| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/09/2005 | CN1576895A Method of fabricating micro-lens and method of fabricating optical module using the method |
| 02/09/2005 | CN1576778A Original and its producing method, exposure apparatus inspection system and method |
| 02/09/2005 | CN1576272A Sulfonate and a resist composition |
| 02/09/2005 | CN1575975A Lithographic process involving on press development |
| 02/09/2005 | CN1189065C Method for making printed circuit board with corrosion-resistant dry film |
| 02/09/2005 | CN1188904C Method for cleaning polymer on aluminium/copper metal connection wire after reaction ion etching |
| 02/09/2005 | CN1188899C Method for detecting corrected accuracy of optical cover machine table |
| 02/09/2005 | CN1188749C Photosensitive resin composition and method for forming Liquid crystal display inter layer insulation layer pattern |
| 02/09/2005 | CN1188748C Optical imaging compositions with improved flexibility and stripping ability, dry film photoetching glue and oligomer thereof |
| 02/09/2005 | CN1188747C Optical imaging compositions with improved stripping ability and resolution and dry film photoetching glue |
| 02/09/2005 | CN1188722C Technology for preparing electrostatic-type micro-mechanical full-light switch |
| 02/08/2005 | US6854106 Reticles and methods of forming and using the same |
| 02/08/2005 | US6854105 Chip arrangement determining apparatus and method |
| 02/08/2005 | US6854104 Optical proximity correction system for local correction of an aerial image produced from a mask defining a target design; includes an analyzer and a controller, |
| 02/08/2005 | US6853871 Exposure apparatus |
| 02/08/2005 | US6853743 Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium |
| 02/08/2005 | US6853653 Laser spectral engineering for lithographic process |
| 02/08/2005 | US6853451 Alignment system of semiconductor exposure apparatus and diaphragm unit of the alignment system |
| 02/08/2005 | US6853443 Exposure apparatus, substrate processing system, and device manufacturing method |
| 02/08/2005 | US6853442 Projection exposure apparatus and device manufacturing method that change a resonator length of a continuous emission excimer laser |
| 02/08/2005 | US6853441 Projection aligner |
| 02/08/2005 | US6853440 Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination |
| 02/08/2005 | US6853439 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components |
| 02/08/2005 | US6853417 Slant reflector with bump structure and fabricating method thereof |
| 02/08/2005 | US6853099 Linear pulse motor, stage apparatus, and exposure apparatus |
| 02/08/2005 | US6852989 Positioning system for use in lithographic apparatus |
| 02/08/2005 | US6852988 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects |
| 02/08/2005 | US6852791 Anti-reflection coating forming composition |
| 02/08/2005 | US6852767 Active energy beam curable composition having predetermined acid value or amine value and ink containing the same |
| 02/08/2005 | US6852766 Photoreactive composition comprises irradiating the composition with light photons, thereby inducing at least one acid- or radical- initiated chemical reaction where the composition is exposed to the light |
| 02/08/2005 | US6852642 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 02/08/2005 | US6852476 Radiation sensitive resin composition, rib, rib forming method and display element |
| 02/08/2005 | US6852474 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 02/08/2005 | US6852471 Exposure control for phase shifting photolithographic masks |
| 02/08/2005 | US6852470 Heat-sensitive lithographic printing plate precursor |
| 02/08/2005 | US6852469 Comprising layer of particulate hydrophobicizing precursor, a light to heat conversion material, a hydrophilic polymer having a silane coupling group, where the sol gel catalyst is a metal complex; excellent press life and print quality |
| 02/08/2005 | US6852468 For ultra-microlithographic processes such as production of high-capacity microchips; improved edge roughness, pitch dependency and surface roughening upon etching Positive resist composition |
| 02/08/2005 | US6852467 Positive resist composition |
| 02/08/2005 | US6852466 For producing well-resolved images |
| 02/08/2005 | US6852465 Photoresist composition for imaging thick films |
| 02/08/2005 | US6852456 Reducing asymmetrically deposited film induced registration error |
| 02/08/2005 | US6852454 Multi-tiered lithographic template and method of formation and use |
| 02/08/2005 | US6852421 Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images |
| 02/08/2005 | US6851873 Method and apparatus for removing organic films |
| 02/03/2005 | WO2005010986A1 In-print method and in-print device |
| 02/03/2005 | WO2005010963A1 Illuminating optical system, exposure system and exposure method |
| 02/03/2005 | WO2005010962A1 Exposure apparatus, device producing method, and exposure apparatus controlling method |
| 02/03/2005 | WO2005010961A1 Exposure apparatus |
| 02/03/2005 | WO2005010960A1 Inspection method and inspection device for projection optical system, and production method for projection optical system |
| 02/03/2005 | WO2005010959A1 Development processing device and development processing method |
| 02/03/2005 | WO2005010940A2 High resolution, dynamic positioning mechanism for specimen inspection and processing |
| 02/03/2005 | WO2005010926A2 Procede de fabrication de film conducteur anisotrope |
| 02/03/2005 | WO2005010620A1 A method for drying developed photoresist in semiconductor processing |
| 02/03/2005 | WO2005010619A2 Lithographic projection apparatus, purge gas supply system and gas purging |
| 02/03/2005 | WO2005010618A2 Modulator circuitry |
| 02/03/2005 | WO2005010617A2 Method of cleaning a surface of an optical device |
| 02/03/2005 | WO2005010616A1 Positive photosensitive resin composition |
| 02/03/2005 | WO2005010615A1 Positive type photosensitive resin composition |
| 02/03/2005 | WO2005010611A2 Wafer table for immersion lithography |
| 02/03/2005 | WO2005010573A1 Method for production of micro-optics structures |
| 02/03/2005 | WO2005010077A1 Silicon-containing polymer, process for rpoducing the same, heat-resistant resin composition, and heat-resistant film |
| 02/03/2005 | WO2005010062A1 Polymerizable unsaturated monomer containing fluorine atom, polymer compound containing fluorine atom and resin composition for photoresist |
| 02/03/2005 | WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer |
| 02/03/2005 | WO2004082814A3 Method and device for wetting a substrate with a liquid |
| 02/03/2005 | WO2004077530A3 Titanium carboxylate films for use in semiconductor processing |
| 02/03/2005 | WO2004074930A3 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 02/03/2005 | WO2004074242A3 Halogenated oxime derivatives and the use thereof as latent acids |
| 02/03/2005 | WO2004066352A3 System and method for providing high brightness illumination |
| 02/03/2005 | WO2004065635A3 Laser exposure of photosensitive masks for dna microarray fabrication |
| 02/03/2005 | US20050028129 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout |
| 02/03/2005 | US20050027905 Reflective mirror for lithographic exposure and production method |
| 02/03/2005 | US20050027388 Reducing asymmetrically deposited film induced registration error |
| 02/03/2005 | US20050027387 Substrate processing apparatus and substrate processing method |
| 02/03/2005 | US20050026438 Semiconductor processing methods |
| 02/03/2005 | US20050026435 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/03/2005 | US20050026385 Method for manufacturing a semiconductor device and semiconductor device with overlay mark |
| 02/03/2005 | US20050026340 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |
| 02/03/2005 | US20050026092 Carbonate, bicarbonate and alkali silicate; permits the formation of images excellent in printing durability, without using any heat-treatment after the exposure of the image-forming material |
| 02/03/2005 | US20050026091 Image-forming method and developer |
| 02/03/2005 | US20050026090 Method for high aspect ratio pattern transfer |
| 02/03/2005 | US20050026087 Controlling wavelength for etching photomask; antireflectivity layer; stabilization of photoresist pattern over layer to be etched ; photolithography |
| 02/03/2005 | US20050026086 Photolithographic techniques for producing angled lines |
| 02/03/2005 | US20050026085 Multilayer; electroconductive layer, dielectrics, antireflectivity layer; forming photoresist pattern; dry etching using photoresist pattern as mask |
| 02/03/2005 | US20050026084 Photoresist layer for pattening a semiconductor; exposure a semiconductor to fluorine |
| 02/03/2005 | US20050026083 Translucent polyester for enhancing contrast in lithographic printing members |
| 02/03/2005 | US20050026082 Mixture of dye, free radical catalyst and unsaturated compound in binder |
| 02/03/2005 | US20050026081 Photopolymerizable compound in binder with photoinitiator |
| 02/03/2005 | US20050026080 Forming patterns upon exposure to ultraviolet radiation light sources |
| 02/03/2005 | US20050026079 Recording medium |
| 02/03/2005 | US20050026078 Forming photoresists by photolithography; fine pattern |
| 02/03/2005 | US20050026077 Forming relief images; for ((opto)electronics; photoresists; mixture of binder and photoactivable compound |
| 02/03/2005 | US20050026076 reacting vinyl phosphonic acid and vinyl acetate in the presence of a free radical catalyst to make a vinyl alcohol-vinyl phosphonic acid copolymer; protective top coating of photoresist; minimal pattern distortion caused by swing phenomenon during patterning; photolithography |
| 02/03/2005 | US20050026075 Lithographic printing plate precursor and polymerizable composition |
| 02/03/2005 | US20050026074 Positive resist composition |
| 02/03/2005 | US20050026073 Positive resist composition and method of forming resist pattern using the same |
| 02/03/2005 | US20050026071 Photoresist polymers and photoresist compositions comprising the same |
| 02/03/2005 | US20050026070 Photoresist polymer and photoresist composition containing the same |
| 02/03/2005 | US20050026069 Solventless thermosetting photosensitive via-filling material |
| 02/03/2005 | US20050026068 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
| 02/03/2005 | US20050026054 Measurement reflection, calibration data |