| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/03/2005 | US20050026050 Exposure mask and mask pattern production method |
| 02/03/2005 | US20050025946 Mixture of binder, photopolymerizable compound and photoinitiator |
| 02/03/2005 | US20050025882 comprise a main optical body comprising a crystal containing halogen atoms; a reflectivity coating for changing the reflectivity of a surface of the main body; and, an intermediate protective layer comprising a material containing free halogen atoms |
| 02/03/2005 | US20050025403 Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device |
| 02/03/2005 | US20050024643 Calibration method for a lithographic apparatus and device manufacturing method |
| 02/03/2005 | US20050024622 Exposure mask and method for divisional exposure |
| 02/03/2005 | US20050024621 Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device |
| 02/03/2005 | US20050024620 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/03/2005 | US20050024619 Exposure apparatus |
| 02/03/2005 | US20050024617 Projection optical system and exposure apparatus having the projection optical system |
| 02/03/2005 | US20050024616 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby |
| 02/03/2005 | US20050024615 Lithographic apparatus and device manufacturing method |
| 02/03/2005 | US20050024614 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/03/2005 | US20050024613 Spatial light modulator, lithographic apparatus and device manufacturing method |
| 02/03/2005 | US20050024612 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
| 02/03/2005 | US20050024611 Lithographic apparatus and integrated circuit manufacturing method |
| 02/03/2005 | US20050024610 Exposure apparatus and stage device, and device manufacturing method |
| 02/03/2005 | US20050024609 Lithographic apparatus and device manufacturing method |
| 02/03/2005 | US20050024477 Exposure head |
| 02/03/2005 | US20050023957 Method for forming pattern of one-dimensional nanostructure |
| 02/03/2005 | US20050023665 Curable encapsulant compositions |
| 02/03/2005 | US20050023486 Electron beam exposure apparatus and electron beam measurement module |
| 02/03/2005 | US20050023444 System and method for compensating for dark current in photosensitive devices |
| 02/03/2005 | US20050023187 Thermophoretic protection of reticles |
| 02/03/2005 | US20050022697 High performance sol-gel spin-on glass materials |
| 02/03/2005 | US20050022411 Positioning aid and method for assisting in aligning heavy machines |
| 02/03/2005 | DE10330907A1 Vorrichtung und Verfahren zum Bearbeiten einer Maskenvorlage für die Halbleiterherstellung Apparatus and method for processing a mask pattern for semiconductor manufacturing |
| 02/03/2005 | DE10330421A1 Belichtungsstation für Folienbahnen Exposure station for film webs |
| 02/03/2005 | DE10329865A1 Semiconductor wafer alignment method during formation of structures in the photosensitive surface layer using masks, whereby the last illumination field of one step is used as the first illumination field of the next |
| 02/03/2005 | DE10329141A1 Extreme ultraviolet illumination system for microlithography, propagates chief ray between pupil and field facet mirrors, and between pupil facet mirror and reflective element, such that propagated ray are opposite and parallel |
| 02/03/2005 | DE10328525A1 Screen printing lacquer for producing ceramic transfer design for decorating ceramics, porcelain and glass contains cationically polymerizable monomer and cationic polymerization initiator |
| 02/03/2005 | DE10314253B4 Verfahren zur scannenden Beleuchtung eines Retikels sowie mikrolithografische Projektionsbelichtungsanlage A method for scanning illumination of a reticle and microlithographic projection exposure apparatus |
| 02/03/2005 | DE102004029007A1 Verfahren zum Entwickeln eines Fotolackmaterials und Halbleiteranordnung A method for developing a photoresist material, and the semiconductor arrangement |
| 02/02/2005 | EP1503403A1 Reticle and optical characteristic measuring method |
| 02/02/2005 | EP1503247A2 Image-forming method and developer |
| 02/02/2005 | EP1503246A2 Positioning mechanism, exposure apparatus, and device manufacturing method |
| 02/02/2005 | EP1503245A2 Modulation of exposure duration and/or power to achieve gray-scaling in maskless photolithography |
| 02/02/2005 | EP1503244A1 Lithographic projection apparatus and device manufacturing method |
| 02/02/2005 | EP1503243A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/02/2005 | EP1503242A2 Stereolithography resins and methods |
| 02/02/2005 | EP1502941A2 Image-forming method and developer |
| 02/02/2005 | EP1502922A1 Curable encapsulant compositions |
| 02/02/2005 | EP1502881A1 Positioning assistance and procedure for the support of the adjustment of heavy machines |
| 02/02/2005 | EP1502736A2 Lithographic printing process |
| 02/02/2005 | EP1502735A2 Lithographic printing plate precursor and polymerizable composition |
| 02/02/2005 | EP1502335A2 Automatic gas control system for a gas discharge laser |
| 02/02/2005 | EP1502334A1 High power deep ultraviolet laser with long life optics |
| 02/02/2005 | EP1502292A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 02/02/2005 | EP1502291A1 Exposure apparatus and device fabrication method using the same |
| 02/02/2005 | EP1502288A2 Lithography laser with beam delivery and beam pointing control |
| 02/02/2005 | EP1502158A1 Projection lens comprising an extremely high aperture |
| 02/02/2005 | EP1502157A1 Lens consisting of a crystalline material |
| 02/02/2005 | EP1502156A2 Method for producing a unit comprising three-dimensional surface structuring and use of said method |
| 02/02/2005 | EP1502155A1 Radiation curable resin composition and rapid prototyping process using the same |
| 02/02/2005 | EP1502154A2 Patterning of solid state features by direct write nanolithographic printing |
| 02/02/2005 | EP1502132A1 Method for producing an optical element from a quartz substrate |
| 02/02/2005 | EP1501916A1 Non-corrosive cleaning compositions for removing etch residues |
| 02/02/2005 | EP1501877A1 Fluorinated polymers |
| 02/02/2005 | EP1326951B1 Stabilized alkaline compositions for cleaning microelectronic substrates |
| 02/02/2005 | EP1086156A4 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 02/02/2005 | CN2676244Y Cylinder grating photoetching machine |
| 02/02/2005 | CN1575525A Contact portion of semiconductor device and method for manufacturing the same and thin film transistor array panel for displaying device including the contact portion and method for manufacturing the |
| 02/02/2005 | CN1575438A Photoacid generators in photoresist compositions for microlithography |
| 02/02/2005 | CN1575437A Method for obtaining elliptical and rounded shapes using beam shaping |
| 02/02/2005 | CN1575331A Composition for cleaning |
| 02/02/2005 | CN1575328A Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 02/02/2005 | CN1575052A Low moisture donor substrate coatable with organic layers transferrable in response in incident radiation |
| 02/02/2005 | CN1574251A Substrate etching method and etching disposal device |
| 02/02/2005 | CN1574246A Composition for removal of sidewall polymer and etchant residues without a separate solvent rinse step |
| 02/02/2005 | CN1574245A Terminal testing method and device |
| 02/02/2005 | CN1574242A Processing method and processing system |
| 02/02/2005 | CN1574237A Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate |
| 02/02/2005 | CN1574234A Pattern formation method |
| 02/02/2005 | CN1574225A Method of fabricating polycrystalline silicon and switching device using polycrystalline silicon |
| 02/02/2005 | CN1574224A Film coating unit and film coating method |
| 02/02/2005 | CN1574222A Photosensitive tabular member suction mechanism and image recording device |
| 02/02/2005 | CN1574221A Liquid supplying device and substrate processing device |
| 02/02/2005 | CN1574220A Pattern formation method |
| 02/02/2005 | CN1574219A Pattern formation method |
| 02/02/2005 | CN1574218A Pattern formation method |
| 02/02/2005 | CN1574217A Semiconductor design layout pattern formation method and graphic pattern formation unit |
| 02/02/2005 | CN1574163A Photocured resin composition and former substrate of plasm display board |
| 02/02/2005 | CN1573576A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573575A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573574A Support of largescale thin shell and its attachment device |
| 02/02/2005 | CN1573573A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573572A Projection optical system for maskless lithography |
| 02/02/2005 | CN1573571A Immersion photolithography system and method using microchannel nozzles |
| 02/02/2005 | CN1573570A Method of preparing components, prepared component, lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573569A Exposure method for exposure device |
| 02/02/2005 | CN1573568A Substrate processing apparatus and method for adjusting a substrate transfer position |
| 02/02/2005 | CN1573567A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573566A Masking device, lithographic apparatus, and device manufacturing method |
| 02/02/2005 | CN1573565A Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 02/02/2005 | CN1573564A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573563A Method of forming uniform features using photoresist |
| 02/02/2005 | CN1573562A System and method for producing gray scaling in a maskless lithography system |
| 02/02/2005 | CN1573561A Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 02/02/2005 | CN1573560A Lithographic apparatus, method of calibrating, and device manufacturing method |
| 02/02/2005 | CN1573559A Double-sided projection exposure device of belt-shape workpieces |