| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/02/2005 | CN1573558A Light mask manufacturing method capable of avoiding electron beam offset due to charge effect |
| 02/02/2005 | CN1573557A Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 02/02/2005 | CN1573556A Position correction in y of mask object shift due to Z offset and non-perpendicular illumination |
| 02/02/2005 | CN1573555A Patten drawing device |
| 02/02/2005 | CN1573554A Method of optical proximity correction design for contact hole mask |
| 02/02/2005 | CN1573553A Composition for forming wiring protective film and uses thereof |
| 02/02/2005 | CN1573552A Plus photoresist composition and resist pattern forming method |
| 02/02/2005 | CN1573551A Chemical amplification type plus photoresist composition and resist pattern forming method |
| 02/02/2005 | CN1573550A Plus photoresist composition and resist pattern forming method |
| 02/02/2005 | CN1573549A Chemical amplification type plus photoresist composition and resist pattern forming method |
| 02/02/2005 | CN1573548A Method for evaluating sensitivity of photoresist, method for preparation of photoresist |
| 02/02/2005 | CN1573547A Pad for display panel, radiosensitive resin composition, and liquid crystal display device |
| 02/02/2005 | CN1573546A Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the displ |
| 02/02/2005 | CN1573545A Light-sensitive sheet, light-sensitive layers, image pattern forming method, and wiring pattern forming method |
| 02/02/2005 | CN1573544A Plus photoresist composition for manufacturing system LCD and method for making resist pattern |
| 02/02/2005 | CN1573543A Photosensitive metal nanoparticle and method of forming conductive pattern using the same |
| 02/02/2005 | CN1573542A Colored photoresist composition |
| 02/02/2005 | CN1573541A Method for coating a substrate for EUV lithography and substrate with photoresist layer |
| 02/02/2005 | CN1573540A Water soluble negative photoresist and method for forming photoresist pattern |
| 02/02/2005 | CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 02/02/2005 | CN1573471A Method and apparatus of manufacturing reflector |
| 02/02/2005 | CN1573414A Pixel position specifying method, method of correcting image offset, and image forming device |
| 02/02/2005 | CN1573410A Laser device |
| 02/02/2005 | CN1573406A Apparatus and method for projection exposure |
| 02/02/2005 | CN1573405A Optical projection system |
| 02/02/2005 | CN1573404A Projection optical system, exposure apparatus, and device manufacturing method |
| 02/02/2005 | CN1573370A Colored composition, method of manufacturing color filter, and method of manufacturing black matrix substrate |
| 02/02/2005 | CN1573369A Sensitive black composition, black substrate using same and color filter |
| 02/02/2005 | CN1187655C Retaining device for photo blanks |
| 02/02/2005 | CN1187654C Radiation-sensitive resin composition |
| 02/02/2005 | CN1187653C Manufacturing method of micro-pipeline |
| 02/02/2005 | CN1187190C Making image on printing plate using ultrashort laser pulse |
| 02/01/2005 | USH2114 Inspection tool for testing and adjusting a projection unit of a lithography system |
| 02/01/2005 | US6851103 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 02/01/2005 | US6850854 Semiconductor production system |
| 02/01/2005 | US6850371 Optical member and method of producing the same, and projection aligner |
| 02/01/2005 | US6850367 Light exposure apparatus and light emitting device therefor |
| 02/01/2005 | US6850332 Method for measuring step difference in a semiconductor device and apparatus for performing the same |
| 02/01/2005 | US6850330 Reticle focus measurement system using multiple interferometric beams |
| 02/01/2005 | US6850327 Inspection method and apparatus for projection optical systems |
| 02/01/2005 | US6850229 Capacitive sensing and data input device power management |
| 02/01/2005 | US6849870 Organic gate insulating film and organic thin film transistor using the same |
| 02/01/2005 | US6849668 For radiation curable compositions, especially for photocurable compositions |
| 02/01/2005 | US6849558 Replication and transfer of microstructures and nanostructures |
| 02/01/2005 | US6849540 Method of fabricating semiconductor integrated circuit device and method of producing a multi-chip module that includes patterning with a photomask that uses metal for blocking exposure light and a photomask that uses organic resin for blocking exposure light |
| 02/01/2005 | US6849391 Alkali-soluble novolak resin and a photosensitive compound having a naphthoquinone diazide group; absorption coefficient alpha of the photoresist for an exposure light falls in the range of 0.5<alpha</=7 |
| 02/01/2005 | US6849389 Lower sulfite/sulfate concentration on the wafer due to plasma treatment translates into less moisture pick up and prevents high aspect ratio collapse; microelectronics |
| 02/01/2005 | US6849388 Self-aligning contacts for stacked electronics |
| 02/01/2005 | US6849386 Stable adhesiveness between a heat-sensitive layer and a silicone rubber layer as well as a high aging stability of a coating solution. |
| 02/01/2005 | US6849385 Polyamide or polyamideimide from an aromatic diamine having a carboxy photosensitive group, e.g., 2-methacryloyloxyethyl 3,5-diaminobenzoate; unsaturated silane coupler; monomer having at least 5 unsaturated bonds |
| 02/01/2005 | US6849384 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions |
| 02/01/2005 | US6849383 Photosensitive resin laminate, and signboard plate and signboard made of the laminate |
| 02/01/2005 | US6849382 Photosensitive polymer containing silicon and a resist composition using the same |
| 02/01/2005 | US6849381 Copolymers and photoresist compositions comprising same |
| 02/01/2005 | US6849380 Positive heat-sensitive lithographic printing plate |
| 02/01/2005 | US6849378 Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns |
| 02/01/2005 | US6849377 Fluorine-containing copolymer comprising a repeat unit derived from a polycyclic ethylenically unsaturated compound (e.g, a tricyclo(4.2.1.0(2,5))nonane) having a fluorine atom, perfluoroalkyl group, or perfluoroalkoxy group |
| 02/01/2005 | US6849376 Polymers and photoresist compositions comprising same |
| 02/01/2005 | US6849375 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 02/01/2005 | US6849374 Can be imaged with short wavelength radiation |
| 02/01/2005 | US6849373 Antireflective coating compositions comprising photoacid generators |
| 02/01/2005 | US6849363 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 02/01/2005 | US6849308 Method of forming a masking pattern on a surface |
| 02/01/2005 | US6849293 Method to minimize iso-dense contact or via gap filling variation of polymeric materials in the spin coat process |
| 02/01/2005 | US6849200 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 02/01/2005 | US6849153 Supplying a mixture of etching gas and an acid neutralizing gas into a vacuum chamber in which a water soluble material of sidewall polymer rails left behind on aluminum/copper line from reactive ion etching, removing it with deionized water |
| 02/01/2005 | US6848876 Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers |
| 02/01/2005 | US6848782 Color filter and process for producing the same |
| 02/01/2005 | US6848455 Comprises simultaneous application of ultraviolet radiation and hydrogen peroxide and dissolved ozone |
| 02/01/2005 | US6848175 Method of forming an out-of-plane structure |
| 01/27/2005 | WO2005008754A1 Flare measurement method, exposure method, and flare measurement mask |
| 01/27/2005 | WO2005008753A1 Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and template creation program |
| 01/27/2005 | WO2005008752A1 Exposure device, exposure method, and device manufacturing method |
| 01/27/2005 | WO2005008747A2 Methods and systems for inspection of wafers and reticles using designer intent data |
| 01/27/2005 | WO2005008700A1 Electric double layer capacitor |
| 01/27/2005 | WO2005008636A1 Process for producing magnetic recording medium, stamper for magnetic recording medium and intermediate body for magnetic recording medium |
| 01/27/2005 | WO2005008340A1 Material for forming fine pattern and method for forming fine pattern using the same |
| 01/27/2005 | WO2005008339A2 Lithographic projection apparatus, purge gas supply system and gas purging method |
| 01/27/2005 | WO2005008338A1 Negative photosensitive resin composition and negative photosensitive element |
| 01/27/2005 | WO2005008337A1 Photosensitive resin composition |
| 01/27/2005 | WO2005008336A2 Dissolution inhibitors in photoresist compositions for microlithography |
| 01/27/2005 | WO2005008335A2 Method for analysing objects in microlithography |
| 01/27/2005 | WO2005008321A1 Method of manufacturing a reflector, and liquid crystal display device including such a reflector |
| 01/27/2005 | WO2005007759A2 Viscosity reducible radiation curable resin composition |
| 01/27/2005 | WO2005007747A2 Photosensitive silsesquioxane resin |
| 01/27/2005 | WO2005007719A2 Positive photoresist composition and method of forming resist pattern |
| 01/27/2005 | WO2005007718A1 Positive photoresist composition and method of forming resist pattern |
| 01/27/2005 | WO2005007564A1 Method for fixing metal particle, and method for producing metal particle-containing substrate, method for producing carbon nanotube-containing substrate and method for producing semiconductor crystalline rod-containing substrate respectively using such fixing method |
| 01/27/2005 | WO2004095110A8 Exposure control |
| 01/27/2005 | WO2004092837A3 Positive photoresist compositions having enhanced processing time |
| 01/27/2005 | WO2004077161A3 Method for producing resist substrates |
| 01/27/2005 | WO2004025364A3 Four color digital printing process and color image element using color-sensitive photopolymers |
| 01/27/2005 | WO2004010227A3 Recording an image with multiple intensity levels |
| 01/27/2005 | US20050022150 Optical proximity correction method |
| 01/27/2005 | US20050020793 Fluorinated copolymers for microlithography |
| 01/27/2005 | US20050020711 acrylated diisocyanates derived from isocynaurate trimers; automobile paint |
| 01/27/2005 | US20050020710 Hybrid onium salt |
| 01/27/2005 | US20050020087 Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate |
| 01/27/2005 | US20050020055 Semiconductor processing methods |
| 01/27/2005 | US20050019962 Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system |