G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/11/2004	US20040223531 High efficiency collector for laser plasma EUV source
11/11/2004	US20040223443 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus
11/11/2004	US20040223385 Multidirectional photoreactive absorption method
11/11/2004	US20040223283 Adaptive gain adjustment for electromagnetic devices
11/11/2004	US20040223229 Projecting exposure apparatus
11/11/2004	US20040223228 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus
11/11/2004	US20040223212 Fluoride crystal material for optical element to be used for photolithography apparatus and method for producing the same
11/11/2004	US20040223206 Optical lithography using both photomask surfaces
11/11/2004	US20040223163 Aberration measuring method
11/11/2004	US20040223144 Rotational stage with vertical axis adjustment
11/11/2004	US20040223142 Method of detecting tightly adhering state, tight adhesion control method and method of and apparatus for near field exposure
11/11/2004	US20040223137 Determination of center of focus by cross-section analysis
11/11/2004	US20040223133 Stage apparatus, exposure system using the same, and device manufacturing method
11/11/2004	US20040223132 Mask exchanging method and exposure apparatus
11/11/2004	US20040223131 Chucking system for modulating shapes of substrates
11/11/2004	US20040223130 Catoptric projection optical system and exposure apparatus having the same
11/11/2004	US20040223129 Projecting exposure apparatus
11/11/2004	US20040223128 Apparatus for forming pattern
11/11/2004	US20040223127 Lithographic apparatus and method to detect correct clamping of an object
11/11/2004	US20040223042 Image forming method
11/11/2004	US20040222809 System for probing, testing, burn-in, repairing and programming of integrated circuits
11/11/2004	US20040222705 Linear pulse motor, stage apparatus, and exposure apparatus
11/11/2004	US20040222388 Surface processing apparatus
11/11/2004	US20040222383 Processing method and system
11/11/2004	US20040222354 System and method for lithography process monitoring and control
11/11/2004	US20040222323 Nozzle device and substrate treating apparatus having using the device
11/11/2004	US20040221954 Coating apparatus and coating method
11/11/2004	US20040221876 using water-free, gaseous sulfur trioxide as an agent to remove various organic coatings, films, layers and residues from the surface of a substrate such as semiconductor and non-semiconductor devices and displays so that it is completely removed by subsequent chemical or physical treatment
11/11/2004	US20040221658 Movement actuator/sensor systems
11/11/2004	DE202004010682U1 Einrichtung zum Verflüssigen oder Gefrieren von Xenon Means for condensing or freezing of xenon
11/11/2004	DE10318583A1 Projection light system for the microlithographic reproduction of a mask on a wafer has a polarizing optical ray cube dividing unpolarized light from the mask into two and using one part
11/11/2004	DE10318562A1 Anordnung zur Inspektion von Objekten, insbesondere von Masken in der Mikrolithographie Arrangement for the inspection of objects, in particular of masks in microlithography
11/11/2004	DE10317893A1 Maskierungsanordnung und Verfahren zum Herstellen von integrierten Schaltungsanordnungen Masking arrangement and method for producing integrated circuit arrangements
11/11/2004	DE10317792A1 Maskenrohling zur Verwendung in der EUV-Lithographie und Verfahren zu dessen Herstellung Mask blank for use in the EUV lithography and a process for its preparation
11/10/2004	EP1475807A2 High efficiency collector for laser plasma EUV source
11/10/2004	EP1475671A1 Method of preparing components for a lithographic apparatus
11/10/2004	EP1475670A2 Lithographic apparatus and device manufacturing method
11/10/2004	EP1475669A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/10/2004	EP1475668A1 Method of preparing components for a lithographic apparatus
11/10/2004	EP1475667A1 Lithographic apparatus and device manufacturing method
11/10/2004	EP1475666A1 Substrate holder for lithographic apparatus
11/10/2004	EP1475665A1 Positive-type photosensitive resin composition
11/10/2004	EP1475663A2 Mask blank for use in EUV-lithography and its process of manufacture
11/10/2004	EP1475239A1 Plate material for printing and method for regenerating;reusing plate material for printing and printing machine
11/10/2004	EP1475231A1 Image evaluation method and quality control method for planographic printing plate
11/10/2004	EP1475230A2 Image forming methods, pattern forming methods, pattern forming material and planographic printing plate
11/10/2004	EP1474844A1 Vibration control utilizing signal detrending
11/10/2004	EP1474726A2 Polarisation-optimised illumination system
11/10/2004	EP1474725A1 Photo-sensitive composition
11/10/2004	EP1474724A1 Halogenated anti-reflective coatings
11/10/2004	EP1474723A2 DRYING RESIST WITH A SOLVENT BATH AND SUPERCRITICAL CO sb 2 /sb
11/10/2004	EP1474543A2 In-line deposition processes for circuit fabrication
11/10/2004	EP1051727A4 Discharge lamp sources apparatus and methods
11/10/2004	EP1041011B1 Water-developable plate package
11/10/2004	EP1040539B1 High pulse rate pulse power system
11/10/2004	EP0927726B1 Photocatalytic composition
11/10/2004	CN1545729A 胶粘带 Adhesive tape
11/10/2004	CN1545645A Composition for forming anti-reflective coating for use in lithography
11/10/2004	CN1545644A Antireflective layer for use in microlithography
11/10/2004	CN1545643A Bathochromic mono-and bis-acylphosphine oxides and sulfides and their use as photoinitiators
11/10/2004	CN1545642A Positive photosensitive resin composition, process for its preparation, and semiconductor devices
11/10/2004	CN1545641A Negative type colored photosensitive composition
11/10/2004	CN1545528A Deodorizing agent for sulfur- or nitrogen-containing initiators
11/10/2004	CN1544994A Method for accurately controlling density of scribed lines during plane holographic grating fabricating process
11/10/2004	CN1544991A Magnetic suspension precise work bench of integrated circuit photolithography equipment
11/10/2004	CN1544967A Severeness type Mach-Zehnder interference structure and fabricating method thereof
11/10/2004	CN1544923A Preparing method of integrated capillary electrophoresis electrochemical luminescence detecting chip
11/10/2004	CN1544308A Soft lithography and tearing technology for colloid crystal microprocessing of pattern
11/10/2004	CN1175475C Method for manufacturing cylindrical condensor bottom electrode
11/10/2004	CN1175470C Method and apparatus for supercritical processing of multiple workpieces
11/10/2004	CN1175320C Method for producing pattern suitable for forming sub-micron width metal lines
11/10/2004	CN1175319C Method for making semiconductor devices by producing optical images on substrate
11/10/2004	CN1175318C Photoinduction SiO2 gel preparation and microfine pattern making method thereof
11/10/2004	CN1175309C Molded optic panel and its mold
11/10/2004	CN1175290C Minitype tool and method for manufacturing same
11/10/2004	CN1175009C Organic anti-reflecting paint polymer, anti-reflecting paint compsns. contg. same and its prepn. method
11/09/2004	US6816568 X-ray projection exposure device, X-ray projection exposure method, and semiconductor device
11/09/2004	US6816326 Optical system with compensated spatial dispersion
11/09/2004	US6816302 Spatial modulator having modulating elements (pixels); analog modulation of the pixels in the slm; micromirror spatial light modulators
11/09/2004	US6816247 Moiré method and a system for measuring the distortion of an optical imaging system
11/09/2004	US6816239 Exposure apparatus, method of controlling same, and method of manufacturing devices
11/09/2004	US6816238 Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
11/09/2004	US6816236 Projection optical system and projection and light exposure apparatus using it
11/09/2004	US6816234 Illumination optical system in exposure apparatus
11/09/2004	US6816233 Continuous multivalued half-tone mask
11/09/2004	US6816232 Support device and manufacturing method thereof, stage device, and exposure apparatus
11/09/2004	US6816231 Method and apparatus for exposure
11/09/2004	US6816230 Exposure control apparatus in a lithography system and method thereof
11/09/2004	US6816182 Radiation welding and imaging apparatus and method for using the same
11/09/2004	US6816150 Data input device power management including beacon state
11/09/2004	US6815876 Cathode with improved work function and method for making the same
11/09/2004	US6815702 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system
11/09/2004	US6815700 Plasma focus light source with improved pulse power system
11/09/2004	US6815699 Rotation limiter; planar magnetic positioning device at allows automatic self recovery and minimizes mechanical loads on conduits attached to the substrate table.
11/09/2004	US6815698 Charged particle beam exposure system
11/09/2004	US6815695 Simplified reticle stage removal system for an electron beam system
11/09/2004	US6815693 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction
11/09/2004	US6815681 Pyroelectric plate on which a patterned metal thin layer is formed as an electron beam source without using a high voltage
11/09/2004	US6815376 Microelectronic substrate edge bead processing apparatus and method
11/09/2004	US6815371 Edge bead removal for spin-on materials containing low volatility solvents using carbon dioxide cleaning

1 ... 714 715 716 717 718 719 720 721 722 723 724 725 726 727 728 729 730 731 732 733 734 ... 1272