| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/28/2004 | US6835529 Polymer having butadiene sulfone repeating unit and resist composition comprising the same |
| 12/28/2004 | US6835528 Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties |
| 12/28/2004 | US6835527 Chemical amplifying type positive resist composition |
| 12/28/2004 | US6835526 Photosensitive compositions |
| 12/28/2004 | US6835525 Polymer, resist composition and patterning process |
| 12/28/2004 | US6835524 Acrylic fluorinated polymer |
| 12/28/2004 | US6835511 Defining multiple position-measurement marks on the reticle; using a reticle-inspection device detecting respective positional coordinates of marks on the reticle; mounting reticle in the microlithography apparatus and detecting |
| 12/28/2004 | US6835510 Used for Forming a non-critical feature on the mask utilizing one of low transmission phase-shift mask and a non-phase shifting mask, and for forming a critical feature on the mask utilizing a high transmission phase shift mask |
| 12/28/2004 | US6835509 Mask for estimating aberration in projection lens system of exposure apparatus |
| 12/28/2004 | US6835507 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 12/28/2004 | US6835506 Method for producing a photomask and corresponding photomask |
| 12/28/2004 | US6835457 Optical detection |
| 12/28/2004 | US6835456 Antireflective, layer-forming composition, layer configuration containing the antireflective layer, and process for producing the antireflective layer |
| 12/28/2004 | US6835426 Providing fabrication tool; initiating relative motion between source of energy and substrate with a first speed; initiating relative motion between source of energy and material carrier with second speed; generating pulses of energy |
| 12/28/2004 | US6835424 Comprises silicone resin coating; for indicating date codes |
| 12/28/2004 | US6834656 During etching, from semiconductors/wafers; dielectrics; integrated circuits |
| 12/28/2004 | US6834549 Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array |
| 12/28/2004 | US6834548 Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
| 12/23/2004 | WO2004112115A1 Remover liquid and removing method for antireflective film and buried material containing silicon |
| 12/23/2004 | WO2004112108A1 Exposure method, substrate stage, exposure apparatus and method for manufacturing device |
| 12/23/2004 | WO2004112107A1 Lighting optical device, exposure system and exposure method |
| 12/23/2004 | WO2004112106A1 Resist exfoliating apparatus |
| 12/23/2004 | WO2004111735A1 Micropattern formation material and method of micropattern formation |
| 12/23/2004 | WO2004111734A1 Positive resist composition, resist laminates and process for the formation of resist patterns |
| 12/23/2004 | WO2004111733A1 Photocurable resin composition |
| 12/23/2004 | WO2004111732A1 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same |
| 12/23/2004 | WO2004111731A1 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon |
| 12/23/2004 | WO2004111730A2 Developer composition for resists and method for formation of resist pattern |
| 12/23/2004 | WO2004111727A2 Methods of removing photoresist from substrates |
| 12/23/2004 | WO2004111726A2 Novel photosensitive resin compositions |
| 12/23/2004 | WO2004111725A2 An intergrated, in-line bumping and exposure system |
| 12/23/2004 | WO2004111701A1 Method for high precision printing of patterns |
| 12/23/2004 | WO2004111690A1 Projection lens and method for selection of optical materials in such a lens |
| 12/23/2004 | WO2004111092A1 Modified alginic acid or alginic acid derivatives and thermosetting anti-reflective compositions thereof |
| 12/23/2004 | WO2004110745A1 Functional organic thin film, organic thin-film transistor and methods for producing these |
| 12/23/2004 | WO2004110607A2 Multiphoton photosensitization method |
| 12/23/2004 | WO2004097894A3 Self-organized nanopore arrays with controlled symmetry and order |
| 12/23/2004 | WO2004088424A3 Photoresist compositions |
| 12/23/2004 | WO2004055594A3 Method and system for determining characteristics of substrates employing fluid geometries |
| 12/23/2004 | WO2004040378A3 Illumination device for a microlithographic projection-exposure system |
| 12/23/2004 | WO2004031861A3 Method for fabrication of diffractive optical elements for maskless lithography |
| 12/23/2004 | WO2003013993A9 Reticle protection and transport |
| 12/23/2004 | US20040260660 Service method, service system and manufacturing / inspection apparatus |
| 12/23/2004 | US20040260505 Compact multibeam laser light source and interleaving raster scan |
| 12/23/2004 | US20040260420 Processing method and processing system |
| 12/23/2004 | US20040260404 Method and apparatus for self-configuring supervisory control and data acquisition (SCADA) system for distributed control |
| 12/23/2004 | US20040260050 Preparation of solvent-resistant binder for an imageable element |
| 12/23/2004 | US20040260031 Preparation of polymer and resist composition |
| 12/23/2004 | US20040259971 Cationic polymerizable epoxy composition treated with actinic radiation for curing with dispersants for optical recording medium |
| 12/23/2004 | US20040259761 Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate |
| 12/23/2004 | US20040259373 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process |
| 12/23/2004 | US20040259371 Reduction of resist defects |
| 12/23/2004 | US20040259364 Stage base, substrate processing apparatus, and maintenance method for stage |
| 12/23/2004 | US20040259357 Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus |
| 12/23/2004 | US20040259356 Processing method |
| 12/23/2004 | US20040259322 A method for printing marks on the edges of wafers |
| 12/23/2004 | US20040259042 Method and system of lithography using masks having gray-tone features |
| 12/23/2004 | US20040259040 Pattern formation method |
| 12/23/2004 | US20040259039 Optical recording media; absorption laser beam onto glass plate; overcoating with photoresists; forming latent images; high speed dissolving of photoresist using base |
| 12/23/2004 | US20040259037 Resist lower layer film material and method for forming a pattern |
| 12/23/2004 | US20040259035 Wet etching ; applying photoresists; exposure to laser light; development |
| 12/23/2004 | US20040259034 Imagewise exposure of photopolymerizable relief -forming alyer; using actinic radiation; removal of residues ; flexography printing plates |
| 12/23/2004 | US20040259033 Process for making flexographic printing plate |
| 12/23/2004 | US20040259032 Multilayer; zones that reflect electromagnetic waves; light transmission insulation layer and light sensitive layers; offset printing images |
| 12/23/2004 | US20040259029 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition |
| 12/23/2004 | US20040259028 Mixture of lactone containing polymer and acid generator |
| 12/23/2004 | US20040259027 Multilayer; substrate, imageable element using lithography printing plates and overcoatings |
| 12/23/2004 | US20040259025 Novel polymers, processes for polymer synthesis and photoresist compositions |
| 12/23/2004 | US20040259024 Polymer blend containing a methacrylate; coating a substrate |
| 12/23/2004 | US20040259023 Crosslinking water soluble molecules |
| 12/23/2004 | US20040259020 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| 12/23/2004 | US20040259019 Positive photosensitive composition |
| 12/23/2004 | US20040259008 Pattern exposure of hydrophilic photoresist to radiation while supplying water |
| 12/23/2004 | US20040259005 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 12/23/2004 | US20040259004 Use of cationic surfactants makes it possible, for a given thickness of photoresist film, to significantly reduce the line width at which a line collapse is observed |
| 12/23/2004 | US20040258294 Method and apparatus for manufacturing diamond shaped chips |
| 12/23/2004 | US20040258122 Line selected F2 two chamber laser system |
| 12/23/2004 | US20040257683 Optical element with an optical axis |
| 12/23/2004 | US20040257681 Bearing arrangement comprising an optical element and a mount |
| 12/23/2004 | US20040257680 Optical element holding system in projection optical system |
| 12/23/2004 | US20040257679 Retainer, exposure apparatus, and device fabrication method |
| 12/23/2004 | US20040257675 Optical measuring system, and a projection objective |
| 12/23/2004 | US20040257669 Zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system |
| 12/23/2004 | US20040257629 Lithograph comprising a moving cylindrical lens system |
| 12/23/2004 | US20040257571 Apparatus and methods for detecting overlay errors using scatterometry |
| 12/23/2004 | US20040257559 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus |
| 12/23/2004 | US20040257554 Wafer handling method for use in lithography patterning |
| 12/23/2004 | US20040257553 Microlithographic projection exposure apparatus |
| 12/23/2004 | US20040257551 System to increase throughput in a dual substrate stage double exposure lithography system |
| 12/23/2004 | US20040257550 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 12/23/2004 | US20040257549 Lithographic apparatus, projection system, method of projecting and device manufacturing method |
| 12/23/2004 | US20040257548 Lithographic apparatus, device manufacturing method and computer program |
| 12/23/2004 | US20040257547 Lithographic apparatus and device manufacturing method |
| 12/23/2004 | US20040257546 Lithographic projection apparatus with collector including concave and convex mirrors |
| 12/23/2004 | US20040257545 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus |
| 12/23/2004 | US20040257544 Immersion photolithography system and method using microchannel nozzles |
| 12/23/2004 | US20040257543 Lithographic systems and methods with extended depth of focus |
| 12/23/2004 | US20040256764 Contacting a substrate with a conformable material with a patterned surface of a mold; and forming a conditioned layer, with a solid first sub-portion and second sub-portion that has a greater affinity for the patterned surface than for the first sub-portion |
| 12/23/2004 | US20040256575 Illumination system with a plurality of light sources |
| 12/23/2004 | US20040256574 Exposure apparatus and device fabrication method |