Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2014
02/12/2014CN102023494B Actuator, positioning system and lithographic apparatus
02/12/2014CN102007455B Rapid exchange device for lithography reticles
02/12/2014CN101946305B Method for making structures with improved edge definition
02/12/2014CN101840159B Lithographic apparatus and device manufacturing method
02/12/2014CN101799628B Surface modifying agent, laminated structure using same, method of manufacturing structure, and transistor including same
02/12/2014CN101373329B Colored cured composition
02/12/2014CN101174086B Etching of nano-imprint templates using etch reactor
02/11/2014US8648997 Member with a cleaning surface and a method of removing contamination
02/11/2014US8647817 Vapor treatment process for pattern smoothing and inline critical dimension slimming
02/11/2014US8647816 Method of manufacturing electronic device
02/11/2014US8647815 Method of manufacturing copper electrode
02/11/2014US8647813 Photosensitive composition and photosensitive lithographic printing plate material
02/11/2014US8647812 Pattern forming method, chemical amplification resist composition and resist film
02/11/2014US8647811 Positive-working lithographic printing plate precursors
02/11/2014US8647810 Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device
02/11/2014US8647809 Metal-oxide films from small molecules for lithographic applications
02/11/2014US8647808 Fluorinated monomer, polymer, resist composition, and patterning process
02/11/2014US8647807 Photosensitive resin composition, photosensitive dry film and method for forming pattern
02/11/2014US8647806 Photosensitive resin composition, photosensitive dry film and method for forming pattern
02/11/2014US8647796 Photoactive compound gradient photoresist
02/11/2014US8647522 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
02/11/2014US8646403 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
02/06/2014WO2014021590A1 Resin composition having photocurable property and thermosetting property, and dry film solder resist
02/06/2014WO2014021471A1 Active anti-vibration apparatus, anti-vibration method, processing device, inspection device, exposure device, and workpiece manufacturing method
02/06/2014WO2014021328A1 Coloring composition, color filter and display element
02/06/2014WO2014021322A1 Photosensitive resin composition and photosensitive resin printing plate precursor
02/06/2014WO2014021256A1 Composition for forming underlayer film for silicon-containing euv resist and containing onium sulfonate
02/06/2014WO2014021086A1 Coloring curable composition and color filter
02/06/2014WO2014021043A1 Developing solution processing device and processing method
02/06/2014WO2014021023A1 Latent additive and composition containing latent additive
02/06/2014WO2014020984A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device
02/06/2014WO2014020112A1 Mirror arrangement for a lithography apparatus and method for producing the same
02/06/2014WO2014020003A1 Lithographic apparatus and method of manufacturing a device
02/06/2014WO2014019870A1 Mask inspection method and mask inspection system for euv-masks
02/06/2014WO2014019675A1 Method for operating a microlithographic projection exposure apparatus
02/06/2014WO2014019617A1 Imaging optical unit for a projection exposure apparatus
02/06/2014WO2014019320A1 Photosensitive resin composition
02/06/2014WO2014019309A1 Mask plate and method for manufacturing color filter
02/06/2014WO2013186136A3 Lithographic apparatus and device manufacturing method
02/06/2014US20140038425 Methods of eliminating pattern collapse on photoresist patterns
02/06/2014US20140038415 Polymer-containing developer
02/06/2014US20140038112 Aqueous base-developable negative-tone films based on functionalized norbornene polymers
02/06/2014US20140038111 Processed substrate and method for manufacturing same
02/06/2014US20140038110 Imaging optical unit for a projection exposure apparatus
02/06/2014US20140038109 Antireflective coating composition and process thereof
02/06/2014US20140038108 Light Emitting Diode Apparatus for Curing an Emulsion
02/06/2014US20140038107 Method and System for E-Beam Lithography with Multi-Exposure
02/06/2014US20140038106 N-acyl-b-lactam derivative, macromolecular compound, and photoresist composition
02/06/2014US20140038105 Resin, resist composition and method for producing resist pattern
02/06/2014US20140038104 Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography
02/06/2014US20140038103 Lithography using photoresist with photoinitiator and photoinhibitor
02/06/2014US20140038102 Photoresist compositions and methods of forming photolithographic patterns
02/06/2014US20140038092 Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene metal complex compound or tautomer thereof
02/06/2014US20140038090 Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same
02/06/2014US20140038089 Self-polarized mask and self-polarized mask application
02/06/2014US20140038086 Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same
02/06/2014US20140036371 Optical device, manufacturing method thereof, and method of manufacturing master
02/06/2014US20140036251 Measurement apparatus, lithography apparatus, and method of manufacturing article
02/06/2014US20140036249 Stage apparatus, lithography apparatus, and method of manufacturing article
02/06/2014US20140036248 Exposure method, exposure apparatus, and method of manufacturing device
02/06/2014US20140036247 Illumination optical unit
02/06/2014US20140036246 Imaging optical system and projection exposure system for microlithography
02/06/2014US20140036244 Method of exposing a semiconductor wafer and exposure apparatus
02/06/2014US20140034759 Target supply device and target supply method
02/06/2014US20140034371 Pattern forming method, alkali-developable thermosetting resin composition, printed circuit board and manufacturing method thereof
02/06/2014US20140034209 Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof
02/06/2014DE102012213794A1 Maskeninspektionsverfahren und Maskeninspektionssystem für EUV-Masken Mask inspection process and mask inspection system for EUV masks
02/06/2014DE102012213671A1 Spiegelanordnung für eine EUV-Lithographieanlage und Verfahren zur Herstellung derselben Mirror assembly for an EUV lithography tool and method for making same
02/06/2014DE102012213515A1 Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage A method of operating a microlithographic projection exposure apparatus
02/05/2014EP2693271A1 Apparatus and method for measuring the dimensions of 1-dimensional and 0-dimensional nanostructures in real-time during epitaxial growth
02/05/2014EP2693270A1 Method for producing lithographic printing plate
02/05/2014EP2692028A1 Laser apparatus
02/05/2014EP2691813A1 Surface planarisation
02/05/2014EP2691812A1 Lithography system with differential interferometer module
02/05/2014EP2691811A1 Measurement of the position of a radiation beam spot in lithography
02/05/2014EP2691810A1 Photo-patternable and developable silesquioxane resins for use in device fabrication
02/05/2014EP2691809A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition
02/05/2014EP2691734A1 Alignment of an interferometer module for an exposure tool
02/05/2014EP2691733A1 Interferometer module
02/05/2014EP2691439A1 Antireflective coating composition and process thereof
02/05/2014CN1885165B Coating apparatus and method of fabricating liquid crystal display device using same
02/05/2014CN103562797A 光学元件 Optics
02/05/2014CN103562796A 树脂组合物及半导体元件基板 The resin composition and a semiconductor element substrate
02/05/2014CN103562795A Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
02/05/2014CN103562794A Method for producing lithographic printing plate
02/05/2014CN103562793A 感光性硅氧烷树脂组合物 The photosensitive resin composition of the silicone
02/05/2014CN103562245A Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same
02/05/2014CN103560083A Stripping process for non-refrigerating infrared FPA detector electrode patterning
02/05/2014CN103558741A Method for machining detection plate
02/05/2014CN103558740A Double-surface stepping photo-etching method for micro electro mechanical system (MEMS) wafer
02/05/2014CN103558739A Photoresist removing method and photolithography technique reworking method
02/05/2014CN103558738A Microlithographic projection exposure apparatus
02/05/2014CN103558737A Substrate holding device, exposure apparatus having the same and method for producing a device
02/05/2014CN103558736A Cleanup method for optics in immersion lithography
02/05/2014CN103558735A Photocurable thermosetting resin composition and printed wiring board using the same
02/05/2014CN103558734A 感光性树脂组合物和固化膜 The photosensitive resin composition and a cured film
02/05/2014CN103558713A Liquid crystal alignment device, liquid crystal alignment method, box aligning substrate and liquid crystal display device
02/05/2014CN103555003A Modified function material, blue photoresist material and color filter as well as preparation methods thereof and display device
02/05/2014CN103554494A Preparation method of ionic type negative photosensitive polyimide material
02/05/2014CN103554433A 固化性树脂组合物 The curable resin composition of the
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