G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/04/2004	DE10318042A1 Verfahren zur Herstellung von fotopolymerisierbaren, zylindrischen, endlos-nahtlosen Flexodruckelementen und deren Verwendung zur Herstellung zylindrischer Flexodruckformen Process for the production of photopolymerizable cylindrical, continuous seamless flexographic printing elements and their use for the production of cylindrical flexographic printing plates
11/04/2004	DE10318003A1 Gas-regulating/maintaining system used in a projection illumination system for the manufacture of semiconductor elements comprises a gas chamber subjected to a pressure that is higher than ambient pressure
11/04/2004	DE10317652A1 Verfahren zur Steuerung einer Nockenwellenverstelleinrichtung Method for controlling a camshaft adjustment device
11/04/2004	DE10317646A1 Strahlungshärtbare Massen Radiation-curable compositions
11/04/2004	DE10317268A1 Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank
11/04/2004	DE10317201A1 Gas-regulating/maintaining system used in a projection illumination system for the manufacture of semiconductor elements comprises a gas chamber subjected to a pressure that is higher than ambient pressure
11/04/2004	DE102004014733A1 Verfahren zum Herstellen einer Aufzeichnungsplatte mit diskreten Spuren mit Hilfe eines zweilagigen Abdeckmaterials zum Abheben von Metall A method of manufacturing a discrete track recording disk by means of a two-layer covering material for withdrawing metal
11/03/2004	EP1473598A2 Lithographic apparatus, device manufacturing methods, mask and method of characterising a mask and/or pellicle
11/03/2004	EP1473597A2 Lithographic apparatus, device manufacturing method and angular encoder
11/03/2004	EP1473596A2 Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
11/03/2004	EP1473595A1 Photopolymerizable compositions and flexographic printing plates derived therefrom
11/03/2004	EP1473594A2 Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
11/03/2004	EP1473593A2 Solid imaging compositions for preparing polypropylene-like articles
11/03/2004	EP1473592A1 Image display medium and image forming method
11/03/2004	EP1473171A1 Plate material for printing and printing machine
11/03/2004	EP1473156A2 Heat-sensitive lithographic printing plate precursor
11/03/2004	EP1473155A1 Imaging device for printing plates of a printing machine.
11/03/2004	EP1473154A2 Printing method and printing machine
11/03/2004	EP1472618A2 Photocuring system database
11/03/2004	EP1472576A2 Sulfonate derivatives and the use therof as latent acids
11/03/2004	EP1472574A1 Spin-on anti-reflective coatings for photolithography
11/03/2004	EP1472562A1 Multi-faceted mirror
11/03/2004	EP1472081A2 Method and composition for making ceramic parts by stereolithophotography and use in dentistry
11/03/2004	EP1320854B1 Illumination system particularly for microlithography
11/03/2004	EP1264214B1 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
11/03/2004	EP1230828B1 Method for obtaining an extreme ultraviolet radiation source and its use in lithography
11/03/2004	EP1026208B1 Anti-reflective coating composition
11/03/2004	CN2653554Y Adjustable mask plate adsorptive table of yellow light micro image equipment machine
11/03/2004	CN1543666A Dry developing method
11/03/2004	CN1543592A Sulfoxide pyrolid(in)one alkanolamine cleaner composition
11/03/2004	CN1543591A Photosensitive resin composition for photoresist
11/03/2004	CN1543590A Radiation-curable resin composition and rapid prototyping process using the same
11/03/2004	CN1543498A Aqueous buffered fluoride-containing etch residue removers and cleaners
11/03/2004	CN1542925A Method of manufacturing electronic device and energy beam absorbing material
11/03/2004	CN1542921A Method for wafer dicing
11/03/2004	CN1542914A Mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberration estimating filter
11/03/2004	CN1542913A Crystallite picture making process
11/03/2004	CN1542910A Process and apparatus for removing residues from the microstructure of an object
11/03/2004	CN1542888A Pattern and method for manufacturing metal or metal compound
11/03/2004	CN1542563A Image setting apparatus having drum simulating supports
11/03/2004	CN1542555A Illuminator controlled tone reversal printing
11/03/2004	CN1542554A Lithographic apparatus, device manufacturing method and angular encoder
11/03/2004	CN1542553A Lithographic apparatus, device manufacturing methods, mask and method of characterising a mask and/or pellicle
11/03/2004	CN1542552A Lithographic apparatus and device manufacturing method
11/03/2004	CN1542551A Focus spot monitoring in a lithographic projection apparatus
11/03/2004	CN1542550A Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size
11/03/2004	CN1542549A Photosensitive layer laminator and photosensitive layer laminating method
11/03/2004	CN1542548A Radiation-sensitive resin composition
11/03/2004	CN1542547A Photosensitive resin composition and method for the formation of a resin pattern using the composition
11/03/2004	CN1542546A Multilayer photoresist system
11/03/2004	CN1542545A Method for detaching polymer after etching treatment
11/03/2004	CN1542528A Fabrication method of thin film transistor liquid crystal display panel
11/03/2004	CN1542480A Latch of micro machinery optical switch and fabrication thereof
11/03/2004	CN1542402A Liquid flow proximity sensor for use in immersion lithography
11/03/2004	CN1542067A Settability resin combination
11/03/2004	CN1542026A Amorphous perfluorinated polymers
11/03/2004	CN1541852A Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
11/03/2004	CN1174468C Photoetching making method capable of reducing kindred effect
11/03/2004	CN1174396C Exposure equipment and exposure method
11/03/2004	CN1174265C Color filter, LCD apparatus, electro-optical apparatus and elctronic instrument having the color filter, and method of manufacture thereof
11/03/2004	CN1173684C Light-induced cationic curing compositions and their use
11/02/2004	US6813759 Adjusting trim without reducing image contrast or process window size
11/02/2004	US6813757 Method for evaluating a mask pattern on a substrate
11/02/2004	US6813088 Projection optical system and projection exposure device which uses same
11/02/2004	US6813070 Optical member for vacuum ultraviolet, and aligner and device manufacture method using same
11/02/2004	US6813062 Using electromagnetic radiation illumination writing pass
11/02/2004	US6813058 Method and apparatus for personalization of semiconductor
11/02/2004	US6813022 Interferometer system
11/02/2004	US6813005 Storage containers for lithography mask and method of use
11/02/2004	US6813004 Precise mask pattern transfer; eliminates transmittance variation influence
11/02/2004	US6813003 Advanced illumination system for use in microlithography
11/02/2004	US6813002 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method
11/02/2004	US6813001 Exposure method and apparatus
11/02/2004	US6813000 Exposure method and apparatus
11/02/2004	US6812999 Device and method of correcting exposure defects in photolithography
11/02/2004	US6812949 Imaging apparatus and method for exposing a photosensitive material
11/02/2004	US6812477 Integrated circuit identification
11/02/2004	US6812474 Pattern generation method and apparatus using cached cells of hierarchical data
11/02/2004	US6812155 Pattern formation method
11/02/2004	US6812045 Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation
11/02/2004	US6811962 Solution of a low concentration is supplied first onto a wafer and left to stand to permit a developing reaction to proceed, followed by further supplying a developing solution of a higher concentration, letting it stand and rinsing
11/02/2004	US6811961 Photoresist releif images; mixture of resin and acid generators
11/02/2004	US6811960 Provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such
11/02/2004	US6811957 Applying a photoresist, masking, radiating with electromagnetic waves, developing, dissolving, synthesising a layer of aligned carbon nanotubes
11/02/2004	US6811956 Sidewalls
11/02/2004	US6811955 Critical dimension uniformity, improved wafer yield in a photoresist patterning process, photolithography
11/02/2004	US6811954 Semiconductor integrated circuit device and method of manufacturing the same, and method of manufacturing masks
11/02/2004	US6811953 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
11/02/2004	US6811952 Exposing a sensitizing chromene dyes with a laser beam; photolithography, organic pigments
11/02/2004	US6811951 Photosensitive constituent for flexographic printing plate
11/02/2004	US6811950 Presensitized plate useful for making lithographic printing plate and method for making lithographic printing plate therefrom
11/02/2004	US6811947 Resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution
11/02/2004	US6811946 Multicolor image-forming material and multicolor image-forming method
11/02/2004	US6811945 Method of producing pattern-formed structure and photomask used in the same
11/02/2004	US6811939 Focus monitoring method, focus monitoring system, and device fabricating method
11/02/2004	US6811937 Cationically polymerizable component; a cationic photoinitiator; a free radical polymerizable component; free radical photoinitiator; improved clarity
11/02/2004	US6811936 Silicon oxygen fluoride (siof) membrane that can be used as a pellicle for radiation wavelengths of approximately 157 nanometers, does not degrade after use in a 157 nm lithographic system and can sustain normal handling
11/02/2004	US6811934 Field correction of overlay error
11/02/2004	US6811933 Variation in light intensity; high density images; photolithography
11/02/2004	US6811932 Method and system for determining flow rates for contact formation

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