Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/23/2004 | US20040256542 Optical tweezer device |
12/23/2004 | US20040256358 Method for releasing resist |
12/23/2004 | US20040256357 Supplying a process gas of CH3F, hydrogen gas and oxygen to the plasma processing chamber,generating a plasma; selectively etching a carbon-rich layer relative to the inorganic layer |
12/23/2004 | US20040256047 Method for correcting surface shape |
12/23/2004 | US20040255974 Equipment cleaner |
12/23/2004 | US20040255886 Method, control unit and program code for a control unit for controlling a camshaft control device |
12/23/2004 | US20040255676 Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
12/23/2004 | DE10325768A1 Beschichtungssystem für Glasoberflächen, Verfahren zu dessen Herstellung und dessen Anwendung A coating system for glass surfaces, to processes for its preparation and its application |
12/23/2004 | DE10324206A1 Projektionsbelichtungsanlage Projection exposure apparatus |
12/23/2004 | DE10323350A1 Lithographisches Verfahren zur Herstellung von Mikrobauteilen Lithographic method for producing microcomponents |
12/23/2004 | DE10319182A1 Verfahren und Anordnung zur Bestimmung der Fokusposition bei der Abbildung einer Probe Method and apparatus for determining the focal position in the imaging of a sample |
12/23/2004 | CA2529329A1 A method and an apparatus for manufacturing an electronic thin-film component and an electronic thin-film component |
12/23/2004 | CA2500176A1 Multiphoton photosensitization method |
12/22/2004 | EP1489555A1 Laser printer |
12/22/2004 | EP1489464A2 Method for reducing pattern dimension in a photoresist layer |
12/22/2004 | EP1489463A2 Method for reducing pattern dimension in a photoresist layer |
12/22/2004 | EP1489462A2 Immersion photolithography system comprising microchannel nozzles |
12/22/2004 | EP1489461A1 Lithographic apparatus and device manufacturing method |
12/22/2004 | EP1489460A2 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer |
12/22/2004 | EP1489459A1 Positive resist composition and method of forming pattern using the same |
12/22/2004 | EP1489449A1 Spatial light modulator |
12/22/2004 | EP1488286A1 Ph buffered compositions for cleaning semiconductor substrates |
12/22/2004 | EP1488285A1 Processless digitally imaged printing plate using microspheres |
12/22/2004 | EP1488284A2 Photomask and method for photolithographic patterning of a substrate by use of phase shifted assist features |
12/22/2004 | EP1487888A2 Polymerisable composition |
12/22/2004 | EP1487885A1 A novel process for producing anhydride-containing polymers for radiation sensitive compositions |
12/22/2004 | EP1297049B1 Accelerators for cationic polymerization catalyzed by iron-based catalysts |
12/22/2004 | EP1283991A4 Positive-working, infrared-sensitive lithographic printing plate and method of imaging |
12/22/2004 | EP1196788B1 Merged-mask micro-machining process |
12/22/2004 | EP0809814B1 Arbitrarily wide lens array with an image field to span the width of a substrate |
12/22/2004 | CN2665762Y Plastic-aluminum composite plate base precoated sensitive plate |
12/22/2004 | CN1556939A 正感光性聚酰亚胺树脂组合物 Positive photosensitive polyimide resin composition |
12/22/2004 | CN1556443A Preparation method of surface plasma resonance image analysis gold film spot array |
12/22/2004 | CN1556442A Binary optica device grey scale changing mask method and device for making |
12/22/2004 | CN1556159A Liquid state photo sensitive insulating ink used for cascade circuit board |
12/22/2004 | CN1181520C Method and device for regeneration of waste solvent |
12/22/2004 | CN1181398C Support for lithographic printing and original plate of lithographic printing using the support |
12/22/2004 | CN1181397C Bottom antireflective coating contg. arylhydrozo dye and its method for forming image |
12/22/2004 | CN1181145C Welding-resistant low-alkaline ink for developing and photosensitive imaging |
12/22/2004 | CN1181109C Composition and polymer for anti-reflection coating and preparation method thereof, and method for forming film pattern |
12/22/2004 | CN1180750C Method for making arteria coronaria undercarriadge |
12/21/2004 | US6834210 Substrate processing system and substrate processing method |
12/21/2004 | US6834158 Pinhole defect repair by resist flow |
12/21/2004 | US6834098 X-ray illumination optical system and X-ray reduction exposure apparatus |
12/21/2004 | US6833949 Projection optical photolithography systems that utilize the vacuum ultraviolet wavelengths of light below 240 nm provide smaller feature dimensions |
12/21/2004 | US6833908 Computer architecture for and method of high-resolution imaging using a low-resolution image transducer |
12/21/2004 | US6833907 Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
12/21/2004 | US6833906 Projection exposure apparatus, and device manufacturing method using the same |
12/21/2004 | US6833905 Illumination apparatus, projection exposure apparatus, and device fabricating method |
12/21/2004 | US6833904 Exposure apparatus and method of fabricating a micro-device using the exposure apparatus |
12/21/2004 | US6833903 Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method |
12/21/2004 | US6833854 Method for high precision printing of patterns |
12/21/2004 | US6833462 Process for preparing acrylate compound |
12/21/2004 | US6833393 Curable composition, cured coating film and coated substrate |
12/21/2004 | US6833388 Adamantane derivative |
12/21/2004 | US6833326 Method for forming fine patterns in semiconductor device |
12/21/2004 | US6833303 Method for forming semiconductor device |
12/21/2004 | US6833234 Modulating radiation exposure of multi-layer resist; data processing |
12/21/2004 | US6833231 Toughened stereolithographic resin compositions |
12/21/2004 | US6833230 Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same |
12/21/2004 | US6833225 Forming uniform layer of hydrophobic substance on surface of printing plate precursor having titanium dioxide; ultraviolet radiating to form hydrophilic images |
12/21/2004 | US6833224 Metal film formed from organometallic compound; combustion |
12/21/2004 | US6833223 Multilayer-film reflective mirrors and optical systems comprising same |
12/21/2004 | US6833221 Method and apparatus for proper ordering of registration data |
12/21/2004 | US6832863 Substrate treating apparatus and method |
12/21/2004 | US6832553 Printing method of planographic printing plate and planographic printing plate processed by this method |
12/21/2004 | US6832552 Method of automated setting of imaging and processing parameters |
12/16/2004 | WO2004109788A1 Removing agent composition and removing/cleaning method using same |
12/16/2004 | WO2004109780A1 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method |
12/16/2004 | WO2004109779A1 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate |
12/16/2004 | WO2004109778A1 Mutilayer film reflector and x-ray exposure system |
12/16/2004 | WO2004109777A1 Exposure method and device, device manufacturing method, and device |
12/16/2004 | WO2004109757A2 Heat pipe with temperature control |
12/16/2004 | WO2004109405A2 Device for generation of and/or influencing electromagnetic radiation from a plasma |
12/16/2004 | WO2004109404A1 Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same |
12/16/2004 | WO2004109403A1 Photosensitive resin composition, and electronic component and display using same |
12/16/2004 | WO2004109402A1 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate |
12/16/2004 | WO2004109401A1 Process for producing structure, structure thereof, and magnetic recording medium |
12/16/2004 | WO2004109400A2 Novel photosensitive resin compositions |
12/16/2004 | WO2004109357A1 Optical element holding device, lens barrel, exposing device, and device producing method |
12/16/2004 | WO2004108846A2 Coating system for glass surfaces, method for the production and use thereof |
12/16/2004 | WO2004108799A1 Novel surface-active polysiloxane photoinitiators |
12/16/2004 | WO2004108780A1 Resin for photoresist composition, photoresist composition and method for forming resist pattern |
12/16/2004 | WO2004108777A1 Bottom anti-reflective coating compositions comprising silicon containing polymers to improve adhesion towards photoresists |
12/16/2004 | WO2004108769A2 Composition and method of use thereof |
12/16/2004 | WO2004108414A2 Lithographic printing plate system and method for manufacturing the plate system |
12/16/2004 | WO2004108413A2 Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station |
12/16/2004 | WO2004108252A1 Filter apparatus, exposure apparatus, and device-producing method |
12/16/2004 | WO2004097517B1 Inkjet printhead nozzle plate |
12/16/2004 | WO2004079451A3 Method for creating lithophane-type images from digital images |
12/16/2004 | WO2004055607A3 Apparatus for processing an object with high position accurancy |
12/16/2004 | US20040255305 Method of forming a pattern of sub-micron broad features |
12/16/2004 | US20040254394 Novel tertiary alcohol compounds having alicyclic structure |
12/16/2004 | US20040253832 Compositions for dissolution of low-k dielectric films, and methods of use |
12/16/2004 | US20040253815 Method for forming a conductive layer |
12/16/2004 | US20040253553 Measuring masking pattern; calibration; stimulating optical intensity distribution |
12/16/2004 | US20040253551 Hot plate; support pins; pattern forming; antireflective and photoresist film; measurement to monitoring pattern; calibration |
12/16/2004 | US20040253550 treating undeveloped photoresist with supercritical carbon dioxide to swell the photoresist; and controllably releasing the carbon dioxide from the photoresist; reduces or dissolves polymer aggregates in the photoresist |
12/16/2004 | US20040253549 Device manufacture method |
12/16/2004 | US20040253548 Mixture of chemically amplified photoresist, acid generator and lactone |