| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/14/2004 | US6830866 Hydrogenated product of ring- opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance |
| 12/14/2004 | US6830865 Blend of water insoluble polymer and phenol compound |
| 12/14/2004 | US6830861 Photosensitivity; sharp images; high contrast |
| 12/14/2004 | US6830853 Providing critical dimension control; working relatively large areas of opaque material |
| 12/14/2004 | US6830850 Interferometric lithography using reflected light from applied layers |
| 12/14/2004 | US6830779 Coating method for coating liquid |
| 12/14/2004 | US6830646 Radiation curable resin layer |
| 12/14/2004 | US6830389 Parallel plate development with the application of a differential voltage |
| 12/14/2004 | US6829988 Nanoimprinting apparatus and method |
| 12/09/2004 | WO2004107418A1 Method for removing photoresist in semiconductor manufacturing process |
| 12/09/2004 | WO2004107417A1 Exposure method, exposure device, and device manufacturing method |
| 12/09/2004 | WO2004107416A1 Exposure apparatus and device-producing method |
| 12/09/2004 | WO2004107415A1 Position information measuring method and device, and exposure method and system |
| 12/09/2004 | WO2004107413A2 Plasma ashing apparatus and endpoint detection process |
| 12/09/2004 | WO2004107407A2 Method of making information storage devices by molecular photolithography |
| 12/09/2004 | WO2004107379A1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 12/09/2004 | WO2004107057A1 Thinner composition for removing photosensitive resin |
| 12/09/2004 | WO2004107056A1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
| 12/09/2004 | WO2004107055A2 Electrode arrangement, and use thereof |
| 12/09/2004 | WO2004107054A2 Projection lighting installation |
| 12/09/2004 | WO2004107053A1 Positive photoresist composition for spinless (slit) coating |
| 12/09/2004 | WO2004107052A1 Negative photoresist composition for spinless (slit) coating |
| 12/09/2004 | WO2004107051A2 Photoacid generators with perfluorinated multifunctional anions |
| 12/09/2004 | WO2004107048A2 Microlithographic projection exposure system |
| 12/09/2004 | WO2004107047A1 Local flare correction |
| 12/09/2004 | WO2004107045A2 Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
| 12/09/2004 | WO2004107042A1 Method for evaluating the effects of multiple exposure processes in lithography |
| 12/09/2004 | WO2004107037A1 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
| 12/09/2004 | WO2004107011A1 Projection optical system, and exposure apparatus and exposure method |
| 12/09/2004 | WO2004106431A2 Curable polymer compound |
| 12/09/2004 | WO2004095135A3 Optical arrangement of autofocus elements for use with immersion lithography |
| 12/09/2004 | WO2004092801A3 Catadioptric reduction lens comprising a polarisation beam splitter |
| 12/09/2004 | WO2004069959A3 Process for refining crude resin for resist |
| 12/09/2004 | WO2004039554A3 Lithographic method for forming mold inserts and molds |
| 12/09/2004 | WO2004036311A3 Anti-reflective compositions comprising triazine compounds |
| 12/09/2004 | WO2004029721A3 Method and device for producing exposed structures |
| 12/09/2004 | WO2004027518A3 A method for the removal of an imaging layer from a semiconductor substrate stack |
| 12/09/2004 | WO2004018908A3 Mems-based fluid valve device |
| 12/09/2004 | US20040250233 A die with text deposited upon the die uses semiconductor processing techniques during fabrication, included in the die are a substrate, a first paragraph in contact with the substrate, a second paragraph in contact with the substrate and aligned with the first paragraph in a column |
| 12/09/2004 | US20040249181 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 12/09/2004 | US20040249099 Polymerized reactive monomers can form strong adhesive bonds between substrates, adhesive bonds are water and humidity resistant, heat resistant, impact and peel resistant and can sustain large loads and stresses, as industrial adhesives, medical and surgical adhesives and optical fibre coating |
| 12/09/2004 | US20040249081 Curable polymer and thiol compound |
| 12/09/2004 | US20040249040 Ceramic multilayer composite with inorganic particles having surface areas with photolithigraphic process for stacking |
| 12/09/2004 | US20040248752 Cleaning solution used in process of fabricating semiconductor device |
| 12/09/2004 | US20040248424 Compositions for dissolution of low-k dielectric film, and methods of use |
| 12/09/2004 | US20040248329 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 12/09/2004 | US20040248147 Biopolymer support for use in genomics, gene expression analysis, sequencing, DNA fingerprinting and mapping biological macromolecules |
| 12/09/2004 | US20040248048 Barrier rib of plasma display panel and forming method thereof |
| 12/09/2004 | US20040248047 Method of forming thin-film pattern |
| 12/09/2004 | US20040248046 Method for fabricating a patterned layer on a semiconductor substrate |
| 12/09/2004 | US20040248045 for forming thin line portion having a line width thinner than a minimum line width which can be optically resolved by a projection exposure system by slimming a line width of a pattern transferred on a semiconductor substrate |
| 12/09/2004 | US20040248043 Exposure method, exposure apparatus and device manufacturing method |
| 12/09/2004 | US20040248042 Method of forming fine pattern |
| 12/09/2004 | US20040248039 Photoresist compositions and processes for preparing the same |
| 12/09/2004 | US20040248037 Composition for actinic energy ray and method of forming pattern |
| 12/09/2004 | US20040248035 resin that increases solubility in an alkali developing solution by the action of an acid, acid generator, non-ionic cyclic ketone compound; improved PED stability, improved line edge roughness, improved profile, improved sensitivity and improved resolution |
| 12/09/2004 | US20040248034 Compositions and methods of use thereof |
| 12/09/2004 | US20040248033 Method for forming photoresist pattern and photoresist laminate |
| 12/09/2004 | US20040248032 have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoresists that comprise such polymers; component of resists imaged at short wavelengths |
| 12/09/2004 | US20040248031 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
| 12/09/2004 | US20040248030 Copolymer of an unsaturated carboxylic acid, an unsaturated carboxylic anhydride, an unsaturated epoxy group, and an olefinically unsaturated compound; and a 1,2-quinonediazide compound; flatness, transparency, developing performance, residual film rate, chemical resistance, heat resistance |
| 12/09/2004 | US20040248029 uses the principle of repellency between an aqueous phase that contains various types of highly diluted substances and an ink that comprises greasy and sticky substances, such as for example resins, oils and pigments of different kinds |
| 12/09/2004 | US20040248021 Reduction of imaging artifacts in a platesetter having a diffractive modulator |
| 12/09/2004 | US20040248020 Exposure mask and pattern exposure method |
| 12/09/2004 | US20040248017 Substrate for photomask, photomask blank and photomask |
| 12/09/2004 | US20040247908 Dry film; polyimides; mixture containing sulfur compound |
| 12/09/2004 | US20040247900 Antireflective film material, and antireflective film and pattern formation method using the same |
| 12/09/2004 | US20040247891 Multi-layer structure and method of drawing microscopic structure therein, optical disc master and method of fabricating the same using the multi-layer structure, and optical disc manufactured using the optical disc master |
| 12/09/2004 | US20040247692 Poviding an aspherical lens having an aspherical surface and an opposite flat surface; defining a multiple-step grating in the flat surface. |
| 12/09/2004 | US20040247361 Lithographic apparatus, substrate holder and method of manufacturing |
| 12/09/2004 | US20040247077 X-ray exposure method |
| 12/09/2004 | US20040246587 Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment |
| 12/09/2004 | US20040246482 Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay |
| 12/09/2004 | US20040246459 Lithographic support structure |
| 12/09/2004 | US20040246458 Lithographic linear motor, lithographic apparatus, and device manufacturing method |
| 12/09/2004 | US20040246456 Exposure apparatus |
| 12/09/2004 | US20040246455 Alignment apparatus and exposure apparatus |
| 12/09/2004 | US20040246454 Projecting exposure apparatus |
| 12/09/2004 | US20040246218 Manufacturing method of color wheel, and color wheel fabricated thereby and incorporated in color wheel assembly and image display apparatus |
| 12/09/2004 | US20040246012 Article transfer system |
| 12/09/2004 | US20040245956 Methods and apparatus for positioning a substrate relative to a support stage |
| 12/09/2004 | US20040245669 Method of producing resin molded product |
| 12/09/2004 | US20040245618 Integrated circuit and method for fabricating an integrated circuit |
| 12/09/2004 | US20040245439 Optical imaging systems and methods using polarized illumination and coordinated pupil filter |
| 12/09/2004 | US20040245213 Process for making circuit board or lead frame |
| 12/09/2004 | US20040244963 Heat pipe with temperature control |
| 12/09/2004 | US20040244818 System and method for cleaning of workpieces using supercritical carbon dioxide |
| 12/09/2004 | US20040244620 Plate-making method, plate-making apparatus used in such plate-making method, and image recording material |
| 12/09/2004 | US20040244619 Planographic printing plate precursor |
| 12/09/2004 | DE10343313A1 Mask unit for optical system, especially for device for wave front measurement of microlithographic projection lens, comprises mask structure layer on support which is heat-conducting in region next to mask structure layer |
| 12/09/2004 | DE10323664A1 Microlithography projection illumination device incorporates a separate radiation sensor for measuring radiation that has traveled through the same optical system as useful radiation to permit regulation and correction |
| 12/09/2004 | DE10323365A1 Vorrichtung zur Herstellung geprägter Substrate Device for producing embossed substrates |
| 12/09/2004 | DE10322239A1 Geblazetes diffraktives optisches Element sowie Projektionsobjektiv mit einem solchen Element Blazed diffractive optical element and projection lens with such an element |
| 12/09/2004 | DE102004002238A1 Verfahren zum Vereinzeln von Wafern A method for separating wafers |
| 12/08/2004 | EP1484756A1 Optical information medium |
| 12/08/2004 | EP1484646A2 Method and apparatus for realising a switchable optical aperture |
| 12/08/2004 | EP1484645A1 Composition for forming anti-reflection coating |
| 12/08/2004 | EP1484644A2 Mould, pattern of nano wires, multiplexer/demultiplexer and method of making same |
| 12/08/2004 | EP1484366A1 Treated pigment, use thereof, and compound for treating pigment |
| 12/08/2004 | EP1483628A1 Full phase shifting mask in damascene process |