| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/05/2004 | US6802051 Method and apparatus for reference distribution aerial image formation |
| 10/05/2004 | US6801827 Overlay inspection apparatus for semiconductor substrate and method thereof |
| 10/05/2004 | US6801825 Management system and management method of semiconductor exposure apparatuses |
| 10/05/2004 | US6801823 Photomask supply system with photomask production period shortened |
| 10/05/2004 | US6801650 Mechanism and method for controlling focal point position of UV light and apparatus and method for inspection |
| 10/05/2004 | US6801560 Line selected F2 two chamber laser system |
| 10/05/2004 | US6801554 Laser oscillating apparatus, exposure apparatus, and device fabrication method |
| 10/05/2004 | US6801368 System for converting optical beams to collimated flat-top beams |
| 10/05/2004 | US6801364 Projection objective for microlithography |
| 10/05/2004 | US6801358 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 10/05/2004 | US6801357 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 10/05/2004 | US6801321 Method and apparatus for measuring lateral variations in thickness or refractive index of a transparent film on a substrate |
| 10/05/2004 | US6801315 Method and system for overlay measurement |
| 10/05/2004 | US6801313 Grooved pattern surrounding mark pattern formed by engraving protects against deformation by thermal expansion or contraction |
| 10/05/2004 | US6801302 Plate registering system and method of operation |
| 10/05/2004 | US6801301 Exposure apparatus |
| 10/05/2004 | US6801300 System and method for switching position signals during servo control of a device table |
| 10/05/2004 | US6801299 System for laser beam expansion without expanding spatial coherence |
| 10/05/2004 | US6801298 Light condenser |
| 10/05/2004 | US6801297 Exposure condition determination system |
| 10/05/2004 | US6801295 Heterogeneity radiant energy flux; adjustable plate with apertures; semiconductor masking |
| 10/05/2004 | US6800861 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 10/05/2004 | US6800721 Unsaturated oligophenol cyanates |
| 10/05/2004 | US6800720 Base polymer containing an ester group to be decomposed to a carboxylic acid to become soluble in the developer for a photoresist used in fine working of a semiconductor using ultraviolet ray; heat resistance; optics; adhesion |
| 10/05/2004 | US6800560 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 10/05/2004 | US6800559 Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface |
| 10/05/2004 | US6800551 Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate |
| 10/05/2004 | US6800428 Generating enlargement pattern; conveying pattern edges; protective coatings; exposure, development |
| 10/05/2004 | US6800426 Negative working image forming; flooding exposure using actinic radiation |
| 10/05/2004 | US6800425 Process of producing polymer optical waveguide |
| 10/05/2004 | US6800424 Optical devices made from radiation curable fluorinated compositions |
| 10/05/2004 | US6800423 Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices |
| 10/05/2004 | US6800422 Thick film photoresists and methods for use thereof |
| 10/05/2004 | US6800421 Pattern in chip areas of a photomask is transferred onto an internal area of a semiconductor wafer as ship areas including defects among the chip areas of the photomask are shielded with a light shielding body; shortens time |
| 10/05/2004 | US6800420 An acrylic or methacrylic copolymer blends contains a photoinitiator, a reactive monomer, a conductive metal, glass powder, solvents; electrode material with high resolution and high contrast; electrode circuits by photolithography |
| 10/05/2004 | US6800419 For use as chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability |
| 10/05/2004 | US6800418 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same |
| 10/05/2004 | US6800417 Lithographic printing plate precursor |
| 10/05/2004 | US6800416 Mixture of fluoropolymer, photoactive material and crosslinking agent |
| 10/05/2004 | US6800415 Negative-acting aqueous photoresist composition |
| 10/05/2004 | US6800414 Radiation-sensitive resin composition |
| 10/05/2004 | US6800409 Able to measure tmah concentration in the recycling system accurately such that alkalinity of tmah in the recycled developer solution can be controlled |
| 10/05/2004 | US6800408 Use of multiple reticles in lithographic printing tools |
| 10/05/2004 | US6800407 Lithographic structuring of semiconductors |
| 10/05/2004 | US6800405 Irradiating the substrate surface with a modifiable layer having a photocatalyst, with a gap of light shielding; color filters; high precise pattern, free of photocatalyst in pattern layer, nondeforming |
| 10/05/2004 | US6800403 Techniques to characterize iso-dense effects for microdevice manufacture |
| 10/05/2004 | US6800370 Substrate having photoionisable moieties capable of undergoing dimerization attached to a portion of the surface; irradiation with light of an appropriate wavelength results in dimerization, thereby altering surfce wettability |
| 10/05/2004 | US6800219 Liquid crystal composition, selectively reflective film and liquid crystal color filter |
| 10/05/2004 | US6800214 Computerized adjustment of the thickness of photoresists; semiconductors; integrated circuits |
| 10/05/2004 | US6800142 Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment |
| 10/05/2004 | US6799907 Plasma enhanced method for increasing silicon-containing photoresist selectivity |
| 10/05/2004 | CA2111718C Photosensitive compositions |
| 09/30/2004 | WO2004084281A1 Projection optical system, exposure system, and exposure method |
| 09/30/2004 | WO2004083962A2 Photoresist composition for the formation of thick films |
| 09/30/2004 | WO2004083960A2 Alternating aperture phase shift photomask having light absorption layer |
| 09/30/2004 | WO2004083490A2 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
| 09/30/2004 | WO2004083309A1 Radiation curable composition, optical waveguide and method for formation thereof |
| 09/30/2004 | WO2004082814A2 Method and device for wetting a substrate with a liquid |
| 09/30/2004 | WO2004050728A3 Method of producing (meth) acrylic acid derivative polymer for resist |
| 09/30/2004 | WO2004036264A3 Polymers, methods of use thereof, and methods of decomposition thereof |
| 09/30/2004 | WO2004035105A3 Polymer microneedles |
| 09/30/2004 | US20040194042 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 09/30/2004 | US20040192867 Photoresists; radiation transparent |
| 09/30/2004 | US20040192804 Photosensitive resin composition |
| 09/30/2004 | US20040192572 comprises carbon dioxide, additive (tetramethylammoniumfluoride) for removing residues, inhibitor (ethylene glycol) of residues, and co-solvent for dissolving additive and inhibitor in carbon dioxide at pressurized fluid conditions; for removal of photoresists during semiconductor processing |
| 09/30/2004 | US20040192045 Apparatus and methods for maskless pattern generation |
| 09/30/2004 | US20040192041 UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| 09/30/2004 | US20040191935 Detection assembly and lithographic projection apparatus provided with such a detection assembly |
| 09/30/2004 | US20040191704 Resin molded product production process, metal structure production process, and resin molded product |
| 09/30/2004 | US20040191703 Photoresist-free micropatterning on polymer surfaces |
| 09/30/2004 | US20040191702 Patterning surface of substrate; transmission light through pattern; masking; positioning len bewtween support and light source |
| 09/30/2004 | US20040191701 Electron exposure to reduce line edge roughness |
| 09/30/2004 | US20040191700 Stamper and transfer apparatus |
| 09/30/2004 | US20040191699 Method of fabricating a semiconductor device |
| 09/30/2004 | US20040191698 Multilayer; forming cathode on substrate, composite layer of carbon nanotubes embedded in matrix ; peeling |
| 09/30/2004 | US20040191697 Method for processing a niobium type thin film and method for manufacturing a superconducting integrated circuit |
| 09/30/2004 | US20040191696 UV-activated dielectric layer |
| 09/30/2004 | US20040191695 Processing inorganic nanoparticles and a carrier to form an electroconductive pattern area that adheres to the surface of a substrate |
| 09/30/2004 | US20040191694 Process for prepaing light-sensitive lithographic printing plate and method for processing the same |
| 09/30/2004 | US20040191693 Light exposure to infrared radiation; heat sensitive elements; presentilized plates; using novolak phenol-formaldehyde resin; alkaline development solution containing surfactant mixtures |
| 09/30/2004 | US20040191692 Support for lithographic printing plate and presensitized plate and method of treating presensitized plate |
| 09/30/2004 | US20040191691 Light sensitive composition and light sensitive planographic printing plate material |
| 09/30/2004 | US20040191690 Using photosensitive copper conductive mixture of copper powder in binder; controlling particle sizes |
| 09/30/2004 | US20040191681 Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes |
| 09/30/2004 | US20040191680 Chemical resistance; radiation transparent; photoresists |
| 09/30/2004 | US20040191679 Photosensitive composition and novel compound used therefor |
| 09/30/2004 | US20040191677 Positive-working chemical-amplification photoresist composition |
| 09/30/2004 | US20040191676 Positive resist composition |
| 09/30/2004 | US20040191675 Support overcoated with hydrophilic surface; aluminum oxide or aluminum hydroxide spacer particles; wear resistant protective coating; controlling particle sizes |
| 09/30/2004 | US20040191674 Chemical amplification resist composition |
| 09/30/2004 | US20040191673 Lithographic printing plate precursor and method for preparation thereof |
| 09/30/2004 | US20040191672 Acid or base generator; releasing acid, or base upon exposure to radiation; photosensitivity, resolution, heat resistance, solvent solubility |
| 09/30/2004 | US20040191671 Mixture of alkali soluble resin, photopolymerization monomer, photoinitiators, solvents and pigments; substrate and black matrix; development of colored pixel that are heat and chemical resistant |
| 09/30/2004 | US20040191670 Resin insoluble in alkaline aqueous solution; mixture with acid generator |
| 09/30/2004 | US20040191669 Resist composition with enhanced X-ray and electron sensitivity |
| 09/30/2004 | US20040191652 Coating with photoresists; masking; exposure to light; development into latent images patterns |
| 09/30/2004 | US20040191650 Phase shift masking for complex patterns with proximity adjustments |
| 09/30/2004 | US20040191644 Mask pattern generating method and mask pattern generating apparatus |
| 09/30/2004 | US20040191643 photoresists/photomasks; for producing a halftone gray level dosage distribution after illumination |
| 09/30/2004 | US20040191641 Forming image; applying paste to substrate; irradiation |