G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2004
12/01/2004	EP1480738A1 Apparatus for treatment of light-sensitive biopolymers
12/01/2004	EP1324875A4 Seamless master and method of making same
12/01/2004	EP0951655B1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
12/01/2004	CN1552091A Coating device and coating method
12/01/2004	CN1552000A Removable optical pellicle
12/01/2004	CN1551998A Compact imaging head and high speed multi-head laser imaging assembly and method
12/01/2004	CN1551310A Method for manufacturing semiconductor, electrooptical device, integrated circuit and electronic device
12/01/2004	CN1551307A Method for manufacturing semiconductor and method for cleaning plasma etching device
12/01/2004	CN1551298A Pattern forming method and method for manufacturing seniconductor applying said method
12/01/2004	CN1551297A Thin membrane pattern forming method,device and its manufacturing method,electrooptical device and electronic instrument
12/01/2004	CN1551278A Thermosensitive transfer film and method of manufacturing display device
12/01/2004	CN1551169A 电子束记录衬底 Electron beam recorder substrate
12/01/2004	CN1550938A Recording material for holograms, manufacturing method thereof, recording medium for holograms, hologram recording method and hologram reproduction method
12/01/2004	CN1550914A Assembly comprising a sensor, a method therefor and a lithographic projection apparatus
12/01/2004	CN1550912A Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/01/2004	CN1550911A Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/01/2004	CN1550910A Method of characterising a process step and device manufacturing method
12/01/2004	CN1550909A Lithographic apparatus and device manufacturing method and device made therefrom
12/01/2004	CN1550908A Control system, lithographic apparatus, device manufacturing method and device manufactured thereby
12/01/2004	CN1550907A Lithographic apparatus and device manufacturing method and device made therefrom
12/01/2004	CN1550906A Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
12/01/2004	CN1550905A Lithographic apparatus and device manufacturing method
12/01/2004	CN1550904A Lithographic apparatus and device manufacturing method
12/01/2004	CN1550903A Surface processing apparatus
12/01/2004	CN1550902A Pattern generator mirror configurations
12/01/2004	CN1550900A Method and apparatus for providing optical proximity correction features to a reticle pattern for optical lithography
12/01/2004	CN1550899A Positive photoresist composition for discharge nozzle type coating process and anticorrosive pattern forming method
12/01/2004	CN1550898A Positive anticorrosive additive composition and anticorrosive pattern forming method
12/01/2004	CN1550897A Photoresist composition for multi-micro nozzle head coater
12/01/2004	CN1550896A Processes for preparing photoresist compositions and the product
12/01/2004	CN1550895A Negative type photosensitive resin composition containing a phenol-biphenylene resin
12/01/2004	CN1550894A Chemical amplification photo etching glue composition
12/01/2004	CN1550893A Solidified resin pattern forming method
12/01/2004	CN1550892A Photosensitive resin composition for image forming
12/01/2004	CN1550891A Colouring photosensitive resin composition
12/01/2004	CN1550890A Method for manufacturing lithographic pringting apparatus and equipment
12/01/2004	CN1550889A Multilayer photoresist system
12/01/2004	CN1550876A Projection exposing device
12/01/2004	CN1550875A Projecting exposure apparatus
12/01/2004	CN1550874A Projecting exposure apparatus
12/01/2004	CN1550872A Image recording method
12/01/2004	CN1550435A Recording material feeding device
12/01/2004	CN1550353A Method for manufacturing support body for lithographic plate and its support body
12/01/2004	CN1550283A Method for removing edge coated on substrate and coating said substrate, and the substrate thereof
12/01/2004	CN1550264A Base board coating device and base board coating method
12/01/2004	CN1178275C Three-D stereo mask
12/01/2004	CN1178260C Method for forming metal pattern on electronic element
12/01/2004	CN1177898C Photosensitive conductive paste
11/2004
11/30/2004	US6826743 Method for automatically correcting overlay alignment of a semiconductor wafer
11/30/2004	US6826738 Optimization of die placement on wafers
11/30/2004	US6826451 Lithography tool having a vacuum reticle library coupled to a vacuum chamber
11/30/2004	US6826442 Processing system including exposure apparatus, reticle stocker having sealing member with first and second gates, controller for controlling atmosphere in interior of sealing member, path for transferring reticle to and from stocker
11/30/2004	US6825988 Etched silicon diffraction gratings for use as EUV spectral purity filters
11/30/2004	US6825932 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
11/30/2004	US6825916 Reticle carrier with positioning cover
11/30/2004	US6825915 Alignment device
11/30/2004	US6825914 System for flushing at least one internal space of an objective
11/30/2004	US6825913 Microlithography; illumination system provides polarized light and magnesium fluoride is oriented with crystal principal axis in direction of optical axis
11/30/2004	US6825912 System for adjusting a photo-exposure time
11/30/2004	US6825635 Vibration isolator, device manufacturing apparatus and method, semiconductor manufacturing plant and method of maintaining device manufacturing apparatus
11/30/2004	US6825614 Short-arc discharge lamp
11/30/2004	US6825481 Exposure apparatus, control method thereof, and device manufacturing method using the same
11/30/2004	US6825261 Multilayer structure comprising at least one antistatic layer containing an organic (e.g., sulfonated polyaniline) or inorganic (e.g., carbon black) conductive material
11/30/2004	US6825156 Semiconductor process residue removal composition and process
11/30/2004	US6824958 Preparing a plurality of first photomasks including one or more resist masks; and transferring each pattern of said photomasks onto a second photomask by reduced projection exposure.
11/30/2004	US6824957 Resist composition having high transparency against short-wavelength light and high dry- etching resistance, capable of forming a resist pattern excellent in adhesion and resolution by means of alkali development
11/30/2004	US6824956 Addition polymer containing units of an adamantyl ester having hydroxy groups
11/30/2004	US6824955 Polymers, resist compositions and patterning process
11/30/2004	US6824954 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
11/30/2004	US6824953 Polymerizable compound having an ethylenic unsaturated bond, a methine dye, and a radical generator that interacts with the dye to generate a radical
11/30/2004	US6824952 Polydimethylglutarimide (pmgi) resin and at least one selected deep-uv absorbing molecule
11/30/2004	US6824951 Photoresist composition for resist flow process
11/30/2004	US6824949 Self-condensation of an o-aminophenolcarboxylic acid and reaction with bis-o-aminophenols along with dicarboxylic acid and acetylene compounds; high resistance against the diffusion of metals
11/30/2004	US6824948 Electron beam or X-ray negative-working resist composition
11/30/2004	US6824947 Formed from a phenol and dimethylolurea; planographic printing plate precursors to form plates that exhibit good durability, good exposure visual image property, and good solvent resistance especially to washing oil used in uv ink
11/30/2004	US6824933 Mask for manufacturing semiconductor devices, method for fabricating the same, and exposure method for the same
11/30/2004	US6824932 Self-aligned alternating phase shift mask patterning process
11/30/2004	US6824931 Verification photomask
11/30/2004	US6824930 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
11/30/2004	US6824879 Comprising silicon-based compound and incorporatable organic absorbing compound that absorbs light at a wavelength less than 375 nm, wherein one of the silicon or absorber compounds comprises an alkyl, an alkoxy, a ketone, or an azo group
11/30/2004	US6824858 Photocurable/thermosetting composition for forming matte film
11/30/2004	US6824616 Substrate processing method and substrate processing system
11/30/2004	US6824277 Optical beam guidance system and method for preventing contamination of optical components contained therein
11/30/2004	US6823791 Plate inverter for plate management system and method of operation
11/25/2004	WO2004102646A1 Exposure apparatus and method for manufacturing device
11/25/2004	WO2004102645A1 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
11/25/2004	WO2004102624A2 Unitary dual damascene process using imprint lithography
11/25/2004	WO2004102621A2 Supercritical fluid-based cleaning compositions and methods
11/25/2004	WO2004102279A2 Method of manufacturing an electronic device
11/25/2004	WO2004102278A2 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
11/25/2004	WO2004102277A2 Method providing an improved bi-layer photoresist pattern
11/25/2004	WO2004102276A2 Method for etching high aspect ratio semiconductor features using organic phot0-resist layers
11/25/2004	WO2004102275A1 Negative photoresist composition
11/25/2004	WO2004102274A2 Use of spin-on, photopatternable, interplayer dielectric materials and intermediate semiconductor device structure utilizing the same
11/25/2004	WO2004102273A2 Lighting system comprising an axicon module
11/25/2004	WO2004102272A2 Photoresist composition for deep uv and imaging process thereof
11/25/2004	WO2004102233A1 Diffraction element and projection objective comprising such an element
11/25/2004	WO2004102232A1 Blazed diffractive optical element and projection objective provided comprising an element of this type
11/25/2004	WO2004102230A1 Polarization-optimized axicon system, and an illuminating system for microlithographic projection system having such an axicon system
11/25/2004	WO2004102224A2 Axicon system and exposure system equipped with the same

1 ... 709 710 711 712 713 714 715 716 717 718 719 720 721 722 723 724 725 726 727 728 729 ... 1272