| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/26/2005 | CN1570760A Correction for optical proximity effect of contact hole, mask and semiconductor device manufacturing method |
| 01/26/2005 | CN1570739A Fabrication method for reflecting electrode applied in reflective panel display and photo mask |
| 01/26/2005 | CN1570678A Light conducting plate and manufacturing method thereof |
| 01/26/2005 | CN1570585A Field measurement method for aberration of imaging optical system |
| 01/25/2005 | US6848066 Using photolithography tool; conveying substrate; automatic focusing predetermination of image onto semiconductor surface using computer |
| 01/25/2005 | US6847919 Characterizing an exposure tool for patterning a wafer |
| 01/25/2005 | US6847485 Beam shaping element for use in a lithographic system |
| 01/25/2005 | US6847464 Measurement of photolithographic features |
| 01/25/2005 | US6847461 System and method for calibrating a spatial light modulator array using shearing interferometry |
| 01/25/2005 | US6847434 Method and apparatus for a pellicle frame with porous filtering inserts |
| 01/25/2005 | US6847433 Long range errors (e.g. lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected; determining deformation values to compensate for the errors |
| 01/25/2005 | US6847432 Alignment system and projection exposure apparatus |
| 01/25/2005 | US6847431 Method and device for controlling fluid flow in an optical assembly |
| 01/25/2005 | US6847430 Lithographic apparatus and device manufacturing method |
| 01/25/2005 | US6847044 Electrical discharge gas plasma EUV source insulator components |
| 01/25/2005 | US6846938 Useful for hydrophilic, water-compatible, water-swellable, or water-wettable coatings and materials; good solution compatibility with oppositely charged polyelectrolytes |
| 01/25/2005 | US6846895 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition |
| 01/25/2005 | US6846789 Removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of |
| 01/25/2005 | US6846618 Process for improving critical dimension uniformity |
| 01/25/2005 | US6846617 Facilitating optical proximity effect correction through pupil filtering |
| 01/25/2005 | US6846616 Process for production of pattern-forming body |
| 01/25/2005 | US6846615 Method for making lithographic printing plate |
| 01/25/2005 | US6846614 Without requiring a preheat step or a separate development step |
| 01/25/2005 | US6846613 Suitable for wet lithographic printing |
| 01/25/2005 | US6846612 Polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore such as 4-hydroxybenzoic acid, trimellitic anhydride |
| 01/25/2005 | US6846610 Positive photosensitive resin composition |
| 01/25/2005 | US6846609 Mixture of copolymer of hydroxystyrene with hydroxy-1-adamantyl (methy)acrylate and acid generators |
| 01/25/2005 | US6846607 For increasing sensitivity of photoresist useful for microfabrication of integrated circuits utilizing deep ultraviolet rays (from excimer lasers) and x-rays; resolution; profile |
| 01/25/2005 | US6846605 Containing an organic borate with a boron anion and a cation, especially a quaternary ammonium cation; excellent sensitivity, storage stability and photodecolorizability |
| 01/25/2005 | US6846598 Overcoating with photoresist forming light shielding patterns; transferring pattern |
| 01/25/2005 | US6846595 Method of improving photomask geometry |
| 01/25/2005 | US6846572 Curable composition, cured product, and laminate |
| 01/25/2005 | US6846360 Apparatus and method for bubble-free application of a resin to a substrate |
| 01/25/2005 | US6846149 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| 01/25/2005 | US6846086 Mirror assembly with thermal contour control |
| 01/20/2005 | WO2005006456A1 Imprint lithography for superconductor devices |
| 01/20/2005 | WO2005006431A1 System and method for integrating in-situ metrology within a wafer process |
| 01/20/2005 | WO2005006424A1 Method and apparatus for removing a residual organic layer from a substrate using reactive gases |
| 01/20/2005 | WO2005006418A1 Exposure apparatus and method for manufacturing device |
| 01/20/2005 | WO2005006417A1 Exposure apparatus and method for manufacturing device |
| 01/20/2005 | WO2005006416A1 Linking unit, exposure apparatus and method for manufacturing device |
| 01/20/2005 | WO2005006415A1 Exposure apparatus and method for manufacturing device |
| 01/20/2005 | WO2005006414A1 Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus |
| 01/20/2005 | WO2005006086A1 Hologram recording material, process for producing the same and hologram recording medium |
| 01/20/2005 | WO2005006083A1 Developing solution for photosensitive composition and method for forming patterned resist film |
| 01/20/2005 | WO2005006082A1 Image producing methods and image producing devices |
| 01/20/2005 | WO2005006081A1 Facet mirrors and a method for producing mirror facets |
| 01/20/2005 | WO2005006080A1 Method for evaluating reproduced images of wafers |
| 01/20/2005 | WO2005006079A1 Lighting device for a microlithographic projection exposure system |
| 01/20/2005 | WO2005006078A1 Resist composition, multilayer body, and method for forming resist pattern |
| 01/20/2005 | WO2005006077A1 Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern |
| 01/20/2005 | WO2005006076A2 Systems for magnification and distortion correction for imprint lithography processes |
| 01/20/2005 | WO2005006075A1 Exposure station for film webs |
| 01/20/2005 | WO2005006026A2 Using isotopically specified fluids as optical elements |
| 01/20/2005 | WO2005005694A1 Artificail crystal member, exposure system, and producton method for exposure system |
| 01/20/2005 | WO2005005404A1 Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation |
| 01/20/2005 | WO2005005147A1 Method and device for manufacturing relief printing plate terminal for seamless printing |
| 01/20/2005 | WO2005005136A1 Nanoimprinting apparatus and method |
| 01/20/2005 | WO2005005121A2 A method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods |
| 01/20/2005 | WO2004107054A3 Projection lighting installation |
| 01/20/2005 | WO2004107045A3 Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
| 01/20/2005 | WO2004102279A3 Method of manufacturing an electronic device |
| 01/20/2005 | WO2004102276A3 Method for etching high aspect ratio semiconductor features using organic phot0-resist layers |
| 01/20/2005 | WO2004100282A3 Manufacture of a polymer device |
| 01/20/2005 | WO2004095134A3 Photolithographic process, stamper, use of said stamper and optical data storage medium |
| 01/20/2005 | WO2004090978A3 Overlay metrology mark |
| 01/20/2005 | WO2004074929A3 Radiation-sensitive compositions and imageable elements based thereon |
| 01/20/2005 | WO2004066364A3 Binder diffusion patterning of a thick film paste layer |
| 01/20/2005 | WO2004065316A3 Polymer derived ceramic materials |
| 01/20/2005 | WO2004065287A3 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 01/20/2005 | WO2003102692A8 Radiation-sensitive compositions containing polymeric sulfonate acid generators and their use in imaging |
| 01/20/2005 | US20050015739 Method for creating patterns for producing integrated circuits |
| 01/20/2005 | US20050015233 Method for computing partially coherent aerial imagery |
| 01/20/2005 | US20050015183 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects |
| 01/20/2005 | US20050015170 System and methods for imaging employing a levitating conveyor |
| 01/20/2005 | US20050015165 Semiconductor production system |
| 01/20/2005 | US20050014876 Photosensitive resin precursor composition |
| 01/20/2005 | US20050014667 Aqueous fluoride compositions for cleaning semiconductor devices |
| 01/20/2005 | US20050014386 Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device |
| 01/20/2005 | US20050014100 Variations in refractive index; forming pattern using photosensitive resin |
| 01/20/2005 | US20050014099 Positioning photoresist on wafer; masking; exposure to light source; phase shifting |
| 01/20/2005 | US20050014098 Biocompatible resists |
| 01/20/2005 | US20050014096 Photoactive adhesion promoter |
| 01/20/2005 | US20050014095 Sulfonate and a resist composition |
| 01/20/2005 | US20050014094 Organic anti-reflective coating composition and pattern forming method using the same |
| 01/20/2005 | US20050014093 Planographic printing plate precursor |
| 01/20/2005 | US20050014092 Novel compound, polymer, resist composition, and patterning process |
| 01/20/2005 | US20050014091 Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes |
| 01/20/2005 | US20050014090 Resist composition |
| 01/20/2005 | US20050014089 Fine pattern photoresists for photolithography; protective coatings |
| 01/20/2005 | US20050014087 an acrylic ester copolymer with a monomer unit having a 2,6-dioxabicyclo[3.3.0]octane ring and two other monomers having different bridged bicyclic or tricyclic lactones and a photosensitive acid generator; semiconductors; dry etch resistance; well balanced solubility |
| 01/20/2005 | US20050014086 "High ortho" novolak copolymers and composition thereof |
| 01/20/2005 | US20050014078 Reticles and methods of forming and using the same |
| 01/20/2005 | US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 01/20/2005 | US20050014073 Photolithography; exposure mask on adjustment panel; accuracy fitting; insertion holes; automatic optical detection |
| 01/20/2005 | US20050013972 Large-size substrate |
| 01/20/2005 | US20050013338 Long-pulse pulse power system for gas discharge laser |
| 01/20/2005 | US20050013328 Laser radiation source |
| 01/20/2005 | US20050013012 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method |
| 01/20/2005 | US20050012938 Apparatus and method for detecting wafer position |