| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/27/2005 | US20050019709 Method and apparatus for maintaining a machine part |
| 01/27/2005 | US20050019707 Method for forming patterned insulating elements and methods for making electron source and image display device |
| 01/27/2005 | US20050019706 Method for developing multilayer imageable elements |
| 01/27/2005 | US20050019705 Applying iquid coating layer of a positive-acting photoresist comprising photoacid generator and resin on substrate surface; removing solvent; exposure to patterned activating radiation; heating; developing to form relief image |
| 01/27/2005 | US20050019704 Coating substrates with subbing layers comprising terpolymers and acid generators, then covering with ultraviolet radiation layers, exposing and selectively etching to form patterns; miniaturization; microelectronics |
| 01/27/2005 | US20050019703 Photocatalysts; color filters |
| 01/27/2005 | US20050019702 Resist exposure system and method of forming a pattern on a resist |
| 01/27/2005 | US20050019701 coating photoresist on substrate, exposing, developing, and etching |
| 01/27/2005 | US20050019697 Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systems |
| 01/27/2005 | US20050019696 Photoresist composition |
| 01/27/2005 | US20050019693 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 01/27/2005 | US20050019692 Resist material and method for pattern formation |
| 01/27/2005 | US20050019691 Positive photoresist composition and patterning process using the same |
| 01/27/2005 | US20050019690 Positive photosensitive composition and method of forming resist pattern |
| 01/27/2005 | US20050019689 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition |
| 01/27/2005 | US20050019688 Quaternary ammonium hydroxide with at least one alkyl having 3+ carbon atoms, a water soluble amine in given ratio to the ammonium hydroxide, water, a corrosion inhibitor and a water soluble organic solvent; corrosion protection of copper, aluminum with efficient stripping |
| 01/27/2005 | US20050019675 Lithographic apparatus, device manufacturing method, and mask |
| 01/27/2005 | US20050018997 Lithographic apparatus and device manufacturing method |
| 01/27/2005 | US20050018990 Polymeric optical waveguide-forming master plate, method for producing polymer optical waveguide, and aperture changeable polymeric optical waveguide |
| 01/27/2005 | US20050018739 Timing control for two-chamber gas discharge laser system |
| 01/27/2005 | US20050018737 Discharge laser with porous insulating layer covering anode discharge surface |
| 01/27/2005 | US20050018312 Projection lens for a microlithographic projection exposure apparatus |
| 01/27/2005 | US20050018296 Diffractive optical element and method of making same |
| 01/27/2005 | US20050018289 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 01/27/2005 | US20050018278 Method for evaluating image formation performance |
| 01/27/2005 | US20050018277 Method for evaluating image formation performance |
| 01/27/2005 | US20050018269 Optical system |
| 01/27/2005 | US20050018255 Image-recording apparatus using spatial light-modulation device on which divided reset actuation is performed |
| 01/27/2005 | US20050018208 Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 01/27/2005 | US20050018206 Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems |
| 01/27/2005 | US20050018190 Overlay alignment metrology using diffraction gratings |
| 01/27/2005 | US20050018169 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method |
| 01/27/2005 | US20050018168 Substrate holding device, substrate processing apparatus using the same, and method for aligning and holding substrate |
| 01/27/2005 | US20050018167 Method and apparatus for positioning a substrate on a substrate table |
| 01/27/2005 | US20050018166 Stage system, exposure apparatus, and device manufacturing method |
| 01/27/2005 | US20050018165 Stage system, exposure apparatus, and device manufacturing method |
| 01/27/2005 | US20050018164 Exposure with intensity balancing to mimic complex illuminator shape |
| 01/27/2005 | US20050018163 Lithographic apparatus, device manufacturing method, and computer-readable storage medium |
| 01/27/2005 | US20050018162 Lithographic apparatus, device manufacturing method, and angular encoder |
| 01/27/2005 | US20050018161 Positioning method, and positioning apparatus |
| 01/27/2005 | US20050018160 Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device |
| 01/27/2005 | US20050018157 Lithographic projection apparatus and device manufacturing method |
| 01/27/2005 | US20050018156 Lithographic apparatus and device manufacturing method |
| 01/27/2005 | US20050018155 Lithographic apparatus and device manufacturing method |
| 01/27/2005 | US20050018154 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/27/2005 | US20050017831 Alignment apparatus |
| 01/27/2005 | US20050017318 Circuit array substrate and method of manufacturing the same |
| 01/27/2005 | US20050017198 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| 01/27/2005 | US20050016685 Substrate holding technique |
| 01/27/2005 | US20050016679 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
| 01/27/2005 | US20050016449 Photoresist coating system |
| 01/27/2005 | DE20320446U1 Aufspannvorrichtung zum Modulieren von Formen und Substraten Clamping device for modulating shapes and substrates |
| 01/27/2005 | DE10350705A1 Method for manufacturing integrated circuit by lithographic structuring illuminates mask film on substrate by two mask patterns from two radiation sources via two exposure masks |
| 01/27/2005 | DE10332112A1 Manufacturing semiconductor, other finely-structured components involves setting working distance at least temporarily to less than maximum size of optical near field of emanating projection light |
| 01/27/2005 | DE10332059A1 Analysis of microlithography objects, especially masks using aerial image measurement systems, whereby a detected image is corrected using a transfer function correction filter |
| 01/27/2005 | DE10329793A1 Microlithographic projection illumination system projection objective has gray filter with locally varying gray value for compensating polarization distribution disturbance caused by optical element |
| 01/27/2005 | DE10328811A1 Verbindung zur Bildung einer selbstorganisierenden Monolage, Schichtstruktur, Halbleiterbauelement mit einer Schichtstruktur und Verfahren zur Herstellung einer Schichtstruktur Compound to form a self-assembled monolayer layer structure semiconductor device having a layer structure and process for producing a layer structure |
| 01/27/2005 | DE10328302A1 Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken Low viscosity, radiation curable formulation, in particular for stereolithography, for use in medical technology, in particular for the production of earpieces |
| 01/26/2005 | EP1500987A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/26/2005 | EP1500986A1 Lithographic apparatus and device manufacturing method |
| 01/26/2005 | EP1500985A2 Safety mechanism for a lithographic patterning device |
| 01/26/2005 | EP1500984A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/26/2005 | EP1500983A2 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus |
| 01/26/2005 | EP1500982A1 Lithographic apparatus and device manufacturing method |
| 01/26/2005 | EP1500981A1 Lithographic apparatus and device manufacturing method |
| 01/26/2005 | EP1500980A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/26/2005 | EP1500979A1 Lithographic apparatus and device manufacturing method |
| 01/26/2005 | EP1500978A2 Photosensitive metal nanoparticle and method of forming conductive pattern using the same |
| 01/26/2005 | EP1500977A1 Radiation-sensitive composition, compound and pattern formation method using the radiation-sensitive composition |
| 01/26/2005 | EP1500976A1 Dissolution inhibitors in photoresist compositions for microlithography |
| 01/26/2005 | EP1500975A2 Process for the fabrication of optical microstructures |
| 01/26/2005 | EP1500974A2 A method, program product and apparatus of simultaneous optimization for na-sigma exposure settings and scattering bars opc using a device layout |
| 01/26/2005 | EP1500515A2 Addressing the imaging elements of a spatial light modulator in an image recording apparatus |
| 01/26/2005 | EP1500498A2 Lithographic printing plate precursour and lithographic printing method |
| 01/26/2005 | EP1499926A1 Method for producing microhole structures |
| 01/26/2005 | EP1499925A2 Lighting system, particularly for use in extreme ultraviolet (euv) lithography |
| 01/26/2005 | EP1499924A2 Imaging method |
| 01/26/2005 | EP1499923A1 Photopolymerizable compositions and flexographic printing plates derived therefrom |
| 01/26/2005 | EP1499646A1 Photocrosslinkable multi-coating system having improved gas-barrier properties |
| 01/26/2005 | EP1499490A1 Method for producing three-dimensional bodies or three-dimensional surfaces by laser radiation |
| 01/26/2005 | EP1499464A1 Method and apparatus for production of a cast component |
| 01/26/2005 | EP1235863B1 Use of an additive composition for increasing the storage stability of ethylenically unsaturated resins |
| 01/26/2005 | EP0898732B1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers |
| 01/26/2005 | CN1572128A Photoimageable dielectric material for circuit protection |
| 01/26/2005 | CN1571943A A method of illuminating a photomask using chevron illumination |
| 01/26/2005 | CN1571788A Photoactivable nitrogen bases |
| 01/26/2005 | CN1571118A Remodeling technique of semiconductor pattern photoresist layer |
| 01/26/2005 | CN1570773A 等离子体反应室 A plasma reaction chamber |
| 01/26/2005 | CN1570772A Anticorrosive developing composition |
| 01/26/2005 | CN1570771A Exposing method and manufacturing method of semiconductor device using the same |
| 01/26/2005 | CN1570770A 装置制造方法 Apparatus manufacturing method |
| 01/26/2005 | CN1570769A Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 01/26/2005 | CN1570768A Three dimensional microstructure processing method based on thick rubber photoetching |
| 01/26/2005 | CN1570767A Discharging unit for discharging a photosensitive material, coater and apparatus for coating a photosensitive material |
| 01/26/2005 | CN1570766A Photoresist coating device |
| 01/26/2005 | CN1570765A Positive photoresistive agent composition and method for forming photoresistive pattern |
| 01/26/2005 | CN1570764A Light-sensitive resin composition for black matrix |
| 01/26/2005 | CN1570763A Fluorinated si-polymers and photoresists comprising same |
| 01/26/2005 | CN1570762A Polymers and photoresists comprising same |
| 01/26/2005 | CN1570761A Method and apparatus for maintaining a machine part |