| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/22/2004 | EP1460886A2 Extreme UV radiation source and semiconductor exposure device |
| 09/22/2004 | EP1460479A2 Method and apparatus for recycling gases in a lithography tool |
| 09/22/2004 | EP1460478A1 Dry film photoresist |
| 09/22/2004 | EP1460477A1 Digitally imageable, light-sensitive flexographic printing element and process for fabricating newspaper flexographic printing plates |
| 09/22/2004 | EP1460468A1 Systems and methods for correction of spatial cross-talk and pattern frame effects in imaging systems. |
| 09/22/2004 | EP1459886A1 Laminated film |
| 09/22/2004 | EP1459134A1 Method for optimizing the imaging characteristics of at least two optical elements and photolithographic production process |
| 09/22/2004 | EP1459133A1 Method of forming optical images, diffraction element for use with this method, apparatus for carrying out this method |
| 09/22/2004 | EP1459132A1 Multiphoton photosensitization system |
| 09/22/2004 | EP1459131A1 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 09/22/2004 | EP1458794A1 Heat-curable resin composition |
| 09/22/2004 | EP1225192B1 Polyimides and polyamic acids |
| 09/22/2004 | EP0976010B1 Waterborne photoresists made from urethane acrylates |
| 09/22/2004 | CN1531840A Method and device for producing extreme ultraviolet radiation and soft X-radiation |
| 09/22/2004 | CN1531750A Lithography method for forming semiconductor devices on wafer and apparatus |
| 09/22/2004 | CN1531745A Method and evaporating solution for rinsing developed photoresist layer |
| 09/22/2004 | CN1531668A Template for room temperature, low pressure micro-and nano-imprint lithography |
| 09/22/2004 | CN1531580A Structural bonding tapes and articles containing the same |
| 09/22/2004 | CN1531481A Lamianted film |
| 09/22/2004 | CN1531052A Method and apparatus for corresponding to supporting table positioning substrate |
| 09/22/2004 | CN1531039A Graphic drawing device and method, detector for the device |
| 09/22/2004 | CN1531029A Placode treating method and treater |
| 09/22/2004 | CN1531020A Emitter for electronic beam project micromovie system and manufacture thereof |
| 09/22/2004 | CN1531019A Producing method for X-ray mask and semiconductor device |
| 09/22/2004 | CN1531018A Microprocess for pattern photoresist |
| 09/22/2004 | CN1530996A Electronic beam etching device with pattern emitter and manufacture of emitter |
| 09/22/2004 | CN1530773A Exposure device and method, Manufacturnig method and dispaying device for thin-membrane transistor |
| 09/22/2004 | CN1530757A Stripping agent, stripping method, thereof, stripping agent circulator and stripping agent controller |
| 09/22/2004 | CN1530756A Photoetchnig device including gas flushing system |
| 09/22/2004 | CN1530755A Photoetching apparatus and method for optimizing lighting light source by photoetching analog technology |
| 09/22/2004 | CN1530754A Method and apparatus for maintaining machniery parts |
| 09/22/2004 | CN1530753A Exposure device and aberration correcting method |
| 09/22/2004 | CN1530752A System and method for analyzing defect availability of task based automative etching mask |
| 09/22/2004 | CN1530751A Photoetching apparatus, device manufacturing method and device thereby |
| 09/22/2004 | CN1530750A Photoetching apparatus and device manufacturing method |
| 09/22/2004 | CN1530749A Photoetching apparatus, device manufacturing method and device therefrom |
| 09/22/2004 | CN1530748A Embedded etching stopping layer for phase shift mask |
| 09/22/2004 | CN1530747A Device manufacturing method and computer programm |
| 09/22/2004 | CN1530746A Design change-over method and apparatus based on model by doublet illumination |
| 09/22/2004 | CN1530745A Slushing compound pattern shaping method and system |
| 09/22/2004 | CN1530744A Method for preventing industrial photoresisting residual |
| 09/22/2004 | CN1530743A Light mask and diffuse-reflecting board |
| 09/22/2004 | CN1530718A Manufacturing method for reflective liquid-crystal displaying device and peripheral circuit |
| 09/22/2004 | CN1530717A Producing method for liquid-crystal displaying device |
| 09/22/2004 | CN1530716A Manufacture of low temperature polycrystal silicon film electric crystal LCD device |
| 09/22/2004 | CN1530429A Cleaning solution for photoresist agent and method for forming pattern by it |
| 09/22/2004 | CN1530404A Preparations of carbon nano tube layout film or composite material from polymerisable semgental surface modified carbon nano tubes |
| 09/22/2004 | CN1168073C Method and device for manufacturing optical recording medium |
| 09/22/2004 | CN1168024C Process monitoring system for lithography lasers |
| 09/22/2004 | CN1167982C 光刻胶组合物 Photoresist composition |
| 09/21/2004 | US6795747 Reducing asymmetrically deposited film induced registration error |
| 09/21/2004 | US6795614 Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber |
| 09/21/2004 | US6795474 Gas discharge laser with improved beam path |
| 09/21/2004 | US6795197 Interferometer system and litographic step-and-scan apparatus provided with such a system |
| 09/21/2004 | US6795170 Structure for attaching a pellicle to a photo-mask |
| 09/21/2004 | US6795169 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 09/21/2004 | US6795168 Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process |
| 09/21/2004 | US6795167 Projection exposure apparatus and device manufacturing method using the same |
| 09/21/2004 | US6795166 Illuminator, exposure apparatus, and method for fabricating device using the same |
| 09/21/2004 | US6795164 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/21/2004 | US6795163 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby |
| 09/21/2004 | US6795162 Method for exposing a peripheral area of a wafer and apparatus for performing the same |
| 09/21/2004 | US6795161 Exposure apparatus, method of manufacturing semiconductor devices and plant therefor |
| 09/21/2004 | US6794763 Semiconductor device and method of manufacturing the same |
| 09/21/2004 | US6794666 Electron emission lithography apparatus and method using a selectively grown carbon nanotube |
| 09/21/2004 | US6794665 Electron beam drawing apparatus |
| 09/21/2004 | US6794660 Long stroke mover for a stage assembly |
| 09/21/2004 | US6794657 Magnetic shunt assembly for an exposure apparatus |
| 09/21/2004 | US6794625 Dynamic automatic focusing method and apparatus using interference patterns |
| 09/21/2004 | US6794582 Mask for screen printing, the method for producing same and circuit board produced by screen printing with such mask |
| 09/21/2004 | US6794459 Photolithography |
| 09/21/2004 | US6794297 Method for etching an antireflective coating and for fabricating a semiconductor device |
| 09/21/2004 | US6794279 Passivating inorganic bottom anti-reflective coating (BARC) using rapid thermal anneal (RTA) with oxidizing gas |
| 09/21/2004 | US6794207 Method of manufacturing integrated circuit |
| 09/21/2004 | US6794120 Photopolymerization of ethylenically unsaturated compound in presence of photoinitiator and binder; imaging, pre-washing; development with alkali metal compound |
| 09/21/2004 | US6794119 Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
| 09/21/2004 | US6794118 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
| 09/21/2004 | US6794116 Negative photosensitive lithograhic printing plate |
| 09/21/2004 | US6794115 Elastomeric binder, ethylenically unsaturated monomer, absorber; crosslinking to form relief-forming layer |
| 09/21/2004 | US6794113 Comprises alkali-soluble polymer (polyvinylphenol), photoacid generator (triphenyl sulfonium trifluoromethanesulfonic acid), and adamantyl alcohol capable of dehydration bonding with polymer; antiswelling; improved resolution |
| 09/21/2004 | US6794112 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices |
| 09/21/2004 | US6794111 Unsaturated tetrahydrofuran derivative monomers and their preparation e.g, 3,6-epoxy-2,2-dimethyl-2,2a,3,6,6a,7-hexahydrobenzo(c)furan |
| 09/21/2004 | US6794110 Development of latent images |
| 09/21/2004 | US6794109 Low abosorbing resists for 157 nm lithography |
| 09/21/2004 | US6794108 Positive photoresist composition for far ultraviolet exposure |
| 09/21/2004 | US6794104 Fine particulate hydrophobicizing precursor and hydrophilic metallized binder polymer; image forming layer comprising light-heat converting substance and microcapsule encapsulating hydrophobic substance |
| 09/21/2004 | US6794100 Method for controlling radiation beam intensity directed to microlithographic substrates |
| 09/21/2004 | US6794098 Capacitor with plasma deposited dielectric |
| 09/21/2004 | US6794040 Printed circuit board or card having plated through-holes filled with a photocured polymer |
| 09/21/2004 | US6793850 Alkali development type photocurable composition and calcined pattern obtained by use of the same |
| 09/21/2004 | US6793780 Stamper forming method |
| 09/21/2004 | US6793753 Method of making a microfabricated elastomeric valve |
| 09/21/2004 | US6792861 Image recorder with recording material feed unit |
| 09/21/2004 | US6792859 Rotating drum and image recording device |
| 09/21/2004 | US6792856 Method and apparatus for accurate, micro-contact printing |
| 09/21/2004 | CA2319587C Method and apparatus for chemical and biochemical reactions using photo-generated reagents |
| 09/16/2004 | WO2004079800A1 Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid |
| 09/16/2004 | WO2004079799A1 Mask repeater and mask manufacturing method |
| 09/16/2004 | WO2004079753A2 Reflective optical element and euv lithography appliance |
| 09/16/2004 | WO2004079632A2 Method and apparatus of wafer print simulation using hybrid model with mask optical images |