G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2004
11/25/2004	WO2004101490A2 Photoactive compounds
11/25/2004	WO2004101484A1 Adamantane derivative and method for production thereof
11/25/2004	WO2004101181A2 System and method for cleaning of workpieces using supercritical carbon dioxide
11/25/2004	WO2004088720A3 Loosely-packed two-dimensional modulator arrangement
11/25/2004	WO2004088423A3 Photoresist compositions
11/25/2004	WO2004077154A3 Lithographic printing with polarized light
11/25/2004	WO2004051380A8 Method for forming resist pattern and resist pattern
11/25/2004	WO2004034424A3 A method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability
11/25/2004	WO2003100826A8 Lithography laser with beam delivery and beam pointing control
11/25/2004	US20040236548 Computer implemented method for development profile simulation, computer program product for controlling a computer system so as to simulate development profile, and computer implemented method for mask pattern data correction
11/25/2004	US20040236046 Fluorine-containing polymerisable monomer and polymer prepared by using same
11/25/2004	US20040236006 Colored composition, method of manufacturing color filter, and method of manufacturing black matrix substrate
11/25/2004	US20040235992 A soluble polyimide that may be epoxy-modified; an unsaturated compound and a photoreaction initiator and/or a sensitizer; may also contain a phosphorus compound, especially a phenyl phosphate, and a halogen-containing compound; printed circuits; hard disc suspension; hard disc head for a PC
11/25/2004	US20040235635 Photolithography methods and systems
11/25/2004	US20040235299 Plasma ashing apparatus and endpoint detection process
11/25/2004	US20040235279 Method of fabricating polycrystalline silicon and switching device using polycrystalline silicon
11/25/2004	US20040235205 Methods and systems for determining a critical dimension and overlay of a specimen
11/25/2004	US20040234905 wafer is placed on the surface of a hot plate, the hot plate is then positioned under an angle with a horizontal direction and may be turned such that the active surface of the wafer, over which a photoresist mask has been formed, faces downwards; changing Critical Dimension in a layer of photoresist
11/25/2004	US20040234904 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
11/25/2004	US20040234903 Forming a film with plasma deposition on photosensitive film on substrate and silicon donor with silane, disilane and nonsilicon exposure to ultraviolet radiation
11/25/2004	US20040234902 Plasma display panel and method for fabricating the same
11/25/2004	US20040234901 is employed to detect the orientation patterns, such that the coordinates of the input points are accurately recognized; orientation patterns do not overlap the pixels, thus the poor aperture ratio problem of the prior art resistance type touch panel is avoided
11/25/2004	US20040234899 Method of forming fine pattern
11/25/2004	US20040234897 Water soluble negative tone photoresist
11/25/2004	US20040234894 Method for forming a via in a substrate
11/25/2004	US20040234893 Resin composition and thermo/photosensitive composition
11/25/2004	US20040234891 A supported aqueous-based imaging layer having overcoating of non-aqueous inverse emulsion of highly hydrophilic, water-swellable microgel particles dispersed in a water-immiscible solvent; durability; lithographic printing plates
11/25/2004	US20040234890 Hydrophilic water swelling particles in nonaqeuos solvent; lithography printing plates
11/25/2004	US20040234889 Laminated film
11/25/2004	US20040234888 Photoacid generators with perfluorinated multifunctional anions
11/25/2004	US20040234886 Photosensitive element for use as flexographic printing plate
11/25/2004	US20040234885 Resist composition and patterning process
11/25/2004	US20040234884 Basic compound, resist composition and patterning process
11/25/2004	US20040234872 Negative type colored photosensitive composition
11/25/2004	US20040234871 Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates
11/25/2004	US20040234870 Mask blank for use in EUV lithography and method for its production
11/25/2004	US20040234869 sub-wavelength features which have a depth corresponding to an etch depth of primary features on the mask, but which produce an effective phase shift of about 60 to 120 degrees; duty cycle of 50%; photolithography
11/25/2004	US20040234868 Novel modification of mask blank to avoid charging effect
11/25/2004	US20040234788 Photoactivateable silane compounds and methods for their synthesis and use
11/25/2004	US20040233494 Device and method for manipulation and routing of a metrology beam
11/25/2004	US20040233490 Lithograph with one-dimensional trigger mask and method for production of digital holograms in a storage medium
11/25/2004	US20040233486 Recording material for holograms, manufacturing method thereof, recording medium for holograms, hologram recording method and hologram reproduction method
11/25/2004	US20040233462 Real time analysis of periodic structures on semiconductors
11/25/2004	US20040233445 Determination of center of focus by parameter variability analysis
11/25/2004	US20040233444 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233443 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233442 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233441 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233440 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233439 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233412 Multiple stage, stage assembly having independent stage bases
11/25/2004	US20040233411 Projection exposure apparatus and method
11/25/2004	US20040233410 Projection exposure apparatus and method
11/25/2004	US20040233409 Projection objective having adjacently mounted aspheric lens surfaces
11/25/2004	US20040233407 Exposure apparatus and method
11/25/2004	US20040233405 Projection optical system, exposure apparatus, and device manufacturing method
11/25/2004	US20040233404 Exposure device and exposure method
11/25/2004	US20040233403 Device and method for optically scanning a substrate disk
11/25/2004	US20040233401 Exposure apparatus
11/25/2004	US20040233306 Determination and correction for laser induced CCD camera degradation
11/25/2004	US20040232943 Lamination and delamination technique for thin film processing
11/25/2004	US20040232563 Adhesive tape
11/25/2004	US20040232357 Electron beam lithography system having improved electron gun
11/25/2004	US20040232354 Illumination system with field mirrors for producing uniform scanning energy
11/25/2004	US20040232330 Thin film analyzing method
11/25/2004	US20040232313 System and method for lithography process monitoring and control
11/25/2004	US20040231822 Method and apparatus for production of a cast component
11/25/2004	US20040231781 Methods of creating patterns on substrates and articles of manufacture resulting therefrom
11/25/2004	US20040231584 Spin coating apparatus for coating photoresist
11/25/2004	US20040231541 Apparatus for exposing printing plates for a printing mechanism
11/25/2004	DE19520949B4 Druckplatten-Trocknungsvorrichtung Printing plate drying apparatus
11/25/2004	DE10360987A1 Erzeugung von Merkmalen in Dickfilmtinten Generation of features in thick film inks
11/25/2004	DE10355319A1 Photoresist-Entfernerzusammensetzungen Photoresist Entfernerzusammensetzungen
11/25/2004	DE10319154A1 Maskenloses Lithographiesystem Maskless lithography system
11/25/2004	DE10319005A1 Reflektives optisches Element, optisches System und EUV-Lithographievorrichtung The reflective optical element, optical system and EUV lithography apparatus
11/25/2004	DE10318681A1 System removing rim of substrate layer and for substrate coating, mainly with photolacquer film, for use in photolithographic process
11/25/2004	DE10317366A1 Projector lens transmission measurement procedure uses scattering grid to create two order beam pattern on lens and records intensity profile in image plane
11/25/2004	DE10297464T5 Kristallmaterialien für die optische Lithographie unter 160 NM und Herstellungsverfahren Crystal materials for optical lithography below 160 nm and manufacturing processes
11/25/2004	DE102004014244A1 Winkelige Phasenform für eine verminderte Beeinträchtigung des Layouts Angular phase form of decreased degradation of the layout
11/25/2004	CA2565231A1 Supercritical fluid-based cleaning compositions and methods
11/24/2004	EP1480282A2 A low moisture donor substrate coatable with organic layers transferrable in response to incident radiation
11/24/2004	EP1480263A1 Method of treating surface, semiconductor device, process for producing semiconductor device, and apparatus for treatment
11/24/2004	EP1480258A1 Exposure device and exposure method
11/24/2004	EP1480093A1 Control system, lithographic apparatus, device manufacturing method and device manufactured thereby
11/24/2004	EP1480086A1 Lithographic apparatus and device manufacturing method
11/24/2004	EP1480085A2 A method for controlling a critical dimension (CD) in an etch process
11/24/2004	EP1480084A1 Lithographic apparatus and device manufacturing method
11/24/2004	EP1480083A2 Lithographic apparatus and device manufacturing method
11/24/2004	EP1480082A1 Ringfield four mirror system with convex primary mirror for EUV lithography
11/24/2004	EP1480081A2 Use of water soluble negative tone photoresist for producing closely spaced contact holes
11/24/2004	EP1480080A1 Lithographic apparatus and device manufacturing method
11/24/2004	EP1480079A2 Photosensitive resin composition
11/24/2004	EP1480078A1 Method for coating a substrate for EUV lithography and substrate with photoresist layer
11/24/2004	EP1480077A2 Device and process for manufacturing embossed substrates
11/24/2004	EP1480065A2 Projection optical system, exposure apparatus, and device manufacturing method
11/24/2004	EP1479824A1 Lining board for lithographic plate and its manufacturing method, and protected lithographic plate and its stack
11/24/2004	EP1479700A1 Processes for preparing photoresist compositions
11/24/2004	EP1479527A1 Printing process film, manufacturing method thereof, process film recycling method, and printer
11/24/2004	EP1478979A2 An image forming method and apparatus
11/24/2004	EP1478978A2 Self-aligned pattern formation using dual wavelengths

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