| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/07/2004 | WO2004062899A3 Method for manufacturing of polymer micro needle array with liga process |
| 10/07/2004 | WO2004051371A3 Template |
| 10/07/2004 | WO2004044025A8 Anti-reflective coatings for photolithography and methods of preparation thereof |
| 10/07/2004 | WO2004036314A3 Acid generating agents and their use in processes for imaging radiation-sensitive elements |
| 10/07/2004 | WO2004019133A3 Method for forming a masking layer on a substrate |
| 10/07/2004 | US20040199349 Automatic calibration of a masking process simulator |
| 10/07/2004 | US20040198861 Solvent and photocurable resin and oxyalkyl compound for photosensitive resin that is water soluble |
| 10/07/2004 | US20040198859 Coinitiator for photopolymerization of olefin using coumarin as photoinitiator or a halogen compound |
| 10/07/2004 | US20040198857 Photochemical reactions using multi-photon upconverting fluorescent inorganic materials |
| 10/07/2004 | US20040198627 Process and apparatus for removing residues from the microstructure of an object |
| 10/07/2004 | US20040198622 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
| 10/07/2004 | US20040198621 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| 10/07/2004 | US20040197951 Membrane IC fabrication |
| 10/07/2004 | US20040197713 Radiation sensitivity; heat treatment ; adjustable spacer |
| 10/07/2004 | US20040197712 Bowing the first surface; moving the bowed first surface toward the second surface at a predetermined rate until the first surface contacts the second surface at a single point of contact; continuing to move the bowed first surface toward the second surface until single point of point of contact expands |
| 10/07/2004 | US20040197710 Forming a material layer on a substrate; forming a patterned photoresist layer onmaterial layer; forming silylated photoresist film around sidewall of the patterned photoresist layer; removing the patterned photoresist layer; removing material layer exposed by first silylated photoresist film, removing |
| 10/07/2004 | US20040197709 For absorbing irradiated light for exposure with a wavelength of 248 nm, 193 nm or 157 nm |
| 10/07/2004 | US20040197708 Positive resist composition and method of forming resist pattern using the same |
| 10/07/2004 | US20040197707 Positive resist composition and method of pattern formation using the same |
| 10/07/2004 | US20040197705 Cyanide compound, optical filter, and optical recording material |
| 10/07/2004 | US20040197704 Photoresist compositions |
| 10/07/2004 | US20040197703 Positive-type photosensitive resin composition |
| 10/07/2004 | US20040197702 Positive resist composition |
| 10/07/2004 | US20040197700 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 10/07/2004 | US20040197699 polyimide from tetracarboxylic compound and a fluorine-containing diamine, especially hexafluoroisopropylidenedianiline, mixed with a polyamic acid and an acid-generating photoinitiator; passivation, buffer coating, and insulating films for semiconductors, multilayer printed circuits, organic EL devices |
| 10/07/2004 | US20040197698 A curable composition using general-purpose hydrolyzable silane compounds without using special hydrolyzable silane compound monomers; also photoacid generator and a basic compound; accuracy; optical waveguides having reduced waveguide loss |
| 10/07/2004 | US20040197696 Photoresist compositions |
| 10/07/2004 | US20040197684 Composition and method for 3-dimensional mapping or radiation dose |
| 10/07/2004 | US20040197683 Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted |
| 10/07/2004 | US20040197680 an opaque-field phase shift mask and the second mask is a single phase structure mask, a phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field |
| 10/07/2004 | US20040197678 Photolithography projections; exposure a photoresist pattern, measurement optics; calibration |
| 10/07/2004 | US20040197677 Trimming or correction mask for lithography |
| 10/07/2004 | US20040197676 Method for forming an opening in a light-absorbing layer on a mask |
| 10/07/2004 | US20040197675 Stencil mask with charge-up prevention and method of manufacturing the same |
| 10/07/2004 | US20040197674 Chromeless phase shift mask |
| 10/07/2004 | US20040197672 Can be used to compensate for the undesirable effects of lens aberrations in the condenser or projection lens; can provide any number of illumination configurations, thereby eliminating the expense of fabricating, testing, and repairing multiple apertures |
| 10/07/2004 | US20040197670 Sensitivity |
| 10/07/2004 | US20040197488 Plasma deposited selective wetting material |
| 10/07/2004 | US20040196526 Loosely-packed two-dimensional modulator arrangement |
| 10/07/2004 | US20040196447 Photomask, flare measuring mechanism, flare measuring method, and exposing method |
| 10/07/2004 | US20040196446 Exposure method and apparatus |
| 10/07/2004 | US20040196445 Method of reducing pitch on semiconductor wafer |
| 10/07/2004 | US20040196444 Method for adjusting projection optical apparatus |
| 10/07/2004 | US20040196357 Apparatus and method for recording image on printing plate |
| 10/07/2004 | US20040196125 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus |
| 10/07/2004 | US20040195527 Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| 10/07/2004 | US20040195526 Energy beam irradiating apparatus |
| 10/07/2004 | US20040195365 Edge remover having a gas sprayer to prevent a chemical solvent from splashing |
| 10/07/2004 | US20040195202 Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate |
| 10/07/2004 | US20040194920 Apparatus for and method of heat-treating a wafer |
| 10/07/2004 | US20040194883 Delivery of dissolved ozone |
| 10/07/2004 | US20040194814 Apparatus and process for stripping resist |
| 10/07/2004 | US20040194556 Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array |
| 10/07/2004 | DE10361257A1 Verfahren zur Herstellung von feinen Mustern A process for producing fine patterns |
| 10/07/2004 | DE10338048A1 Phasenverschiebungsmaske, Verfahren zumBilden eines Musters mit einer Phasenverschiebungsmaske, Verfahren zum Herstellen einer elektronischen Vorrichtung Phase shift mask method zumBilden a pattern having a phase shift mask method for manufacturing an electronic device |
| 10/07/2004 | DE10312628A1 Verfahren und Vorrichtung zum Benetzen eines Substrats mit einer Flüssigkeit Method and apparatus for wetting a substrate with a liquid |
| 10/07/2004 | DE10310137A1 Satz von wenigstens zwei Masken zur Projektion von jeweils auf den Masken gebildeten und aufeinander abgestimmten Strukturmustern und Verfahren zur Herstellung der Masken Set of at least two masks for the projection of the respectively formed on the masks and concerted structure patterns and methods for making the masks |
| 10/06/2004 | EP1465018A2 Correction in scanning direction of mask-to-object shift due to Z offset and non-perpendicular illumination |
| 10/06/2004 | EP1465016A2 Illumination source and photomask optimization |
| 10/06/2004 | EP1465015A1 Lithographic apparatus and device manufacturing method |
| 10/06/2004 | EP1465014A2 Lithographic apparatus, device manufacturing method and device manufacturated thereby |
| 10/06/2004 | EP1465013A2 Lithographic apparatus and device manufacturing method |
| 10/06/2004 | EP1465012A2 Supporting structure for use in a lithographic apparatus |
| 10/06/2004 | EP1465011A1 Transfer apparatus for transferring an object and method of use thereof and lithographic projection apparatus comprising such a transfer apparatus |
| 10/06/2004 | EP1465010A1 Positive resist composition |
| 10/06/2004 | EP1464992A1 Fluoride crystal material for optical device used for photolithographic apparatus and its manufacturing method |
| 10/06/2004 | EP1464678A1 Cyanine compound, optical filter, and optical recording material |
| 10/06/2004 | EP1464492A2 Printing plate removing/supplying device |
| 10/06/2004 | EP1464487A2 Positive photosensitive composition and positive photosensitive lithographic printing plate |
| 10/06/2004 | EP1463978A1 Continuously adjustable neutral density filter |
| 10/06/2004 | EP1463778A2 Modified pigment products and black matrixes comprising same |
| 10/06/2004 | EP1279072B1 Ozone-enhanced silylation process to increase etch resistance of ultra thin resists |
| 10/06/2004 | EP1203427B1 High pulse rate pulse power system with liquid cooling |
| 10/06/2004 | EP1076906B1 Lighting system, especially for extreme ultraviolet lithography |
| 10/06/2004 | EP1037110B1 Photopolymer plate for letterpress printing |
| 10/06/2004 | CN1535475A Correction of overlay offset between inspection layers in interated circuits |
| 10/06/2004 | CN1535392A Catadioptric systema and exposure device having this system |
| 10/06/2004 | CN1535306A Triazine ring based polymers for photoinduced liquid crystal alignment, liquid crystal alignment layer containing same, liquid crystal element using alignment and method of mfg. same |
| 10/06/2004 | CN1535299A 聚酰胺酸树脂组合物 Polyamic acid resin composition |
| 10/06/2004 | CN1535213A Forming mark on gemstone or industrial diamond |
| 10/06/2004 | CN1535212A Mounting and preparing gemstone or industrial diamond for formation of mark on surface thereof |
| 10/06/2004 | CN1534730A Method of forming and testing phase shift mask |
| 10/06/2004 | CN1534729A Manufacturing process of integrated aligning mark and channel component element |
| 10/06/2004 | CN1534387A Photoetching mark structure, photoetching projection device and method of proceeding base plate aligning |
| 10/06/2004 | CN1534386A Supporting structure used for photoetching equipment |
| 10/06/2004 | CN1534385A Transferring equipment used for transferring matter and its use method and photoetching projection equipment containing said transferring equipment |
| 10/06/2004 | CN1534382A Dismountable stencil plate window and supporting frame using magnetic force |
| 10/06/2004 | CN1534381A Cleaning method of photoetching projection device component element surface photo etching projection device, device manufacturing method and cleaning system |
| 10/06/2004 | CN1534380A Method and device of transferring optical enclosure picture and method of manufacturing optical enclosure |
| 10/06/2004 | CN1534379A Photosensitive composition and new compound therefor |
| 10/06/2004 | CN1534271A Device detection |
| 10/06/2004 | CN1534269A Non contact capacitance type displacement sensor used for measuring shape of shaping target |
| 10/06/2004 | CN1170209C Linear-array light source for photoetching scanner of array-type integrated circuit |
| 10/06/2004 | CN1170208C Separate exposure process by using common ultraviolet photoetching in deep layer |
| 10/06/2004 | CN1170207C Phenol-alicyclic copolymer photoresist, preparing process and product thereof |
| 10/06/2004 | CN1170206C Process for producing photoresist composition having reduced tendency to produce particles |
| 10/06/2004 | CN1170205C Photosensitive resin composition for roll coating and method of roll coating |
| 10/06/2004 | CN1170204C Photosensitive resin compsn. |
| 10/06/2004 | CN1169884C Composition for reflection reducing coating |
| 10/06/2004 | CN1169679C Print method for lithographic plate and lithographic plate treated by said method |