| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/02/2004 | US20040242798 Photoresist compositions and processes for preparing the same |
| 12/02/2004 | US20040242759 Bottom anti-reflective coating compositions comprising silicon containing polymers to improve adhesion towards photoresists |
| 12/02/2004 | US20040242016 Compositions for dissolution of low-k dielectric films, and methods of use |
| 12/02/2004 | US20040241996 Apparatus and method for preventing substrates from being contaminated by condensed liquid |
| 12/02/2004 | US20040241896 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
| 12/02/2004 | US20040241886 Method for exposing a peripheral area of a wafer and apparatus for performing the same |
| 12/02/2004 | US20040241600 Planographic printing plate material, printing plate and printing method |
| 12/02/2004 | US20040241596 Forming a resist film on a substrate; exposing an element formation region of resist film at a first exposure amount able to develop resist film via a mask; exposing an unexposed region other than the element formation region; developing resist film |
| 12/02/2004 | US20040241595 Detecting at least one parameter for the characterization of the mask,automatically selecting a stored correction data record from a correction database; measuring optical properties of a structure of the mask using a measuring system; combining measurement results; storing a measurement data record |
| 12/02/2004 | US20040241594 Method for removing color resist for exposure alignment |
| 12/02/2004 | US20040241593 Method of forming uniform features using photoresist |
| 12/02/2004 | US20040241592 Irradiating light onto a member having a modulation profile smaller than the wavelength of irradiated light and forming a distribution of optical near-field corresponding to surface of said member; introducing material gas to be used for a photochemical reaction; causing photochemical reaction |
| 12/02/2004 | US20040241591 Method for forming image through reaction development |
| 12/02/2004 | US20040241590 Forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer |
| 12/02/2004 | US20040241588 Method and apparatus of manufacturing reflector |
| 12/02/2004 | US20040241587 Providing a substrate having a layer; forming a photoresist layer;transferring a pattern into photoresist layer to expose layer;forming a thermal-compressive layer; heating thermal-compressive layer and photoresist layer to induce expansion |
| 12/02/2004 | US20040241584 having different storage characteristics at a plurality of discrete memory locations by providing a substrate with a surface portion having a linking group or charge storage group coupled thereto, each with a photocleavable protecting group |
| 12/02/2004 | US20040241583 Processless digitally imaged photopolymer elements using microspheres |
| 12/02/2004 | US20040241582 Method for high resolution patterning using low-energy electron beam, process for preparing nano device using the method |
| 12/02/2004 | US20040241580 Radiation-sensitive resin composition |
| 12/02/2004 | US20040241579 Positive resist material and pattern formation method using the same |
| 12/02/2004 | US20040241577 Resist lower layer film material and method for forming a pattern |
| 12/02/2004 | US20040241576 Negative resist material and method for forming resist pattern |
| 12/02/2004 | US20040241574 Polymer containing silicon and/or boron for (extreme) ultraviolet (EUV) lithography; isoprene and/or styrene polymers hydrosilated and/or hydroborated with organosilane, dimesitylborane, and or carboranecarboxylic acid; reactive ion etch resistance, transmission; doping substrates |
| 12/02/2004 | US20040241569 Maleic anhydride-alicyclic vinyl ether-(meth)acrylic ester terpolymer; photoacid generator; photolithography; well resolved images and patterns |
| 12/02/2004 | US20040241561 Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control |
| 12/02/2004 | US20040241558 Focus detection structure |
| 12/02/2004 | US20040241324 System for dispensing liquids |
| 12/02/2004 | US20040241320 Enhancing the inplane uniformity of the thickness of a coating film to improve throughput by applying coating liquid spirally, monitoring to detect uncoated regions, and applying a second coating liquid to fill the uncoated region |
| 12/02/2004 | US20040240922 Image recording apparatus and image recording method |
| 12/02/2004 | US20040240813 Pattern writing apparatus |
| 12/02/2004 | US20040240695 Hearing aid |
| 12/02/2004 | US20040240513 Stage with thermal expansion compensation |
| 12/02/2004 | US20040240506 DUV light source optical element improvements |
| 12/02/2004 | US20040240489 Laser device and exposure device using the same |
| 12/02/2004 | US20040240210 Optical projection system |
| 12/02/2004 | US20040240079 Optical system, exposure apparatus having the optical system and device producing method |
| 12/02/2004 | US20040240073 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system |
| 12/02/2004 | US20040240071 Projection optical system |
| 12/02/2004 | US20040240047 Catadioptric imaging system for broad band microscopy |
| 12/02/2004 | US20040239911 Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees of freedom of motion |
| 12/02/2004 | US20040239910 Stage device and control method therefor, exposure apparatus, and device manufacturing method |
| 12/02/2004 | US20040239909 Imaging apparatus |
| 12/02/2004 | US20040239908 Encapsulation; reacting anionic and cationic polymers; crosslinking using an aldehyde |
| 12/02/2004 | US20040239907 System and method for dose control in a lithographic system |
| 12/02/2004 | US20040239906 Exposure apparatus and device fabrication method |
| 12/02/2004 | US20040239905 Lithographic apparatus, system, method, computer program, and apparatus for height map analysis |
| 12/02/2004 | US20040239904 Exposure apparatus and exposure method capable of controlling illumination distribution |
| 12/02/2004 | US20040239903 Apparatus and method for projection exposure |
| 12/02/2004 | US20040239902 System and method to increase throughput in a dual substrate stage double exposure lithography system |
| 12/02/2004 | US20040239901 System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system |
| 12/02/2004 | US20040239900 Self-cleaning method for semiconductor exposure apparatus |
| 12/02/2004 | US20040239893 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
| 12/02/2004 | US20040239283 System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism |
| 12/02/2004 | US20040238762 Extreme ultraviolet light source |
| 12/02/2004 | US20040238758 Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/02/2004 | US20040238491 Fine-dimension masks and related processes |
| 12/02/2004 | US20040238486 Improve etching resistance of photoresist; forming protection layer which is insoluble in water containing developer; finer pattern formation |
| 12/02/2004 | US20040237998 FRAM capacitor stack clean |
| 12/02/2004 | US20040237880 Method for manufacturing an optical member formed of a fluoride crystal |
| 12/02/2004 | US20040237842 shearing/salt-kneading a halogenated phthalocyanine pigment with a yellow pigment of the disazo condensation, barbituric acid or azoquinolone series |
| 12/02/2004 | US20040237821 Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station |
| 12/02/2004 | DE10322393A1 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage Illumination system for a microlithography projection exposure apparatus |
| 12/02/2004 | DE10322376A1 Axiconsystem und Beleuchtungssystem damit Axiconsystem and lighting system so |
| 12/02/2004 | DE10322375A1 Polarisationsoptimiertes Axiconsystem und Beleuchtungssystem mit einem solchen Axiconsystem Optimized polarization Axiconsystem and lighting system with such Axiconsystem |
| 12/02/2004 | DE10321598A1 Beleuchtungssystem mit Axikon-Modul Lighting system with axicon module |
| 12/02/2004 | DE10321103A1 Verfahren zur Vermeidung von Kontamination und EUV-Lithographievorrichtung Procedures to prevent contamination and EUV lithography apparatus |
| 12/02/2004 | DE10319268A1 Diffraktiver Strahlteiler für Abbildungssysteme Diffractive beam splitter for imaging systems |
| 12/02/2004 | DE102004011504A1 Flüssigkeitsverarbeitungsvorrichtung und Flüssigkeitsverarbeitungsverfahren Fluid processing apparatus and liquid processing method |
| 12/01/2004 | EP1482541A2 Method of photolithographically forming narrow transistor gate elements |
| 12/01/2004 | EP1482375A2 Lithographic apparatus and device manufacturing method |
| 12/01/2004 | EP1482374A2 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 12/01/2004 | EP1482373A1 Lithographic apparatus and device manufacturing method |
| 12/01/2004 | EP1482372A1 Lithographic apparatus and device manufacturing method |
| 12/01/2004 | EP1482371A1 Method of calibrating a lithographic apparatus |
| 12/01/2004 | EP1482370A1 Substrate holder for lithographic apparatus |
| 12/01/2004 | EP1482369A1 Method and device for vibration control |
| 12/01/2004 | EP1482368A2 Exposure apparatus and device fabrication method |
| 12/01/2004 | EP1482367A2 System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system |
| 12/01/2004 | EP1482366A2 Maskless lithography using spatial light modulators |
| 12/01/2004 | EP1482365A2 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
| 12/01/2004 | EP1482364A2 Apparatus and method for projection exposure |
| 12/01/2004 | EP1482363A1 Lithographic apparatus |
| 12/01/2004 | EP1482362A1 Planographic printing plate material, printing plate and printing method |
| 12/01/2004 | EP1482361A1 Acid-degradable resin compositions containing ketene-aldehyde copolymer |
| 12/01/2004 | EP1482360A1 Photosensitive resin composition |
| 12/01/2004 | EP1482343A1 Optical projection system |
| 12/01/2004 | EP1481973A1 Heterocycle-bearing onium salts |
| 12/01/2004 | EP1481741A2 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 12/01/2004 | EP1481288A2 Reduced striae extreme ultraviolet lithographic elements, a method of manufacturing the same and a method of measuring striae |
| 12/01/2004 | EP1481287A2 Device, euv-lithographic device and method for preventing and cleaning contamination on optical elements |
| 12/01/2004 | EP1481286A2 Refractive projection lens with a middle part |
| 12/01/2004 | EP1481285A1 Fluorinated copolymers for microlithography |
| 12/01/2004 | EP1481284A1 Method of passivating of low dielectric materials in wafer processing |
| 12/01/2004 | EP1481283A1 Lithography pattern shrink process and articles |
| 12/01/2004 | EP1481282A1 Negative photoresists for short wavelength imaging |
| 12/01/2004 | EP1481276A1 Lighting system comprising a nested collector for annularly illuminating an exit pupil |
| 12/01/2004 | EP1481111A2 Aperture masks for circuit fabrication |
| 12/01/2004 | EP1480968A1 Thioxanthone derivatives, and their use as cationic photoinitiators |
| 12/01/2004 | EP1480929A2 Fluorine-containing compounds with high transparency in the vacuum ultraviolet |