G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/09/2004	US6815367 Elimination of resist footing on tera hardmask
11/09/2004	US6815361 Method of fabricating anti-stiction micromachined structures
11/09/2004	US6815311 Method for fabricating semiconductor memory device
11/09/2004	US6815280 Method of manufacturing a semiconductor device including a plurality of kinds of MOS transistors having different gate widths
11/09/2004	US6815232 Method and apparatus for overlay control using multiple targets
11/09/2004	US6815151 Rinsing solution for lithography and method for processing substrate with the use of the same
11/09/2004	US6815150 Photoresist stripping composition and process for stripping resist
11/09/2004	US6815146 Fluoropolymer with monomers formed by cyclopolymerization of a fluorinated diene and polymerization of an acrylic monomer and an acid-generating compound
11/09/2004	US6815145 Photoresists useful in micro-lithography; for pattern formation on semiconductor wafers
11/09/2004	US6815144 Acid generating agent which is an iodonium salt with a fluoroalkyl sulfonate ion; interpolymer of vinylphenol, styrene and an alkyl (meth)acrylate; solubility-reducing group capable of being eliminated by acid
11/09/2004	US6815143 Resist material and pattern forming method
11/09/2004	US6815142 Pre-baking; forming film resist overlaying layer containing water soluble acid and photo base generator; exposure to light beams; after-baking and development; dimensional uniformity; rectangular patterns
11/09/2004	US6815140 Positive resist composition
11/09/2004	US6815139 Image-wise exposing a non-ablative image-recording layer (hydrophobic polymer particles) which is removable in a single-fluid ink to heat or light, and processing with an emulsion of an ink phase and a non-aqueous polar phase
11/09/2004	US6815137 Producing hydrophobic polymer fine particles having a highly hydrophilic surface.
11/09/2004	US6815129 Calculating flare variation over patterned mask imaged; biasing; photolithography; extreme ultraviolet lithography; aerial photography
11/09/2004	US6815128 Box-in-box field-to-field alignment structure
11/09/2004	US6815125 Photocatalyst-containing layer on transparent substrate; variable wettability, multicolor; ink repellent convex part formed at edge of picture element
11/09/2004	US6814898 Imprint lithography utilizing room temperature embossing
11/09/2004	US6814879 Coating method using a solution containing a solvent which is incapable of dissolving the first resist.
11/09/2004	US6814809 Temperature adjuster used before exposure provides uniform temperature over many substrates to be transferred to the exposing apparatus for less thermal effects to exposing processing, for high yields; photolithography
11/04/2004	WO2004095895A1 Debris collector for euv light generator
11/04/2004	WO2004095661A1 2-stage laser device for exposure
11/04/2004	WO2004095600A2 Deposition of permanent polymer structures for oled fabrication
11/04/2004	WO2004095550A1 Organic matter removing apparatus, organic matter removing method, ozone water jet nozzle, and organic matter removing apparatus for mask substrate
11/04/2004	WO2004095549A1 Pattern plotting device and pattern plotting method
11/04/2004	WO2004095548A1 Stage device and exposure device
11/04/2004	WO2004095547A1 Semiconductor device manufacturing method and semiconductor device manufacturing system
11/04/2004	WO2004095142A1 Resist composition and organic solvent for removing resist
11/04/2004	WO2004095141A1 Method and apparatus for refreshment and reuse of loaded developer
11/04/2004	WO2004095140A2 Collectors in two hemispheres
11/04/2004	WO2004095138A2 Micromachining process, system and product
11/04/2004	WO2004095137A1 Projection optical system
11/04/2004	WO2004095135A2 Optical arrangement of autofocus elements for use with immersion lithography
11/04/2004	WO2004095134A2 Photolithographic process, stamper, use of said stamper and optical data storage medium
11/04/2004	WO2004095110A1 Exposure control
11/04/2004	WO2004095080A2 Apparatus and methods for thermal reduction of optical distortion
11/04/2004	WO2004095065A2 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof
11/04/2004	WO2004094967A2 Composition and method for 3-dimensional mapping or radiation dose
11/04/2004	WO2004094581A1 Aqueous fluoride compositions for cleaning semiconductor devices
11/04/2004	WO2004073049A3 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment
11/04/2004	WO2004069916A3 Photo-imageable nanocomposites
11/04/2004	WO2004059700A3 Photoresist removal
11/04/2004	WO2004042319A3 Compensation of refractivity perturbations in an intererometer path
11/04/2004	WO2004038504A3 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication
11/04/2004	WO2004036312A3 Irradiation device for testing objects coated with light-sensitive paint
11/04/2004	WO2003098350A3 Method for the targeted deformation of an optical element
11/04/2004	US20040221255 Dissection of edges with projection points in a fabrication layout for correcting proximity effects
11/04/2004	US20040221254 Mixed mode optical proximity correction
11/04/2004	US20040220066 removal polymeric material using quaternizating ammonium silicate
11/04/2004	US20040220065 stripping photoresists
11/04/2004	US20040219803 Arrangement for transferring information/structures to wafers
11/04/2004	US20040219728 Extreme ultraviolet light generating device, exposure apparatus using the same and semiconductor manufacturing method
11/04/2004	US20040219462 Multilayer; semiconconductor substrate; barrier electroconductive structure with drains, intakes; dielectrics
11/04/2004	US20040219461 Parallelism adjustment device
11/04/2004	US20040219459 Producing method of photosensitive planographic printing plate and printing plate produced thereby
11/04/2004	US20040219458 bag containing photocurable liquid polymer ; insertion into holder; exposure to ultraviolet radiation
11/04/2004	US20040219457 photopolymerization; mixture of silicone monomer, macromonomer and unsaturated compound
11/04/2004	US20040219456 Photosensitive bottom anti-reflective coatings
11/04/2004	US20040219454 Hydroxy-amino thermally cured undercoat for 193 NM lithography
11/04/2004	US20040219453 A protective coatings for photoresists, comprising an acid generator, a toluenesulfonate acid amine salt, as crosslinking agent, promoting shelf life, storage stability, consistent absorption spectra
11/04/2004	US20040219452 Dissolution rate modifiers for photoresist compositions
11/04/2004	US20040219451 Heat resistance; impact strength; blend of phenolic resin, novolaks and epoxy compound; forming photoresist pattern
11/04/2004	US20040219450 Photosensitive compound on support containing polymer; transferring photosensitive material to glass; applying heat and pressure rolls; tension adjustment
11/04/2004	US20040219444 Method for fabricating semiconductor device and equipment for fabricating the same
11/04/2004	US20040219443 Monitoring die positioning on wafer ; pattern with multiple die segments; masking; etching; applying photoresist; exposure to light
11/04/2004	US20040219442 Exposure system and method with group compensation
11/04/2004	US20040219441 Photomask for focus monitoring, method of focus monitoring, unit for focus monitoring and manufacturing method for a unit
11/04/2004	US20040219440 Electrical field alignment vernier
11/04/2004	US20040219439 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
11/04/2004	US20040219438 Multilayer; transparent substrate with light shielding layout pattern; uniform etching of channels
11/04/2004	US20040219435 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping
11/04/2004	US20040219309 Thermosensitive transfer film and method of manufacturing display device
11/04/2004	US20040219246 Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
11/04/2004	US20040218889 Methods of forming waveguides and waveguides formed therefrom
11/04/2004	US20040218289 Mirror holding mechanism in exposure apparatus, and device manufacturing method
11/04/2004	US20040218271 Retardation element made from cubic crystal and an optical system therewith
11/04/2004	US20040218262 Inspection system using small catadioptric objective
11/04/2004	US20040218193 Methods and apparatus for determining a position of a substrate relative to a support stage
11/04/2004	US20040218192 Edge roughness measurement in optical metrology
11/04/2004	US20040218169 Preparing process of printing plate and printing plate material
11/04/2004	US20040218168 Lithographic projection assembly, substrate handling apparatus and substrate handling method
11/04/2004	US20040218167 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method
11/04/2004	US20040218166 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method
11/04/2004	US20040218164 Exposure apparatus
11/04/2004	US20040218163 Projection optical system
11/04/2004	US20040218162 Roll printer with decomposed raster scan and X-Y distortion correction
11/04/2004	US20040218161 Apparatus for forming pattern
11/04/2004	US20040218160 Holding mechanism in exposure apparatus, and device manufacturing method
11/04/2004	US20040218159 Exposure system and method
11/04/2004	US20040218158 Exposure method and device
11/04/2004	US20040218157 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
11/04/2004	US20040217545 Methods and apparatus for positioning a substrate relative to a support stage
11/04/2004	US20040217304 Method of exposing a target to a charged particle beam
11/04/2004	US20040217288 Microstructured pattern inspection method
11/04/2004	US20040217086 Pattern formation method
11/04/2004	US20040217085 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size
11/04/2004	US20040216762 cork or the said cork-based material is put into contact with a dense fluid under pressure at a temperature of from 10 to 120 degrees C. and at a pressure of from 10 to 600 bars; to remove organic compounds having an undesirable taste, an undesirable smell, or both an undesirable taste and smell
11/04/2004	DE19853093B4 Verfahren und Anordnung zur Belichtung eines Substrates Method and apparatus for exposing a substrate
11/04/2004	DE10318805A1 Katadioptrisches Reduktionsobjektiv mit Polarisationsstrahlteiler A catadioptric reduction lens with polarizing beam splitter

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