G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/16/2004	US6819402 System and method for laser beam expansion
11/16/2004	US6819401 Exposure method and apparatus
11/16/2004	US6819400 Lithographic apparatus and device manufacturing method
11/16/2004	US6819399 Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask
11/16/2004	US6819398 Exposure apparatus and control method therefor, and semiconductor device manufacturing method
11/16/2004	US6819396 Exposure apparatus, and device manufacturing method
11/16/2004	US6818912 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
11/16/2004	US6818911 Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method
11/16/2004	US6818910 Writing methodology to reduce write time, and system for performing same
11/16/2004	US6818908 Device and method for optical processing for processing inorganic transparent material by optical patterning
11/16/2004	US6818907 Surface plasmon enhanced illumination system
11/16/2004	US6818608 A mixture comprising tetrabutylammonium fluoride, 1,8-diazabicyclo(5.4.0)undec-7-ene or diethylhyroxlyamine, a solvent of n,n-dimethylacetamide or methyl ethyl ketone; antisoilants removing polysiloxanes, acrylic, epoxy resins
11/16/2004	US6818563 Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles
11/16/2004	US6818480 Method of forming a pattern of a semiconductor device and photomask therefor
11/16/2004	US6818459 Methods and systems for determining a presence of macro defects and overlay of a specimen
11/16/2004	US6818389 Utilizes a mask including dense repetitive structures of features that result in a wide array of fine densely populated features on the exposed substrate film.
11/16/2004	US6818387 Method of forming a pattern
11/16/2004	US6818385 Phase shifting circuit manufacture method and apparatus
11/16/2004	US6818384 Methods of fabricating microelectronic features by forming intermixed layers of water-soluble resins and resist materials
11/16/2004	US6818383 Method for forming a resist pattern and method for manufacturing a semiconductor device
11/16/2004	US6818382 Photosensitive composition, cured article thereof, and printed circuit board using the same
11/16/2004	US6818381 Underlayer compositions for multilayer lithographic processes
11/16/2004	US6818380 Decreasing number of defects by using photoresist of aqueous solution of tetramethylammonium hydroxide
11/16/2004	US6818379 Sulfonium salt represented by the following formula (i): wherein q1, q2 and q3 each independently represent hydrogen, hydroxy, alkyl having 1 to 6 carbon atoms, or alkoxy having 1 to 6 carbon atoms, but all of q1, q2 and q3 are not the same;
11/16/2004	US6818378 Suitable for direct plate-making, which is capable of producing a printing plate directly by recording digital image signals formed by and output from computer with an infrared laser beam
11/16/2004	US6818377 Acid generator; resin containing a polyalicyclic group or a furanone, cyclopentanone, pyrrolidone or tetrahydrothiophenone group
11/16/2004	US6818376 Overcoating semiconductor substrate with photosensitive polymer; exposure to radiation in presence of acid generator
11/16/2004	US6818375 Photoresist composition
11/16/2004	US6818373 Coating fluid for printing plates and method of making a printing plate
11/16/2004	US6818372 Fine particles containing a radical polymerizable encapsulated by microcapsules
11/16/2004	US6818363 Aqueous dispersions for color imaging
11/16/2004	US6818258 Acid generator and a fluoropolymer formed by cyclopolymerizing a fluorinated diene monomer having blocked acidic groups
11/16/2004	US6818148 Resist composition and patterning method
11/16/2004	US6818139 Method for forming a micro-pattern on a substrate
11/16/2004	US6818064 Photoresist dispense arrangement by compensation for substrate reflectivity
11/16/2004	US6817790 Substrate processing method and substrate processing apparatus
11/16/2004	US6817602 Manufacturing system method for processing a lithography mask container
11/16/2004	US6817486 Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same
11/16/2004	US6817368 Substrate processing method and substrate processing apparatus
11/16/2004	US6817293 Patterning method with micro-contact printing and its printed product
11/16/2004	US6817211 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
11/11/2004	WO2004097918A1 Etching liquid, remover liquid and etching method
11/11/2004	WO2004097911A1 Projection optical system, exposure apparatus, and exposure method
11/11/2004	WO2004097894A2 Self-organized nanopore arrays with controlled symmetry and order
11/11/2004	WO2004097528A2 System and method for characterizing lithography effects on a wafer
11/11/2004	WO2004097527A2 Maskless lithographic system
11/11/2004	WO2004097526A1 Positive photoresist composition and method for forming resist pattern
11/11/2004	WO2004097525A1 Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound
11/11/2004	WO2004097524A1 Positive resist composition and method of formation of resist patterns
11/11/2004	WO2004097523A1 Photopolymerizable compositions and flexographic printing plates derived therefrom
11/11/2004	WO2004097522A1 Negative resist composition for organic insulator of high aperture lcd
11/11/2004	WO2004097521A1 Optical proximity effect correction verification method
11/11/2004	WO2004097520A2 Fiber laser-based euv-lithography
11/11/2004	WO2004097519A2 Method and mark for metrology of phase errors on phase shift masks
11/11/2004	WO2004097517A1 Inkjet printhead nozzle plate
11/11/2004	WO2004097499A1 Illuminating and imaging system comprising a diffractive beam splitter
11/11/2004	WO2004097493A1 Method and array for determining the focal position during imaging of a sample
11/11/2004	WO2004097467A1 Reflective optical element, optical system and euv lithography device
11/11/2004	WO2004096786A1 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
11/11/2004	WO2004096698A1 Method of bonding molecule and molecule bonding apparatus
11/11/2004	WO2004096681A1 Warning device, device and method of transportation, and exposure device
11/11/2004	WO2004096514A2 Compositions and methods for use in three dimensional model printing
11/11/2004	WO2004066358A3 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
11/11/2004	WO2004057295A3 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
11/11/2004	WO2004037877A9 Organosiloxanes
11/11/2004	WO2004029722A3 Lithographic method for wiring a side surface of a substrate
11/11/2004	US20040225993 Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor device
11/11/2004	US20040225401 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
11/11/2004	US20040225159 Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
11/11/2004	US20040224865 Supercritical fluid-based cleaning compositions and methods
11/11/2004	US20040224528 Electronic device manufacture
11/11/2004	US20040224525 Pattern formation method
11/11/2004	US20040224523 Method of fabricating anti-stiction micromachined structures
11/11/2004	US20040224520 Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
11/11/2004	US20040224516 Semiconductor stress buffer coating edge bead removal compositions and method for their use
11/11/2004	US20040224514 Manufacturing method of semiconductor device
11/11/2004	US20040224513 Fine contact hole forming method employing thermal flow process
11/11/2004	US20040224512 Method of manufacturing semiconductor device
11/11/2004	US20040224458 Method and apparatus for manufacturing semiconductor device
11/11/2004	US20040224442 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same
11/11/2004	US20040224265 irradiating photoresist film with exposing light while supplying, between projection lens and resist film, a circulating solution of water including antifoaming agent (silicone oil), baking, then developing; for production of semiconductors
11/11/2004	US20040224264 hardening by oxidation provides a selectivity of the top image layer to the underlayer may almost double to an etch selectivity of 1:5
11/11/2004	US20040224262 Direct alignment scheme between multiple lithography layers
11/11/2004	US20040224261 Unitary dual damascene process using imprint lithography
11/11/2004	US20040224260 photosensitivity; checkerboard imaging; infrared radiation lasers
11/11/2004	US20040224259 Functionalized polymer
11/11/2004	US20040224257 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image
11/11/2004	US20040224255 Fluorinated Si-polymers and photoresists comprising same
11/11/2004	US20040224254 Photoresist and organic antireflective coating compositions
11/11/2004	US20040224253 Negative-type photosensitive resin composition containing epoxy compound
11/11/2004	US20040224252 comprises catalyst precursor (alkyl, alkenyl, alkynyl-carboxylic acid metal salt) with metal-deposition catalytic activity suitable for electroless metal plating
11/11/2004	US20040224251 comprises fluoro-vinyl copolymers which become alkali soluble upon action of acid generator such as (4-methylphenyl)diphenylsulfonium trifluoromethanesulfonate; for use in F2 excimer laser lithography
11/11/2004	US20040224248 Multicolor image-forming material and multicolor image-forming method
11/11/2004	US20040224242 forming focus monitor marks and exposure monitor marks on semiconductor wafers/liquid crystal displays, to measure effective exposure
11/11/2004	US20040224240 Method of forming and testing a phase shift mask
11/11/2004	US20040224239 steps of mapping a first phase onto a first mask, mapping a second phase onto a second mask, and mapping a trim onto the first mask or second mask (or both)
11/11/2004	US20040224237 photomasks/photoresists; scanning electron microscopy; microelectronics
11/11/2004	US20040224236 comprises photoresists/pattern blocking; for production of integrated circuits;
11/11/2004	US20040223926 Coating solution for forming wettability-varied pattern and method of producing pattern-formed body
11/11/2004	US20040223883 System for determining characteristics of substrates employing fluid geometries

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