| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/05/2014 | CN102681357B Design method for extreme ultraviolet photoetching projection lens |
| 02/05/2014 | CN102566315B Method for detecting offset of focus of lithography machine |
| 02/05/2014 | CN102495531B Double-stage revolving and switching method and apparatus based on independent synchronic direction-regulation |
| 02/05/2014 | CN102495528B Double-workpiece-table same-phase rotation exchange method and device based on follow-up rotation-resisting mechanisms |
| 02/05/2014 | CN102446749B Method for achieving accurate graphic positioning during observation using scanning electron microscope |
| 02/05/2014 | CN102393613B Double workpiece stage rotary exchange device based on synchronous gear direction adjustment |
| 02/05/2014 | CN102053490B Impression equipment |
| 02/04/2014 | US8642561 Peptides whose uptake by cells is controllable |
| 02/04/2014 | US8642526 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon |
| 02/04/2014 | US8642253 Resist composition for negative tone development and pattern forming method using the same |
| 02/04/2014 | US8642250 Optical waveguide using a resin composition and production method of the optical waveguide |
| 02/04/2014 | US8642247 Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate |
| 02/04/2014 | US8642246 Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| 02/04/2014 | US8642245 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same |
| 02/04/2014 | US8642244 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
| 02/04/2014 | US8642243 Polymerizable composition, and lithographic printing plate precursor, antifouling member and antifogging member each using the same |
| 02/04/2014 | US8642232 Method of direct writing with photons beyond the diffraction limit |
| 02/04/2014 | CA2490975C A device having a light-absorbing mask and a method for fabricating same |
| 01/30/2014 | WO2014017667A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device |
| 01/30/2014 | WO2014017666A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device |
| 01/30/2014 | WO2014017665A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device |
| 01/30/2014 | WO2014017664A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device |
| 01/30/2014 | WO2014017663A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin |
| 01/30/2014 | WO2014017640A1 Support for lithographic printing plate and manufacturing method therefor, as well as original lithographic printing plate |
| 01/30/2014 | WO2014017618A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device using the same |
| 01/30/2014 | WO2014017458A1 Mask unit and exposure device |
| 01/30/2014 | WO2014017408A1 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition, and electronic device producing method and electronic device |
| 01/30/2014 | WO2014017331A1 Resist upper layer film forming composition for lithography and method for manufacturing semiconductor device using same |
| 01/30/2014 | WO2014017269A1 Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method |
| 01/30/2014 | WO2014017268A1 Resin composition and pattern forming method using the same |
| 01/30/2014 | WO2014017144A1 Method for forming negative resist pattern and photoresist composition |
| 01/30/2014 | WO2014016168A1 Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus |
| 01/30/2014 | WO2014016163A1 Lithographic apparatus and device manufacturing method |
| 01/30/2014 | WO2014016139A1 Euv light source |
| 01/30/2014 | WO2014016056A1 Inspection method and apparatus, lithographic system and device manufacturing method |
| 01/30/2014 | WO2014015826A1 Optical proximity correction device and correction method |
| 01/30/2014 | US20140030881 Photoresist composition, thin film transistor array panel, and method of manufacturing the same |
| 01/30/2014 | US20140030811 Gradient Structures Interfacing Microfluidics and Nanofluidics, Methods for Fabrication and Uses Thereof |
| 01/30/2014 | US20140030661 Upper surface antireflective film forming composition and pattern forming method using same |
| 01/30/2014 | US20140030660 Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition |
| 01/30/2014 | US20140030659 Liquid ejection head and method of manufacturing the same |
| 01/30/2014 | US20140030658 Method of manufacturing copper electrode |
| 01/30/2014 | US20140030656 Method for forming resist patterns and method for producing patterned substrates |
| 01/30/2014 | US20140030655 Enhanced Multi-Photon Imaging Resolution Method |
| 01/30/2014 | US20140030654 Photoresist composition and method for producing photoresist pattern |
| 01/30/2014 | US20140030653 Coating compositions for photolithography |
| 01/30/2014 | US20140030652 Primer and pattern forming method for layer including block copolymer |
| 01/30/2014 | US20140030643 Actinic-ray-or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition |
| 01/30/2014 | US20140030642 Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene metal complex compound or tautomer thereof |
| 01/30/2014 | US20140030641 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 01/30/2014 | US20140030640 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| 01/30/2014 | US20140030637 Reticles for use in forming implant masking layers and methods of forming implant masking layers |
| 01/30/2014 | US20140030423 Liquid processing apparatus, liquid processing method and storage medium for liquid processing |
| 01/30/2014 | US20140028992 Driving system and driving method, exposure apparatus and exposure method, and driving system design method |
| 01/30/2014 | US20140028991 Exposure control device |
| 01/30/2014 | US20140028990 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 01/30/2014 | US20140028987 Exposure apparatus and device fabrication method |
| 01/30/2014 | US20140027955 Imprint apparatus and method of manufacturing article |
| 01/30/2014 | DE112012000601T5 Verfahren zum Herstellen einer Halbleitervorrichtung sowie Halbleitervorrichtung A method of manufacturing a semiconductor device and semiconductor device |
| 01/30/2014 | DE102013202292A1 Extreme UV (EUV) projection exposure system for semiconductor lithography, has optic element that is mechanically connected with gyro worked against tipping of optic element |
| 01/30/2014 | DE102013200962A1 Optical beam splitter of polarization measurement device used in projection exposure system, has beam splitting surface for splitting incoming light beam reflected at beam splitting surface of beam portion and has curved form |
| 01/30/2014 | DE102013200531A1 Micro mirror for projection exposure system such as extreme UV (EUV) projection exposure system, has mirror element which is tiltable formed around axis, and coil spring is provided to bias mirror element in basic position |
| 01/30/2014 | DE102012212898A1 Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage Mirror assembly for an EUV projection exposure apparatus, method of operating the same, and EUV projection exposure apparatus |
| 01/29/2014 | EP2690497A1 Polymer-containing developer |
| 01/29/2014 | EP2690496A1 Method for measuring distortion of projection objective |
| 01/29/2014 | EP2690495A1 Lithographic printing plate precursor and plate making method thereof |
| 01/29/2014 | EP2689450A1 Functional liquid ejection apparatus, functional liquid ejection method and imprinting system |
| 01/29/2014 | EP2689292A1 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| 01/29/2014 | EP2688539A1 Method of producing color change in a substrate |
| 01/29/2014 | EP2486453B1 Positive-working photoimageable bottom antireflective coating |
| 01/29/2014 | EP2343195B1 Lithographic printing original plate, method for producing lithographic printing plate, and polymerizable monomer |
| 01/29/2014 | CN203414734U Optical detection device used for LED (Light Emitting Diode) exposure machine and LED exposure machine |
| 01/29/2014 | CN203414733U Ultraviolet LED (Light Emitting Diode) exposure machine |
| 01/29/2014 | CN203414732U Dynamic air lock for extreme ultra-violet lithography machine |
| 01/29/2014 | CN203414731U Exposure device |
| 01/29/2014 | CN203414730U Exposure film of printed circuit board |
| 01/29/2014 | CN103548095A Illumination optical unit |
| 01/29/2014 | CN103547968A Method of slimming radiation-sensitive material lines in lithographic applications |
| 01/29/2014 | CN103547967A Arrangement for actuating an element in a microlithographic projection exposure apparatus |
| 01/29/2014 | CN103547966A 感光性树脂组合物 The photosensitive resin composition |
| 01/29/2014 | CN103547955A Mirror array |
| 01/29/2014 | CN103547945A Reflective optical element and optical system for EUV lithography |
| 01/29/2014 | CN103545174A Photoetching focusing parameter testing method and system |
| 01/29/2014 | CN103543620A Developing film removing liquid for printed circuit board (PCB) |
| 01/29/2014 | CN103543619A Anticorrosive agent composition comprising imidazoline |
| 01/29/2014 | CN103543618A Resist film remover |
| 01/29/2014 | CN103543617A Preservative mixture and negative photoresist remover composition |
| 01/29/2014 | CN103543616A Anticorrosive agent composition and application thereof in anticorrosive film peeling process |
| 01/29/2014 | CN103543615A Laser imaging processing device |
| 01/29/2014 | CN103543614A Cleaning system and substrate processing unit |
| 01/29/2014 | CN103543613A Moving-iron cableless six-freedom-of-degree magnetic levitation moving platform |
| 01/29/2014 | CN103543612A Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover |
| 01/29/2014 | CN103543611A Lithography process |
| 01/29/2014 | CN103543610A Calibration method for focusing and leveling light spot position |
| 01/29/2014 | CN103543609A Double-mercury lamp spliced exposure system for lithography equipment |
| 01/29/2014 | CN103543608A Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same |
| 01/29/2014 | CN103543607A Organic EL element, radiation-sensitive resin composition, and cured film |
| 01/29/2014 | CN103543606A Photoresist composition and method for processing glass |
| 01/29/2014 | CN103543605A Colored photosensitive resin composition and color filter using the same |
| 01/29/2014 | CN103543604A Nano-imprinting method |