| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/16/2004 | US20040253547 Pattern formation method |
| 12/16/2004 | US20040253546 Method for manufacturing a diffuser for a backlight module |
| 12/16/2004 | US20040253545 Microfabrication methods and devices |
| 12/16/2004 | US20040253542 Novel positive photosensitive resin compositions |
| 12/16/2004 | US20040253541 Photoresist composition having a high heat resistance |
| 12/16/2004 | US20040253540 Exposure to alkaline developer; flexible, soldering heat resistance |
| 12/16/2004 | US20040253538 Positive resist composition |
| 12/16/2004 | US20040253537 Novel photosensitive resin compositions |
| 12/16/2004 | US20040253536 Overcoating metal particles with thiol or isocyanate compound |
| 12/16/2004 | US20040253535 Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images |
| 12/16/2004 | US20040253532 crosslinkable acetyl alginate modified with an epoxy ether or carboxylic ether light-absorber; crosslinking agent is an aminoplast, isocyanate, an allyl compound or allyl homo- or copolymer; semiconductor thin films; photolithography |
| 12/16/2004 | US20040253525 Photomask correcting method and manufacturing method of semiconductor device |
| 12/16/2004 | US20040253524 Substrate with light shielding film; measurement flatness of substrate; calibration; forming pattern ; optical images |
| 12/16/2004 | US20040253523 Embedded bi-layer structure for attenuated phase shifting mask |
| 12/16/2004 | US20040253461 Etching selectivity; using antireflecvtivity as hardmask; polysiloxane copolymer having a light-absorbing group, and acid generator and solvent; lithography |
| 12/16/2004 | US20040253426 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 12/16/2004 | US20040253380 Substrate processing system, coating apparatus, and coating method |
| 12/16/2004 | US20040253005 Sheet body holding device |
| 12/16/2004 | US20040252740 Laser gas replenishment method |
| 12/16/2004 | US20040252287 Reaction frame assembly that functions as a reaction mass |
| 12/16/2004 | US20040252181 Imaging device for a printing form and method for arranging optical components in the imaging device |
| 12/16/2004 | US20040252180 Pixel position specifying method, method of correcting image offset, and image forming device |
| 12/16/2004 | US20040251775 Apparatus to control displacement of a body spaced-apart from a surface |
| 12/16/2004 | US20040251430 Method for high precision printing of patterns |
| 12/16/2004 | US20040251429 Adjustable lithography blocking device and method |
| 12/16/2004 | US20040250945 Method for and apparatus for bonding patterned imprint to a substrate by adhering means |
| 12/16/2004 | US20040250839 Dual outlet nozzle for the combined edge bead removal and backside wash of spin coated wafers |
| 12/16/2004 | US20040250835 Compositions for dissolution of low-k dielectric films, and methods of use |
| 12/16/2004 | US20040250776 Sample-setting moving stage, manufacturing apparatus for circuit pattern, and inspection apparatus for circuit pattern |
| 12/16/2004 | US20040250720 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 12/16/2004 | DE10324796A1 Facetted mirror in illuminators for projection illumination installations in microlithography, using radiation in extreme UV range under ultra high vacuum (UHV) conditions |
| 12/16/2004 | DE10324613A1 Elektrodenanordnung und deren Verwendung Electrode assembly and their use |
| 12/16/2004 | DE10323185A1 Adjustment marker for mask or reticle in semiconductor exposure apparatus, has grating-like arrangement of sub-structural elements on long side of structural element |
| 12/16/2004 | DE10322854A1 Apparatus for rinsing a lens such as a projector lens in a semiconductor manufacture system having a gas tight cut off valve controlled by a pressure sensor |
| 12/16/2004 | DE10322238A1 Diffraktives optisches Element sowie Projektionsobjektiv mit einem solchen Element A diffractive optical element and projection lens with such an element |
| 12/16/2004 | CA2525412A1 Novel surface-active polysiloxane photoinitiators |
| 12/16/2004 | CA2467873A1 Imaging device for a printing form and method for arranging optical components in the imaging device |
| 12/15/2004 | EP1486830A2 Device manufacturing method |
| 12/15/2004 | EP1486829A2 Stage system, exposure apparatus, and device manufacturing method |
| 12/15/2004 | EP1486828A2 Lithographic apparatus and device manufacturing method |
| 12/15/2004 | EP1486827A2 Lithographic apparatus and device manufacturing method |
| 12/15/2004 | EP1486826A2 Pixel position specifying method, method of correcting image offset, and image forming device |
| 12/15/2004 | EP1486825A1 Supporting device, lithographic projection apparatus and device manufacturing method using a supporting device and a position control system arranged for use in a supporting device |
| 12/15/2004 | EP1486824A1 A movable stage system for in a lithographic projection apparatus, lithographic projection apparatus and device manufacturing method |
| 12/15/2004 | EP1485949A2 Novel planarization method for multi-layer lithography processing |
| 12/15/2004 | EP1485944A1 Laser assisted direct imprint lithography |
| 12/15/2004 | EP1485763A1 Method and apparatus for printing large data flows |
| 12/15/2004 | EP1485762A2 Device for manipulation of the angular position of an object relative to a fixed structure |
| 12/15/2004 | EP1485761A2 Device for exposing substrate materials |
| 12/15/2004 | EP1485760A1 Refractive projection objective for immersion lithography |
| 12/15/2004 | EP1485759A2 Grating element for filtering wavelengths = 100nm |
| 12/15/2004 | EP1485758A1 A method for fabricating a structure for a microelectromechanical systems (mems) device |
| 12/15/2004 | EP1485757A1 METHOD OF PRODUCING AN ETCH−RESISTANT POLYMER STRUCTURE USING ELECTRON BEAM LITHOGRAPHY |
| 12/15/2004 | EP1485756A2 Method of forming a pattern of sub-micron broad features |
| 12/15/2004 | EP1203257B1 Scanning interferometric near-field confocal microscopy |
| 12/15/2004 | EP1200448B1 Organo-silicon compounds and their use as photoinitiators |
| 12/15/2004 | EP0938409B1 Printing plate precursor comprising a laser imageable tuned optical cavity thin film |
| 12/15/2004 | EP0916683B1 Light-absorbing polymer, composition forming light-absorbing coatings, light-absorbing coatings, and antireflection coating made by using the same |
| 12/15/2004 | CN2664028Y Shading device of working plate in exposure procedure |
| 12/15/2004 | CN1555510A Etching method and composition for forming etching protective layer |
| 12/15/2004 | CN1555503A Method for apodizing a planar waveguide grating |
| 12/15/2004 | CN1555502A Retardation element made from cubic crystal and an optical system therewith |
| 12/15/2004 | CN1555500A Photolithographic method and uv transmitting fluoride crystals with minimized spatial dispersion |
| 12/15/2004 | CN1555499A Photolithographic uv transmitting mixed fluoride crystal |
| 12/15/2004 | CN1555409A Improved post plasma ashing wafer cleaning formulation |
| 12/15/2004 | CN1555405A Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition |
| 12/15/2004 | CN1555314A 印刷板 Printing plates |
| 12/15/2004 | CN1554988A Exposure method for once scanning two common exposure areas |
| 12/15/2004 | CN1554987A Printing and carving process for preparing pattern of minimum size in nano level |
| 12/15/2004 | CN1554986A Ultraviolet exposing machine and its exposure automatic control method and its device |
| 12/15/2004 | CN1554959A Light sensitive resin composition for color filter |
| 12/15/2004 | CN1180315C Method for reducing optical proximity effect |
| 12/15/2004 | CN1180314C Photoimageable compositions having improved stripping properties in aqueous alkaline solutions and its dry film anti-corrosion agent |
| 12/15/2004 | CN1180313C Phase error detection pattenr and its use |
| 12/15/2004 | CN1180312C Process for preparing nano metal sulfide as physically developing nucleus |
| 12/15/2004 | CN1180293C Back board structure for silicon silicon base liquid srystal |
| 12/15/2004 | CN1180286C Torsion-arm type static-electric driven switch of inclined electrode str4ucture and its making method |
| 12/14/2004 | US6832045 Exposure device |
| 12/14/2004 | US6831997 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 12/14/2004 | US6831794 Objective with at least one aspheric lens |
| 12/14/2004 | US6831768 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
| 12/14/2004 | US6831766 Projection exposure apparatus using wavefront detection |
| 12/14/2004 | US6831744 Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method |
| 12/14/2004 | US6831731 Projection optical system and an exposure apparatus with the projection optical system |
| 12/14/2004 | US6831730 Optical magnification adjustment system and projection exposure device |
| 12/14/2004 | US6831291 Process for producing alternate striped electrode array in which transparent electrodes alternate with opaque electrodes, based on single mask designed for the opaque electrodes in self-aligned manner |
| 12/14/2004 | US6831285 Lithographic apparatus, magnetic support for use therein, device manufacturing method, and device manufactured thereby |
| 12/14/2004 | US6831281 Methods and devices for detecting and canceling magnetic fields external to a charged-particle-beam (CPB) optical system, and CPB microlithography apparatus and methods comprising same |
| 12/14/2004 | US6831278 System and method for electron beam irradiation |
| 12/14/2004 | US6831260 Electron beam exposure apparatus, reduction projection system, and device manufacturing method |
| 12/14/2004 | US6831258 Heating device, method for evaluating heating device and pattern forming method |
| 12/14/2004 | US6831048 Detergent composition |
| 12/14/2004 | US6831018 Method for fabricating semiconductor device |
| 12/14/2004 | US6830874 Method for making lithographic printing plate |
| 12/14/2004 | US6830872 Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound |
| 12/14/2004 | US6830871 Chemical amplification type resist composition |
| 12/14/2004 | US6830870 Acetal protected polymers and photoresists compositions thereof |
| 12/14/2004 | US6830869 Copolymer conatining vinylsilfonic compound and hydroxystyrene compound with acid generators |
| 12/14/2004 | US6830868 Useful as a chemically amplified resist responding to active radiation, for example ultraviolet rays such as a KrF excimer laser, ArF excimer laser, and F2 excimer laser |
| 12/14/2004 | US6830867 Positive photosensitive composition |