| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/29/2004 | WO2004114382A1 Method for forming pattern and method for manufacturing semiconductor device |
| 12/29/2004 | WO2004114381A1 Method for manufacturing semiconductor device |
| 12/29/2004 | WO2004114380A1 Exposure device and device producing method |
| 12/29/2004 | WO2004114371A2 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 12/29/2004 | WO2004114024A2 Exposure method and exposure apparatus |
| 12/29/2004 | WO2004114023A2 Method and apparatus for manufacturing polygon shaped chips |
| 12/29/2004 | WO2004114022A1 Positive resist composition |
| 12/29/2004 | WO2004114021A1 Photosensitive composition and process for production of printed wiring boards with the same |
| 12/29/2004 | WO2004114020A1 Radiation-sensitive resin composition and method for forming pattern using the same |
| 12/29/2004 | WO2004114019A1 Negative photosensitive composition and negative photosensitive lithographic printing plate |
| 12/29/2004 | WO2004114018A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/29/2004 | WO2004114017A1 A nano impression lithographic process which involves the use of a die having a region able to generate heat |
| 12/29/2004 | WO2004113826A2 Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| 12/29/2004 | WO2004113486A1 Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate |
| 12/29/2004 | WO2004113404A1 Polymerizable monomer, polymer compound, resin composition for photoresist and method for producing semiconductor |
| 12/29/2004 | WO2004113396A1 Actinic-energy-ray-curable stereolithographic resin composition with improved stability |
| 12/29/2004 | WO2004113395A1 Photocurable resin composition |
| 12/29/2004 | WO2004112952A1 Process for the recovery of surfactants |
| 12/29/2004 | WO2004102277A3 Method providing an improved bi-layer photoresist pattern |
| 12/29/2004 | WO2004101181A3 System and method for cleaning of workpieces using supercritical carbon dioxide |
| 12/29/2004 | WO2004092865A3 Selection method, exposure method, selection device, exposure device, and device manufacturing method |
| 12/29/2004 | WO2004090466A3 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
| 12/29/2004 | WO2004066029A3 Thermally-convertible lithographic printing precursor developable with aqueous medium |
| 12/29/2004 | WO2004063815A3 Method and system for fabricating nanoscale patterns in light curable compositions using an electric field |
| 12/29/2004 | WO2004062936A9 Combination mask |
| 12/29/2004 | WO2004013692A3 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 12/29/2004 | WO2003096497A8 High power deep ultraviolet laser with long life optics |
| 12/29/2004 | WO2003057678A8 Positive-working photoimageable bottom antireflective coating |
| 12/29/2004 | EP1492310A2 Industrial equipment network |
| 12/29/2004 | EP1492153A2 Method and system for monitoring an etch process |
| 12/29/2004 | EP1492147A1 Method for patterning thick-film paste material layer, method for manufacturing cold-cathode field electron emission device, and method for manufacturing cold-cathode field electron emission display |
| 12/29/2004 | EP1492093A1 Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium |
| 12/29/2004 | EP1491967A1 Method and apparatus for positioning a substrate on a substrate table |
| 12/29/2004 | EP1491966A1 Calibration method for a lithographic apparatus |
| 12/29/2004 | EP1491965A1 Lithographic apparatus and device manufacturing method |
| 12/29/2004 | EP1491964A2 Filter bypass method and system for chiller loop to control coolant purity levels. |
| 12/29/2004 | EP1491963A2 Laser produced plasma radiation system with contamination barrier |
| 12/29/2004 | EP1491962A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/29/2004 | EP1491961A1 Lithographic apparatus and device manufacturing method |
| 12/29/2004 | EP1491960A2 Lithographic apparatus |
| 12/29/2004 | EP1491959A1 Lithographic apparatus and device manufacturing method |
| 12/29/2004 | EP1491958A2 Projection optical system for maskless lithography |
| 12/29/2004 | EP1491957A2 Immersion photolithography apparatus with projection system positioned below the substrate |
| 12/29/2004 | EP1491956A1 Lithographic apparatus and device manufacturing method |
| 12/29/2004 | EP1491955A1 Lithographic projection apparatus and device manufacturing method |
| 12/29/2004 | EP1491954A1 Sealing assembly, lithographic projection apparatus, and device manufacturing method |
| 12/29/2004 | EP1491953A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/29/2004 | EP1491952A2 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| 12/29/2004 | EP1491951A2 Positive-working resist composition |
| 12/29/2004 | EP1491950A1 Micro device and process for producing it |
| 12/29/2004 | EP1491560A1 Process for the production of high-molecular compounds for photoresist |
| 12/29/2004 | EP1491536A1 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image |
| 12/29/2004 | EP1491356A2 Lithographic printing plate precursor and lithographic printing method |
| 12/29/2004 | EP1491331A2 Process for making flexographic printing plate |
| 12/29/2004 | EP1490899A1 Composition for removing sidewall residues |
| 12/29/2004 | EP1490733A1 Collector unit comprising a reflective element for lighting systems having a wavelength of less than 193 nm |
| 12/29/2004 | EP1490657A1 A mask blank and a method for producing the same |
| 12/29/2004 | EP1490412A1 Photoinitiator, novel compound, and photocurable composition |
| 12/29/2004 | EP1490227A1 Compositions for positive heat sensitive lithographic printing plates |
| 12/29/2004 | EP1334408A4 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
| 12/29/2004 | EP1311394B1 Thermal digital lithographic printing plate |
| 12/29/2004 | EP1252239B1 Curable composition containing reactive melamine derivative, cured product, and laminate |
| 12/29/2004 | EP1177105B1 Coated transfer sheet comprising a thermosetting and/or uv curable material |
| 12/29/2004 | EP1073876B1 Measuring a diffracting structure, broadband, polarized, ellipsometric, and an underlying structure |
| 12/29/2004 | EP1010031A4 Illumination design for scanning microlithography systems |
| 12/29/2004 | CN1559023A Negative-acting aqueous photoresist composition |
| 12/29/2004 | CN1558918A Alkali-soluble maleimide copolymer and liquid crystal display comprising the same |
| 12/29/2004 | CN1558875A Fused silica having high internal transmission and low birefringence |
| 12/29/2004 | CN1558294A Developing machine bench with edge scrubbing device |
| 12/29/2004 | CN1558292A Method for fabricating thin film transistors |
| 12/29/2004 | CN1558291A Method and system for preparing high polymer group biochip micro flow path structure adopting quasi molecule laser |
| 12/29/2004 | CN1558290A Micropattern forming material and fine structure forming method |
| 12/29/2004 | CN1558264A Polar ultraviolet light 20nm~40nm spectrum generator |
| 12/29/2004 | CN1558260A Method for fabricating waveguide Prague grating based on ultraviolet light write through technology |
| 12/29/2004 | CN1182568C Method of producing semiconductor integrated circuit device and multi-chip module |
| 12/29/2004 | CN1182567C Method for reducing photoresist roughness |
| 12/29/2004 | CN1182441C Supporting body for lithographic printing plate and the lithographic printing plate |
| 12/29/2004 | CN1182440C Sandwich for deep ultra violet photolithography and method for forming photolithographic sandwich |
| 12/29/2004 | CN1182439C Layout encode method for photoetching system of array-type integrated circuit |
| 12/28/2004 | US6836531 X-ray projection exposure apparatus and a device manufacturing method |
| 12/28/2004 | US6836530 Illumination system with a plurality of individual gratings |
| 12/28/2004 | US6836380 Optical reduction system with elimination of reticle diffraction induced bias |
| 12/28/2004 | US6836379 Catadioptric objective |
| 12/28/2004 | US6836365 Diffractive optical element, method of fabricating the element, illumination device provided with the element, projection exposure apparatus, exposure method, optical homogenizer, and method of fabricating the optical homogenizer |
| 12/28/2004 | US6836316 Substrate holding apparatus and exposure apparatus using the same |
| 12/28/2004 | US6836315 Lithographic apparatus and device manufacturing method |
| 12/28/2004 | US6836283 Method of setting the image line width in an exposer |
| 12/28/2004 | US6836093 Exposure method and apparatus |
| 12/28/2004 | US6836031 Linear motor and exposure apparatus using the same |
| 12/28/2004 | US6835942 Dividing a processing pattern in a specified way; calculating a pattern area density for the first and second patterns in a unit region; and calculating a corrected dose for the processing pattern according to the pattern area density |
| 12/28/2004 | US6835937 Correcting method for correcting exposure data used for a charged particle beam exposure system |
| 12/28/2004 | US6835804 Preparation of polymer, and resist composition using the polymer |
| 12/28/2004 | US6835683 Quartz glass member and projection aligner |
| 12/28/2004 | US6835671 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition |
| 12/28/2004 | US6835652 Method of fabricating patterns with a dual damascene process |
| 12/28/2004 | US6835651 Wiring forming method |
| 12/28/2004 | US6835534 Chemical functionalization nanolithography |
| 12/28/2004 | US6835533 Photoimageable dielectric epoxy resin system film |
| 12/28/2004 | US6835532 Organic anti-reflective coating composition and method for forming photoresist patterns using the same |
| 12/28/2004 | US6835530 Base material for lithography |