G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2004
10/19/2004	US6806945 Automatic exposing apparatus and method for exposing both sides of works
10/19/2004	US6806943 Mask clamping device
10/19/2004	US6806942 Projection exposure system
10/19/2004	US6806941 Pattern forming method and pattern forming apparatus
10/19/2004	US6806897 Image recording apparatus using the grating light valve
10/19/2004	US6806549 Method of manufacturing semiconductor device including a step of forming element isolation trench and semiconductor device
10/19/2004	US6806477 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
10/19/2004	US6806456 System and method for lithography process monitoring and control
10/19/2004	US6806335 PolymEric compound and resin composition for photoresist
10/19/2004	US6806209 Develop processing method of a resist surface on a substrate for reduced processing time and reduced defect density
10/19/2004	US6806050 Biochip for use as tols in genetic engineering, medicine and drug screening
10/19/2004	US6806040 Organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein x denotes hydrogen, deuterium, halogen, an alkyl group or an
10/19/2004	US6806039 Photolithographic element blank calcium strontium fluoride UV transmitting mixed fluoride crystal with minimized spatial dispersion
10/19/2004	US6806038 Forming a conductive trace on a substrate. the conductive trace is patterned with a photoresist mask and etched, thereby forming a polymer layer on a top surface and sidewalls of the photoresist mask and on sidewalls of the conductive trace and
10/19/2004	US6806037 Method for producing and/or renewing an etching mask
10/19/2004	US6806033 Photoimaged dielectric, its manufacture and use in electronics
10/19/2004	US6806032 Negative-type photosensitive resin composition
10/19/2004	US6806029 Pattern formation material and pattern formation method
10/19/2004	US6806028 Reacting metal hydroxides present on the surface of the powdered base metal with a polyvalent alcohol having at least 4 hydroxyl groups; organic binder having acidic groups to form a microgel; photosensitive organic component
10/19/2004	US6806027 For use on semiconductor wafers/chips; etch plasma resistance
10/19/2004	US6806026 Polymer of a fluorinated hydroxyalkyl acrylate
10/19/2004	US6806025 Photoresist monomers, polymers thereof and photoresist compositons containing the same
10/19/2004	US6806024 Oxime derivatives and the use thereof as photoinitiators
10/19/2004	US6806023 Positive radiation-sensitive composition
10/19/2004	US6806022 Positive photosensitive resin composition
10/19/2004	US6806021 Method for forming a pattern and method of manufacturing semiconductor device
10/19/2004	US6806020 Negative working imageable composition containing sulfonic acid
10/19/2004	US6806019 Coating substrates with photoresist mixtures comprising novolaks, acrylic ester copolymers and photosensitizers, then exposing the coatings and developing, to form semiconductors or flat panel displays
10/19/2004	US6806018 Processless digitally imaged printing plate using microspheres
10/19/2004	US6806008 Method for adjusting a temperature in a resist process
10/19/2004	US6806007 EUV mask which facilitates electro-static chucking
10/19/2004	US6806006 Integrated cooling substrate for extreme ultraviolet reticle
10/19/2004	US6806005 Method and apparatus for forming resist pattern
10/19/2004	US6805958 Epoxy resin composition, and adhesive film and prepreg using the composition, and multilayer printed-wiring board using them, and process for manufacturing the same
10/19/2004	US6805917 Novolac epoxy acrylated oligomer, isobornyl acrylate monomer, photoinitiator, metallic pigment, and flow control agent; free of volatile organic solvents
10/19/2004	US6805829 Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows
10/19/2004	US6805809 Decal transfer microfabrication
10/19/2004	US6805731 Hollow fiber membrane contactor
10/19/2004	US6805283 Lithography rework analysis method and system
10/19/2004	US6805139 Hydrogen gas flow; supplying activation energy to remove cross-linked photoresist crust using ion bombardment; low pressure, low temperature; prevents popping
10/19/2004	US6805054 Method, system and holder for transferring templates during imprint lithography processes
10/19/2004	US6804900 Method for drying microstructure member
10/14/2004	WO2004088720A2 Loosely-packed two-dimensional modulator arrangement
10/14/2004	WO2004088429A1 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
10/14/2004	WO2004088428A1 Photoresist composition and method for forming resist pattern using the same
10/14/2004	WO2004088427A1 Negative resist composition and process for formation of resist patterns
10/14/2004	WO2004088426A1 Method for making a metal forming structure
10/14/2004	WO2004088425A2 Contact masks and lithographic patterning methods using said masks
10/14/2004	WO2004088424A2 Photoresist compositions
10/14/2004	WO2004088423A2 Photoresist compositions
10/14/2004	WO2004088422A1 Fluoro compound and fluoropolymer
10/14/2004	WO2004088421A1 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method
10/14/2004	WO2004088418A1 Method of manufacturing mask blank
10/14/2004	WO2004088414A2 Positive tone bi-layer imprint lithography method and compositions therefor
10/14/2004	WO2004088363A1 Maskless optical interferometric lithography
10/14/2004	WO2004087793A1 Crosslinked polyimide, composition comprising the same and method for producing the same
10/14/2004	WO2004087773A1 Auxiliary for forming fine pattern and process for producing the same
10/14/2004	WO2004087636A1 Dicarboxylic acid monoester compound, method for producing same and polymer thereof
10/14/2004	WO2004023211A3 Exposure method, exposure mask, and exposure apparatus
10/14/2004	WO2004010222A3 Method for the production of photoresist structures
10/14/2004	US20040205425 Method and system for efficient and accurate processing of a discrete time input signal
10/14/2004	US20040204901 Position detecting method and apparatus
10/14/2004	US20040204777 Precision motion control using feed forward of acceleration
10/14/2004	US20040204613 Photopolymerization of unsaturated compounds
10/14/2004	US20040204555 Resin composition, optical filter and plasma display
10/14/2004	US20040204513 Capable of undergoing photopolymerization with high sensitivity; stereolithography; optical recording media
10/14/2004	US20040204328 exposing the substrate comprising photoresist coatings to radiation source, to form patterns, then applying developer solutions, rinsing with water and contacting with a mixture of aqueous, nonaqueous solvents and surfactants, to stabilize the patterns and reduce surface roughness ; surface tension
10/14/2004	US20040203256 Irradiation-assisted immobilization and patterning of nanostructured materials on substrates for device fabrication
10/14/2004	US20040203177 Method and system for monitoring an etch process
10/14/2004	US20040202969 Photoresist polymer remover formulation containing 1-5% by wt. sulfuric acid, 1-5% by wt. hydrogen peroxide or 0.0001 to 0.05% by wt. ozone, 0.1-5% by wt. of acetic acid, 0.0001 to 0.5% by wt. ammonium fluoride, remaining amount of water
10/14/2004	US20040202968 Optical lithography and a method of inducing transmission in optical lithography preforms
10/14/2004	US20040202967 Method of manufacturing semiconductor device
10/14/2004	US20040202966 Negative-working photoresist composition
10/14/2004	US20040202965 Phase conflict resolution for photolithographic masks
10/14/2004	US20040202964 Method for enhancing adhesion between reworked photoresist and underlying oxynitride film
10/14/2004	US20040202963 using three exposures, the sum of doses is equal to that required to expose the entire radiation sensitive layer; the allowable contact hole locations are the intersection points of first array of parallel regularly spaced lines with second array of parallel regularly spaced lines; integrated circuits
10/14/2004	US20040202961 Radiation sensitive material and method for forming pattern
10/14/2004	US20040202959 Substrate coated with a melamine material and a layer of a chemically-amplified positive photoresist; resin binder and a compound capable of causing a thermally induced crosslinking reaction of said binder, increasing adhesion
10/14/2004	US20040202957 Photosensitive composition and lithographic printing plate precursor using the same
10/14/2004	US20040202956 Photoreactive composition
10/14/2004	US20040202954 Positive resist composition and pattern formation method using the same
10/14/2004	US20040202953 comprising a dinitrobenzyl group in conjunction with a photoacid generator which is a diazide and/or a sulfonyl aceto carbonyl compound; storage stable, pH stable, and water stable positive photoresist compositions
10/14/2004	US20040202946 of a triarylmethane dye on a substrate; color filter array shows excellent spectroscopic characteristics; blue filter has high colorfastness and photostability
10/14/2004	US20040202943 Set of at least two masks for the projection of structure patterns and method for producing the masks
10/14/2004	US20040202942 a binder capable of cationic polymerization, a polymerizable acrylic compound, a photoinitiator, and a curing agent that is a thermal cationic polymerization catalyst; improved photostability and recording sensitivity
10/14/2004	US20040202898 Lithographic apparatus device manufacturing method and device manufactured thereby
10/14/2004	US20040202844 Feature formation in thick-film inks
10/14/2004	US20040202793 Dip-spin coater
10/14/2004	US20040202784 Evenly drying coating; producing uniform thickness without using rotary mechanism
10/14/2004	US20040201909 Objective, particularly a projection objective for use in semiconductor lithography
10/14/2004	US20040201899 Optical projection lens system
10/14/2004	US20040201858 Method for measuring a characteristic dimension of at least one pattern on a disc -shaped object in a measuring instrument
10/14/2004	US20040201842 Method and apparatus for article inspection including speckle reduction
10/14/2004	US20040201834 Stage apparatus and its driving method, exposure apparatus and device manufacturing method
10/14/2004	US20040201833 Lithographic apparatus
10/14/2004	US20040201832 Pattern writing apparatus and pattern writing method
10/14/2004	US20040201831 Enhanced illuminator for use in photolithographic systems
10/14/2004	US20040201830 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
10/14/2004	US20040200572 Assembling pellicle frames and photomasks
10/14/2004	US20040200510 Apparatus and method for splash-back proofing

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