| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/12/2005 | EP1495866A2 Lithographic printing plate precursor and lithographic printing method |
| 01/12/2005 | EP1495864A2 Lithographic printing plate precursor and lithographic printing method |
| 01/12/2005 | EP1495370A2 Method for producing a mask adapted to a lighting device |
| 01/12/2005 | EP1495369A2 Interferometric measuring device and projection illumination installation comprising one such measuring device |
| 01/12/2005 | EP1495368A2 Printing elements and method for producing the same using digital imaging photopolymerization |
| 01/12/2005 | EP1495366A1 Method of treatment of porous dielectric films to reduce damage during cleaning |
| 01/12/2005 | EP1495365A1 Antireflective sio-containing compositions for hardmask layer |
| 01/12/2005 | EP1495312A1 Sample surface inspection apparatus and method |
| 01/12/2005 | EP1266922B1 Photocurable/thermosetting composition for forming matte film |
| 01/12/2005 | EP1023634B1 Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 01/12/2005 | CN1565035A Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 01/12/2005 | CN1564969A Process for manufacturing a microelectronic device |
| 01/12/2005 | CN1564968A Composition for forming antireflection film for lithography |
| 01/12/2005 | CN1564967A Method for forming image through reaction development |
| 01/12/2005 | CN1564966A Positive photoresist composition for liquid crystal device |
| 01/12/2005 | CN1564958A Method and system for correction of intrinsic birefringence in UV microlithography |
| 01/12/2005 | CN1564834A Process and composition for rapid mass production of holographic recording article |
| 01/12/2005 | CN1564084A Digital shape spliting mask prodn. method for microoptical element |
| 01/12/2005 | CN1564083A Light sensitive resin compsn. for black matrix |
| 01/12/2005 | CN1564082A Negative pressure fully automatic upper/lower sheet device of laser plotter |
| 01/12/2005 | CN1564053A High solution digital microoptical grey mask prodn. system and its prodn, method |
| 01/12/2005 | CN1564043A Method of mfg. microoptical lens |
| 01/12/2005 | CN1563315A Composition for removing residues from the microstructure |
| 01/12/2005 | CN1561962A Implanted degradable high molecular material medicine control-release carrier and its preparing process |
| 01/12/2005 | CN1184667C Filmforming method and device |
| 01/12/2005 | CN1184665C Auxiliary designing method of contact hole photoetching |
| 01/12/2005 | CN1184536C Chemically enhanced possitive photoetching compositions |
| 01/12/2005 | CN1184535C Optical imageable composite with improved flexibility |
| 01/12/2005 | CN1184534C Positive photoresist layer and prepn. method |
| 01/12/2005 | CN1184299C Photoresist cleaning composition |
| 01/11/2005 | US6842577 Solubility of polysilsesquioxane polymer is altered upon exposure to actinic radiation; developable in aqueous solution; electronics, optical waveguides |
| 01/11/2005 | US6842544 Method for apodizing a planar waveguide grating |
| 01/11/2005 | US6842500 Exposure apparatus and exposure method using same |
| 01/11/2005 | US6842298 Broad band DUV, VUV long-working distance catadioptric imaging system |
| 01/11/2005 | US6842294 Catadioptric objective |
| 01/11/2005 | US6842284 Joining plates of calcium fluoride and barium fluoride to form unitary blank with optically seamless joint; shaping, polishing; microlithography projection |
| 01/11/2005 | US6842277 Deformable mirror with high-bandwidth servo for rigid body control |
| 01/11/2005 | US6842256 Compensating for effects of variations in gas refractivity in interferometers |
| 01/11/2005 | US6842248 System and method for calibrating mirrors of a stage assembly |
| 01/11/2005 | US6842247 Reticle independent reticle stage calibration |
| 01/11/2005 | US6842230 Exposing method |
| 01/11/2005 | US6842229 Imprint lithography template comprising alignment marks |
| 01/11/2005 | US6842226 Flexure supported wafer table |
| 01/11/2005 | US6842225 Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device |
| 01/11/2005 | US6842224 Exposure method and apparatus |
| 01/11/2005 | US6842223 Projection tools; aperture enables good control of both isolated and dense pattern images on semiconductor wafers |
| 01/11/2005 | US6842222 Method of reducing pitch on semiconductor wafer |
| 01/11/2005 | US6842221 Exposure apparatus and exposure method, and device manufacturing method |
| 01/11/2005 | US6842220 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 01/11/2005 | US6842206 Substrate for electro-optical panel and fabrication method of the same, electro-optical panel and electronic device |
| 01/11/2005 | US6841965 Guideless stage with isolated reaction stage |
| 01/11/2005 | US6841956 Actuator to correct for off center-of-gravity line of force |
| 01/11/2005 | US6841889 Adjusting coordinates of a feature of mask in response to correction for zone in which feature is mapped; optical photolithography projection; integrated circuits |
| 01/11/2005 | US6841801 Mask for correcting optical proximity effect |
| 01/11/2005 | US6841787 Maskless photon-electron spot-grid array printer |
| 01/11/2005 | US6841786 Calculating radiation dose for light, ion or electron beam for counter stress; extreme ultraviolet radiation reflection masks; data processing |
| 01/11/2005 | US6841526 Cleaning solution for removing photoresist |
| 01/11/2005 | US6841488 Pattern formation method |
| 01/11/2005 | US6841475 Method for fabricating thin film transistors |
| 01/11/2005 | US6841465 Method of forming dual damascene pattern in semiconductor device |
| 01/11/2005 | US6841451 Method of fabricating semiconductor device having alignment mark |
| 01/11/2005 | US6841404 Method for determining optical constant of antireflective layer, and method for forming resist pattern |
| 01/11/2005 | US6841402 Alignment-mark detection methods and devices for charged-particle-beam microlithography, and microelectronic-device manufacturing methods comprising same |
| 01/11/2005 | US6841399 Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device |
| 01/11/2005 | US6841342 Substrate processing apparatus and substrate processing method |
| 01/11/2005 | US6841339 Silicon micro-mold and method for fabrication |
| 01/11/2005 | US6841338 Exposing a microelectronic structure that has a photoresist layer of a (co)polymer of p-hydroxystyrene and p-oxystyrene with a remnant ratio of 40-85% to light and developing |
| 01/11/2005 | US6841336 Free from print staining and excellent in press life due to use of alkali developing solution having low pH |
| 01/11/2005 | US6841334 Onium salts and positive resist materials using the same |
| 01/11/2005 | US6841333 Photochemically activated initiators for cationic addition polymerization in negative resists and polymer coating formulations |
| 01/11/2005 | US6841332 Achieves uniform volume growth in chemical expansion reaction on photomask via acid-catalyzed separations; semiconductors; integrated circuits |
| 01/11/2005 | US6841331 Admixing the polymer with a photoactive component |
| 01/11/2005 | US6841323 Mask producing method |
| 01/11/2005 | US6841322 Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems |
| 01/11/2005 | US6841321 Method and system for processing a semi-conductor device |
| 01/11/2005 | US6841315 An adjacent opaque part area with a transmission part area, by reducing the amount of exposing radiation transmitted through the area, improve the geometrical shape and dimensional accuracy of a photoresist pattern |
| 01/11/2005 | US6841308 Phase shift lithography provides control of the phase of an exposure of light beam at a target |
| 01/11/2005 | US6841307 Photomask making method and alignment method |
| 01/11/2005 | US6841306 Polymeric mold for providing a micro-scale part |
| 01/11/2005 | US6841031 Substrate processing apparatus equipping with high-pressure processing unit |
| 01/11/2005 | US6840640 Multi mirror system for an illumination system |
| 01/11/2005 | US6840638 Deformable mirror with passive and active actuators |
| 01/06/2005 | WO2005001914A1 Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array |
| 01/06/2005 | WO2005001913A1 Stage control apparatus, stage control method, light exposure apparatus, and light exposure method |
| 01/06/2005 | WO2005001912A1 Method of measuring focus deviation in pattern exposure and pattern exposure method |
| 01/06/2005 | WO2005001901A2 Wet developable hard mask in conjunction with thin photoresist for micro photolithography |
| 01/06/2005 | WO2005001844A1 Supporting unit, and moving table device and linear-motion guiding device using the supporting unit |
| 01/06/2005 | WO2005001593A2 Reference pattern extraction method and device, pattern matching method and device, position detection method and device, and exposure method and device |
| 01/06/2005 | WO2005001578A2 Developer composition for resists and method for formation of resist pattern |
| 01/06/2005 | WO2005001577A1 System and method for optical mertology of semiconductor wafers |
| 01/06/2005 | WO2005001576A1 Positive photosensitive composition |
| 01/06/2005 | WO2005001575A1 Photosensitive resin composition |
| 01/06/2005 | WO2005001574A1 Resist composition with enhanced x-ray and electron sensitivity |
| 01/06/2005 | WO2005001573A2 Adhesion method using gray-scale photolithography |
| 01/06/2005 | WO2005001572A2 Lithographic apparatus and device manufacturing method |
| 01/06/2005 | WO2005001570A1 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces |
| 01/06/2005 | WO2005001569A1 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 01/06/2005 | WO2005001567A1 Highly reflectivesubstrates for the digital processing of photopolymer printing plates |
| 01/06/2005 | WO2005001544A1 Optical unit, image-forming optical system, method for adjusting aberration of image-forming optical system, projection optical system, method for producing projection optical system, exposure apparatus, and exposure method |
| 01/06/2005 | WO2005001543A1 Projection optical system, exposure system, and device production method |