G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/24/2004	EP1478977A2 Polymers blends and their use in photoresist compositions for microlithography
11/24/2004	EP1478976A1 Critical dimension control using full phase and trim masks
11/24/2004	EP1478683A1 Spin-on-glass anti-reflective coatings for photolithography
11/24/2004	EP1478682A1 Anti-reflective coatings for photolithography and methods of preparation thereof
11/24/2004	EP1478681A1 Spin-on-glass anti-reflective coatings for photolithography
11/24/2004	EP1478668A2 Thiol compound, photopolymerization initiator composition and photosensitive composition
11/24/2004	EP1478516A1 On-press developable ir sensitive printing plates
11/24/2004	EP1478512A1 Method and device for printing wherein a hydrophilic layer is produced and structured
11/24/2004	EP1337470A4 Process for recovering onium hydroxides from solutions containing onium compounds
11/24/2004	EP1203031A4 Optical devices made from radiation curable fluorinated compositions
11/24/2004	EP1037112B1 Positive photosensitive resin precursor composition and process for producing the same
11/24/2004	EP1004057B1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
11/24/2004	CN1549307A Method for cleaning hole material and apparatus thereof
11/24/2004	CN1549303A Pattern formation method
11/24/2004	CN1549060A Method for removing colour light resistance in exposure positioning producing technology
11/24/2004	CN1549059A First yellow light and etching method in liquid crystal display panel front section array manufacturing technology
11/24/2004	CN1549058A Apparatus and method for preventing backsputtering
11/24/2004	CN1549057A Exposure system and method with group compensation function
11/24/2004	CN1549056A Exposure system and method
11/24/2004	CN1549055A Pattern formation method and exposure system
11/24/2004	CN1549054A Microimage producing process
11/24/2004	CN1549053A Optical hood for reducing lens aberration and pattern shifting and method
11/24/2004	CN1549042A Method for producing light interference type display unit
11/24/2004	CN1549041A Light interference type display unit structure and producing method
11/24/2004	CN1549039A Method for producing light interference display unit
11/24/2004	CN1549015A Colour optical filter and producing method thereof
11/24/2004	CN1549008A Liquid crystal device and producing method thereof
11/24/2004	CN1549004A Method for producing transparent current-conducing plate with low-contact surface resistance
11/24/2004	CN1548990A Method for producing light conducting plate mould core
11/24/2004	CN1548989A Multiple anti-reflection coating and method for producing micro-image utilizing the same multiple anti reflection coating
11/24/2004	CN1177355C Washing water and method for cleaning wafers
11/24/2004	CN1177354C Substrate treatment method
11/24/2004	CN1177352C Exposure mask and its mfg. method
11/23/2004	US6822740 Method of measuring displacement of optical axis, optical microscope and evaluation mark
11/23/2004	US6822731 Method and apparatus for a pellicle frame with heightened bonding surfaces
11/23/2004	US6822730 Substrate holder and device manufacturing method
11/23/2004	US6822728 Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system
11/23/2004	US6822727 Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector
11/23/2004	US6822669 Method and multibeam scanning device for the ablation of flexo printing plates by laser engraving
11/23/2004	US6822407 Multiple degree of freedom substrate manipulator
11/23/2004	US6822342 Raised-lines overlay semiconductor targets and method of making the same
11/23/2004	US6822251 Monolithic silicon EUV collector
11/23/2004	US6821869 Photomask, method of generating resist pattern, and method of fabricating master information carrier
11/23/2004	US6821718 Radiation sensitive silicon-containing negative resists and use thereof
11/23/2004	US6821714 Lithography process for patterning HgI2 photonic devices
11/23/2004	US6821713 Regulate and repeatably trim a nitride or polysilicon spacer
11/23/2004	US6821712 Forming a semiconductive antireflection film on the rear of the substrate having a specified band gap energy and reflectance that satisfies an equation relating refractive indexes of the substrate and the film
11/23/2004	US6821711 Manufacturing method of a phase-shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device
11/23/2004	US6821706 Polymerizable composition, polymer, resist, and process for electron beam lithography
11/23/2004	US6821705 Radiation-sensitive resin composition
11/23/2004	US6821691 Color filter array having a red filter layer
11/23/2004	US6821690 Photomask and method for forming micro patterns of semiconductor device using the same
11/23/2004	US6821689 Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature
11/23/2004	US6821550 Apparatus and method for applying process solution
11/23/2004	US6821348 Aperture mask patterns; elongated web of flexible film; integrated circuits
11/23/2004	US6820551 Method and system for electronically generating exposure scale for laser imaging devices
11/23/2004	CA2261129C Electrostatic precipitator for a gas discharge laser
11/18/2004	WO2004100282A2 Manufacture of a polymer device
11/18/2004	WO2004100237A1 Stage apparatus, exposure apparatus, and device-producing method
11/18/2004	WO2004100236A1 Illumination optical system, projection/exposure device, micro device manufacturing method, illumination device manufacturing method, projection/exposure device adjustment method, and projection/exposure device manufacturing method
11/18/2004	WO2004100235A1 Method of processing resist, semiconductor device, and method of producing the device
11/18/2004	WO2004100234A1 Processing schedule making method, coating/developing apparatus, pattern forming device, and processing system
11/18/2004	WO2004099879A2 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
11/18/2004	WO2004099878A2 Method for preventing contamination and lithographic device
11/18/2004	WO2004099877A1 Optical measuring device and operating method for an optical imaging system
11/18/2004	WO2004099876A1 Photosensitive resin composition and dry film resist using the same
11/18/2004	WO2004099874A1 Pattern decision method and system, mask manufacturing method, focusing performance adjusting method, exposure method and device, program, and information recording medium
11/18/2004	WO2004099873A2 Illumination system for a microlithographic projection illumination installation
11/18/2004	WO2004099373A2 Biocompatible resists
11/18/2004	WO2004099262A1 Novel trifunctional photoinitiators
11/18/2004	WO2004099086A1 Filter cartridge for fluid for treating surface of electronic device substrate
11/18/2004	WO2004076963A3 Apparatus and method for detecting overlay errors using scatterometry
11/18/2004	WO2004051714A3 A polymer solution for nanoprint lithography to reduce imprint temperature and pressure
11/18/2004	WO2004049073A3 Drying process for low-k dielectric films
11/18/2004	WO2003052514A3 Patterning of solid state features by direct write nanolithographic printing
11/18/2004	US20040230939 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method
11/18/2004	US20040230326 System and method for discrete time trajectory planning for lithography
11/18/2004	US20040229761 Composition for removal of sidewall polymer and etchant residues without a separate solvent rinse step
11/18/2004	US20040229472 Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask
11/18/2004	US20040229471 Periodic patterns and technique to control misalignment between two layers
11/18/2004	US20040229416 [method of forming ldd of semiconductor devices]
11/18/2004	US20040229410 Pattern forming method, method of manufacturing thin film transistor substrate, method of manufacturing liquid crystal display and exposure mask
11/18/2004	US20040229409 Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology
11/18/2004	US20040229171 Forming u-shaped grooves in the first photolithograpic step; then using a second mask having smaller transmissive regions than those of the first; etching regions not covered and removing the mask; thin film transistor liquid crystal displays
11/18/2004	US20040229170 Aqueous surfactant solution for developing coating film layer
11/18/2004	US20040229169 produce small features on a reticle with precise critical dimensions, using a technique suitable to a variety of energy sources; uses resist and transfer layers over a workpiece substrate
11/18/2004	US20040229168 Method of fabricating a poly fuse
11/18/2004	US20040229167 Novel photosensitive resin compositions
11/18/2004	US20040229166 Novel photosensitive resin compositions
11/18/2004	US20040229164 Multilayer ink jet print heads; crosslinked polymer
11/18/2004	US20040229163 Lithographic printing plate precursor requiring no fountain solution
11/18/2004	US20040229162 Photoacid generators, chemically amplified resist compositions, and patterning process
11/18/2004	US20040229161 acid-decomposable group-containing polysiloxane or polysilsesquioxane and a specific amount of an acid generator that generates a sulfonic acid, and an organic base; high sensitivity, high resolution and good line edge roughness
11/18/2004	US20040229160 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a photosensitive compound, and a solvent; use in microelectronics, relief images
11/18/2004	US20040229159 Fluorinated Si-polymers and photoresists comprising same
11/18/2004	US20040229157 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
11/18/2004	US20040229155 photoacid generators comprising arylsulfonium, aryliodonium, arylsulfonates or aryldisulfonyl compounds useful in photoresists in the field of microlithography; useful for imaging in deep UV (ultraviolet radiation)
11/18/2004	US20040229140 Method of forming color filter layer and method of fabricating liquid crystal display device using the same
11/18/2004	US20040229138 Exposure method for correcting line width variation in a photomask
11/18/2004	US20040229137 Method for correcting characteristics of attenuated phase-shift mask

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