| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/10/2005 | US20050030513 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030512 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/10/2005 | US20050030511 Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method |
| 02/10/2005 | US20050030510 Projection exposure apparatus and device manufacturing method |
| 02/10/2005 | US20050030509 Illumination optical system in exposure apparatus |
| 02/10/2005 | US20050030508 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method |
| 02/10/2005 | US20050030506 Projection exposure method and projection exposure system |
| 02/10/2005 | US20050030505 Exposure apparatus and exposure method |
| 02/10/2005 | US20050030504 Exposure apparatus |
| 02/10/2005 | US20050030503 Lithographic apparatus and device manufacturing method |
| 02/10/2005 | US20050030502 Photomask, exposure control method and method of manufacturing a semiconductor device |
| 02/10/2005 | US20050030501 Lithographic apparatus and device manufacturing method |
| 02/10/2005 | US20050030500 Apparatus for forming pattern |
| 02/10/2005 | US20050030499 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components |
| 02/10/2005 | US20050030498 Lithographic projection apparatus and device manufacturing method |
| 02/10/2005 | US20050030497 Liquid immersion type exposure apparatus |
| 02/10/2005 | US20050030496 Exposure apparatus |
| 02/10/2005 | US20050030495 Thermal proximity effects in lithography |
| 02/10/2005 | US20050029981 Foam core chuck for the scanning stage of a lithography system |
| 02/10/2005 | US20050029473 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/10/2005 | US20050029236 System and method for manufacturing embedded conformal electronics |
| 02/10/2005 | US20050028699 Image recorder and image recording method |
| 02/10/2005 | US20050028697 Lithographic printing process |
| 02/10/2005 | US20050028618 System for determining characteristics of substrates employing fluid geometries |
| 02/10/2005 | US20050028314 Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| 02/10/2005 | DE10355699A1 Photoresistpolymer und Photoresistzusammensetzung, die dieses enthält Photoresist polymer and photoresist composition containing this |
| 02/10/2005 | DE10351453B3 Angled correcting process for lighting of printing flat involves forming indicator lines from sections along angled path from adjacent picture lines of matrix |
| 02/10/2005 | CA2532256A1 Master mold for duplicating fine structure and production method thereof |
| 02/09/2005 | EP1505630A2 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/09/2005 | EP1505629A2 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 02/09/2005 | EP1505588A2 Method for manufacturing a photoresist-coated glass board, method for manufacturing a stamper and method for manufacturing a recording medium |
| 02/09/2005 | EP1505444A1 Lithographic apparatus and device manufacturing method |
| 02/09/2005 | EP1505443A2 Resist polymer, resist composition and patterning process |
| 02/09/2005 | EP1505442A1 Positive resist composition and pattern formation method using the same |
| 02/09/2005 | EP1505441A2 Alkali-soluble polymer and polymerizable composition thereof |
| 02/09/2005 | EP1505440A2 Positive resist composition and method of forming resist pattern using the same |
| 02/09/2005 | EP1505439A2 Positive photosensitive composition and method of forming resist pattern |
| 02/09/2005 | EP1505438A2 Stencil mask, charged particle irradiation apparatus and the method |
| 02/09/2005 | EP1505146A1 Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols |
| 02/09/2005 | EP1505090A1 Reactive diluent composition and curable resin composition |
| 02/09/2005 | EP1505050A1 Bridged carbocyclic compounds and methods of making and using same |
| 02/09/2005 | EP1504308A2 Projection method comprising pupillary filtration and a projection lens therefor |
| 02/09/2005 | EP1504307A1 Imaging process and products providing durable assemblages |
| 02/09/2005 | EP1504306A1 Photopolymerizable compositions comprising thianthrenium salts as cationic photoinitiators |
| 02/09/2005 | EP1392675B1 Substituted oxime derivatives and the use thereof as latent acids |
| 02/09/2005 | EP1298491B1 Resist composition |
| 02/09/2005 | EP1257881A4 Laser imaged printing plates comprising a multi-layer slip film |
| 02/09/2005 | EP1110437B1 Scanning method and apparatus |
| 02/09/2005 | EP0984931B1 Aromatic maleimides and their use as photoinitiators |
| 02/09/2005 | CN1579003A Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 02/09/2005 | CN1578932A Method for releasing resist |
| 02/09/2005 | CN1578931A Positive resist composition and method of forming resist pattern |
| 02/09/2005 | CN1578930A Environmentally durable, self-sealing optical articles |
| 02/09/2005 | CN1578766A 杂化鎓盐 Hybrid salt |
| 02/09/2005 | CN1578602A Image forming apparatus and image forming method and program |
| 02/09/2005 | CN1578596A Image forming apparatus |
| 02/09/2005 | CN1578595A 图像形成装置 The image forming apparatus |
| 02/09/2005 | CN1578377A Plotter and plotting method |
| 02/09/2005 | CN1577766A Semiconductor device manufacture method and etching system |
| 02/09/2005 | CN1577741A Method for producing substrate with etch-resistant film |
| 02/09/2005 | CN1577739A 涂布方法和涂布装置 Coating method and coating apparatus |
| 02/09/2005 | CN1577738A Single-line arrangement development processing apparatus and method |
| 02/09/2005 | CN1577737A Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device |
| 02/09/2005 | CN1577731A Semiconductor production system |
| 02/09/2005 | CN1577112A Slushing composition for removing color etch - resistant agent in tft-lcd producing technology |
| 02/09/2005 | CN1577111A Photoresist stripping liquid composition and stripping methof for photoresist using photoresist stripping liquid composition |
| 02/09/2005 | CN1577110A Photoresist stripping liquid composition and stripping methof for photoresist using photoresist stripping liquid composition |
| 02/09/2005 | CN1577109A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/09/2005 | CN1577108A Safety mechanism for a lithographic patterning device |
| 02/09/2005 | CN1577107A Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/09/2005 | CN1577106A Lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577105A Exposure apparatus |
| 02/09/2005 | CN1577104A Lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577103A Lithographic apparatus and integrated circuit manufacturing method |
| 02/09/2005 | CN1577102A Large field of view protection optical system with aberration correctability for flat panel displays |
| 02/09/2005 | CN1577101A Immersion photolithography system and method using inverted wafer-projection optics interface |
| 02/09/2005 | CN1577100A Lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577099A Method and apparatus of simultaneous optimization for na-sigma exposure settings and scattering bars OPC using a device layout |
| 02/09/2005 | CN1577098A Lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577097A Laser produced plasma radiation system with contamination barrier |
| 02/09/2005 | CN1577096A Calibration method for a lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577095A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/09/2005 | CN1577094A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/09/2005 | CN1577093A Lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577092A Method for producing semiconductor device using illuminating system including diffraction optical element |
| 02/09/2005 | CN1577091A Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 02/09/2005 | CN1577090A Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crytal display device using the same |
| 02/09/2005 | CN1577089A Tinted photosensitive resin composition |
| 02/09/2005 | CN1577088A 感光性树脂前体组合物 The photosensitive resin precursor composition |
| 02/09/2005 | CN1577087A Lithographic printing plate precursor and lithographic printing method |
| 02/09/2005 | CN1577086A Photopolymerization lithographic plate |
| 02/09/2005 | CN1577084A Method for producing grey mask |
| 02/09/2005 | CN1577082A Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus |
| 02/09/2005 | CN1577080A Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same |
| 02/09/2005 | CN1577029A Large-size substrate |
| 02/09/2005 | CN1577018A Circuit array substrate and method of manufacturing the same |
| 02/09/2005 | CN1576961A Apparatus and method for processing substrate |
| 02/09/2005 | CN1576908A Polarizer, projection lens system, exposure device and exposure method |
| 02/09/2005 | CN1576903A Mirror and lithographic apparatus with mirror |
| 02/09/2005 | CN1576899A Method for producing Light conducting plate mould |