| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/04/2005 | US6839126 Photolithography process with multiple exposures |
| 01/04/2005 | US6839125 Method for optimizing an illumination source using full resist simulation and process window response metric |
| 01/04/2005 | US6839124 Projection aligner |
| 01/04/2005 | US6839077 Method for controlling exposure and scan-exposure apparatus |
| 01/04/2005 | US6838896 Method and system for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
| 01/04/2005 | US6838808 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same |
| 01/04/2005 | US6838699 Electro-optical device with undercut-reducing thin film pattern and reticle |
| 01/04/2005 | US6838686 Alignment method and exposure apparatus using the method |
| 01/04/2005 | US6838684 Lithographic projection apparatus and particle barrier for use therein |
| 01/04/2005 | US6838682 Electron beam exposure equipment and electron beam exposure method |
| 01/04/2005 | US6838643 Method and apparatus for performing baking treatment to semiconductor wafer |
| 01/04/2005 | US6838384 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
| 01/04/2005 | US6838229 Photolithography patterning of polymer |
| 01/04/2005 | US6838228 System to enable photolithography on severe structure topologies |
| 01/04/2005 | US6838227 Polystyrene as a resist for making patterned media |
| 01/04/2005 | US6838226 A supported aqueous-based imaging layer having overcoating of non-aqueous inverse emulsion of highly hydrophilic, water-swellable microgel particles dispersed in a water-immiscible solvent; durability; lithographic printing plates |
| 01/04/2005 | US6838225 Radiation-sensitive resin composition |
| 01/04/2005 | US6838224 Chemical amplification, positive resist compositions |
| 01/04/2005 | US6838223 Compositions for anti-reflective light absorbing layer and method for forming patterns in semiconductor device using the same |
| 01/04/2005 | US6838222 Photopolymerizable composition |
| 01/04/2005 | US6838217 Define overlay dummy pattern in mark shielding region to reduce wafer scale error caused by metal deposition |
| 01/04/2005 | US6838216 Semiconductors; improved aerial image contrast |
| 01/04/2005 | US6837943 Method and apparatus for cleaning a semiconductor substrate |
| 01/04/2005 | US6837936 Semiconductor manufacturing device |
| 01/04/2005 | US6837631 Substrate processing method and substrate processing apparatus |
| 01/04/2005 | CA2297816C Novel crystalline ion-association substance, process for producing the same, and latent photopolymerization initiator |
| 01/04/2005 | CA2116939C Printing plate |
| 12/30/2004 | US20040268289 Method for error reduction in lithography |
| 12/30/2004 | US20040268272 Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 12/30/2004 | US20040267506 Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus |
| 12/30/2004 | US20040267490 Feed forward critical dimension control |
| 12/30/2004 | US20040266913 Storage life, capable of thermocompression bonding at a low temperature and ensuring excellent adhesive strength |
| 12/30/2004 | US20040266901 Novel photosensitive compound, photosensitive resin, and photosensitive composition |
| 12/30/2004 | US20040266637 Stability; controlling pH; cleaning semiconductor substrate; mixture of quaternary ammonium compound and buffer |
| 12/30/2004 | US20040266635 Mixture of supercritical fluid and adjuvant |
| 12/30/2004 | US20040266207 Patterning of devices |
| 12/30/2004 | US20040266049 Micro device and process for producing it |
| 12/30/2004 | US20040266039 Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crytal display device using the same |
| 12/30/2004 | US20040266012 Using air flow variation in vaccum to identify defects in semiconductor wafer |
| 12/30/2004 | US20040265755 Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties |
| 12/30/2004 | US20040265754 Multilayer photoresist system |
| 12/30/2004 | US20040265750 Selective surface exposure, cleans, and conditioning of the germanium film in a Ge photodetector |
| 12/30/2004 | US20040265749 Overcoating substrate using masking layer; shrinkage ; etching |
| 12/30/2004 | US20040265748 Pattern transfer of an extreme ultraviolet imaging layer via flood exposure of contact mask layer (EUV CML) |
| 12/30/2004 | US20040265747 Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging |
| 12/30/2004 | US20040265746 Forming multilayer photoresist; overlapping zones atre exposured to actinic radiation; adjust solubility; development |
| 12/30/2004 | US20040265745 Forming photoresist on semiconductor substrate ; masking |
| 12/30/2004 | US20040265743 Prevents collapse of patterns when photoresist patterns; for photolithography |
| 12/30/2004 | US20040265739 Photoresist with adjustable polarized light reaction and photolithography process using the photoresist |
| 12/30/2004 | US20040265738 Polymer derived from ethylenically unsaturated monomers comprising a fluoroalcohol and photosensitive compound; high ultraviolet transparency; developable in alkaline solution |
| 12/30/2004 | US20040265737 Radiation sensitive refractive index changing composition, pattern forming method and optical material |
| 12/30/2004 | US20040265736 Lithographic printing plate precursor and lithographic printing method |
| 12/30/2004 | US20040265735 Chemical, etching , heat resistance ; mixture of polymer, acid generator and solvent |
| 12/30/2004 | US20040265733 Photoacid generators |
| 12/30/2004 | US20040265732 Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation |
| 12/30/2004 | US20040265731 Mixture of a soluble polyimide and (meth)acrylate compound with solvent and fire retarder; electronics |
| 12/30/2004 | US20040265730 Photosensitive composition and production processes for photosensitive film and printed wiring board |
| 12/30/2004 | US20040265713 Transferring exposure dosage; monitoring masking; calibrating photoresist film; diffraction grid; semiconductor |
| 12/30/2004 | US20040265712 Detecting erosion in collector optics with plasma sources in extreme ultraviolet (euv) lithography systems |
| 12/30/2004 | US20040265711 comprises an adhesive layer for adhering the film to a substrate, a scratch resistant layer containing dispersed carbon black particles, and a metallized layer of aluminum deposited on a polyethylene terephthalate substrate |
| 12/30/2004 | US20040265710 Lithographic processing method and device manufactured thereby |
| 12/30/2004 | US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device |
| 12/30/2004 | US20040265707 Source and mask optimization |
| 12/30/2004 | US20040265706 Method of extending the stability of a photoresist during direct writing of an image |
| 12/30/2004 | US20040265704 Semiconductor wafers; photosensitive masking cycles |
| 12/30/2004 | US20040265493 Substrate holder for holding a wafer, a coating solution discharge nozzle, and anti-drying boards opposed to a surface of the wafer; coating solution on or over the surface of the wafer is restrained from being dried and a coating film is formed with even thickness on or over the surface of the wafer |
| 12/30/2004 | US20040265490 Method of fabricating patterned polymer film with nanometer scale |
| 12/30/2004 | US20040264519 Filter bypass method and system for chiller loop to control purity levels |
| 12/30/2004 | US20040263977 Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method |
| 12/30/2004 | US20040263955 Catadioptric reduction lens |
| 12/30/2004 | US20040263866 Apparatus for optical proximity correction, method for optical proximity correction, and computer program product for optical proximity correction |
| 12/30/2004 | US20040263846 Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| 12/30/2004 | US20040263823 Lithographic projection assembly, load lock and method for transferring objects |
| 12/30/2004 | US20040263822 Reticle transferring support and transferring method thereof |
| 12/30/2004 | US20040263821 Advanced illumination system for use in microlithography |
| 12/30/2004 | US20040263820 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask |
| 12/30/2004 | US20040263819 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus |
| 12/30/2004 | US20040263817 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus |
| 12/30/2004 | US20040263816 Lithographic apparatus and device manufacturing method |
| 12/30/2004 | US20040263814 Projection optical system and projection exposure apparatus having the same |
| 12/30/2004 | US20040263813 Projection optical system for maskless lithography |
| 12/30/2004 | US20040263812 Imaging device in a projection exposure facility |
| 12/30/2004 | US20040263810 Method for distortion correction in a microlithographic projection exposure apparatus |
| 12/30/2004 | US20040263809 Immersion exposure technique |
| 12/30/2004 | US20040263808 Immersion photolithography system and method using inverted wafer-projection optics interface |
| 12/30/2004 | US20040263726 Substrate for liquid crystal display and method of fabricating the same |
| 12/30/2004 | US20040263429 Large field of view protection optical system with aberration correctability for flat panel displays |
| 12/30/2004 | US20040263000 Lithographic apparatus and device manufacturing method |
| 12/30/2004 | US20040262658 Method of forming integrated circuit structures in silicone ladder polymer |
| 12/30/2004 | US20040262543 Variably shaped beam EB writing system |
| 12/30/2004 | US20040262541 Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| 12/30/2004 | US20040262540 Surface treating device and surface treating method |
| 12/30/2004 | US20040262500 Method and apparatus for spatially resolved polarimetry |
| 12/30/2004 | US20040261823 Providing encapsulating transport, applying the at least one encapsulating transport to the layer, the layer being a chemically reactive layer; wherein the encapsulating transport ruptures on the chemically reactive layer and releases the reactive gas onto the chemically reactive layer |
| 12/30/2004 | US20040261817 Foreign matter removing apparatus, substrate treating apparatus, and substrate treating method |
| 12/30/2004 | US20040261701 Coating apparatus and coating method |
| 12/30/2004 | DE10326429A1 Method for producing an optical component by irradiation of a polymer body with high-energy rays involves adjustment of the irradiation doses and/or energy in a specified manner |
| 12/30/2004 | DE10325461A1 Verfahren und Anordnung zur Realisierung einer schaltbaren optischen Apertur Method and apparatus for implementing a switchable optical aperture |
| 12/30/2004 | DE10324477A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
| 12/30/2004 | DE102004025959A1 Processing a substrate by pressurizing processing chamber before, after, and/or simultaneous with application of radiation to heat substrate and/or processing chemistry contained in processing chamber |