| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/28/2004 | US6797841 Aminobenzophenones and photopolymerizable compositions including the same |
| 09/28/2004 | US6797739 Triazene-based compound comprising functionalized alkylthio groups, and photopolymerization initiator |
| 09/28/2004 | US6797682 Resist stripper |
| 09/28/2004 | US6797648 Cleaning water for cleaning a wafer and method of cleaning a wafer |
| 09/28/2004 | US6797647 Method for fabricating organic thin film |
| 09/28/2004 | US6797607 Contact planarization using nanoporous silica materials |
| 09/28/2004 | US6797527 Manufacturing method of a phase shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device |
| 09/28/2004 | US6797457 Method for improving the resolution of optic lithography |
| 09/28/2004 | US6797456 Photoresist structure that does not have swelling defects |
| 09/28/2004 | US6797454 Method and apparatus for thermal processing a photosensitive element |
| 09/28/2004 | US6797453 Which has resolution high enough to form through hole or u-shaped depression; comprises silane coupling agent; for electroluminescent liquid crystal displays |
| 09/28/2004 | US6797452 Dissolved in high-boiling solvent having low toxicity (propylene glycol); can be developed with water without affecting strong adhesion; screen printing; blade coating |
| 09/28/2004 | US6797451 Semiconductor substrates; forming photoresist patterns |
| 09/28/2004 | US6797450 Alkali-soluble resin having no epoxy group and a 1,2-quinonediazide compound |
| 09/28/2004 | US6797449 For planographic printing plate precursors, color proofs, photoresists and color filters; high infrared radiation absorption; semiconductor lasers |
| 09/28/2004 | US6797443 Light is directed onto a photomask by non- telecentric illumination obtained by controlling a shape of an opening of an illumination aperture |
| 09/28/2004 | US6797442 Fabrication method of semiconductor integrated circuit device |
| 09/28/2004 | US6797441 Assigning different phases to selected cuts on a complementary mask to clear phase conflicts generated by a phase shifting mask during an optical lithography process used in fabricating a semiconductor chip |
| 09/28/2004 | US6797440 First phase-shifting regions phase shift the light traveling through them 180 degrees relative to the light traveling through the rims, thereby increasing the contrast of the light traveling through the rim phase shifting mask |
| 09/28/2004 | US6797096 Polymer having a photo-reactive ethenyl group on a main chain; improved alignment stability against external shocks, light, and heat. |
| 09/28/2004 | US6796664 Method and device for decontaminating optical surfaces |
| 09/28/2004 | US6796236 Flexible substrate, ink repellent or hydrophilic layer, and a light heat conversion material containing a thermoplastic; does not require a special developing agent; infrared light carries out exposure and fixing |
| 09/28/2004 | US6796235 Applying imagewise an insolubilizing chemical to the coating for imaging a printing plate having a coating comprising diazo compounds |
| 09/28/2004 | CA2249886C Acrylic microchannels and their use in electrophoretic applications |
| 09/26/2004 | CA2423531A1 Method of imparting patterns of surface relief to rigid substrates |
| 09/23/2004 | WO2004082000A1 Method for forming pattern in semi-conductor device |
| 09/23/2004 | WO2004081999A1 Optical device, exposure apparatus and method for manufacturing device |
| 09/23/2004 | WO2004081998A1 X-ray generator and euv exposure device |
| 09/23/2004 | WO2004081988A2 Model pattern simulation of semiconductor wafer processing steps |
| 09/23/2004 | WO2004081666A1 Immersion lithography methods using carbon dioxide |
| 09/23/2004 | WO2004081665A1 Chemical amplification type positive resist composition |
| 09/23/2004 | WO2004081664A2 Novel photosensitive resin compositions |
| 09/23/2004 | WO2004081663A2 Novel photosensitive resin compositions |
| 09/23/2004 | WO2004081662A2 Development enhancement of radiation-sensitive elements |
| 09/23/2004 | WO2004081621A1 Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays |
| 09/23/2004 | WO2004081559A1 Micro fluid device and process for producing the same |
| 09/23/2004 | WO2004081503A2 Discharge produced plasma euv light source |
| 09/23/2004 | WO2004081065A1 Acid-sensitive copolymer and use thereof |
| 09/23/2004 | WO2004080722A2 Flexographic printing |
| 09/23/2004 | WO2004072734A3 Transmission mask with differential attenuation to improve iso-dense proximity |
| 09/23/2004 | WO2004063814A3 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 09/23/2004 | WO2004059389A3 Sensitizer dyes for photoacid generating systems |
| 09/23/2004 | WO2004049072A3 Method and apparatus for overlay control using multiple targets |
| 09/23/2004 | WO2004044656A3 Method for washing an optical lens |
| 09/23/2004 | WO2004031867A3 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 09/23/2004 | WO2004025368A3 Device for sealing a projection illumination system |
| 09/23/2004 | WO2002044811A3 Polymers blends and their use in photoresist compositions for microlithography |
| 09/23/2004 | US20040186609 Process monitoring system for lithography lasers |
| 09/23/2004 | US20040186195 Acid generator, oxidation radical generator and fused polycyclic aromatic compound; visible light catalytic system: dental materials; simple, no polishing required; sealing |
| 09/23/2004 | US20040185682 Reticle tracking and cleaning |
| 09/23/2004 | US20040185644 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 09/23/2004 | US20040185387 Fullerene addition in photoresist via incorporation in the developer |
| 09/23/2004 | US20040185386 evanescently coupling; etching, cladding, planarization, then etching waveguide; chemical vapor deposition; chemical mechanical polishing |
| 09/23/2004 | US20040185385 Method for fabricating a mold |
| 09/23/2004 | US20040185383 Resist pattern forming method and resist pattern forming system |
| 09/23/2004 | US20040185382 Method for forming a minute pattern and method for manufacturing a semiconductor device using the same |
| 09/23/2004 | US20040185381 exposure light flux is transmitted and inverted through the shifter edge region contacted with the border of the opening region; destructive interference between exposure light fluxes improves resolution; microminiaturization, increased integration; photolithography |
| 09/23/2004 | US20040185380 Method and apparatus for bilayer photoresist dry development |
| 09/23/2004 | US20040185378 Stimulus sensitive compound and stimulus sensitive composition containing the same |
| 09/23/2004 | US20040185377 comprising a flexible support having a hydrophilic layer and an image forming layer; superior exposure visibility of images formed upon exposure to lasers or near-infrared rays and enhanced sensitivity without producing stains in the printer; printing |
| 09/23/2004 | US20040185376 Photoresist coatings for copper clad stainless steel printing plates |
| 09/23/2004 | US20040185374 Developing solution for heat-sensitive lithographic printing plate precursor and method for preparing lithographic printing plate |
| 09/23/2004 | US20040185373 Photosensitive composition |
| 09/23/2004 | US20040185372 a dye-containing curable composition containing an alkali soluble binder, an organic-solvent-soluble dye, a radiation-sensitive compound and a metal complex of a transition element; high light fastness after alkali development and a good retained layer rate after development. |
| 09/23/2004 | US20040185371 Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate |
| 09/23/2004 | US20040185370 Resist remover composition |
| 09/23/2004 | US20040185368 Light-sensitive photoresist composition especially useful for imaging thick films, comprising a film-forming alkali-soluble resin, a photoactive compound, and a surfactant at a level ranging from about 2000 ppm to about 14,000 ppm by weight of |
| 09/23/2004 | US20040185354 capable of getting a smooth sloped portion of the blaze and a sharp rising portion of the blaze edge using a small-diameter beam, and reducing the overall blaze patterning time at the same time |
| 09/23/2004 | US20040185353 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means |
| 09/23/2004 | US20040185351 Design and layout of phase shifting photolithographic masks |
| 09/23/2004 | US20040185349 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 09/23/2004 | US20040185348 optical lithography; radiation transparent; semiconductors/integrated circuits |
| 09/23/2004 | US20040184503 Narrow band electric discharge gas laser having improved beam direction stability |
| 09/23/2004 | US20040184119 Imaging head unit, imaging device and imaging method |
| 09/23/2004 | US20040184036 Substrate alignment apparatus and method, and exposure apparatus |
| 09/23/2004 | US20040184035 Generic interface for an optical metrology system |
| 09/23/2004 | US20040184030 Method and apparatus for providing lens aberration compensation by illumination source optimization |
| 09/23/2004 | US20040184021 Photolithography processing system and method thereof |
| 09/23/2004 | US20040184020 Positioning device |
| 09/23/2004 | US20040184019 Optically polarizing retardation arrangement, and microlithography projection exposure machine |
| 09/23/2004 | US20040184018 Abbe arm calibration system for use in lithographic apparatus |
| 09/23/2004 | US20040184015 Aligner and device fabrication method |
| 09/23/2004 | US20040184014 Contamination barrier with expandable lamellas |
| 09/23/2004 | US20040183236 capable of transferring a pattern with a higher degree of accuracy in a manufacturing process for semiconductor devices |
| 09/23/2004 | US20040183038 Extreme UV radiation source and semiconductor exposure device |
| 09/23/2004 | US20040183037 Method and device for producing extreme ultraviolet radiation and soft x-ray radiation |
| 09/23/2004 | US20040183036 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 09/23/2004 | US20040183031 Dual hemispherical collectors |
| 09/23/2004 | US20040183030 Method and apparatus for recycling gases used in a lithography tool |
| 09/23/2004 | US20040182820 For forming a fine structure on a substrate using a mold comprising a heating and a pressure-applying mechanism |
| 09/23/2004 | US20040182565 Temperature adjusting system and exposure apparatus incorporating the same |
| 09/23/2004 | US20040182422 Applying a semiconductor process to wafer being supported by a surface tension gradient device; monitoring and outputting result |
| 09/23/2004 | US20040182419 High-pressure processing apparatus and high-pressure processing method |
| 09/23/2004 | US20040182266 Method for manufacturing photosensitive resin printing plate, and developer treatment device |
| 09/23/2004 | US20040182168 Shaped non-contact capacitive displacement sensors for measuring shaped targets |
| 09/23/2004 | DE4230058B4 Lichtempfindliches Element für lithographische Platten A photosensitive element for lithographic plates |
| 09/23/2004 | DE10307523A1 Process for preparation of an auxiliary mask for structuring of semiconductor substrates, giving a photoresist film useful for Si wafers, for production of trenches for deep-trench transistors, and as a mask for dry etching processes |
| 09/23/2004 | DE10253919B4 Verfahren zur Justage eines Substrates in einem Gerät zur Durchführung einer Belichtung A method for adjusting a substrate in an apparatus for performing an exposure |
| 09/23/2004 | DE10242142A9 Verfahren und Vorrichtung zum Herstellen von belichteten Strukturen Method and apparatus for producing exposed structures |
| 09/23/2004 | DE102004004854A1 Fotomaske sowie Verfahren und Vorrichtung zu ihrer Herstellung Photomask and method and apparatus for the production thereof |