| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/14/2004 | US20040200411 Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field |
| 10/14/2004 | US20040200369 Method and system for printing press image distortion compensation |
| 10/14/2004 | US20040200226 Exposure apparatus |
| 10/14/2004 | DE4102731B4 Lithographieeinrichtung zum direkten Beschreiben eines Subtrates Lithography for directly describing a Subtrates |
| 10/14/2004 | DE19906421B4 Verfahren zur Verminderung von Unschärfen und zur Einstellung der optischen Auflösung eines Belichtungsgerätes A method for reducing blur and to adjust the optical resolution of an exposure apparatus |
| 10/14/2004 | DE10314104A1 Catadioptric projection lens for semiconductor photolithography, has device for absorbing stray light passing through beam splitter, comprising absorbing medium such as eloxal |
| 10/14/2004 | DE10311855A1 Appliance for transfer of information or structures onto wafer, using stamp with raised structures produced by suitable method, e.g. photolithography in conjunction with etching |
| 10/14/2004 | DE10297564T5 Verfahren und Vorrichtung zum Steuern der Photolithographie-Überlagerungsjustierung mit vorwärtsgekoppelter Überlagerungsinformation Method and apparatus for controlling the photolithography overlay adjustment with feedforward overlay information |
| 10/14/2004 | CA2516603A1 Maskless optical interferometric lithography |
| 10/13/2004 | EP1467554A2 Method and system for printing press image distortion compensation. |
| 10/13/2004 | EP1467256A1 Device manufacturing method and mask set for use in the method |
| 10/13/2004 | EP1467255A1 Lithographic apparatus, device manufacturing method and computer program |
| 10/13/2004 | EP1467254A1 Lithographic apparatus and device manufacturing method |
| 10/13/2004 | EP1467253A1 Lithographic apparatus and device manufacturing method |
| 10/13/2004 | EP1467252A1 Device manufacturing method and mask set for use in the method |
| 10/13/2004 | EP1467251A1 Positive resist composition |
| 10/13/2004 | EP1467250A2 Photosensitive composition and litographic printing plate precursor |
| 10/13/2004 | EP1467249A2 Resin composition, optical filter and plasma display |
| 10/13/2004 | EP1466893A1 Polymerizable composition and compound therefor |
| 10/13/2004 | EP1466216A1 Process for producing an image using a first minimum bottom antireflective coating composition |
| 10/13/2004 | EP1466215A1 Negative deep ultraviolet photoresist |
| 10/13/2004 | EP1466214A2 Negative-working photoimabeable bottom antireflective coating |
| 10/13/2004 | EP1466213A2 Fabrication of high resolution biological molecule detection device |
| 10/13/2004 | EP1466212A1 Multi-image reticles |
| 10/13/2004 | EP1465877A1 Positive-working photoimageable bottom antireflective coating |
| 10/13/2004 | EP1347461A4 Device for x-ray lithography |
| 10/13/2004 | EP1086030A4 Smif pod including independently supported wafer cassette |
| 10/13/2004 | EP0910612B1 Curing process for cationically photocurable formulations |
| 10/13/2004 | CN1537124A Polymer suitable for photoresist compositons |
| 10/13/2004 | CN1536640A Method for positioning substratge relatively to supporting table and its equipment |
| 10/13/2004 | CN1536638A Method for defining substrate position prelatively to supporting table and equipment |
| 10/13/2004 | CN1536624A Stripping device and method for protective layer |
| 10/13/2004 | CN1536618A Method for mfg. semiconductor device |
| 10/13/2004 | CN1536447A Photoresist removing composite |
| 10/13/2004 | CN1536445A Photoetching equipment, device mfg. method and computer program |
| 10/13/2004 | CN1536444A Functional polymer |
| 10/13/2004 | CN1536443A Positive type photo erosion resistant agent composition used for outlet spray nozzle coating method and forming method anticorrosion picture |
| 10/13/2004 | CN1536442A 正型光敏树脂组合物 The positive-type photosensitive resin composition |
| 10/13/2004 | CN1536441A Optical cover process and method for making film transistor |
| 10/13/2004 | CN1536437A Corrosion-proof film forming method and photomask making method |
| 10/13/2004 | CN1536417A Method for making liquid crystal display panel |
| 10/13/2004 | CN1536416A Method for making flm transistor liquid crystal display |
| 10/13/2004 | CN1535965A cyanine compound, filter and optical recording material |
| 10/13/2004 | CN1535763A Base plate processing device, coating device and coading method |
| 10/13/2004 | CN1171288C Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 10/13/2004 | CN1171287C Trench-open on semiconductor substrate, method for making deep slot and opening contact hole |
| 10/13/2004 | CN1171126C Optical proximity effect correcting method |
| 10/13/2004 | CN1171125C Copolymer with nitrile and alcyl group and photoresist composition containing the copolymer |
| 10/13/2004 | CN1171124C Radiation-sensitive resin composition |
| 10/13/2004 | CN1171123C A process for making photoactive compound and photoresist therefrom |
| 10/13/2004 | CN1171122C Optical polymerism composition |
| 10/13/2004 | CN1170695C Component delivery device and method for mfg. planographic printing plate |
| 10/12/2004 | US6804327 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
| 10/12/2004 | US6804323 Mask pattern magnification correction method, magnification correction apparatus, and mask structure |
| 10/12/2004 | US6804288 Electron beam exposure apparatus and electron beam deflection apparatus |
| 10/12/2004 | US6804014 Method and apparatus for determining contact opening dimensions using scatterometry |
| 10/12/2004 | US6804005 Overlay measurements using zero-order cross polarization measurements |
| 10/12/2004 | US6803996 Device manufacturing-related apparatus, gas purge method, and device manufacturing method |
| 10/12/2004 | US6803995 Projecting energy beam through lithographic mask to form setting target; measuring defocus sensitive dimension and adjusting; semiconductor wafers for microelectronic circuits |
| 10/12/2004 | US6803994 Wavefront aberration correction system |
| 10/12/2004 | US6803993 Lithographic apparatus and device manufacturing method |
| 10/12/2004 | US6803992 Projection exposure apparatus |
| 10/12/2004 | US6803991 Exposure amount control method in exposure apparatus |
| 10/12/2004 | US6803990 Exposure apparatus and pressure correction method |
| 10/12/2004 | US6803589 Apparatus and method applied to exposure by charged beam |
| 10/12/2004 | US6803554 System and method for lithography process monitoring and control |
| 10/12/2004 | US6803434 Providing a reaction mixture of an ethylenically unsaturated anhydride monomer, a ethylenically unsaturated non-anhydride monomer, a free radical initiator and an alkyl substituted tetrahydrofuran solvent, polymerizing the reaction mixture |
| 10/12/2004 | US6803392 Photoinitiator formulations |
| 10/12/2004 | US6803316 Method of planarizing by removing all or part of an oxidizable material layer from a semiconductor substrate |
| 10/12/2004 | US6803292 Method for manufacturing a semiconductor device and semiconductor device with overlay mark |
| 10/12/2004 | US6803178 Two mask photoresist exposure pattern for dense and isolated regions |
| 10/12/2004 | US6803176 Methods for forming line patterns in semiconductor substrates |
| 10/12/2004 | US6803175 Method of producing pattern-formed structure and photomask used in the same |
| 10/12/2004 | US6803174 Forming photosensitive dielectric film pattern; reflection electrode; liquid crystals display |
| 10/12/2004 | US6803173 A polymer having a silicon atom in a side chain, which is insoluble in aqueous alkali solution and becomes soluble in aqueous alkali solution by the action of an acid, generated by acid generator on exposure to active light radiation |
| 10/12/2004 | US6803172 Organic anti-reflective coating material and preparation thereof |
| 10/12/2004 | US6803171 For forming relief images; manufacturing electronic and optoelectronic device; useful as photoresists |
| 10/12/2004 | US6803170 Resist composition and method for manufacturing semiconductor device using the resist composition |
| 10/12/2004 | US6803169 Deep ultraviolet radiation photoresists |
| 10/12/2004 | US6803168 Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition |
| 10/12/2004 | US6803167 Preparation of lithographic printing plates |
| 10/12/2004 | US6803160 Multi-tone photomask and method for manufacturing the same |
| 10/12/2004 | US6803157 Making added features of sub-resolution size that do not produce features on the exposed wafer |
| 10/12/2004 | US6803154 Such as a phase type computer generated hologram (cgh), a two-dimensional binary structure or a phase modulation plate, for example, usable as an optical component of a semiconductor manufacturing reduction exposure apparatus |
| 10/12/2004 | US6803093 Ceramic blank with a photostructurable functional layer containing platinum and method for production thereof |
| 10/12/2004 | US6802986 Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors |
| 10/07/2004 | WO2004086471A1 Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| 10/07/2004 | WO2004086470A1 Exposure system and device production method |
| 10/07/2004 | WO2004086469A1 Inline connection setting method and device and substrate processing device and substrate processing system |
| 10/07/2004 | WO2004086468A1 Exposure apparatus and method, and method of producing apparatus |
| 10/07/2004 | WO2004086467A1 Extreme ultraviolet light source and target for extreme ultraviolet light source |
| 10/07/2004 | WO2004086151A1 Holographic recording medium and recording method therefor |
| 10/07/2004 | WO2004086148A1 Device for the low-deformation replaceable mounting of an optical element |
| 10/07/2004 | WO2004086147A2 Method of imparting patterns of surface relief to rigid substrates |
| 10/07/2004 | WO2004086146A1 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof |
| 10/07/2004 | WO2004086145A1 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel |
| 10/07/2004 | WO2004086144A1 Photosensitive resin composition |
| 10/07/2004 | WO2004086121A1 Optical element, optical system, laser device, exposure device, mask testing device, and high polymer crystal processing device |
| 10/07/2004 | WO2004085993A2 Generic interface for an optical metrology system |
| 10/07/2004 | WO2004066026A3 Imageable elements and compositions for imaging by means of uv irradiation |