| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/27/2004 | EP1471388A1 A carrier and method for making a carrier |
| 10/27/2004 | EP1471387A2 Photosensitive composition and compound used thereof |
| 10/27/2004 | EP1471386A1 Lithographic processing method and device manufactured thereby |
| 10/27/2004 | EP1471385A1 Arrangement for inspecting objects, in particular for masks in microlithography |
| 10/27/2004 | EP1470916A2 Printing process with on press plate development |
| 10/27/2004 | EP1470915A1 Process for preparing a printing plate and printing plate |
| 10/27/2004 | EP1470450A1 Optical element for forming an arc-shaped field |
| 10/27/2004 | EP1470449A1 Method of joining a workpiece and a microstructure by light exposure |
| 10/27/2004 | EP1470447A1 Photolithographic critical dimension control using reticle measurements |
| 10/27/2004 | EP1470446A1 Organic anti-reflective coating compositions for advanced microlithography |
| 10/27/2004 | EP1470207A1 Aqueous stripping and cleaning composition |
| 10/27/2004 | EP1110054B1 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 10/27/2004 | CN1541051A Soldering resist compsn. and printed wiring board |
| 10/27/2004 | CN1540747A Micro image technique in use for encoding and arranging mask type ROM |
| 10/27/2004 | CN1540447A 湿蚀刻装置 Wet etching apparatus |
| 10/27/2004 | CN1540446A Substrates carrier and method of mfg. same |
| 10/27/2004 | CN1540445A Lighographic processing method and device made therefrom |
| 10/27/2004 | CN1540444A Negative photosensitive resin composition contg, expoxy compound |
| 10/27/2004 | CN1540443A LKithographic projection assembly, handling appts. for handling substrates and method of handling substrate |
| 10/27/2004 | CN1540404A Method for fabricating nose of panel display |
| 10/27/2004 | CN1540386A Method for processing and manufacturing components and parts applied in micro-electronics and mechanical system |
| 10/27/2004 | CN1539560A Machine and method for coating |
| 10/27/2004 | CN1173387C Substrate processing apparatus |
| 10/27/2004 | CN1173384C Improved ladder boat for supporting waters, and method of processing semiconductor wafers |
| 10/27/2004 | CN1173234C Pattern generator with EUV |
| 10/27/2004 | CN1173233C Chemical-amplifying type positive photoetching gel composition |
| 10/27/2004 | CN1173232C Chemical enlargement type positive photoetching gum compositions |
| 10/27/2004 | CN1173231C Thermal assisted photosensitive composition and method thereof |
| 10/27/2004 | CN1173230C Optical lithography beyond conventional resolution limits |
| 10/26/2004 | US6810299 Semiconductor manufacturing apparatus |
| 10/26/2004 | US6810298 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 10/26/2004 | US6810297 System and methods for imaging employing a levitating conveyor |
| 10/26/2004 | US6810104 X-ray mask and method for making |
| 10/26/2004 | US6809888 Apparatus and methods for thermal reduction of optical distortion |
| 10/26/2004 | US6809876 Optical element equipped with lanthanum fluoride film |
| 10/26/2004 | US6809871 Geometric beamsplitter and method for its fabrication |
| 10/26/2004 | US6809827 Self referencing mark independent alignment sensor |
| 10/26/2004 | US6809824 Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate |
| 10/26/2004 | US6809802 Substrate attracting and holding system for use in exposure apparatus |
| 10/26/2004 | US6809800 Apparatus for patterning a semiconductor wafer |
| 10/26/2004 | US6809799 Processing system and device manufacturing method using the same |
| 10/26/2004 | US6809798 Stage control method, exposure method, exposure apparatus and device manufacturing method |
| 10/26/2004 | US6809797 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 10/26/2004 | US6809794 Immersion photolithography system and method using inverted wafer-projection optics interface |
| 10/26/2004 | US6809793 System and method to monitor reticle heating |
| 10/26/2004 | US6809785 Semipermeable liquid crystal display device and manufacturing method thereof |
| 10/26/2004 | US6809755 Pattern writing apparatus, pattern writing method and substrate |
| 10/26/2004 | US6809751 Card printing system and method |
| 10/26/2004 | US6809420 Characterization of induced shift on an overlay target using post-etch artifact wafers |
| 10/26/2004 | US6809356 Method and apparatus for high density nanostructures |
| 10/26/2004 | US6809327 EUV source box |
| 10/26/2004 | US6809323 Isolated frame caster |
| 10/26/2004 | US6809319 Electron beam writing equipment and electron beam writing method |
| 10/26/2004 | US6809300 Temperature adjusting system in exposure apparatus |
| 10/26/2004 | US6809036 Dry silylation plasma etch process |
| 10/26/2004 | US6808946 Method of using critical dimension measurements to control stepper process parameters |
| 10/26/2004 | US6808942 Method for controlling a critical dimension (CD) in an etch process |
| 10/26/2004 | US6808869 Excellent light absorbance with high resolution and low film thickness dependency; thermal crosslinking agent and a light absorbing addition polymer with pendant naphthalene ring substituted with an electron donating group |
| 10/26/2004 | US6808867 Mesoporous material comprising at least one region of mesoporous material patterned at lithographic scale; for use in catalysis, membrane separation, sensors, optoelectronics |
| 10/26/2004 | US6808865 Ink for printed circuits screen printing stencil; water and solvent resistant; polymer of polyvinyl alcohol and an n-alkylolacrylamide, an ethylenically unsaturated photoreactive monomer, photopolymerization initiator, and an epoxy compound |
| 10/26/2004 | US6808863 Multilayer; support, ink receptive layer and water receptive layer |
| 10/26/2004 | US6808862 Including a compound (especially a sulfonium salt) that generates an alpha-fluoroalkanesulfonic acid upon irradiation; a (non-fluoro alkanesulfonic acid onium salt; and a monocyclic or polycyclic alicyclic hydrocarbon resin |
| 10/26/2004 | US6808861 Suitable for direct plate making by means of a semiconductor laser or a yag laser |
| 10/26/2004 | US6808860 Positive photoresist composition |
| 10/26/2004 | US6808859 Dissolved only slightly in developing solutions, superior in etch resistance, thermal resistance and adhesiveness; copolymer of a norbornene carboxylic ester, and/or vinylene carbonate or maleic anhydride |
| 10/26/2004 | US6808858 Diazonium polycondensate (diazo resin) with and unsaturated compound (acrylated carbamate) with a binder polymer of vinyl alcohol, vinyl acetate, acrylic acid, a vinyl acetal |
| 10/26/2004 | US6808857 Preheating, development using alkali soluble resin |
| 10/26/2004 | US6808850 Integrated circuit |
| 10/26/2004 | US6808668 Process for fabricating composite substrate carrier |
| 10/26/2004 | US6808646 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size |
| 10/26/2004 | US6808609 Device and method for moving charged particles |
| 10/21/2004 | WO2004090978A2 Overlay metrology mark |
| 10/21/2004 | WO2004090965A2 Organosilicate resin formulation for use in microelectronic devices |
| 10/21/2004 | WO2004090957A1 Light source unit, illumination optical system, exposure apparatus and exposure method |
| 10/21/2004 | WO2004090956A1 Exposure apparatus and method for manufacturing device |
| 10/21/2004 | WO2004090955A1 Illuminating optical device, projection exposure system and exposure method |
| 10/21/2004 | WO2004090954A1 Holder, optical system, exposure apparatus, and exposure method |
| 10/21/2004 | WO2004090953A1 Stage device, exposure deice, and method of producing device |
| 10/21/2004 | WO2004090952A1 Exposure method and apparatus, and device manufacturing method |
| 10/21/2004 | WO2004090951A1 Heat treating apparatus and heat treating method |
| 10/21/2004 | WO2004090950A2 Creation of a permanent structure with high three-dimensional resolution |
| 10/21/2004 | WO2004090946A1 Wafer having alternating design structure and method for manufacturing semiconductor package using the same |
| 10/21/2004 | WO2004090646A1 Holographic recording medium and recording method using the same |
| 10/21/2004 | WO2004090640A1 Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound |
| 10/21/2004 | WO2004090639A2 The method for realizing a structured polymeric semiconductor, and a light-emiting diode. transistor, photodiode or sensor comprising a structured polymeric simiconductor as obtained with the method |
| 10/21/2004 | WO2004090638A1 Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate |
| 10/21/2004 | WO2004090637A1 Photosensitive resin film and cured film made therefrom |
| 10/21/2004 | WO2004090636A1 Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom |
| 10/21/2004 | WO2004090634A2 Environmental system including vaccum scavange for an immersion lithography apparatus |
| 10/21/2004 | WO2004090633A2 An electro-osmotic element for an immersion lithography apparatus |
| 10/21/2004 | WO2004090600A2 Catadioptric projection objective |
| 10/21/2004 | WO2004090577A2 Maintaining immersion fluid under a lithographic projection lens |
| 10/21/2004 | WO2004090540A1 Method of fixing low-molecular compound to solid-phase support |
| 10/21/2004 | WO2004090490A1 Diffuser, wavefront source, wavefront sensor and projection lighting facility |
| 10/21/2004 | WO2004090466A2 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
| 10/21/2004 | WO2004090465A2 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
| 10/21/2004 | WO2004089996A1 Modified cycloolefin copolymer, process for producing the same, and use of the polymer |
| 10/21/2004 | WO2004089995A2 Photopolymerization systems and their use |
| 10/21/2004 | WO2004079632A3 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 10/21/2004 | WO2004055852A3 Field emission device, and method of manufacturing such a device |