G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2004
10/21/2004	WO2003102690B1 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
10/21/2004	WO2003089888A3 Scatterometric measurement of undercut multi-layer diffracting structures
10/21/2004	US20040210423 Complementary division condition determining method and program and complementary division method
10/21/2004	US20040210034 a polyimide from a bis(aminophenyl)methane or sulfone and a diphenyl(methane or sulfone)-3,3'4,4'-tetracarboxylic acid; photolithographic dispersions; spin coatings for semiconductor wafers
10/21/2004	US20040209480 Method to reduce photoresist mask line dimensions
10/21/2004	US20040209470 Isothermal imprinting
10/21/2004	US20040209469 Etching method
10/21/2004	US20040209415 Semiconductor device employing a method for forming a pattern using a crystal structure of a crystalline material
10/21/2004	US20040209203 graft polymerization on supports having polymerization initiation layers obtained by fixing or crosslinking polymers
10/21/2004	US20040209201 development of photoresist coatings on wafers, cleaning the developer solutions, then transferring the wafer to the electron beam radiation unit before the rinsing solution and the resist dry, then irradiaotion in the presence of inert gases; preventing deformation and breaking of patterns
10/21/2004	US20040209200 Coating compositions for use with an overcoated photoresist
10/21/2004	US20040209196 reduced deviation in critical dimension between regions having a different pattern densities due to optical flare occurring in a photo-exposure operation; complicated steps when a filtering plate is used to reduce the light intensity going to the sparse pattern region are eliminated
10/21/2004	US20040209195 Method for fabricating an interference display unit
10/21/2004	US20040209194 first ultraviolet-light radiating units for radiating ultraviolet light having a wavelength not exceeding 200 nm; and second ultraviolet-light radiating units for radiating ultraviolet light having a wavelength longer than 200 nm.
10/21/2004	US20040209193 better exposure profiles for the resulting ICs and improved chip yield and increased throughput by reducing the need to alter settings and/or switch reticles between exposures.
10/21/2004	US20040209192 Method for fabricating an interference display unit
10/21/2004	US20040209188 Solvents and photoresists compositions for short wavelength imaging
10/21/2004	US20040209187 the polymer has a controlled ratio of silanol groups to Si atoms of 0.01 to 1.5., especially from trichlorosilanes with fluoroalcohol, fluoromethylsulfonamide, or fluorocarboxylic acid groups and a norbornane ring
10/21/2004	US20040209186 oxime sulfonates, e.g., 2-[Cyano-(5-n-propanesulfonyloxyimino-5H-thiophen-2-ylidene)-methyl]-benzoic acid methyl ester with high stability and good solubility in the field of chemically amplified photoresists.
10/21/2004	US20040209177 High-resolution overlay alignment for imprint lithography processes;semiconductor wafer
10/21/2004	US20040209173 For semiconductor production; improved uniformity of photoresists
10/21/2004	US20040209171 inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion
10/21/2004	US20040209170 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
10/21/2004	US20040209123 Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
10/21/2004	US20040209004 apparatus comprising a coater for coating a liquid that reacts with an ultraviolet ray to deposit metal on the substrate, and an ultraviolet irradiating means; wiring pattern formed by ink jet printing of good adhesion
10/21/2004	US20040209000 dip coating apparatus for magnetic or magnetooptic recording media such as hard disks, including a viscosity control system for monitoring and maintaining the viscosity of a dip coating liquid supplied to said dip coating vessel
10/21/2004	US20040207928 Reticle-masking objective with aspherical lenses
10/21/2004	US20040207925 Apparatus and methods for thermal reduction of optical distortion
10/21/2004	US20040207849 Metrology system using optical phase
10/21/2004	US20040207830 Method, system, and apparatus for management of reaction loads in a lithography system
10/21/2004	US20040207829 Illuminator controlled tone reversal printing
10/21/2004	US20040207828 Exposure apparatus and device fabrication method
10/21/2004	US20040207827 Method and apparatus for aerial image improvement in projection lithography using a phase shifting aperture
10/21/2004	US20040207826 Exposure apparatus and device fabrication method
10/21/2004	US20040207825 Optical arrangement and projection exposure system for microlithography with passive thermal compensation
10/21/2004	US20040207824 Lithographic apparatus and device manufacturing method
10/21/2004	US20040207711 Device for setting the focus of exposure heads of a printing plate exposer
10/21/2004	US20040207386 Method to detect a defective element
10/21/2004	US20040207271 Linear motor, moving stage system, exposure apparatus, and device manufacturing method
10/21/2004	US20040207269 Lithographic apparatus and motor for use in the apparatus
10/21/2004	US20040206912 Method of reducing heat-induced distortion of photomasks during lithography
10/21/2004	US20040206881 Artificial band gap
10/21/2004	US20040206702 Purification of photoresists to remove trace metals from aqueous solutions by oxidation
10/21/2004	US20040206425 Fabrication of a high-strength steel article with inclusion control during melting
10/21/2004	US20040206303 Color filter composition, method and apparatus for manfacturing a color filter having the same
10/21/2004	US20040206261 Development process on a press of planographic printing plate material and printing process
10/21/2004	DE20122177U1 Oberflächenplasmon-Optikvorrichtung und Oberflächenplasmon-Strahlungsquellen für Photolithographie Surface plasmon optical device and surface plasmon radiation sources for photolithography
10/21/2004	DE19853092B4 Übernahme- und Haltesystem für ein Substrat Acquisition and retention system for a substrate
10/21/2004	DE10316821A1 Process for the correction of image errors in an optical system for the manufacture of masks for semiconductors
10/21/2004	DE10316428A1 Katadioptrisches Reduktionsobjektiv A catadioptric reduction objective
10/21/2004	DE102004014766A1 Verfahren zur Verzeichnungskorrektur in einer mikrolithographischen Projektionsbelichtungsanlage Method for Distortion in a microlithography projection exposure apparatus
10/21/2004	DE102004014140A1 Mikrooptisches Element, Verfahren zur Herstellung desselben, sowie derselben enthaltenden Belichtungsvorrichtung Micro-optical element, method for producing the same, and the same exposure apparatus containing
10/21/2004	DE102004013087A1 Geformte berührungslose kapazitive Verlagerungssensoren für ein Messen von geformten Zielen Molded non-contact capacitive displacement sensors for measurement of shaped targets
10/21/2004	DE10024634B4 Elektronenstrahl-Belichtungsvorrichtung und -verfahren Electron beam exposure apparatus and method
10/20/2004	EP1469354A1 Coating material for pattern fineness enhancement and method of forming fine pattern with the same
10/20/2004	EP1469353A1 Two-layer film and method of forming pattern with the same
10/20/2004	EP1469352A2 Illuminator controlled tone reversal printing
10/20/2004	EP1469351A1 Lithographic apparatus and device manufacturing method
10/20/2004	EP1469350A2 Exposure apparatus and aberration correction method
10/20/2004	EP1469349A1 Lithographic projection apparatus with collector including a concave mirror and a convex mirror
10/20/2004	EP1469348A1 Projection system and method of use thereof
10/20/2004	EP1469347A1 Lithographic apparatus and device manufacturing method
10/20/2004	EP1469346A1 Positively photosensitive insulating resin composition and cured object obtained therefrom
10/20/2004	EP1469345A2 Complementary division condition determining method and program and complementary division method
10/20/2004	EP1469037A1 Solvent-soluble block copolyimide composition and process for producing the same
10/20/2004	EP1469015A1 Amorphous perfluorinated polymers
10/20/2004	EP1468994A1 Process for preparing cyclic amine substituted phenyl-alkyl-ketones
10/20/2004	EP1468822A2 Development process on a press of planographic printing plate material and printing process
10/20/2004	EP1468821A1 Lithographic printing plate material and printing method
10/20/2004	EP1468426A2 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp
10/20/2004	EP1468335A1 A cleaning agent composition for a positive or a negative photoresist
10/20/2004	EP1468334A2 Method for the production of a flexographic plate and flexographic plate obtained according to said method
10/20/2004	EP1468333A2 Method for constructing an optical beam guide system in a contamination-free atmosphere and universal optical module for said construction
10/20/2004	EP1468332A1 Photosensitive composition and photosensitive planographic printing plate
10/20/2004	EP1468331A2 Polymeric material, containing a latent acid
10/20/2004	EP1468041A1 Resin composition
10/20/2004	EP1468033A1 Phosphorus-containing urethane (meth)acrylate compounds and photosensitive compositions
10/20/2004	EP1446698A4 An interferometer system for a semiconductor exposure system
10/20/2004	EP1129145B1 Non-corrosive stripping and cleaning composition
10/20/2004	EP1095310A4 A reflection system for imaging on a nonplanar substrate
10/20/2004	CN1539254A Star pinch x-ray and extreme ultraviolet photon source
10/20/2004	CN1538978A Resin composition, composition for solder resist, and cured article obtained therefrom
10/20/2004	CN1538600A 振动控制装置 Vibration control device
10/20/2004	CN1538245A Lithographic apparats, apparatus manufacturing method and computer program
10/20/2004	CN1538244A Lithographic projection apparatus with lollector including concave mirror and convex mirror
10/20/2004	CN1538243A Projection system and method of use thereof
10/20/2004	CN1538242A Controlling position of mass in lithographic apparatus
10/20/2004	CN1538241A Chemical amplification photo resist composition
10/20/2004	CN1538240A Load lock device, lithographic equipment comprising the deivce and method for making substrate
10/20/2004	CN1538239A Reticle transfering suport and reticle transfering method
10/20/2004	CN1538238A Mask for EUV photoetching and manufacturing method thereof
10/20/2004	CN1538206A Liquid crystal display and its manufacturing method
10/20/2004	CN1172355C Polishing method
10/20/2004	CN1171952C Polyimide/clay photosensitive nano composite material preparation
10/19/2004	US6807662 Performance of integrated circuit components via a multiple exposure technique
10/19/2004	US6807519 Methods of forming radiation-patterning tools; carrier waves and computer readable media
10/19/2004	US6807022 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
10/19/2004	US6807013 Projection aligner
10/19/2004	US6806961 Interferometric cyclic error compensation
10/19/2004	US6806951 Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen

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