| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/06/2005 | WO2005001527A1 Corrective device for compensating disturbances of polarization distribution, and microlithographic projection lens |
| 01/06/2005 | WO2005001456A1 Pattern comparison inspection method and pattern comparison inspection device |
| 01/06/2005 | WO2005001432A2 Optical fluids, and systems and methods of making and using the same |
| 01/06/2005 | WO2005000924A1 Photoresist polymers |
| 01/06/2005 | WO2005000923A1 Photoresist polymers and compositions having acrylic- or methacrylic-based polymeric resin prepared by a living free radical process |
| 01/06/2005 | WO2005000912A2 Novel positive photosensitive resin compositions |
| 01/06/2005 | WO2005000909A2 Multiphoton photosensitization system |
| 01/06/2005 | WO2005000801A1 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing |
| 01/06/2005 | WO2005000552A2 Method to reduce adhesion between a conformable region and a pattern of a mold |
| 01/06/2005 | WO2004101490A3 Photoactive compounds |
| 01/06/2005 | US20050005257 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 01/06/2005 | US20050004778 Method for producing library |
| 01/06/2005 | US20050004774 Methods and systems for inspection of wafers and reticles using designer intent data |
| 01/06/2005 | US20050004288 Resin composition, composition for solder resist, and cured article obtained therefrom |
| 01/06/2005 | US20050004249 A crystalline isomeric mixture of bis[4-(2-methyl-3-hydroxy-propionyl)-phenyl]-methane and [3-(2-methyl-3-hydroxy-propionyl)-phenyl]-[4-(2-methyl-3-hydroxy-propionyl)-phenyl]methane; chemical synthesis; electromagnetic radiation curable coatings containing unsaturated aminoacrylate monomer; odorless |
| 01/06/2005 | US20050004247 Contains less volatile decomposition products and by products than known acyl- and bis-acylphosphine oxides; photoinitiators |
| 01/06/2005 | US20050003977 Composition for cleaning |
| 01/06/2005 | US20050003674 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 01/06/2005 | US20050003617 Template padding method for padding edges of holes on semiconductor masks |
| 01/06/2005 | US20050003311 Using infrared radiation laser forming plates; alkaline developing solution; determination ration between development inhibitor and alkalinity; measuring concentration; calibration |
| 01/06/2005 | US20050003310 Etching process including plasma pretreatment for generating fluorine-free carbon-containing polymer on a photoresist pattern |
| 01/06/2005 | US20050003309 Forming photoresist on thin film; etching; heat treatment |
| 01/06/2005 | US20050003307 Method for forming DRAM cell bit-line contact |
| 01/06/2005 | US20050003306 Lithographic process |
| 01/06/2005 | US20050003305 Photo mask, exposure method using the same, and method of generating data |
| 01/06/2005 | US20050003303 Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process |
| 01/06/2005 | US20050003300 Alkali soluble novolak resin; distilaltion; acid generators; crosslinking agents; liquid crystal display |
| 01/06/2005 | US20050003299 Interface containing organosilicon polymer with patterns for photoresists |
| 01/06/2005 | US20050003285 Imageable element with solvent-resistant polymeric binder |
| 01/06/2005 | US20050003284 Exposure, development of testing photoresist using photomask; forming hole pattern; measurement; adjustment |
| 01/06/2005 | US20050003281 Pattern mask with features to minimize the effect of aberrations |
| 01/06/2005 | US20050003280 Exposure to adjustment design pattern; shaping inclined edge zones; measurement calibration; drawing pattern using electron beams |
| 01/06/2005 | US20050003279 Positioning mask on semiconductor wafer; exposure; fading zones |
| 01/06/2005 | US20050003087 On a semiconductor wafer surface dispensing a solvent of 70-90% diacetone alcohol and aliphatic ester; spinning for uniform distribution and then dispensing a photoresist solution on the wafer; quality films; efficiency |
| 01/06/2005 | US20050002674 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 01/06/2005 | US20050002553 Image pattern recording method |
| 01/06/2005 | US20050002136 Combination current sensor and relay |
| 01/06/2005 | US20050002111 Microlithographic illumination method and a projection lens for carrying out the method |
| 01/06/2005 | US20050002102 Illuminating system having a diffuser element |
| 01/06/2005 | US20050002090 EUV illumination system having a folding geometry |
| 01/06/2005 | US20050002070 Image forming apparatus and image forming method |
| 01/06/2005 | US20050002040 Lithographic apparatus, device manufacturing method, and computer program |
| 01/06/2005 | US20050002034 Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same |
| 01/06/2005 | US20050002012 Stage apparatus, static pressure bearing apparatus, positioning method, exposure apparatus and method for manufacturing device |
| 01/06/2005 | US20050002011 Support mechanism, exposure apparatus having the same, and aberration reducing method |
| 01/06/2005 | US20050002010 Lithographic apparatus and method of a manufacturing device |
| 01/06/2005 | US20050002009 Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
| 01/06/2005 | US20050002008 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 01/06/2005 | US20050002007 Projection optical system and projection and light exposure apparatus using it |
| 01/06/2005 | US20050002006 Image forming device |
| 01/06/2005 | US20050002005 Image forming apparatus |
| 01/06/2005 | US20050002004 Lithographic apparatus and device manufacturing method |
| 01/06/2005 | US20050002003 Lithographic apparatus and device manufacturing method |
| 01/06/2005 | US20050002002 Pattern writing apparatus and pattern writing method |
| 01/06/2005 | US20050001894 Image recorder |
| 01/06/2005 | US20050001011 Moly mask construction and process |
| 01/06/2005 | US20050000936 Methods of forming patterned compositions |
| 01/06/2005 | CA2500173A1 Multiphoton photosensitization system |
| 01/05/2005 | EP1494267A1 Exposure method, exposure device, and device manufacturing method |
| 01/05/2005 | EP1494079A1 Lithographic apparatus and device manufacturing method |
| 01/05/2005 | EP1494078A1 Lithographic apparatus and device manufacturing method. |
| 01/05/2005 | EP1494077A2 Image forming apparatus and image forming method |
| 01/05/2005 | EP1494076A2 Large field of view projection optical system with aberration correctability for flat panel displays |
| 01/05/2005 | EP1494075A1 Lithographic projection apparatus and device manufacturing method |
| 01/05/2005 | EP1494074A1 Lithographic apparatus and device manufacturing method |
| 01/05/2005 | EP1494073A2 Photosensitive resin composition and printed wiring board |
| 01/05/2005 | EP1494072A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material |
| 01/05/2005 | EP1494071A2 Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 01/05/2005 | EP1494070A2 A method, program product and apparatus for generating assist features utilizing an image field map |
| 01/05/2005 | EP1493757A1 Photopolymerizable composition |
| 01/05/2005 | EP1493719A1 Synthetic quartz glass |
| 01/05/2005 | EP1493562A2 A method for developing a lithographic printing plate precursor |
| 01/05/2005 | EP1493313A2 Waterborne printed circuit board coating compositions |
| 01/05/2005 | EP1493061A2 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 01/05/2005 | EP1493060A2 Method and device for imaging a mask onto a substrate |
| 01/05/2005 | EP1493059A1 Multi-layer negative working imageable element |
| 01/05/2005 | EP1493058A2 On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
| 01/05/2005 | EP1493054A1 Light modulating engine |
| 01/05/2005 | EP1493039A2 Extreme ultraviolet light source |
| 01/05/2005 | EP1493018A1 Holographic sensor based on a volume hologram in a porous medium |
| 01/05/2005 | EP1492994A2 Method and apparatus for stage mirror mapping |
| 01/05/2005 | EP1105925B1 Method for double-sided patterning of high temperature superconducting circuits |
| 01/05/2005 | DE10327963A1 Polarization beam splitter for microscopy or projection system or UV lithography using grid array with parallel grid lines formed by multi-layer system with alternating non-metallic dielectric layers with differing optical characteristics |
| 01/05/2005 | DE10326324A1 1,4-Dihydropyridin-Sensibilisator enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente 1,4-dihydropyridine-sensitizer containing radiation-sensitive compositions and imageable elements based thereon |
| 01/05/2005 | DE10325151A1 Vorrichtung für die Erzeugung und/oder Beeinflussung elektromagnetischer Strahlung eines Plasmas An apparatus for generating and / or influencing electromagnetic radiation of a plasma |
| 01/05/2005 | DE10297208T5 Verbessertes Verfahren und verbesserte Vorrichtung unter Verwendung eines SLM Improved method and improved apparatus using a SLM |
| 01/05/2005 | DE102004027124A1 Process to manufacture a recording medium e.g. CD or DVD by application of a monomer polymer top separation layer |
| 01/05/2005 | DE102004024710A1 Imaging device for e.g. printing press e.g. a sheet-processing, for printing form, has micro-optics positioned in respective emission regions so that image spots lie at disjoint positions on printing form along spanning polyline |
| 01/05/2005 | CN1561540A Processing method |
| 01/05/2005 | CN1561355A Polymeric compositions and uses therefor |
| 01/05/2005 | CN1560700A Method for preparing optical film for stretching visual angle of display screen |
| 01/05/2005 | CN1183423C Photosensitive composition for sandblasting and photosensitive film comprising the same |
| 01/05/2005 | CN1183422C Photosensitive composition used in sand milling and photosensitive membrane using said composition |
| 01/05/2005 | CN1182959C Method for making lithographic printing plate |
| 01/05/2005 | CN1182958C Flat printed element capable of infrared laser imaging and making method for said printed element and imaging method thereof |
| 01/05/2005 | CN1182952C Micro structure and its manufacture method |
| 01/04/2005 | US6839890 Mask manufacturing method |
| 01/04/2005 | US6839372 Gas discharge ultraviolet laser with enclosed beam path with added oxidizer |
| 01/04/2005 | US6839142 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 01/04/2005 | US6839141 Method and apparatus for compensation of time-varying optical properties of gas in interferometry |