Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2014
02/18/2014US8652712 Photoacid generators for extreme ultraviolet lithography
02/13/2014WO2014025716A1 Photocurable compositions
02/13/2014WO2014025149A1 Apparatus and method for manufacturing phase-type diffraction element using laser exposure type
02/13/2014WO2014024951A1 Photosensitive film laminate, flexible printed wiring board, and method for manufacturing same
02/13/2014WO2014024836A1 Composition for forming resist underlayer film
02/13/2014WO2014024804A1 Photosensitive resin composition for permanent mask resist, photosensitive element, method for forming resist pattern, and method for producing printed wiring board
02/13/2014WO2014024702A1 Method for producing polymer compound, polymer compound, and photoresist resin composition
02/13/2014WO2014024633A1 Pattern forming method, and, method for producing electronic device and electronic device, each using the same
02/13/2014WO2014024594A1 Processing apparatus and device manufacturing method
02/13/2014WO2014024483A1 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device
02/13/2014WO2014024465A1 Exposure method, method for manufacturing flat-panel display, and method for manufacturing device
02/13/2014WO2014023665A1 Substrate for high-resolution electronic lithography and corresponding lithography method
02/13/2014WO2014023660A1 Illumination system for an euv projection lithographic projection exposure apparatus
02/13/2014WO2014023619A1 Microlithographic exposure method, and microlithographic projection exposure apparatus
02/13/2014WO2014023589A1 Methods for providing lithography features on a substrate by self-assembly of block copolymers
02/13/2014US20140045335 Photo lithographic rinse solution and method of manufacturing a semiconductor device using the same
02/13/2014US20140045124 Method of manufacturing semiconductor device
02/13/2014US20140045123 Monomer, polymer, resist composition, and patterning process
02/13/2014US20140045122 Positive resist composition and patterning process
02/13/2014US20140045121 Photoresist composition and method of forming a black matrix using the same
02/13/2014US20140045119 Photosensitive organic particles
02/13/2014US20140045118 Negative-working lithographic printing plate precursors with ir dyes
02/13/2014US20140045117 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device
02/13/2014US20140045106 Colored curable composition for color filter, colored cured film, method for producing color filter, color filter, and display device
02/13/2014US20140045102 Mask and method of manufacturing a substrate using the mask
02/13/2014US20140044979 Method for producing a ceramic component composed of a plurality of joined preforms and component obtained by the method
02/13/2014US20140044932 Photocurable compositions
02/13/2014US20140043596 Arrangement for actuating an element in a microlithographic projection exposure apparatus
02/13/2014US20140043595 EUV collector system with enhanced EUV radiation collection
02/13/2014US20140043594 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method
02/13/2014US20140043593 Exposure apparatus, exposure method, and method for producing device
02/13/2014US20140043592 Optical element and exposure apparatus
02/13/2014US20140041902 Printed circuit board and method of manufacturing the same
02/13/2014DE102013203713A1 Incremental encoder for use in lithography device for detecting displacements or movements of optical elements, has lower movable reference grid and upper movable reference grid that include different lattice constants in optical path
02/13/2014DE102013202656A1 Microlithographic exposure method for microlithographic manufacturing of e.g. integrated circuits, involves varying adjustment of mirror elements and arrangement based on comparison of determined distribution with predetermined distribution
02/13/2014DE102013101328B3 Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung Blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography and process for its production
02/13/2014DE102012223230A1 Optical system for use in microlithographic projection exposure system for manufacturing e.g. LCD, has optical element converting linear polarization distribution into tangential, radial or mixed tangential-radial polarization distribution
02/13/2014DE102012214063A1 Beleuchtungssystem für eine Projektionsbelichtungsanlage für die EUV-Projektionslithographie Illumination system for a projection exposure apparatus for EUV projection lithography
02/13/2014DE102012214052A1 Mikrolithographisches Belichtungsverfahren, sowie mikrolithographische Projektionsbelichtungsanlage Microlithographic exposure method, and microlithography projection exposure apparatus
02/13/2014DE102012003543B4 Bewegungsvorrichtung und Verfahren zu deren Betrieb Movement apparatus and method for its operation
02/12/2014EP2695020A1 Process for manufacturing an electrochemical device based on self-alignment electrolytes on electrodes
02/12/2014EP2695015A1 Exposure device for the structured exposure of a surface
02/12/2014EP2694705A2 Microfrabication of tunnels
02/12/2014CN203433267U Device for recycling photoresist resin in developing solution
02/12/2014CN203433266U Device for recycling photoresist resin in developing solution
02/12/2014CN203433265U Exposure machine based on CCD (Charge Coupled Device) alignment system
02/12/2014CN203432610U Development point testing apparatus of photosensitive wet film for PCB
02/12/2014CN103582847A Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
02/12/2014CN103582845A Process for manufacturing an electrochemical device based on self-alignment electrolytes on electrodes
02/12/2014CN103582665A Underlayer composition and process thereof
02/12/2014CN103579531A Method for forming peelable elastomer mask plate on surface of polymer base materials
02/12/2014CN103579434A Method for manufacturing patterned sapphire substrate with residual-layer-free nano-imprinting technology
02/12/2014CN103579421A Preparation method for large-area patterning sapphire substrate
02/12/2014CN103579059A Substrate slice loading system special for substrate machine table and slice loading method
02/12/2014CN103579058A Method for achieving multi-batch continuous operation
02/12/2014CN103578971A Method for removing photoresist after high-energy ion implantation
02/12/2014CN103578928A Substrate drying method, substrate manufacturing method, and low-temperature heating drying device thereof
02/12/2014CN103578353A Method for manufacturing gradient-gradual-change double-layer-system material and application in anti-counterfeiting identification
02/12/2014CN103576470A Development process nozzle
02/12/2014CN103576469A 光刻胶曝光装置 Photoresist exposure device
02/12/2014CN103576468A Exposure equipment and control method of baffle of same
02/12/2014CN103576467A Alignment device and alignment method
02/12/2014CN103576466A Photoetching method
02/12/2014CN103576465A Rotary exposure carrying equipment
02/12/2014CN103576464A Ejection mechanism and photoetching device with ejection mechanism
02/12/2014CN103576463A Workbench of lithography machine and working method thereof
02/12/2014CN103576462A Method for photoetching front surface of wafer after wet etching on back surface
02/12/2014CN103576461A Photosensitive resin composition, colored filter, liquid crystal display device and imaging element
02/12/2014CN103576460A Photosensitive resin composition, color filter, liquid display device, and camera element
02/12/2014CN103576459A Light-curing thermal-curing resin composition
02/12/2014CN103576458A Photoresist composition and method of forming photolithographic pattern
02/12/2014CN103576457A Solid resin compound and purpose thereof
02/12/2014CN103576456A Active ray-curable composition, and printing ink composition and adhesive composition
02/12/2014CN103576455A A colored photosensitive resin composition, color filter and liquid crystal display device having the same
02/12/2014CN103576454A Colored curable resin composition
02/12/2014CN103576453A Ink composition used for silk screen printing and pattern forming method
02/12/2014CN103576452A Light-curing thermal-curing resin composition
02/12/2014CN103576451A Method for duplicating micro-nanostructure
02/12/2014CN103576450A Method for preparing nanoscale thickness thin film and structure on curved surface substrate
02/12/2014CN103576449A Composite template for nano-imprinting and preparation method of composite template
02/12/2014CN103576448A Method for preparing porous antireflection film through nanometer coining
02/12/2014CN103576447A Fluorine-containing polymer ultraviolet nano-coining template and preparation method thereof
02/12/2014CN103576446A Preparation method of novel nickel template
02/12/2014CN103576445A Photoetching method for photoresist as silicon groove etching mask
02/12/2014CN103576233A Light guide plate and manufacturing method of the same
02/12/2014CN103576225A Method for preparing nano cycle optical gratings with adjustable duty ratio by phase mask photoetching
02/12/2014CN103576224A Multilayer-film filling type composite medium nanometer period grating structure and manufacturing method of multilayer-film filling type composite medium nanometer period grating structure
02/12/2014CN103576221A Electron beam exposure method for improving uniformity of grating structure
02/12/2014CN103573815A Micropositioner and gas bearing
02/12/2014CN103572342A Shielding method for local surface treatment
02/12/2014CN103571265A Solder resist ink with low-energy ultraviolet curing performance
02/12/2014CN103571233A Salt for dye
02/12/2014CN103571219A Dye compound and method of manufacturing the same, colored curable composition, colored cured film, color filter and method of manufacturing the same, and display device
02/12/2014CN103571189A Polyimide-containing layer and method for etching polyimide-containing layer
02/12/2014CN103570503A Method of purifying cresols, method of producing novolak resin for photosensitive resin composition and photosensitive resin composition
02/12/2014CN103568471A Lithographic printing plate precursor and plate making method thereof
02/12/2014CN102789128B Method for preparing patterned ZnO nanorod array
02/12/2014CN102681358B Space image detection-based projection objective wave aberration in-situ measurement method
02/12/2014CN102393610B Gyro precession type active stabilizing device for workbench of lithography machine
02/12/2014CN102093282B 肟酯光敏引发剂 Oxime ester photoinitiator
1 ... 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 ... 1272