G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/02/2004	US6811931 Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form
11/02/2004	US6811817 Method for reducing pattern dimension in photoresist layer
11/02/2004	US6811606 Manufacturing method for calcium fluoride and calcium fluoride for photolithography
11/02/2004	US6810687 Incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body, varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of heat treatment
11/02/2004	CA2466687A1 Apparatus for exposing printing plates for a printing mechanism
11/02/2004	CA2185009C Method and device for removing swellable polymer particles from a liquid dispersion
10/2004
10/28/2004	WO2004093175A1 Hydrogen plasma downflow processing method and hydrogen plasma downflow processing apparatus
10/28/2004	WO2004093172A1 Resist stripping method and device
10/28/2004	WO2004093171A1 Pattern forming apparatus and pattern forming method
10/28/2004	WO2004093170A1 Developing method and developing device
10/28/2004	WO2004093160A2 Run-off path to collect liquid for an immersion lithography apparatus
10/28/2004	WO2004093159A2 Immersion lithography fluid control system
10/28/2004	WO2004093145A2 Voltage tunable photodefinable dielectric and method of manufacture therefore
10/28/2004	WO2004093130A2 Cleanup method for optics in immersion lithography
10/28/2004	WO2004092865A2 Selection method, exposure method, selection device, exposure device, and device manufacturing method
10/28/2004	WO2004092845A2 Precision motion control using feed forward of acceleration
10/28/2004	WO2004092844A2 Optical element for a lighting system
10/28/2004	WO2004092843A2 Projection lens, microlithographic projection exposure system and method for producing a semiconductor circuit
10/28/2004	WO2004092842A1 Optical system, method of altering retardances therein and photolithography tool
10/28/2004	WO2004092841A2 Method for the production of photopolymerizable, cylindrical, continuous seamless flexographic printing elements, and use thereof for the production of cylindrical flexographic printing forms
10/28/2004	WO2004092840A1 Porous underlayer film and underlayer film forming composition used for forming the same
10/28/2004	WO2004092839A1 Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same
10/28/2004	WO2004092838A1 Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof
10/28/2004	WO2004092837A2 Positive photoresist compositions having enhanced processing time
10/28/2004	WO2004092836A1 Fabrication of nanostructures
10/28/2004	WO2004092835A2 Composition and method for printing a patterned resist layer
10/28/2004	WO2004092834A2 System for regulating and maintaining a gas atmosphere in an optical system
10/28/2004	WO2004092833A2 Environmental system including a transport region for an immersion lithography apparatus
10/28/2004	WO2004092832A2 Determination of center of focus by parameter variability analysis
10/28/2004	WO2004092831A2 Photoresists and methods for use thereof
10/28/2004	WO2004092830A2 Liquid jet and recovery system for immersion lithography
10/28/2004	WO2004092829A2 Masking arrangement and method for producing integrated circuit arrangements
10/28/2004	WO2004092801A2 Catadioptric reduction lens comprising a polarisation beam splitter
10/28/2004	WO2004092693A2 Collector for euv light source
10/28/2004	WO2004092320A1 Detergent composition for alkali development apparatus
10/28/2004	WO2004092289A1 Radiation-cured substances
10/28/2004	WO2004092238A1 Resin for under-layer material, under-layer material, laminate and method for forming resist pattern
10/28/2004	WO2004092237A2 Radiation curable resin layer
10/28/2004	WO2004092103A1 Polyphenol compounds, esterified quinone diazides, and positive photoresist compositions
10/28/2004	WO2004092082A1 METHOD FOR PRODUCING SiO2-TiO2 BASED GLASS, SiO2-TiO2 BASED GLASS AND EXPOSURE SYSTEM
10/28/2004	WO2004076495A3 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
10/28/2004	WO2004067688A3 Process for refining crude resin for electronic material
10/28/2004	WO2004057424A3 Illumination system having a more efficient collector optic
10/28/2004	WO2004053593A3 Positive imageable thick film compositions
10/28/2004	WO2004019128A3 Projection optical system and method for photolithography and exposure apparatus and method using same
10/28/2004	WO2004006291A3 Patterning method
10/28/2004	WO2004002955A3 Photosensitive compositions
10/28/2004	US20040214945 curable and storage stability mixtures comprising alicyclic epoxy and oxetane compounds, photoinitiators and polymerization inhibitors, used as carriers for varnishes, paints, adhesives, prepregs, sealers, laminates and molding materials
10/28/2004	US20040214924 Heat resistance; waterproofing; adhesives; electrical properties
10/28/2004	US20040214483 Driving apparatus, optical system, exposure apparatus and device fabrication method
10/28/2004	US20040214448 Method of ashing a photoresist
10/28/2004	US20040214440 Methods of forming patterns for semiconductor constructions; and molds configured to pattern masses associated with semiconductor constructions
10/28/2004	US20040214426 Method of manufacturing electronic device and energy beam absorbing material
10/28/2004	US20040214115 emitting appropriate polarisation light waves on a photosensitive material for inducing therein a topographic modification through an aperture of at the most 100 mm bound by an opaque area, and such layer being arranged at the most 100 mm away from the aperture
10/28/2004	US20040214113 Active hardmask for lithographic patterning
10/28/2004	US20040214112 Laying down two separate photoresist layers to eliminate distortion of features in the resist image close to cavity edge; the first reduces problems, e.g., air bubbles; the second's processed normally; thickness; uniformity; integrated circuits
10/28/2004	US20040214109 Method to form reduced dimension pattern with good edge roughness
10/28/2004	US20040214105 Planographic printing plate precursor and planographic printing method
10/28/2004	US20040214104 Image recording material
10/28/2004	US20040214103 norbornene derivative for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity, has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone
10/28/2004	US20040214102 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
10/28/2004	US20040214099 for obtaining a preferable image without "stripe-shaped unevenness"; photosensitive material is exposed with a plurality of exposure heads
10/28/2004	US20040214098 An octafunctional epoxidized novolac resin, solvent, photoinitiator, a diester plasticizer and an adhesion promoter selected from glycidoxy-, mercapto, and aminopropyltrimethoxysilane; noncracking; stress resistance; antipeeling agents; wafers
10/28/2004	US20040214095 Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device
10/28/2004	US20040214094 Photomasks including shadowing elements therein and related methods and systems
10/28/2004	US20040213971 Forming a self-aligned pattern on an existing pattern on a substrate by coating a masking material to the substrate and allowing a portion of the masking material to preferentially attach to portions of the existing pattern; including metal elements and dielectrics; microelectronics; simplifification
10/28/2004	US20040213894 Imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance
10/28/2004	US20040213563 Pattern forming method and apparatus for fabricating semiconductor device
10/28/2004	US20040213530 Exposure apparatus
10/28/2004	US20040212899 Objective with at least one aspheric lens
10/28/2004	US20040212809 Beam delivery methods, and systems, and wafer edge exposure apparatus delivering a plurality of laser beams
10/28/2004	US20040212801 Wafer Alignment System Using Parallel Imaging Detection
10/28/2004	US20040212796 Method and mark for metrology of phase errors on phase shift masks
10/28/2004	US20040212794 Driving unit, exposure apparatus using the same, and device fabrication method
10/28/2004	US20040212793 Projection exposure apparatus with line width calculator controlled diaphragm unit
10/28/2004	US20040212792 Exposure apparatus and device fabrication method
10/28/2004	US20040212791 Lithographic apparatus comprising a gas flushing system
10/28/2004	US20040212661 Method of producing a liquid ejection head
10/28/2004	US20040212062 Tape stiffener and semiconductor device component assemblies including same
10/28/2004	US20040211925 Charged particle beam apparatus, charged particle beam irradiation method, and method of manufacturing semiconductor device
10/28/2004	US20040211922 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/28/2004	US20040211921 Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
10/28/2004	US20040211920 Lithographic apparatus and device manufacturing method
10/28/2004	US20040211514 Delivery of dissolved ozone
10/28/2004	US20040211448 Apparatus for in-situ cleaning of carbon contaminated surfaces
10/28/2004	US20040211331 Printing process
10/28/2004	US20040211329 Pattern forming method and pattern forming device
10/28/2004	US20040211285 Multiple degree of freedom substrate manipulator
10/28/2004	DE19848070B4 Niedrigenergie-Elektronenstrahllithographie Low-energy electron beam lithography
10/28/2004	DE10356178A1 Cleaning solution for photoresist patterns used for manufacture of semiconductor device, comprises water as solvent, and surfactant of phosphate-alcohol amine salt as an additive
10/28/2004	DE10316590A1 Bearing for optical element connected to holder in microlithography projection lens, compensates for aberration by optical element tilting to holder when thermally expanding
10/28/2004	DE10313277A1 Photoresist outputting device for microlithography, has homogenizing device in photoresist flow between filter and outlet opening
10/28/2004	DE10240115B4 Verfahren und System zum Handhaben von Substraten in einer Produktionslinie mit einer Cluster-Anlage und einer Messanlage Method and system for handling substrates in a production line with a cluster system and a measuring system
10/28/2004	DE102004016706A1 Tauch-Schleuder-Beschichter Dip-spin coater
10/28/2004	DE102004011850A1 Beschichtungs- und Bearbeitungsvorrichtung und Verfahren Coating and processing apparatus and method
10/28/2004	DE102004006488A1 Wärmebehandlungseinrichtung und Wärmebehandlungsverfahren Heat treatment device and heat treatment process
10/28/2004	CA2522922A1 Precision motion control using feed forward of acceleration
10/27/2004	EP1471540A1 Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
10/27/2004	EP1471390A2 Driving apparatus, optical system, exposure apparatus and device fabrication method
10/27/2004	EP1471389A2 Projection optical system

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