| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/16/2004 | WO2004079454A1 Photosensitive resin composition and cured coating film |
| 09/16/2004 | WO2004079453A1 Resist material for liquid immersion exposure process and method of forming resist pattern with the resist material |
| 09/16/2004 | WO2004079452A1 Photosensitive resin composition and curing product thereof |
| 09/16/2004 | WO2004079451A2 Method for creating lithophane-type images from digital images |
| 09/16/2004 | WO2004079450A1 Method for manufacturing a patterned structure |
| 09/16/2004 | WO2004078930A2 Nanometer-controlled polymeric thin films that resist adsorption of biological molecules and cells |
| 09/16/2004 | WO2004078803A1 Polymer and positive type resist composition |
| 09/16/2004 | WO2004078703A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation-sensitive resin compositions |
| 09/16/2004 | WO2004078688A1 Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition |
| 09/16/2004 | WO2004059394A3 Determining lithographic parameters to optimise a process window |
| 09/16/2004 | WO2004057421A3 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin |
| 09/16/2004 | WO2004050653A3 Oxime ester photoinitiators with heteroaromatic groups |
| 09/16/2004 | WO2004006021A3 Optical device comprising an light source |
| 09/16/2004 | WO2003099463A3 Method and device for transferring a pattern from a stamp to a substrate |
| 09/16/2004 | WO2003092256A3 Projection method and projection system comprising an optical filtering process |
| 09/16/2004 | WO2003087945A3 Interferometric measuring device and projection illumination installation comprising one such measuring device |
| 09/16/2004 | WO2003082937A9 Polymerisable composition |
| 09/16/2004 | WO2003067334A3 Polarisation-optimised illumination system |
| 09/16/2004 | US20040181770 Method and apparatus for controlling rippling during optical proximity correction |
| 09/16/2004 | US20040181768 Model pattern simulation of semiconductor wafer processing steps |
| 09/16/2004 | US20040181728 Methods and systems for estimating reticle bias states |
| 09/16/2004 | US20040181097 Allowing a compound having a hydroxyl group to react with an alkenyl ether compound in presence of an acid catalyst; forming a protected hydroxy compound |
| 09/16/2004 | US20040181023 Novel thiol compound, copolymer and method for producing the copolymer |
| 09/16/2004 | US20040180984 Composition for forming a conjugated polymer pattern and process of forming a conjugated polymer pattern using the same |
| 09/16/2004 | US20040180537 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 09/16/2004 | US20040180435 Process for producing a substrate for attachment of cells and a substrate for attachment of cells |
| 09/16/2004 | US20040180300 Photoresist removal |
| 09/16/2004 | US20040180299 supercritical and/or liquid carbon dioxide may be used at various steps in an immersion lithography process and, thereby, replace the use of some or all solvents that have been heretofore been used |
| 09/16/2004 | US20040180297 spacing between neighboring lines is reduced to be less than the resolution limit of a lithographic process, thereby increasing the integration density of the semiconductor device |
| 09/16/2004 | US20040180295 Method for fabricating a dual damascene structure using a single photoresist layer |
| 09/16/2004 | US20040180294 Lithographic printing with polarized light |
| 09/16/2004 | US20040180293 Cleaning solution for photoresist and method for forming pattern using the same |
| 09/16/2004 | US20040180291 lithographic printing plate precursors; suited for use with direct digital ultraviolet imaging devices |
| 09/16/2004 | US20040180290 Planographic printing plate precursor and its fixing method on plate cylinder |
| 09/16/2004 | US20040180288 Postitive resist composition |
| 09/16/2004 | US20040180287 Fluorinated polymers having ester groups and photoresists for microlithography |
| 09/16/2004 | US20040180286 Photosensitive resin composition, process of forming patterns with the same, and electronic components |
| 09/16/2004 | US20040180278 measuring a change of transmittance depending on a light path of the projection optical system, based on a pattern image of the diffraction light transferred to the wafer |
| 09/16/2004 | US20040180277 Substrate treating method and apparatus |
| 09/16/2004 | US20040180276 Determining the maximum number of dies fitting on a semiconductor wafer |
| 09/16/2004 | US20040180273 Methods of forming aligned structures with radiation-sensitive material |
| 09/16/2004 | US20040180272 Methods of printing structures |
| 09/16/2004 | US20040180270 Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container |
| 09/16/2004 | US20040180226 Radiation curable aqueous compositions for low extractable film packaging |
| 09/16/2004 | US20040180142 For forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow |
| 09/16/2004 | US20040180141 For coating a coating solution and removing an unnecessary coating solution deposited on the side and back surfaces of a quadrangular substrate |
| 09/16/2004 | US20040179922 Apparatus for loading and unloading a supply of plates in an automated plate handler |
| 09/16/2004 | US20040179808 Particle guidance system |
| 09/16/2004 | US20040179726 Process for detecting defects in photomasks |
| 09/16/2004 | US20040179564 Method for manufacturing an optical element having a structured surface, such optical element, and projection illumination system having such an optical element |
| 09/16/2004 | US20040179560 Gas discharge laser light source beam delivery unit |
| 09/16/2004 | US20040179272 Objective with lenses made of a crystalline material |
| 09/16/2004 | US20040179270 Illumination system and method for efficiently illuminating a pattern generator |
| 09/16/2004 | US20040179269 Beam shaping element for use in a lithographic system |
| 09/16/2004 | US20040179192 Positioning apparatus, exposure apparatus, and method for producing device |
| 09/16/2004 | US20040179190 Optical properties measurement method, exposure method, and device manufacturing method |
| 09/16/2004 | US20040179184 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 09/16/2004 | US20040179183 Lithographic apparatus, device manufacturing method and substrate holder |
| 09/16/2004 | US20040179182 Lithographic apparatus with debris suppression, and device manufacturing method |
| 09/16/2004 | US20040179180 Exposure apparatus, exposure method, and device manufacturing method |
| 09/16/2004 | US20040179179 Exposure apparatus |
| 09/16/2004 | US20040179178 Processing apparatus for processing object in vessel |
| 09/16/2004 | US20040179177 Exposure method |
| 09/16/2004 | US20040179176 Exposure apparatus |
| 09/16/2004 | US20040179175 Exposure apparatus and aberration correction method |
| 09/16/2004 | US20040179174 Method and device for controlling fluid flow in an optical assembly |
| 09/16/2004 | US20040179173 Multi-stage type processing apparatus |
| 09/16/2004 | US20040179086 Image recording apparatus |
| 09/16/2004 | US20040179050 Pattern drawing apparatus and pattern drawing method for forming patterns, that have mirror image relationship to each other with respect to a substrate, on both sides of the substrate, and test apparatus for use in the pattern drawing apparatus |
| 09/16/2004 | US20040178986 Recording material and image forming method |
| 09/16/2004 | US20040178570 Device and method for detecting the edge of a recording material |
| 09/16/2004 | US20040178405 Emitter for electron-beam projection lithography system and manufacturing method thereof |
| 09/16/2004 | US20040178366 Electron-beam drawing apparatus and electron-beam drawing method |
| 09/16/2004 | US20040178365 Electrode in a discharge produced plasma extreme ultraviolet source |
| 09/16/2004 | US20040178364 Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter |
| 09/16/2004 | US20040178362 Lithographic apparatus and method of manufacturing a device |
| 09/16/2004 | US20040177867 Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal |
| 09/16/2004 | US20040177782 Flexographic printing |
| 09/16/2004 | US20040177520 Positioning apparatus |
| 09/16/2004 | DE20122196U1 Imprint lithography template for producing microelectronic devices, has multiple recesses of specified size and alignment marks and is transparent to activating light |
| 09/16/2004 | DE20122179U1 Patterning method used in semiconductor device manufacture involves forming light curable liquid between template and substrate, curing the liquid and forming a pattern of template in the liquid, and separating template from liquid |
| 09/16/2004 | DE10351977A1 Maskenmanagementvorrichtung in einem Halbleiter-Wafer-Herstellungsverfahren Mask management device in a semiconductor wafer manufacturing process |
| 09/16/2004 | DE10310168A1 Wässrige Entwicklerlösung für Offset-Druckplatten Aqueous solution developer for offset printing plates |
| 09/16/2004 | DE10310136A1 Set of masks for projection of structure patterns on each mask to photosensitive layer on semiconductor wafer as trim or correction mask in lithographic process in manufacture of integrated circuits |
| 09/16/2004 | DE10309084A1 Reflektives optisches Element und EUV-Lithographiegerät The reflective optical element and EUV lithography machine |
| 09/16/2004 | DE10308271A1 Verfahren und System zum Verbessern der Belichtungsgleichförmigkeit in einem schrittweisen Belichtungsprozess A method and system for improving the Belichtungsgleichförmigkeit in a stepwise exposure process |
| 09/16/2004 | DE10307453A1 Oxazol-Derivate enthaltende strahlungs empfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Oxazole derivatives containing radiation- sensitive compositions and imageable elements based thereon |
| 09/16/2004 | DE10307451A1 Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Radiation-sensitive compositions and imageable elements based thereon |
| 09/16/2004 | DE102004009336A1 Verfahren zum Unterdrücken eines Lithographievorgangs am Rand einer Halbleiterscheibe A method of suppressing a lithography process at the edge of a semiconductor wafer |
| 09/16/2004 | CA2518457A1 Photosensitive resin composition and curing product thereof |
| 09/15/2004 | EP1458066A2 Line selected F2 two chamber laser system |
| 09/15/2004 | EP1458015A2 Spin coating apparatus for coating photoresist |
| 09/15/2004 | EP1458013A1 A method and an apparatus for determining a position of a substrate relative to a support stage |
| 09/15/2004 | EP1457979A2 Electron beam recording substrate |
| 09/15/2004 | EP1457838A1 Method to reduce precipitation in developers for lithographic printing plates |
| 09/15/2004 | EP1457837A2 Developing solution for heat-sensitive lithographic printing plate precursor and method for peparing lithographic printing plate |
| 09/15/2004 | EP1457836A2 Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate |
| 09/15/2004 | EP1457835A2 Exposure apparatus |
| 09/15/2004 | EP1457834A2 Positioning apparatus, exposure apparatus and method for producing device |
| 09/15/2004 | EP1457833A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |