| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/20/2005 | US20050012928 Apparatus and method for measuring overlay by diffraction gratings |
| 01/20/2005 | US20050012920 High resolution, dynamic positioning mechanism for specimen inspection and processing |
| 01/20/2005 | US20050012919 Photosensitive tabular member suction mechanism and image recording device |
| 01/20/2005 | US20050012918 System and method for measuring displacement of a stage |
| 01/20/2005 | US20050012917 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 01/20/2005 | US20050012916 Lithographic apparatus and device manufacturing method |
| 01/20/2005 | US20050012915 Lithographic apparatus and device manufacturing method |
| 01/20/2005 | US20050012914 Multiple mask step and scan aligner |
| 01/20/2005 | US20050012913 Masking device, lithographic apparatus, and device manufacturing method |
| 01/20/2005 | US20050012912 Lithographic apparatus and device manufacturing method |
| 01/20/2005 | US20050012052 Ion irradiation of a target at very high and very low kinetic ion energies |
| 01/20/2005 | US20050011581 Chamber, exposure apparatus, and device manufacturing method |
| 01/20/2005 | US20050011537 Substrate processing method and apparatus |
| 01/20/2005 | US20050011384 Printing method |
| 01/20/2005 | US20050011382 Integrated, in-line bumping and exposure system |
| 01/20/2005 | DE10341551A1 Process for exposing the inner surface of a cylinder comprises applying a mask film on the inner surface by feeding the film into the cylinder, introducing compressed air, and exposing the inner surface through the film |
| 01/20/2005 | DE10328938A1 Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie Correcting means for compensating for disturbances of polarization distribution, and projection objective for microlithography |
| 01/20/2005 | DE10326223A1 Thin film patterning method by optical lithography, e.g. for bio-chip manufacture, by forming evanescent sections in thin film to increase their solubility |
| 01/20/2005 | DE10324468A1 Mikrolithografische Projektionsbelichtungsanlage, Projektionsobjektiv hierfür sowie darin enthaltenes optisches Element Microlithographic projection exposure apparatus, projection lens for this purpose and contained therein optical element |
| 01/20/2005 | DE10323378B3 Test mark arrangement for detection of alignment and measuring mark structures in lithographic structuring of substrate for integrated circuit manufacture using 5 parallel rows of differing test mark elements |
| 01/19/2005 | EP1498781A2 Lithographic apparatus and device manufacturing method |
| 01/19/2005 | EP1498780A2 Substrate holder and lithographic projection apparatus |
| 01/19/2005 | EP1498779A2 Marker structure for alignment or overlay |
| 01/19/2005 | EP1498778A1 Lithographic apparatus and device manufacturing method |
| 01/19/2005 | EP1498777A1 Substrate holder and lithographic projection apparatus |
| 01/19/2005 | EP1498776A2 Method for forming pattern, and optical element |
| 01/19/2005 | EP1498775A2 Large-size substrate for photolithographic applications |
| 01/19/2005 | EP1498750A1 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 01/19/2005 | EP1498394A1 Synthetic quartz glass for optical member, projection exposure device, and projection exposure method |
| 01/19/2005 | EP1498281A2 Printing method using printing plate |
| 01/19/2005 | EP1498262A1 Method and apparatus for producing a screen printing stencil and a screen with a stencil |
| 01/19/2005 | EP1498261A2 Planographic printing plate precursor |
| 01/19/2005 | EP1497698A1 Method, device and computer program product for lithography |
| 01/19/2005 | EP1497697A2 Photoresist compositions comprising acetals and ketals as solvents |
| 01/19/2005 | EP1497696A2 Photocurable compositions containing reactive particles |
| 01/19/2005 | EP1497695A2 Nanoimprint resist |
| 01/19/2005 | EP1497611A2 Scatterometric measurement of undercut multi-layer diffracting structures |
| 01/19/2005 | EP1497368A1 Novolak resin mixtures and photosensitive compositions comprising the same |
| 01/19/2005 | EP1497341A1 Preparation of homo-, co- and terpolymers of substituted styrenes |
| 01/19/2005 | EP1497122A1 Stabilized infrared-sensitive polymerizable systems |
| 01/19/2005 | EP1497102A1 Device and method for transferring a pattern to a substrate |
| 01/19/2005 | EP1194803B1 Broad band ultraviolet catadioptric imaging system |
| 01/19/2005 | EP0948757B9 Method of contact printing on gold coated films |
| 01/19/2005 | CN1568444A Photosnesitive resin composition comprising quinonediazide sulfate ester compound |
| 01/19/2005 | CN1567543A Method and equipment for preventing base plate from being polluted by condensation liquid |
| 01/19/2005 | CN1567542A Method for improving assembly non-defective rate of sensing components |
| 01/19/2005 | CN1567095A Photoresistive striping process |
| 01/19/2005 | CN1567094A Wet etching apparatus |
| 01/19/2005 | CN1567093A Apparatus for preventing liquid spitting back |
| 01/19/2005 | CN1567092A Exposure process for different levels |
| 01/19/2005 | CN1567091A An electron beam reduced projection exposure imaging system |
| 01/19/2005 | CN1567090A Reclaiming system for tetramethylammonium hydroxide developing liquid and method therefor |
| 01/19/2005 | CN1567089A Machine arrangement for dust-free chamber production program |
| 01/19/2005 | CN1567088A X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
| 01/19/2005 | CN1567087A Method for making T type grating through combination of X-ray etching and optical etching |
| 01/19/2005 | CN1567080A Structure releasing arrangement and method for preparing same |
| 01/19/2005 | CN1567079A Method of making optical interference type display units |
| 01/19/2005 | CN1567071A Thin film transistor panel manufacturing method, etching bath cleaning method and use of alkali |
| 01/19/2005 | CN1567068A Method of making optical spacing walls |
| 01/19/2005 | CN1567017A Method of making aspheric surface lens |
| 01/19/2005 | CN1566998A Light guiding board and method for preparing same |
| 01/19/2005 | CN1566997A Method for making light guiding board core |
| 01/19/2005 | CN1185911C Liquid droplet mist generating method and apparatus, mask-alignment for ultraviolet light source and substrate |
| 01/19/2005 | CN1185688C Method of forming patterned photoresist |
| 01/19/2005 | CN1185687C Detergent for lithography |
| 01/19/2005 | CN1185673C 铁电发射体 Ferroelectric emitters |
| 01/19/2005 | CN1185645C Method for manufacturing original edition CD |
| 01/19/2005 | CN1185551C Method for detecting corrected accuracy of optical cover machine table |
| 01/19/2005 | CN1185550C Multiple exposing method |
| 01/19/2005 | CN1185549C Optical nearby correcting method based on contact hole model |
| 01/19/2005 | CN1185548C Process for making shallow trench isolation |
| 01/19/2005 | CN1185547C IR- and UV-radiation-sensitive composition and lithographic plate |
| 01/19/2005 | CN1185492C Single-point strobed micro electromagnetic units array chip or electromagnetic biologic chip and application thereof |
| 01/19/2005 | CN1185268C Organic anti-reflecting cladding polymer, anti-reflecting cladding composition containing same and its preparation method |
| 01/18/2005 | US6845497 Method for fabrication of patterns and semiconductor devices |
| 01/18/2005 | US6845287 Method, system, and computer program product for improved trajectory planning and execution |
| 01/18/2005 | US6845145 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices |
| 01/18/2005 | US6844994 Optical element deformation system |
| 01/18/2005 | US6844982 Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system |
| 01/18/2005 | US6844972 Reducing aberration in optical systems comprising cubic crystalline optical elements |
| 01/18/2005 | US6844922 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus |
| 01/18/2005 | US6844921 Wafer holder |
| 01/18/2005 | US6844920 Exposure device and method for compensating optical defects |
| 01/18/2005 | US6844919 Projection optical system and exposure apparatus having the projection optical system |
| 01/18/2005 | US6844918 Alignment system and methods for lithographic systems using at least two wavelengths |
| 01/18/2005 | US6844917 Method of determining movement sequence and apparatus for realizing it |
| 01/18/2005 | US6844916 Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers |
| 01/18/2005 | US6844915 Optical system and exposure apparatus provided with the optical system |
| 01/18/2005 | US6844696 Electromagnetic alignment and scanning apparatus |
| 01/18/2005 | US6844695 Electromagnetic alignment and scanning apparatus |
| 01/18/2005 | US6844694 Stage assembly and exposure apparatus including the same |
| 01/18/2005 | US6844678 Short arc discharge lamp |
| 01/18/2005 | US6844560 Lithography system comprising a converter plate and means for protecting the converter plate |
| 01/18/2005 | US6844379 Organic component comprises long-chain cycloaliphatic epoxy resin, short-chain cycloaliphatic epoxy resin, cyanate ester, lewis acid catalyst; useful in die attach adhesives, underfills, encapsulants, via fills, prepreg binders |
| 01/18/2005 | US6844375 Emission-free, photocationic crosslinkers for production of solvent-resistant and transparent films |
| 01/18/2005 | US6844272 Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers |
| 01/18/2005 | US6844270 Polymers and photoresist compositions for short wavelength imaging |
| 01/18/2005 | US6844267 Anisotropic etching of organic-containing insulating layers |
| 01/18/2005 | US6844266 Anisotropic etching of organic-containing insulating layers |
| 01/18/2005 | US6844244 Dual sided lithographic substrate imaging |