157A1 Colored stereolithographic resins
09/10/2004WO2004077156A1 Photomask and its production method, and pattern forming method
09/10/2004WO2004077155A1 Method for fabricating photomask and semiconductor device
09/10/2004WO2004077154A2 Lithographic printing with polarized light
09/10/2004WO2004077153A2 Photosensitive composition and use thereof
09/10/2004WO2004077104A2 High performance catadioptric imaging system
09/10/2004WO2004076963A2 Apparatus and method for detecting overlay errors using scatterometry
09/10/2004WO2004076558A1 Curable composition
09/10/2004WO2004076535A1 Silsesquioxane resin, positive resist composition, layered product including resist, and method of forming resist pattern
09/10/2004WO2004076522A1 Curable resin composition
09/10/2004WO2004076495A2 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof