| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/15/2005 | US6856408 Line profile asymmetry measurement using scatterometry |
| 02/15/2005 | US6856404 Scanning exposure method and apparatus, and device manufacturing method using the same |
| 02/15/2005 | US6856402 Interferometer with dynamic beam steering element |
| 02/15/2005 | US6856379 Polarizer and microlithography projection system with a polarizer |
| 02/15/2005 | US6856378 Method of photolithographic exposure dose control as a function of resist sensitivity |
| 02/15/2005 | US6856377 Relay image optical system, and illuminating optical device and exposure system provided with the optical system |
| 02/15/2005 | US6856376 Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby |
| 02/15/2005 | US6856334 Sheet material fixing device |
| 02/15/2005 | US6855997 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
| 02/15/2005 | US6855646 Plasma polymerized electron beam resist |
| 02/15/2005 | US6855487 Method and apparatus for refreshment and reuse of loaded developer |
| 02/15/2005 | US6855486 Lithographic method and apparatus |
| 02/15/2005 | US6855485 Prebaking photoresist film; exposure to ultraviolet radiation through photomask in vacuum; development |
| 02/15/2005 | US6855483 Forming a coating including a photosensitive formulation containing carboxylic acid structure; irradiating coating in a predetermined pattern to convert portion of carboxylic acid structure that is irradiated into a lactone structure |
| 02/15/2005 | US6855482 Without photoresists; for graphic arts reproduction |
| 02/15/2005 | US6855481 Apparatus and a method for forming a pattern using a crystal structure of material |
| 02/15/2005 | US6855480 Photoresist composition |
| 02/15/2005 | US6855478 Microfabrication of organic optical elements |
| 02/15/2005 | US6855477 For forming photoresist pattern; sensitive to high-energy radiation |
| 02/15/2005 | US6855476 Produce a fluorinated alkyl sulfonic acid having a short perfluoroalkyl chain attached to an ether linkage. This ether linkage connects the fluorinated alkyl portion of the molecule with a variety of other substituents. |
| 02/15/2005 | US6855475 Photoresist composition |
| 02/15/2005 | US6855474 Laser thermal color donors with improved aging characteristics |
| 02/15/2005 | US6855466 Planarizing antireflective coating compositions |
| 02/15/2005 | US6855465 Improve the quality of the liquid crystal display panel by using a double-exposure for spacer fabrication. |
| 02/15/2005 | US6855464 Fast and flexible method and system for grating overlay patterns, semiconductors |
| 02/15/2005 | US6855389 Photopolymerizable resin compositions for optical recording media and optical recording media |
| 02/15/2005 | US6855206 Coating film layer moisture adjusting device and planographic printing plate producing method |
| 02/15/2005 | US6854514 Temperature control apparatus and method with recirculated coolant |
| 02/10/2005 | WO2005013601A1 Composition for forming lower layer film for lithography comprising compound having protected carboxyl group |
| 02/10/2005 | WO2005013342A1 Resist removing apparatus |
| 02/10/2005 | WO2005013335A2 Method of depositing patterned films of materials using a positive imaging process |
| 02/10/2005 | WO2005013308A1 Master mold for duplicating fine structure and production method thereof |
| 02/10/2005 | WO2005013194A2 Reduction smith-talbot interferometer prism for micropatterning |
| 02/10/2005 | WO2005013027A1 Lorentz motor control system for a payload |
| 02/10/2005 | WO2005013011A1 Material for thickening resist pattern, method for producing resist pattern using same, and method for manufacturing semiconductor device |
| 02/10/2005 | WO2005013010A1 Method for reclaiming alkyl esters |
| 02/10/2005 | WO2005013009A1 Use of perfluoro-n-alkanes in vacuum ultraviolet applications |
| 02/10/2005 | WO2005013008A2 Method for monitoring and controlling imaging in immersion lithography systems |
| 02/10/2005 | WO2005013007A1 Further method to pattern a substrate |
| 02/10/2005 | WO2005013006A1 Psm alignment method and device |
| 02/10/2005 | WO2005013005A1 Pattern drawing method and pattern drawing device |
| 02/10/2005 | WO2005013004A2 Measuring the effect of flare on line width |
| 02/10/2005 | WO2005013002A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/10/2005 | WO2005012384A1 Modified epoxy resin, process for production thereof, photosensitive resin compositions and photosensitive elements |
| 02/10/2005 | WO2005012374A1 Acrylic polymers and radiation-sensitive resin compositions |
| 02/10/2005 | WO2005012372A1 Fluorine-containing compound, fluorine-containing polymer, method for producing same and resist composition containing same |
| 02/10/2005 | WO2004109405A3 Device for generation of and/or influencing electromagnetic radiation from a plasma |
| 02/10/2005 | WO2004102272A3 Photoresist composition for deep uv and imaging process thereof |
| 02/10/2005 | WO2004092829A3 Masking arrangement and method for producing integrated circuit arrangements |
| 02/10/2005 | WO2004086147A3 Method of imparting patterns of surface relief to rigid substrates |
| 02/10/2005 | WO2004077153A3 Photosensitive composition and use thereof |
| 02/10/2005 | US20050034096 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
| 02/10/2005 | US20050033550 Method for detection of photolithographic defocus |
| 02/10/2005 | US20050032946 Resin composition |
| 02/10/2005 | US20050032935 Heat-curable resin composition |
| 02/10/2005 | US20050032659 Organic solvent, sugar, water and such as n-methylethanolamine; suppressing corrosion; gallium arsenide semiconductors; quality, low cost integrated circuits |
| 02/10/2005 | US20050032658 Monoethanolamine and dimethylacetamide; cleanly eliminates thick films; nondamaging |
| 02/10/2005 | US20050032657 Stripping and cleaning compositions for microelectronics |
| 02/10/2005 | US20050032373 Photoresists and methods for use thereof |
| 02/10/2005 | US20050032004 scanning electron microscope video signaling |
| 02/10/2005 | US20050032003 Multiple exposure method for forming a patterned photoresist layer |
| 02/10/2005 | US20050032002 tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates |
| 02/10/2005 | US20050032001 Method of forming micropattern, method of manufacturing optical recording medium master copy, optical recording medium master copy optical recording medium stamper, and optical recording medium |
| 02/10/2005 | US20050031998 Simple, low cost production of precise micro patterns; forming photoresist film then exposing, developing and dry etching |
| 02/10/2005 | US20050031997 photoresist patterning and development method for achieving convex or concave micro-structural features |
| 02/10/2005 | US20050031996 Fabrication of durable thermal liquid discharge head; forming protective layer and anticavitation film in edge portion of wirings; ink jet printing |
| 02/10/2005 | US20050031995 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 02/10/2005 | US20050031994 Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| 02/10/2005 | US20050031992 Applying a resist to a substrate,exposing the resist, developing the exposed resist, etching the substrate |
| 02/10/2005 | US20050031991 Process for producing a semiconductor device |
| 02/10/2005 | US20050031990 Pattern forming process |
| 02/10/2005 | US20050031989 Resist polymer, resist composition and patterning process |
| 02/10/2005 | US20050031988 Acrylic ester copolymer having bicyclo[2.2.1]heptane, 2-oxofuran and adamantane pendant groups; increased dissolution rate in alkali developer; high energy radiation sensitivity, improved resolution, minimized line edge roughness; micropatterning |
| 02/10/2005 | US20050031987 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device |
| 02/10/2005 | US20050031986 Suitably used as a recording material of a so-called direct plate-making lithographic printing plate precursor, from which a printing plate is directly prepared based on digital signal, for example, from a computer using various kinds of lasers |
| 02/10/2005 | US20050031984 Chemical amplification type positive resist composition |
| 02/10/2005 | US20050031975 Precision photolithography; preventing overlay errors; monitoring wafer deformation and comparing to database reference marks |
| 02/10/2005 | US20050031974 Ensuring uniform illumination of exposure tool; coating with resist film, generating patterns and comparing to reference image to detect abnormalities |
| 02/10/2005 | US20050031972 Design and layout of phase shifting photolithographic masks |
| 02/10/2005 | US20050031971 Computer assisted technology for complex designs; readable definitions of alternating aperture, dark field and complimentary mask generation; simplification, quality |
| 02/10/2005 | US20050031970 Predicting laser induced damage using thermally stimulated current method |
| 02/10/2005 | US20050031969 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 02/10/2005 | US20050031968 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 02/10/2005 | US20050031967 Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device |
| 02/10/2005 | US20050031966 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 02/10/2005 | US20050031964 Lithographic antireflective hardmask compositions and uses thereof |
| 02/10/2005 | US20050031261 Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device |
| 02/10/2005 | US20050031072 X-ray illumination optical system and x-ray reduction exposure apparatus |
| 02/10/2005 | US20050031071 X-ray multi-layer mirror and x-ray exposure apparatus |
| 02/10/2005 | US20050030987 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 02/10/2005 | US20050030656 Facet mirror having a number of mirror facets |
| 02/10/2005 | US20050030653 Facet mirror having a number of mirror facets |
| 02/10/2005 | US20050030638 Aberration correction optical system |
| 02/10/2005 | US20050030635 Projection objective for microlithography |
| 02/10/2005 | US20050030634 Projection exposure machine comprising a projection lens |
| 02/10/2005 | US20050030537 Mark position measuring method and apparatus |
| 02/10/2005 | US20050030536 Overlay measurements using zero-order cross polarization measurements |
| 02/10/2005 | US20050030516 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030515 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/10/2005 | US20050030514 Use of multiple reticles in lithographic printing tools |