| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/08/2004 | EP1483627A2 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same |
| 12/08/2004 | EP1483626A2 Refractive projection lens |
| 12/08/2004 | EP1483625A1 High-aperture projection lens |
| 12/08/2004 | EP1483624A1 Photosensitive element for use as flexographic printing plate |
| 12/08/2004 | EP1483623A2 Solvent resistent copolymers |
| 12/08/2004 | EP1483616A1 Optical system with birefringent optical elements |
| 12/08/2004 | EP1483614A2 Objective lens consisting of crystal lenses |
| 12/08/2004 | EP1483559A2 Moir method and measuring system for measuring the distortion of an optical imaging system |
| 12/08/2004 | EP1483310A1 Accelerators for cationic photopolymerization |
| 12/08/2004 | EP1483063A1 Method and device for the decontamination of optical surfaces |
| 12/08/2004 | EP1390309A4 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass |
| 12/08/2004 | EP1313620B1 Pretreated sheet product for lithographic plates |
| 12/08/2004 | CN1554119A Parallel, individually addressable probes for nanolithography |
| 12/08/2004 | CN1554111A Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
| 12/08/2004 | CN1554037A 感光树脂组合物 A photosensitive resin composition |
| 12/08/2004 | CN1553922A Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 12/08/2004 | CN1553372A Semitone mask coding method for producing microoptical element |
| 12/08/2004 | CN1553284A Wavelength or long wavelength optical contact approach nanometer photoetching optical apparatus |
| 12/08/2004 | CN1553283A Metal mask plate |
| 12/08/2004 | CN1553282A Method for forming photoresist layer without side vanes |
| 12/08/2004 | CN1553267A Planar displaying device and producing method thereof |
| 12/08/2004 | CN1553225A Primary microlens mask forming method |
| 12/08/2004 | CN1553224A Deep relief continuous nonspheric microlens high fidelity transferring method |
| 12/08/2004 | CN1553223A Preparing method for quadrpyramid microstructure array |
| 12/08/2004 | CN1553222A Continuous deep relief nonspheric microlens array manufacturing method |
| 12/08/2004 | CN1552589A Continuous microlens array amplifying displaying antifogery method |
| 12/08/2004 | CN1179398C Process for preparing low storage junctions of DRAM |
| 12/08/2004 | CN1179245C Projection exposure device and method |
| 12/08/2004 | CN1179244C Photopolymerizable thermosetting resin composition |
| 12/08/2004 | CN1178965C Organic antireflective coating polymer and antireflective paint composition containing said polymer and process for preparing same |
| 12/08/2004 | CN1178959C Quick photo-addressable substrates and photo-addressable side-group polymers having highly inducible double refraction |
| 12/08/2004 | CN1178902C New O-acyloxime photointiators |
| 12/08/2004 | CN1178763C Method for making miniature cutter and stereo microstructure |
| 12/07/2004 | US6829559 Methods and systems for determining a presence of macro and micro defects on a specimen |
| 12/07/2004 | US6829380 Optimization of OPC design factors utilizing an advanced algorithm on a low voltage CD-SEM system |
| 12/07/2004 | US6829279 Laser oscillating apparatus, exposure apparatus using the same and device fabrication method |
| 12/07/2004 | US6829261 Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation |
| 12/07/2004 | US6829107 Device for mounting an optical element, for example a lens element in a lens |
| 12/07/2004 | US6829099 Projection optical system and projection exposure apparatus |
| 12/07/2004 | US6829084 Ultraviolet and vacuum ultraviolet antireflection substrate |
| 12/07/2004 | US6829041 Projection optical system and projection exposure apparatus having the same |
| 12/07/2004 | US6829040 Lithography contrast enhancement technique by varying focus with wavelength modulation |
| 12/07/2004 | US6829039 Optical member for photolithography and method of evaluating the same |
| 12/07/2004 | US6829038 Exposure apparatus and exposure method |
| 12/07/2004 | US6829034 Exposure apparatus and device manufacturing method |
| 12/07/2004 | US6829022 Chuck for exposure apparatus |
| 12/07/2004 | US6828634 Semiconductor device with two types of FET's having different gate lengths and its manufacture method |
| 12/07/2004 | US6828574 Modulator driven photocathode electron beam generator |
| 12/07/2004 | US6828573 Electron beam lithography system |
| 12/07/2004 | US6828569 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 12/07/2004 | US6828542 System and method for lithography process monitoring and control |
| 12/07/2004 | US6828289 Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature |
| 12/07/2004 | US6828247 Method for etching organic film, method for fabricating semiconductor device and pattern formation method |
| 12/07/2004 | US6828244 Method and apparatus for high density nanostructures |
| 12/07/2004 | US6828085 Printing fine pattern and masking pattern overcoating substrate; exposure to light source |
| 12/07/2004 | US6828083 Comprising photoactive component and polymer that comprises groups reactive to crosslinking and photoacid-labile groups |
| 12/07/2004 | US6828082 Method to pattern small features by using a re-flowable hard mask |
| 12/07/2004 | US6828080 Pattern forming method and method of fabricating device |
| 12/07/2004 | US6828079 Chemical amplification type positive resist composition |
| 12/07/2004 | US6828078 Photoresist for use in optoelectronic and display fields; porosity; optical fibers |
| 12/07/2004 | US6828068 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 12/07/2004 | US6827979 Improving imaging resolution; coating with hydrophobic material that overcomes water condensation interference |
| 12/07/2004 | US6827973 Substrate processing method |
| 12/07/2004 | US6827782 Chemical treating apparatus |
| 12/07/2004 | CA2357296C Thermal transfer film comprising a reactive polymer composition for laser-induced coating |
| 12/02/2004 | WO2004105107A1 Exposure device and device manufacturing method |
| 12/02/2004 | WO2004105106A1 Exposure method, exposure device, and device manufacturing method |
| 12/02/2004 | WO2004105105A1 Stage apparatus, exposure apparatus, and method of producing device |
| 12/02/2004 | WO2004105096A2 Method of making barrier layers |
| 12/02/2004 | WO2004105093A2 Tetra-organic ammonium fluoride and hf in supercritical fluid for photoresist and residue removal |
| 12/02/2004 | WO2004105046A2 Scanning probe microscopy probe and method for scanning probe contact printing |
| 12/02/2004 | WO2004105010A1 Multi-layer structure and method of drawing microscopic structure therein |
| 12/02/2004 | WO2004104708A2 Seal and support structure for semiconductor wafer |
| 12/02/2004 | WO2004104707A2 Method and device for cleaning at least one optical component |
| 12/02/2004 | WO2004104706A1 Imaging member with microgel protective layer |
| 12/02/2004 | WO2004104705A1 Preparing imaging member with microgel protective layer |
| 12/02/2004 | WO2004104704A2 Lithographic method for producing microcomponents |
| 12/02/2004 | WO2004104703A1 Chemically amplified positive photo resist composition and method for forming resist pattern |
| 12/02/2004 | WO2004104702A1 Chemically amplified positive photo resist composition and method for forming resist pattern |
| 12/02/2004 | WO2004104701A1 Photosensitive structure for flexographic printing |
| 12/02/2004 | WO2004104700A1 Pattern dimension correction device and method, photo mask, and test photo mask |
| 12/02/2004 | WO2004104699A1 Correction of pattern dimension |
| 12/02/2004 | WO2004104698A2 Dielectric materials to prevent photoresist poisoning |
| 12/02/2004 | WO2004104654A1 Depolarization element, illumination optical device, exposure device, and exposure method |
| 12/02/2004 | WO2004104051A1 Bimolecular photoinitiator systems |
| 12/02/2004 | WO2004103671A1 Method of decorating surface of mold and mold |
| 12/02/2004 | WO2004089995A3 Photopolymerization systems and their use |
| 12/02/2004 | WO2004083962A3 Photoresist composition for the formation of thick films |
| 12/02/2004 | WO2004081662A3 Development enhancement of radiation-sensitive elements |
| 12/02/2004 | WO2004053596A3 Method for adjusting a desired optical property of a positioning lens and microlithographic projection exposure system |
| 12/02/2004 | WO2004021088A3 Lithographic method for small line printing |
| 12/02/2004 | US20040243967 Semiconductor design layout pattern formation method and graphic pattern formation unit |
| 12/02/2004 | US20040243320 Visual inspection and verification system |
| 12/02/2004 | US20040242901 Sulfoniun salts, methods for their preparation and use thereof as phtoinitiators for radiation curable systems |
| 12/02/2004 | US20040242867 Photoinitiators; basic catalyst; absorption of light |
| 12/02/2004 | US20040242839 Waterproofing, heat resistance, radiation transparent; encapsulating electronics |
| 12/02/2004 | US20040242821 comprises pendant polysilsequioxanes which improve alkali solubility under the action of an acid; photoresists have improved resistance to etching |
| 12/02/2004 | US20040242820 preparing transparent films at 157 nm; solutions of perfluorodioxole polymers with stable, nonionic end groups in perfluorinated solvents are sintered and pelletized for infrared spectrum analysis |
| 12/02/2004 | US20040242818 Mixture of cationic polymer, sulfonium acid generator and odor reducer |
| 12/02/2004 | US20040242813 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |