| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/18/2004 | US20040229135 Multiple exposure method for circuit performance improvement |
| 11/18/2004 | US20040229134 Phase-shift mask |
| 11/18/2004 | US20040229133 Method of optical proximity correction design for contact hole mask |
| 11/18/2004 | US20040229132 Mechanized retractable pellicles and methods of use |
| 11/18/2004 | US20040229130 Configuring an array of micro-mirrors in a deep ultraviolet maskless photolithography system by generating an ideal mask layout representative of image characteristics associated with a desired image; next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout |
| 11/18/2004 | US20040229050 Use of spin-on, photopatternable, interlayer dielectric materials and intermediate semiconductor device structure utilizing the same |
| 11/18/2004 | US20040229025 Voltage tunable photodefinable dielectric and method of manufacture therefore |
| 11/18/2004 | US20040229002 Stereolithographic seal and support structure for semiconductor wafer |
| 11/18/2004 | US20040228962 Scanning probe microscopy probe and method for scanning probe contact printing |
| 11/18/2004 | US20040228012 Optical element holder, exposure apparatus, and device fabricating method |
| 11/18/2004 | US20040228004 System and method for cutting using a variable astigmatic focal beam spot |
| 11/18/2004 | US20040228001 Lithographic objective having a first lens group including only lenses having a positive refractive power |
| 11/18/2004 | US20040227988 Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lens |
| 11/18/2004 | US20040227951 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
| 11/18/2004 | US20040227950 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
| 11/18/2004 | US20040227925 Exposure apparatus |
| 11/18/2004 | US20040227924 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof |
| 11/18/2004 | US20040227923 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 11/18/2004 | US20040227922 Lithographic apparatus and device manufacturing method |
| 11/18/2004 | US20040227920 Illumination apparatus, projection exposure apparatus, and device fabrication method |
| 11/18/2004 | US20040227919 Projection exposure apparatus and method |
| 11/18/2004 | US20040227918 Exposure apparatus, reticle shape measurement apparatus and method |
| 11/18/2004 | US20040227917 Photomask for exposure to optical near-field, method of controlling optical near-field intensity distribution using the same, pattern preparing method and pattern preparing apparatus |
| 11/18/2004 | US20040227916 Displacement correction apparatus, exposure system, exposure method and a computer program product |
| 11/18/2004 | US20040227915 Optical system in exposure apparatus, and device manufacturing method |
| 11/18/2004 | US20040227914 Optical system for use in exposure apparatus and device manufacturing method using the same |
| 11/18/2004 | US20040227913 Cooling apparatus, optical element having the same, and exposure apparatus |
| 11/18/2004 | US20040227912 Imaging apparatus and imaging method |
| 11/18/2004 | US20040227474 Magnetic guiding apparatus |
| 11/18/2004 | US20040227107 Lithographic apparatus and device manufacturing method |
| 11/18/2004 | US20040227103 Collector with fastening devices for fastening mirror shells |
| 11/18/2004 | US20040227102 Method and device for measuring contamination of a surface of a component of a lithographic apparatus |
| 11/18/2004 | US20040227075 Scanning probe microscopy probe and method for scanning probe contact printing |
| 11/18/2004 | US20040226464 Scanning probe microscopy probe and method for scanning probe contact printing |
| 11/18/2004 | US20040226460 Nanoimprinting apparatus and method |
| 11/18/2004 | DE202004014949U1 Vorrichtung zum Wärmebehandeln einer Beschichtung von Flachoffset-Druckplatten An apparatus for heat-treating a coating of flat-bed offset printing plates |
| 11/18/2004 | DE19638630B4 UV- und thermisch härtbare Gießharzformulierung und ihre Verwendung zum Unterfüllprozeß bei elektrischen und elektronischen Bauelementen UV and thermally curable casting resin formulation and their use for Unterfüllprozeß in electrical and electronic components |
| 11/18/2004 | DE10320520A1 Illumination system with a vibrating diffuser, e.g. for use in microlithography projection illumination systems, whereby vibration of the diffuser induced in any of a number of ways |
| 11/18/2004 | DE10319685A1 Vorrichtung zum Belichten von Druckplatten eines Druckwerkes Apparatus for exposing printing plates of a printing unit |
| 11/18/2004 | DE10318847A1 Integrated circuit having two circuit parts on the same wafer made using specific first and second exposure masks from sets of masks specific to that circuit part |
| 11/18/2004 | DE10317667A1 Optisches Element für ein Beleuchtungssystem An optical element for an illumination system |
| 11/18/2004 | DE10317662A1 Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung Projection lens, microlithographic projection exposure apparatus and method for manufacturing a semiconductor circuit |
| 11/18/2004 | DE102004016704A1 Verfahren zur Reduktion des Rastermaßes auf einer Halbleiterscheibe A process for the reduction of the modular dimension on a semiconductor wafer |
| 11/18/2004 | DE10000191B4 Projektbelichtungsanlage der Mikrolithographie Project exposure system for microlithography |
| 11/17/2004 | EP1478010A1 Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium |
| 11/17/2004 | EP1477860A1 Lithographic marker structure compliant with microelectronic device processing |
| 11/17/2004 | EP1477859A1 Composition for removal of sidewall polymer and etchant residues without a separate solvent rinse step |
| 11/17/2004 | EP1477858A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 11/17/2004 | EP1477857A1 Method of characterising a process step and device manufacturing method |
| 11/17/2004 | EP1477856A1 Lithographic apparatus and device manufacturing method |
| 11/17/2004 | EP1477855A1 Lithographic apparatus and device manufacturing method |
| 11/17/2004 | EP1477854A2 Projection optical system |
| 11/17/2004 | EP1477853A2 Optical element holder, exposure apparatus, and device fabricating method |
| 11/17/2004 | EP1477852A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 11/17/2004 | EP1477851A1 Device manufacturing method and lithographic apparatus |
| 11/17/2004 | EP1477850A1 Lithographic apparatus and device manufacturing method |
| 11/17/2004 | EP1477849A2 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size |
| 11/17/2004 | EP1477848A1 Radiation-sensitive resin composition |
| 11/17/2004 | EP1477847A1 Resist material and microfabrication method |
| 11/17/2004 | EP1477321A1 Support for lithographic printing plate and presensitized plate |
| 11/17/2004 | EP1477309A2 Lithographic printing plate precursor requiring no fountain solution |
| 11/17/2004 | EP1476788A2 Fluorinated molecules and methods of making and using same |
| 11/17/2004 | EP1476787A1 Visible radiation sensitive composition |
| 11/17/2004 | EP1476786A2 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same |
| 11/17/2004 | EP1476452A2 Acyl- and bisacylphosphine derivatives |
| 11/17/2004 | EP1358670A4 Process and apparatus for removing residues from the microstructure of an object |
| 11/17/2004 | EP1296899A4 Fused silica with constant induced absorption |
| 11/17/2004 | EP1276555B1 A method of fabricating coded particles |
| 11/17/2004 | EP1005664B1 Lithographic apparatus comprising a dedicated mirror projection system |
| 11/17/2004 | EP0963573B1 Alignment device and lithographic apparatus comprising such a device |
| 11/17/2004 | CN1547684A Phase-shift-moire focus monitor |
| 11/17/2004 | CN1547683A 光敏性树脂组合物 The photosensitive resin composition of the |
| 11/17/2004 | CN1547681A Reticle and optical characteristic measuring method |
| 11/17/2004 | CN1547251A A method for reducing dimension differences between isolated contact aperture and dense contact aperture |
| 11/17/2004 | CN1547241A A method for preventing side lobe from being transferred to substrate when etching |
| 11/17/2004 | CN1547199A Metal-organic compound layer contained mask for near-field super resolution photomemory |
| 11/17/2004 | CN1547079A Quasi-molecule laser electrochemical microstructure manufacturing method and equipment |
| 11/17/2004 | CN1547078A A electron beam chemical amplitude positive resist and method for making same and photoetching technology |
| 11/17/2004 | CN1546551A Macromolecule thioxanthone photo-initiator and its preparation method |
| 11/17/2004 | CN1546488A Diepoxy group containing thioxanthone photoinitiator and preparation method therefor |
| 11/17/2004 | CN1176406C Worktable motion controlling method and system for array IC scanning photoetching |
| 11/17/2004 | CN1176405C Emission photoetching method and device using transmitter with pattern |
| 11/17/2004 | CN1176404C Method for preparing positive photoresist combination |
| 11/17/2004 | CN1176396C Method for preparing LCD in the mode of switching at the same plane |
| 11/17/2004 | CN1176199C Acidic composition containing fluoride for removal of photoresists and etch residues |
| 11/16/2004 | US6819843 Device and method for photolithographically irradiating biological substances |
| 11/16/2004 | US6819493 Illumination apparatus with light shielding near an exit plane of an optical pipe and projection exposure apparatus using same |
| 11/16/2004 | US6819490 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
| 11/16/2004 | US6819469 High-resolution spatial light modulator for 3-dimensional holographic display |
| 11/16/2004 | US6819450 Enhanced edge resolution and critical dimension linearity in lithography |
| 11/16/2004 | US6819433 Exposure apparatus including interferometer system |
| 11/16/2004 | US6819427 Apparatus of monitoring and optimizing the development of a photoresist material |
| 11/16/2004 | US6819426 Overlay alignment metrology using diffraction gratings |
| 11/16/2004 | US6819425 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 11/16/2004 | US6819424 Exposure device for a strip-shaped workpiece |
| 11/16/2004 | US6819414 Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method |
| 11/16/2004 | US6819406 Aligner |
| 11/16/2004 | US6819405 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 11/16/2004 | US6819404 Stage device and exposure apparatus |
| 11/16/2004 | US6819403 Illumination optical system, exposure apparatus, and microdevice manufacturing method |