| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/18/2005 | US6844206 Refractive index system monitor and control for immersion lithography |
| 01/18/2005 | US6844144 Applying layer of polymerizable initiator to bearings; then polymer |
| 01/18/2005 | US6844143 Sandwich photoresist structure in photolithographic process |
| 01/18/2005 | US6844142 Imagewise exposure of the photopolymerizable relief-forming layer by means of actinic radiation, heating; removal of the softened, unpolymerized parts of the relief-forming layer with formation of a printing relief |
| 01/18/2005 | US6844141 Method for developing multilayer imageable elements |
| 01/18/2005 | US6844139 Direct digital imaging with infrared radiation; using acid generator free of elements presenting handling and disposal problems |
| 01/18/2005 | US6844138 Processes for producing lithographic printing plate |
| 01/18/2005 | US6844136 High resolution and speed including small negative types; ethylene oxide adduct diacrylate, binder, photoreducible dye and metallocene; long print run printing plates |
| 01/18/2005 | US6844135 Chemically amplified resist material and patterning method using same |
| 01/18/2005 | US6844134 For semiconductors; high transmittance; improved dry etching resistance, adhesiveness, and wettability |
| 01/18/2005 | US6844133 (Meth)acrylate polymer comprising (co)monomers having adamantane group such as 2-ethyl-2-adamantyl-methacrylate, 10.0 g of hydroxyadamantyl methacrylate, 15.2 g of 4,8-dioxatricyclo[4.2.1.03,7]nonan-5-on-2-yl methacrylate; sensitive to high energy radiation; resolution; micropatterning |
| 01/18/2005 | US6844132 Positive photosensitive compositions |
| 01/18/2005 | US6844131 Positive-working photoimageable bottom antireflective coating |
| 01/18/2005 | US6844130 Prepolymer having a carboxyl group in combination with at least two unsaturated bonds in its molecule, a polymerization initiator, a diluent, a di- or polyoxetane compound, and a curing promoter |
| 01/18/2005 | US6844123 System for production of large area display panels with improved precision |
| 01/18/2005 | US6844121 Enhancing performance of projector system; high temperature deposition of optical filter material |
| 01/18/2005 | US6844117 Reactive ion etching using a mixed gas including an oxygen containing gas and a halogen containing gas, and a reducing gas for dry etching a metal film; high precision pattern-etched product; dry etching apparatus |
| 01/18/2005 | US6844027 Environment exchange control for material on a wafer surface |
| 01/18/2005 | US6844023 Alumina insulation for coating implantable components and other microminiature devices |
| 01/18/2005 | US6843572 Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same |
| 01/18/2005 | US6843259 Solution treatment unit |
| 01/18/2005 | US6843175 Support for lithographic printing plate and presensitized plate |
| 01/13/2005 | WO2005004211A1 Focus test mask, focus measureing method, and exposure device |
| 01/13/2005 | WO2005004199A2 Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers |
| 01/13/2005 | WO2005003864A2 Apparatus and method for providing a confined liquid for immersion lithography |
| 01/13/2005 | WO2005003863A2 Device and method for processing a mask pattern used for the production of semiconductors |
| 01/13/2005 | WO2005003862A1 Device for the polarization-specific examination of an optical system |
| 01/13/2005 | WO2005003861A1 Positive type resist composition and method of forming resist pattern from the same |
| 01/13/2005 | WO2005003860A1 Photosensitive resin composition, laminate thereof and process for producing the same |
| 01/13/2005 | WO2005003859A2 Resist composition |
| 01/13/2005 | WO2005003858A2 Compositions comprising photoacid generators |
| 01/13/2005 | WO2005003198A1 Photoresist polymer compositions |
| 01/13/2005 | WO2005003196A1 Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern |
| 01/13/2005 | WO2005003193A1 Positive resist composition and method for forming resist pattern using same |
| 01/13/2005 | WO2005003192A1 Synthesis of photoresist polymers |
| 01/13/2005 | WO2004092835A3 Composition and method for printing a patterned resist layer |
| 01/13/2005 | WO2004092832A3 Determination of center of focus by parameter variability analysis |
| 01/13/2005 | WO2004077163A3 Method for creating a pattern on a wafer using a single photomask |
| 01/13/2005 | WO2004066366A3 Tailored reflecting diffractor for euv lithographic system aberration measurement |
| 01/13/2005 | WO2004037877A3 Organosiloxanes |
| 01/13/2005 | US20050010878 Generating an optical model for lens aberrations |
| 01/13/2005 | US20050009365 Method of forming fine patterns |
| 01/13/2005 | US20050009356 Method of manufacturing semiconductor device and method of cleaning plasma etching apparatus used therefor |
| 01/13/2005 | US20050009215 Semiconductor device manufacture method and etching system |
| 01/13/2005 | US20050009214 Method for aligning a wafer and apparatus for performing the same |
| 01/13/2005 | US20050009014 Sequence specific reagents attached to a solid substrate and capable of specifically binding to predetermined subunit sequence (polynucleotide or polypeptide) |
| 01/13/2005 | US20050008980 An abrasive sheet includs a substrate having two second major surfaces, an abrasive on the first surface, and hooking stems on the second; the stems are adapted to hook engaging structures on an opposed surface to releasably affix abrasive sheet to the surface |
| 01/13/2005 | US20050008979 Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus |
| 01/13/2005 | US20050008978 Spraying wiht hydrogen silsesquioxane compound; heating or irradiation with electron beams in vacuum ; reduced venting of water or hydrocarbons inside lithography apparatus |
| 01/13/2005 | US20050008976 Method of manufacturing an electronic device |
| 01/13/2005 | US20050008975 Chemical resistance; bonding strength; accuracte patterns; photolithography |
| 01/13/2005 | US20050008972 Multilayered body for photolithographic patterning |
| 01/13/2005 | US20050008971 Multilayer; supports, undercoatings, image recording layers; polymerization initiator and polymerizable compound |
| 01/13/2005 | US20050008970 Lithographic printing plate precursor and lithographic printing method using the same |
| 01/13/2005 | US20050008968 Basic compound, resist composition and patterning process |
| 01/13/2005 | US20050008967 Polymerizable composition and compound therefor |
| 01/13/2005 | US20050008964 Composition for forming anti-reflective coating for use in lithography |
| 01/13/2005 | US20050008955 Forming film from organometallic compound by combustion; forming resin on surface of substrate; absorption ; washing |
| 01/13/2005 | US20050008954 Color filter array having a yellow filter layer |
| 01/13/2005 | US20050008870 Photolithography; accumulation of electromagnetic radiation; controlling distribution; reducing number of mirrors; efficiency |
| 01/13/2005 | US20050008864 Substrate covered with photoresist; projecting patterned beam |
| 01/13/2005 | US20050008828 Patterned polymer microgel and method of forming same |
| 01/13/2005 | US20050008818 Curved honeycomb article, EUV apparatus having a curved honeycomb article, and method of making a curved honeycomb article |
| 01/13/2005 | US20050008360 Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate |
| 01/13/2005 | US20050008314 Fabrication of integrated circuit |
| 01/13/2005 | US20050008269 Hydrostatic bearing, alignment apparatus, exposure apparatus, and device manufacturing method |
| 01/13/2005 | US20050007677 Illumination system and method allowing for varying of both field height and pupil |
| 01/13/2005 | US20050007671 Spatial light modulator, method of spatially modulating a radiation beam, lithographic apparatus and device manufacturing method |
| 01/13/2005 | US20050007576 [holder of photomask] |
| 01/13/2005 | US20050007575 Exposure apparatus |
| 01/13/2005 | US20050007574 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/13/2005 | US20050007573 Device manufacturing method |
| 01/13/2005 | US20050007572 Lithographic apparatus and device manufacturing method |
| 01/13/2005 | US20050007570 Lithographic apparatus and device manufacturing method |
| 01/13/2005 | US20050007569 Lithographic apparatus and device manufacturing method |
| 01/13/2005 | US20050007567 Contact or proximity printing using a magnified mask image |
| 01/13/2005 | US20050006605 Lithography device |
| 01/13/2005 | US20050006603 Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method |
| 01/13/2005 | US20050006563 Lithographic apparatus, method of calibrating, and device manufacturing method |
| 01/13/2005 | US20050006343 Systems for magnification and distortion correction for imprint lithography processes |
| 01/13/2005 | US20050006340 Method for preventing formation of photoresist scum |
| 01/13/2005 | US20050005801 Method and device for forming a surface structure on a wafer |
| 01/13/2005 | US20050005799 Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate |
| 01/13/2005 | US20050005794 Coating method and planographic printing plate |
| 01/13/2005 | US20050005707 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects |
| 01/13/2005 | DE202004017044U1 Cold UV LED light unit to expose silk screen stencil, offset printing plates, flexo printing plates |
| 01/13/2005 | DE10309266B3 Verfahren zum Bilden einer Öffnung einer Licht absorbierenden Schicht auf einer Maske A method of forming an opening of a light-absorbing layer on a mask |
| 01/13/2005 | DE10116060B4 Lithograph mit Triggermaske und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium Lithograph with trigger mask and method of producing digital holograms in a storage medium |
| 01/12/2005 | EP1496545A1 Resist removing apparatus and method of removing resist |
| 01/12/2005 | EP1496544A1 Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| 01/12/2005 | EP1496540A2 Exposure system and exposure method |
| 01/12/2005 | EP1496521A1 Mirror and lithographic apparatus with mirror |
| 01/12/2005 | EP1496510A1 Stamper original and its manufacturing method, stamper and its manufacturing method, and optical disk |
| 01/12/2005 | EP1496399A2 Exposure apparatus |
| 01/12/2005 | EP1496398A1 Apparatus for polarisation related inspection, optical projection system and calibration method |
| 01/12/2005 | EP1496397A1 Method and system for feedforward overlay correction of pattern induced distortion and displacement, and lithographic projection apparatus using such a method and system |
| 01/12/2005 | EP1496396A1 Positively photosensitive resin composition and method of pattern formation |
| 01/12/2005 | EP1496395A2 Photosensitive resin precursor composition |
| 01/12/2005 | EP1496394A2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 01/12/2005 | EP1496077A1 Novel polyether compound containing acid group and unsaturated group, process for producing the same, and resin composition |